S. H. Chan, A. K. Wong, and E. Y. Lam, “Initialization for robust inverse synthesis of phase-shifting masks in optical projection lithography,” Opt. Express 16(19), 14746–14760 (2008).

[Crossref]
[PubMed]

X. Ma and G. Arce, “Binary mask optimization for inverse lithography with partially coherent illumination,” J. Opt. Soc. Am. A 25(12), 2960–2970 (2008).

[Crossref]

X. Ma and G. R. Arce, “PSM design for inverse lithography with partially coherent illumination,” Opt. Express 16(24), 20126–20141 (2008).

[Crossref]
[PubMed]

J.-C. Yu, P. Yu, and H.-Y. Chao, “Model-based sub-resolution assist features using an inverse lithography method,” Proc. SPIE 7140, 714014 (2008).

[Crossref]

Y. Granik, “Fast pixel-based mask optimization for inverse lithography,” J. Microlith. Microfab. Microsyst. 5, 043002 (2006).

[Crossref]

D. S. Abrams and L. Pang, “Fast inverse lithography technology,” Proc. SPIE 6154, 534–542 (2006).

C. Hung, B. Zhang, E. Guo, L. Pang, Y. Liu, K. Wang, and G. Dai, “Pushing the lithography limit: Applying inverse lithography technology (ILT) at the 65nm generation,” Proc. SPIE 6154, 61541M (2006).

[Crossref]

L. Pang, Y. Liu, and D. Abrams, “Inverse lithography technology (ILT): What is the impact to the photomask industry?” Proc. SPIE 6283, 62830X (2006).

[Crossref]

W. Huang, C. Lin, C. Kuo, C. Huang, J. Lin, J. Chen, R. Liu, Y. Ku, and B. Lin, “Two threshold resist models for optical proximity correction,” Proc. SPIE 5377, 1536–1543 (2001).

[Crossref]

S. Sherif, B. Saleh, and R. De Leone, “Binary image synthesis using mixed linear integer programming,” IEEE Trans. Image Process. 4(9), 1252–1257 (1995).

[Crossref]
[PubMed]

B. Saleh and S. Sayegh, “Reductions of errors of microphotographic reproductions by optical corrections of original masks,” Opt. Eng. 20, 781–784 (1981).

L. Pang, Y. Liu, and D. Abrams, “Inverse lithography technology (ILT): What is the impact to the photomask industry?” Proc. SPIE 6283, 62830X (2006).

[Crossref]

D. S. Abrams and L. Pang, “Fast inverse lithography technology,” Proc. SPIE 6154, 534–542 (2006).

J.-C. Yu, P. Yu, and H.-Y. Chao, “Model-based sub-resolution assist features using an inverse lithography method,” Proc. SPIE 7140, 714014 (2008).

[Crossref]

W. Huang, C. Lin, C. Kuo, C. Huang, J. Lin, J. Chen, R. Liu, Y. Ku, and B. Lin, “Two threshold resist models for optical proximity correction,” Proc. SPIE 5377, 1536–1543 (2001).

[Crossref]

C. Hung, B. Zhang, E. Guo, L. Pang, Y. Liu, K. Wang, and G. Dai, “Pushing the lithography limit: Applying inverse lithography technology (ILT) at the 65nm generation,” Proc. SPIE 6154, 61541M (2006).

[Crossref]

S. Sherif, B. Saleh, and R. De Leone, “Binary image synthesis using mixed linear integer programming,” IEEE Trans. Image Process. 4(9), 1252–1257 (1995).

[Crossref]
[PubMed]

Y. Granik, “Fast pixel-based mask optimization for inverse lithography,” J. Microlith. Microfab. Microsyst. 5, 043002 (2006).

[Crossref]

C. Hung, B. Zhang, E. Guo, L. Pang, Y. Liu, K. Wang, and G. Dai, “Pushing the lithography limit: Applying inverse lithography technology (ILT) at the 65nm generation,” Proc. SPIE 6154, 61541M (2006).

[Crossref]

W. Huang, C. Lin, C. Kuo, C. Huang, J. Lin, J. Chen, R. Liu, Y. Ku, and B. Lin, “Two threshold resist models for optical proximity correction,” Proc. SPIE 5377, 1536–1543 (2001).

[Crossref]

W. Huang, C. Lin, C. Kuo, C. Huang, J. Lin, J. Chen, R. Liu, Y. Ku, and B. Lin, “Two threshold resist models for optical proximity correction,” Proc. SPIE 5377, 1536–1543 (2001).

[Crossref]

C. Hung, B. Zhang, E. Guo, L. Pang, Y. Liu, K. Wang, and G. Dai, “Pushing the lithography limit: Applying inverse lithography technology (ILT) at the 65nm generation,” Proc. SPIE 6154, 61541M (2006).

[Crossref]

W. Huang, C. Lin, C. Kuo, C. Huang, J. Lin, J. Chen, R. Liu, Y. Ku, and B. Lin, “Two threshold resist models for optical proximity correction,” Proc. SPIE 5377, 1536–1543 (2001).

[Crossref]

W. Huang, C. Lin, C. Kuo, C. Huang, J. Lin, J. Chen, R. Liu, Y. Ku, and B. Lin, “Two threshold resist models for optical proximity correction,” Proc. SPIE 5377, 1536–1543 (2001).

[Crossref]

W. Huang, C. Lin, C. Kuo, C. Huang, J. Lin, J. Chen, R. Liu, Y. Ku, and B. Lin, “Two threshold resist models for optical proximity correction,” Proc. SPIE 5377, 1536–1543 (2001).

[Crossref]

W. Huang, C. Lin, C. Kuo, C. Huang, J. Lin, J. Chen, R. Liu, Y. Ku, and B. Lin, “Two threshold resist models for optical proximity correction,” Proc. SPIE 5377, 1536–1543 (2001).

[Crossref]

W. Huang, C. Lin, C. Kuo, C. Huang, J. Lin, J. Chen, R. Liu, Y. Ku, and B. Lin, “Two threshold resist models for optical proximity correction,” Proc. SPIE 5377, 1536–1543 (2001).

[Crossref]

W. Huang, C. Lin, C. Kuo, C. Huang, J. Lin, J. Chen, R. Liu, Y. Ku, and B. Lin, “Two threshold resist models for optical proximity correction,” Proc. SPIE 5377, 1536–1543 (2001).

[Crossref]

L. Pang, Y. Liu, and D. Abrams, “Inverse lithography technology (ILT): What is the impact to the photomask industry?” Proc. SPIE 6283, 62830X (2006).

[Crossref]

C. Hung, B. Zhang, E. Guo, L. Pang, Y. Liu, K. Wang, and G. Dai, “Pushing the lithography limit: Applying inverse lithography technology (ILT) at the 65nm generation,” Proc. SPIE 6154, 61541M (2006).

[Crossref]

X. Ma and G. R. Arce, “Pixel-based simultaneous source and mask optimization for resolution enhancement in optical lithography,” Opt. Express 17(7), 5783–5793 (2009).

[Crossref]
[PubMed]

X. Ma and G. R. Arce, “PSM design for inverse lithography with partially coherent illumination,” Opt. Express 16(24), 20126–20141 (2008).

[Crossref]
[PubMed]

X. Ma and G. Arce, “Binary mask optimization for inverse lithography with partially coherent illumination,” J. Opt. Soc. Am. A 25(12), 2960–2970 (2008).

[Crossref]

X. Ma and G. R. Arce, “Generalized inverse lithography methods for phase-shifting mask design,” Opt. Express 15(23), 15066–15079 (2007).

[Crossref]
[PubMed]

A. Poonawala and P. Milanfar, “Mask design for optical microlithography--an inverse imaging problem,” IEEE Trans. Image Process. 16(3), 774–788 (2007).

[Crossref]
[PubMed]

L. Pang, Y. Liu, and D. Abrams, “Inverse lithography technology (ILT): What is the impact to the photomask industry?” Proc. SPIE 6283, 62830X (2006).

[Crossref]

C. Hung, B. Zhang, E. Guo, L. Pang, Y. Liu, K. Wang, and G. Dai, “Pushing the lithography limit: Applying inverse lithography technology (ILT) at the 65nm generation,” Proc. SPIE 6154, 61541M (2006).

[Crossref]

D. S. Abrams and L. Pang, “Fast inverse lithography technology,” Proc. SPIE 6154, 534–542 (2006).

A. Poonawala and P. Milanfar, “Mask design for optical microlithography--an inverse imaging problem,” IEEE Trans. Image Process. 16(3), 774–788 (2007).

[Crossref]
[PubMed]

S. Sherif, B. Saleh, and R. De Leone, “Binary image synthesis using mixed linear integer programming,” IEEE Trans. Image Process. 4(9), 1252–1257 (1995).

[Crossref]
[PubMed]

K. Nashold and B. Saleh, “Image construction through diffraction-limited high-contrast imaging systems: An iterative approach,” J. Opt. Soc. Am. A 2(5), 635–643 (1985).

[Crossref]

B. Saleh and S. Sayegh, “Reductions of errors of microphotographic reproductions by optical corrections of original masks,” Opt. Eng. 20, 781–784 (1981).

B. Saleh and S. Sayegh, “Reductions of errors of microphotographic reproductions by optical corrections of original masks,” Opt. Eng. 20, 781–784 (1981).

S. Sherif, B. Saleh, and R. De Leone, “Binary image synthesis using mixed linear integer programming,” IEEE Trans. Image Process. 4(9), 1252–1257 (1995).

[Crossref]
[PubMed]

C. Hung, B. Zhang, E. Guo, L. Pang, Y. Liu, K. Wang, and G. Dai, “Pushing the lithography limit: Applying inverse lithography technology (ILT) at the 65nm generation,” Proc. SPIE 6154, 61541M (2006).

[Crossref]

J.-C. Yu, P. Yu, and H.-Y. Chao, “Model-based sub-resolution assist features using an inverse lithography method,” Proc. SPIE 7140, 714014 (2008).

[Crossref]

J.-C. Yu, P. Yu, and H.-Y. Chao, “Model-based sub-resolution assist features using an inverse lithography method,” Proc. SPIE 7140, 714014 (2008).

[Crossref]

C. Hung, B. Zhang, E. Guo, L. Pang, Y. Liu, K. Wang, and G. Dai, “Pushing the lithography limit: Applying inverse lithography technology (ILT) at the 65nm generation,” Proc. SPIE 6154, 61541M (2006).

[Crossref]

S. Sherif, B. Saleh, and R. De Leone, “Binary image synthesis using mixed linear integer programming,” IEEE Trans. Image Process. 4(9), 1252–1257 (1995).

[Crossref]
[PubMed]

A. Poonawala and P. Milanfar, “Mask design for optical microlithography--an inverse imaging problem,” IEEE Trans. Image Process. 16(3), 774–788 (2007).

[Crossref]
[PubMed]

Y. Granik, “Fast pixel-based mask optimization for inverse lithography,” J. Microlith. Microfab. Microsyst. 5, 043002 (2006).

[Crossref]

B. Saleh and S. Sayegh, “Reductions of errors of microphotographic reproductions by optical corrections of original masks,” Opt. Eng. 20, 781–784 (1981).

X. Ma and G. R. Arce, “Generalized inverse lithography methods for phase-shifting mask design,” Opt. Express 15(23), 15066–15079 (2007).

[Crossref]
[PubMed]

S. H. Chan, A. K. Wong, and E. Y. Lam, “Initialization for robust inverse synthesis of phase-shifting masks in optical projection lithography,” Opt. Express 16(19), 14746–14760 (2008).

[Crossref]
[PubMed]

X. Ma and G. R. Arce, “PSM design for inverse lithography with partially coherent illumination,” Opt. Express 16(24), 20126–20141 (2008).

[Crossref]
[PubMed]

X. Ma and G. R. Arce, “Pixel-based simultaneous source and mask optimization for resolution enhancement in optical lithography,” Opt. Express 17(7), 5783–5793 (2009).

[Crossref]
[PubMed]

E. Y. Lam and A. K. K. Wong, “Computation lithography: virtual reality and virtual virtuality,” Opt. Express 17(15), 12259–12268 (2009).

[Crossref]
[PubMed]

W. Huang, C. Lin, C. Kuo, C. Huang, J. Lin, J. Chen, R. Liu, Y. Ku, and B. Lin, “Two threshold resist models for optical proximity correction,” Proc. SPIE 5377, 1536–1543 (2001).

[Crossref]

J.-C. Yu, P. Yu, and H.-Y. Chao, “Model-based sub-resolution assist features using an inverse lithography method,” Proc. SPIE 7140, 714014 (2008).

[Crossref]

D. S. Abrams and L. Pang, “Fast inverse lithography technology,” Proc. SPIE 6154, 534–542 (2006).

C. Hung, B. Zhang, E. Guo, L. Pang, Y. Liu, K. Wang, and G. Dai, “Pushing the lithography limit: Applying inverse lithography technology (ILT) at the 65nm generation,” Proc. SPIE 6154, 61541M (2006).

[Crossref]

L. Pang, Y. Liu, and D. Abrams, “Inverse lithography technology (ILT): What is the impact to the photomask industry?” Proc. SPIE 6283, 62830X (2006).

[Crossref]

M. Minoux, Mathematical programming theory and algorithms (John Wiley and Sons, Chichester, 1986).

E. Hecht, Optics, 4thed (Addison Wesley, San Francisco, 2002).

M. Born, and E. Wolf, Principles of Optics, 7th(expanded) ed. (Cambridge University Press, 1999).

J. W. Goodman, Statistical Optics (John Wiley and Sons, 1985).

A. K. Wong, Optical Imaging in Projection Microlithography (SPIE Press, 2005).

N. B. Cobb, Fast optical and process proximity correction algorithms for integrated circuit manufacturing (University of California at Berkeley, Berkely, California, 1998).

J. S. Leon, Linear Algebra with applications, 6th ed. (Prentice-Hall, 2002).