We report on manufacturing and testing results of high efficiency mixed metal dielectric gratings (MMLD) for high power pulse compression applications. The gratings with 1780 l/mm are etched in the top low index layer of a Au-(SiO2/HfO2)4-SiO2 mirror stack. Various grating profiles manufactured in order to modify the near electric field distribution are damage tested on a facility operating at 1.053 µm, 500 fs pulse duration. We evidence that damage threshold is governed by the value of the maximum electric field intensity inside the grating pillar. Moreover thresholds close to 3 J/cm2 beam normal are obtained with this new MMLD grating being thus an interesting alternative to gold and pure dielectric gratings for pulse compression applications.
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