R. Delmdahl, “The excimer laser: precision engineering,” Nat. Photonics 4(5), 286–287 (2010).
[Crossref]
J. Bolten, J. Hofrichter, N. Moll, S. Schonenberger, F. Horst, B. J. Offrein, T. Wahlbrink, T. Mollenhauer, and H. Kurz, “CMOS compatible cost-efficient fabrication of SOI grating couplers,” Microelectron. Eng. 86(4-6), 1114–1116 (2009).
[Crossref]
S. Homampour, M. P. Bulk, P. E. Jessop, and A. P. Knights, “Thermal tuning of planar Bragg gratings in silicon-on-insulator rib waveguides,” Phys. Status Solidi., C Curr. Top. Solid State Phys. 6(S1), S240–S243 (2009).
[Crossref]
M. P. Bulk, A. P. Knights, P. E. Jessop, P. Waugh, R. Loiacono, G. Z. Mashanovich, G. T. Reed, and R. M. Gwilliam, “Optical filters utilizing ion implanted Bragg gratings in SOI waveguides,” Adv. Opt. Technol. 2008, 276165 (2008).
A. P. Knights, K. J. Dudeck, W. D. Walters, and P. G. Coleman, “Modification of silicon waveguide structures using ion implantation induced defects,” Appl. Surf. Sci. 255(1), 75–77 (2008).
[Crossref]
A. A. D. T. Adikaari, N. K. Mudugamuwa, and S. R. P. Silva, “Nanocrystalline silicon solar cells from excimer laser crystallization of amorphous silicon,” Sol. Energy Mater. Sol. Cells 92(6), 634–638 (2008).
[Crossref]
N. P. Barradas, K. Arstila, G. Battistig, M. Bianconi, N. Dytlewski, C. Jeynes, E. Kotai, G. Lulli, M. Mayer, E. Rauhala, E. Szilagyi, and M. Thompson, “International atomic energy agency intercomparison of ion beam analysis software,” Nucl. Instrum. Methods Phys. Res. B 262(2), 281–303 (2007).
[Crossref]
L. Pelaz, L. A. Marques, and J. Barbolla, “Ion-beam-induced amorphization and recrystallization in silicon,” J. Appl. Phys. 96(11), 5947–5976 (2004).
[Crossref]
G. Hobler and G. Otto, “Status and open problems in modeling of as-implanted damage in silicon,” Mater. Sci. Semicond. Process. 6(1-3), 1–14 (2003).
[Crossref]
M. J. A. de Dood, A. Polman, T. Zijlstra, and E. W. J. M. Van der Drift, “Amorphous silicon waveguides for microphotonics,” J. Appl. Phys. 92(2), 649 (2002).
[Crossref]
E. C. Baranova, V. M. Gusev, Y. V. Martynenko, C. V. Starinin, and I. B. Haibullin, “On silicon amorphization during different mass ion implantation,” Radiat. Eff. 18(1), 21–26 (1973).
[Crossref]
H. Y. Fan and A. K. Ramdas, “Infrared absorption and photoconductivity in irradiated silicon,” J. Appl. Phys. 30(8), 1127–1134 (1959).
[Crossref]
A. A. D. T. Adikaari, N. K. Mudugamuwa, and S. R. P. Silva, “Nanocrystalline silicon solar cells from excimer laser crystallization of amorphous silicon,” Sol. Energy Mater. Sol. Cells 92(6), 634–638 (2008).
[Crossref]
N. P. Barradas, K. Arstila, G. Battistig, M. Bianconi, N. Dytlewski, C. Jeynes, E. Kotai, G. Lulli, M. Mayer, E. Rauhala, E. Szilagyi, and M. Thompson, “International atomic energy agency intercomparison of ion beam analysis software,” Nucl. Instrum. Methods Phys. Res. B 262(2), 281–303 (2007).
[Crossref]
E. C. Baranova, V. M. Gusev, Y. V. Martynenko, C. V. Starinin, and I. B. Haibullin, “On silicon amorphization during different mass ion implantation,” Radiat. Eff. 18(1), 21–26 (1973).
[Crossref]
L. Pelaz, L. A. Marques, and J. Barbolla, “Ion-beam-induced amorphization and recrystallization in silicon,” J. Appl. Phys. 96(11), 5947–5976 (2004).
[Crossref]
N. P. Barradas, K. Arstila, G. Battistig, M. Bianconi, N. Dytlewski, C. Jeynes, E. Kotai, G. Lulli, M. Mayer, E. Rauhala, E. Szilagyi, and M. Thompson, “International atomic energy agency intercomparison of ion beam analysis software,” Nucl. Instrum. Methods Phys. Res. B 262(2), 281–303 (2007).
[Crossref]
N. P. Barradas, K. Arstila, G. Battistig, M. Bianconi, N. Dytlewski, C. Jeynes, E. Kotai, G. Lulli, M. Mayer, E. Rauhala, E. Szilagyi, and M. Thompson, “International atomic energy agency intercomparison of ion beam analysis software,” Nucl. Instrum. Methods Phys. Res. B 262(2), 281–303 (2007).
[Crossref]
N. P. Barradas, K. Arstila, G. Battistig, M. Bianconi, N. Dytlewski, C. Jeynes, E. Kotai, G. Lulli, M. Mayer, E. Rauhala, E. Szilagyi, and M. Thompson, “International atomic energy agency intercomparison of ion beam analysis software,” Nucl. Instrum. Methods Phys. Res. B 262(2), 281–303 (2007).
[Crossref]
J. Bolten, J. Hofrichter, N. Moll, S. Schonenberger, F. Horst, B. J. Offrein, T. Wahlbrink, T. Mollenhauer, and H. Kurz, “CMOS compatible cost-efficient fabrication of SOI grating couplers,” Microelectron. Eng. 86(4-6), 1114–1116 (2009).
[Crossref]
S. Homampour, M. P. Bulk, P. E. Jessop, and A. P. Knights, “Thermal tuning of planar Bragg gratings in silicon-on-insulator rib waveguides,” Phys. Status Solidi., C Curr. Top. Solid State Phys. 6(S1), S240–S243 (2009).
[Crossref]
M. P. Bulk, A. P. Knights, P. E. Jessop, P. Waugh, R. Loiacono, G. Z. Mashanovich, G. T. Reed, and R. M. Gwilliam, “Optical filters utilizing ion implanted Bragg gratings in SOI waveguides,” Adv. Opt. Technol. 2008, 276165 (2008).
A. P. Knights, K. J. Dudeck, W. D. Walters, and P. G. Coleman, “Modification of silicon waveguide structures using ion implantation induced defects,” Appl. Surf. Sci. 255(1), 75–77 (2008).
[Crossref]
M. J. A. de Dood, A. Polman, T. Zijlstra, and E. W. J. M. Van der Drift, “Amorphous silicon waveguides for microphotonics,” J. Appl. Phys. 92(2), 649 (2002).
[Crossref]
R. Delmdahl, “The excimer laser: precision engineering,” Nat. Photonics 4(5), 286–287 (2010).
[Crossref]
A. P. Knights, K. J. Dudeck, W. D. Walters, and P. G. Coleman, “Modification of silicon waveguide structures using ion implantation induced defects,” Appl. Surf. Sci. 255(1), 75–77 (2008).
[Crossref]
N. P. Barradas, K. Arstila, G. Battistig, M. Bianconi, N. Dytlewski, C. Jeynes, E. Kotai, G. Lulli, M. Mayer, E. Rauhala, E. Szilagyi, and M. Thompson, “International atomic energy agency intercomparison of ion beam analysis software,” Nucl. Instrum. Methods Phys. Res. B 262(2), 281–303 (2007).
[Crossref]
H. Y. Fan and A. K. Ramdas, “Infrared absorption and photoconductivity in irradiated silicon,” J. Appl. Phys. 30(8), 1127–1134 (1959).
[Crossref]
E. C. Baranova, V. M. Gusev, Y. V. Martynenko, C. V. Starinin, and I. B. Haibullin, “On silicon amorphization during different mass ion implantation,” Radiat. Eff. 18(1), 21–26 (1973).
[Crossref]
M. P. Bulk, A. P. Knights, P. E. Jessop, P. Waugh, R. Loiacono, G. Z. Mashanovich, G. T. Reed, and R. M. Gwilliam, “Optical filters utilizing ion implanted Bragg gratings in SOI waveguides,” Adv. Opt. Technol. 2008, 276165 (2008).
E. C. Baranova, V. M. Gusev, Y. V. Martynenko, C. V. Starinin, and I. B. Haibullin, “On silicon amorphization during different mass ion implantation,” Radiat. Eff. 18(1), 21–26 (1973).
[Crossref]
G. Hobler and G. Otto, “Status and open problems in modeling of as-implanted damage in silicon,” Mater. Sci. Semicond. Process. 6(1-3), 1–14 (2003).
[Crossref]
J. Bolten, J. Hofrichter, N. Moll, S. Schonenberger, F. Horst, B. J. Offrein, T. Wahlbrink, T. Mollenhauer, and H. Kurz, “CMOS compatible cost-efficient fabrication of SOI grating couplers,” Microelectron. Eng. 86(4-6), 1114–1116 (2009).
[Crossref]
S. Homampour, M. P. Bulk, P. E. Jessop, and A. P. Knights, “Thermal tuning of planar Bragg gratings in silicon-on-insulator rib waveguides,” Phys. Status Solidi., C Curr. Top. Solid State Phys. 6(S1), S240–S243 (2009).
[Crossref]
J. Bolten, J. Hofrichter, N. Moll, S. Schonenberger, F. Horst, B. J. Offrein, T. Wahlbrink, T. Mollenhauer, and H. Kurz, “CMOS compatible cost-efficient fabrication of SOI grating couplers,” Microelectron. Eng. 86(4-6), 1114–1116 (2009).
[Crossref]
S. Homampour, M. P. Bulk, P. E. Jessop, and A. P. Knights, “Thermal tuning of planar Bragg gratings in silicon-on-insulator rib waveguides,” Phys. Status Solidi., C Curr. Top. Solid State Phys. 6(S1), S240–S243 (2009).
[Crossref]
M. P. Bulk, A. P. Knights, P. E. Jessop, P. Waugh, R. Loiacono, G. Z. Mashanovich, G. T. Reed, and R. M. Gwilliam, “Optical filters utilizing ion implanted Bragg gratings in SOI waveguides,” Adv. Opt. Technol. 2008, 276165 (2008).
N. P. Barradas, K. Arstila, G. Battistig, M. Bianconi, N. Dytlewski, C. Jeynes, E. Kotai, G. Lulli, M. Mayer, E. Rauhala, E. Szilagyi, and M. Thompson, “International atomic energy agency intercomparison of ion beam analysis software,” Nucl. Instrum. Methods Phys. Res. B 262(2), 281–303 (2007).
[Crossref]
S. Homampour, M. P. Bulk, P. E. Jessop, and A. P. Knights, “Thermal tuning of planar Bragg gratings in silicon-on-insulator rib waveguides,” Phys. Status Solidi., C Curr. Top. Solid State Phys. 6(S1), S240–S243 (2009).
[Crossref]
M. P. Bulk, A. P. Knights, P. E. Jessop, P. Waugh, R. Loiacono, G. Z. Mashanovich, G. T. Reed, and R. M. Gwilliam, “Optical filters utilizing ion implanted Bragg gratings in SOI waveguides,” Adv. Opt. Technol. 2008, 276165 (2008).
A. P. Knights, K. J. Dudeck, W. D. Walters, and P. G. Coleman, “Modification of silicon waveguide structures using ion implantation induced defects,” Appl. Surf. Sci. 255(1), 75–77 (2008).
[Crossref]
N. P. Barradas, K. Arstila, G. Battistig, M. Bianconi, N. Dytlewski, C. Jeynes, E. Kotai, G. Lulli, M. Mayer, E. Rauhala, E. Szilagyi, and M. Thompson, “International atomic energy agency intercomparison of ion beam analysis software,” Nucl. Instrum. Methods Phys. Res. B 262(2), 281–303 (2007).
[Crossref]
J. Bolten, J. Hofrichter, N. Moll, S. Schonenberger, F. Horst, B. J. Offrein, T. Wahlbrink, T. Mollenhauer, and H. Kurz, “CMOS compatible cost-efficient fabrication of SOI grating couplers,” Microelectron. Eng. 86(4-6), 1114–1116 (2009).
[Crossref]
M. P. Bulk, A. P. Knights, P. E. Jessop, P. Waugh, R. Loiacono, G. Z. Mashanovich, G. T. Reed, and R. M. Gwilliam, “Optical filters utilizing ion implanted Bragg gratings in SOI waveguides,” Adv. Opt. Technol. 2008, 276165 (2008).
N. P. Barradas, K. Arstila, G. Battistig, M. Bianconi, N. Dytlewski, C. Jeynes, E. Kotai, G. Lulli, M. Mayer, E. Rauhala, E. Szilagyi, and M. Thompson, “International atomic energy agency intercomparison of ion beam analysis software,” Nucl. Instrum. Methods Phys. Res. B 262(2), 281–303 (2007).
[Crossref]
L. Pelaz, L. A. Marques, and J. Barbolla, “Ion-beam-induced amorphization and recrystallization in silicon,” J. Appl. Phys. 96(11), 5947–5976 (2004).
[Crossref]
E. C. Baranova, V. M. Gusev, Y. V. Martynenko, C. V. Starinin, and I. B. Haibullin, “On silicon amorphization during different mass ion implantation,” Radiat. Eff. 18(1), 21–26 (1973).
[Crossref]
M. P. Bulk, A. P. Knights, P. E. Jessop, P. Waugh, R. Loiacono, G. Z. Mashanovich, G. T. Reed, and R. M. Gwilliam, “Optical filters utilizing ion implanted Bragg gratings in SOI waveguides,” Adv. Opt. Technol. 2008, 276165 (2008).
N. P. Barradas, K. Arstila, G. Battistig, M. Bianconi, N. Dytlewski, C. Jeynes, E. Kotai, G. Lulli, M. Mayer, E. Rauhala, E. Szilagyi, and M. Thompson, “International atomic energy agency intercomparison of ion beam analysis software,” Nucl. Instrum. Methods Phys. Res. B 262(2), 281–303 (2007).
[Crossref]
J. Bolten, J. Hofrichter, N. Moll, S. Schonenberger, F. Horst, B. J. Offrein, T. Wahlbrink, T. Mollenhauer, and H. Kurz, “CMOS compatible cost-efficient fabrication of SOI grating couplers,” Microelectron. Eng. 86(4-6), 1114–1116 (2009).
[Crossref]
J. Bolten, J. Hofrichter, N. Moll, S. Schonenberger, F. Horst, B. J. Offrein, T. Wahlbrink, T. Mollenhauer, and H. Kurz, “CMOS compatible cost-efficient fabrication of SOI grating couplers,” Microelectron. Eng. 86(4-6), 1114–1116 (2009).
[Crossref]
A. A. D. T. Adikaari, N. K. Mudugamuwa, and S. R. P. Silva, “Nanocrystalline silicon solar cells from excimer laser crystallization of amorphous silicon,” Sol. Energy Mater. Sol. Cells 92(6), 634–638 (2008).
[Crossref]
J. Bolten, J. Hofrichter, N. Moll, S. Schonenberger, F. Horst, B. J. Offrein, T. Wahlbrink, T. Mollenhauer, and H. Kurz, “CMOS compatible cost-efficient fabrication of SOI grating couplers,” Microelectron. Eng. 86(4-6), 1114–1116 (2009).
[Crossref]
G. Hobler and G. Otto, “Status and open problems in modeling of as-implanted damage in silicon,” Mater. Sci. Semicond. Process. 6(1-3), 1–14 (2003).
[Crossref]
L. Pelaz, L. A. Marques, and J. Barbolla, “Ion-beam-induced amorphization and recrystallization in silicon,” J. Appl. Phys. 96(11), 5947–5976 (2004).
[Crossref]
M. J. A. de Dood, A. Polman, T. Zijlstra, and E. W. J. M. Van der Drift, “Amorphous silicon waveguides for microphotonics,” J. Appl. Phys. 92(2), 649 (2002).
[Crossref]
H. Y. Fan and A. K. Ramdas, “Infrared absorption and photoconductivity in irradiated silicon,” J. Appl. Phys. 30(8), 1127–1134 (1959).
[Crossref]
N. P. Barradas, K. Arstila, G. Battistig, M. Bianconi, N. Dytlewski, C. Jeynes, E. Kotai, G. Lulli, M. Mayer, E. Rauhala, E. Szilagyi, and M. Thompson, “International atomic energy agency intercomparison of ion beam analysis software,” Nucl. Instrum. Methods Phys. Res. B 262(2), 281–303 (2007).
[Crossref]
M. P. Bulk, A. P. Knights, P. E. Jessop, P. Waugh, R. Loiacono, G. Z. Mashanovich, G. T. Reed, and R. M. Gwilliam, “Optical filters utilizing ion implanted Bragg gratings in SOI waveguides,” Adv. Opt. Technol. 2008, 276165 (2008).
J. Bolten, J. Hofrichter, N. Moll, S. Schonenberger, F. Horst, B. J. Offrein, T. Wahlbrink, T. Mollenhauer, and H. Kurz, “CMOS compatible cost-efficient fabrication of SOI grating couplers,” Microelectron. Eng. 86(4-6), 1114–1116 (2009).
[Crossref]
A. A. D. T. Adikaari, N. K. Mudugamuwa, and S. R. P. Silva, “Nanocrystalline silicon solar cells from excimer laser crystallization of amorphous silicon,” Sol. Energy Mater. Sol. Cells 92(6), 634–638 (2008).
[Crossref]
E. C. Baranova, V. M. Gusev, Y. V. Martynenko, C. V. Starinin, and I. B. Haibullin, “On silicon amorphization during different mass ion implantation,” Radiat. Eff. 18(1), 21–26 (1973).
[Crossref]
N. P. Barradas, K. Arstila, G. Battistig, M. Bianconi, N. Dytlewski, C. Jeynes, E. Kotai, G. Lulli, M. Mayer, E. Rauhala, E. Szilagyi, and M. Thompson, “International atomic energy agency intercomparison of ion beam analysis software,” Nucl. Instrum. Methods Phys. Res. B 262(2), 281–303 (2007).
[Crossref]
N. P. Barradas, K. Arstila, G. Battistig, M. Bianconi, N. Dytlewski, C. Jeynes, E. Kotai, G. Lulli, M. Mayer, E. Rauhala, E. Szilagyi, and M. Thompson, “International atomic energy agency intercomparison of ion beam analysis software,” Nucl. Instrum. Methods Phys. Res. B 262(2), 281–303 (2007).
[Crossref]
M. J. A. de Dood, A. Polman, T. Zijlstra, and E. W. J. M. Van der Drift, “Amorphous silicon waveguides for microphotonics,” J. Appl. Phys. 92(2), 649 (2002).
[Crossref]
J. Bolten, J. Hofrichter, N. Moll, S. Schonenberger, F. Horst, B. J. Offrein, T. Wahlbrink, T. Mollenhauer, and H. Kurz, “CMOS compatible cost-efficient fabrication of SOI grating couplers,” Microelectron. Eng. 86(4-6), 1114–1116 (2009).
[Crossref]
A. P. Knights, K. J. Dudeck, W. D. Walters, and P. G. Coleman, “Modification of silicon waveguide structures using ion implantation induced defects,” Appl. Surf. Sci. 255(1), 75–77 (2008).
[Crossref]
M. P. Bulk, A. P. Knights, P. E. Jessop, P. Waugh, R. Loiacono, G. Z. Mashanovich, G. T. Reed, and R. M. Gwilliam, “Optical filters utilizing ion implanted Bragg gratings in SOI waveguides,” Adv. Opt. Technol. 2008, 276165 (2008).
M. J. A. de Dood, A. Polman, T. Zijlstra, and E. W. J. M. Van der Drift, “Amorphous silicon waveguides for microphotonics,” J. Appl. Phys. 92(2), 649 (2002).
[Crossref]
M. P. Bulk, A. P. Knights, P. E. Jessop, P. Waugh, R. Loiacono, G. Z. Mashanovich, G. T. Reed, and R. M. Gwilliam, “Optical filters utilizing ion implanted Bragg gratings in SOI waveguides,” Adv. Opt. Technol. 2008, 276165 (2008).
A. P. Knights, K. J. Dudeck, W. D. Walters, and P. G. Coleman, “Modification of silicon waveguide structures using ion implantation induced defects,” Appl. Surf. Sci. 255(1), 75–77 (2008).
[Crossref]
M. J. A. de Dood, A. Polman, T. Zijlstra, and E. W. J. M. Van der Drift, “Amorphous silicon waveguides for microphotonics,” J. Appl. Phys. 92(2), 649 (2002).
[Crossref]
L. Pelaz, L. A. Marques, and J. Barbolla, “Ion-beam-induced amorphization and recrystallization in silicon,” J. Appl. Phys. 96(11), 5947–5976 (2004).
[Crossref]
H. Y. Fan and A. K. Ramdas, “Infrared absorption and photoconductivity in irradiated silicon,” J. Appl. Phys. 30(8), 1127–1134 (1959).
[Crossref]
G. Hobler and G. Otto, “Status and open problems in modeling of as-implanted damage in silicon,” Mater. Sci. Semicond. Process. 6(1-3), 1–14 (2003).
[Crossref]
J. Bolten, J. Hofrichter, N. Moll, S. Schonenberger, F. Horst, B. J. Offrein, T. Wahlbrink, T. Mollenhauer, and H. Kurz, “CMOS compatible cost-efficient fabrication of SOI grating couplers,” Microelectron. Eng. 86(4-6), 1114–1116 (2009).
[Crossref]
R. Delmdahl, “The excimer laser: precision engineering,” Nat. Photonics 4(5), 286–287 (2010).
[Crossref]
N. P. Barradas, K. Arstila, G. Battistig, M. Bianconi, N. Dytlewski, C. Jeynes, E. Kotai, G. Lulli, M. Mayer, E. Rauhala, E. Szilagyi, and M. Thompson, “International atomic energy agency intercomparison of ion beam analysis software,” Nucl. Instrum. Methods Phys. Res. B 262(2), 281–303 (2007).
[Crossref]
S. Homampour, M. P. Bulk, P. E. Jessop, and A. P. Knights, “Thermal tuning of planar Bragg gratings in silicon-on-insulator rib waveguides,” Phys. Status Solidi., C Curr. Top. Solid State Phys. 6(S1), S240–S243 (2009).
[Crossref]
E. C. Baranova, V. M. Gusev, Y. V. Martynenko, C. V. Starinin, and I. B. Haibullin, “On silicon amorphization during different mass ion implantation,” Radiat. Eff. 18(1), 21–26 (1973).
[Crossref]
A. A. D. T. Adikaari, N. K. Mudugamuwa, and S. R. P. Silva, “Nanocrystalline silicon solar cells from excimer laser crystallization of amorphous silicon,” Sol. Energy Mater. Sol. Cells 92(6), 634–638 (2008).
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