Z. Qiu, X. Wang, Q. Bi, Q. Yuan, B. Peng, and L. Duan, “Translational-symmetry alternating phase shifting mask grating mark used in a linear measurement model of lithographic projection lens aberrations,” Appl. Opt. 48(19), 3654–3663 (2009).

[CrossRef]
[PubMed]

Z. Qiu, X. Wang, Q. Yuan, and F. Wang, “Coma measurement by use of an alternating phase-shifting mask mark with a specific phase width,” Appl. Opt. 48(2), 261–269 (2009).

[CrossRef]
[PubMed]

Q. Yuan, X. Wang, Z. Qiu, F. Wang, and M. Ma, “Even aberration measurement of lithographic projection system based on optimized phase-shifting marks,” Microelectron. Eng. 86(1), 78–82 (2009).

[CrossRef]

M. Mulder, A. Engelen, O. Noordman, R. Kazinczi, G. Streutker, B. van Drieenhuizen, S. Hsu, K. Gronlund, M. Degünther, D. Jürgens, J. Eisenmenger, M. Patra, and A. Major, “Performance of a programmable illuminator for generation of freeform sources on high NA immersion systems,” Proc. SPIE 7520, 75200Y (2009).

[CrossRef]

A. Engelen, M. Mulder, I. Bouchoms, S. Hansen, A. Bouma, A. Ngai, M. van Veen, and J. Zimmermann, “Imaging solutions for the 22nm node using 1.35NA,” Proc. SPIE 7274, 72741Q (2009).

[CrossRef]

W. Liu, S. Liu, T. Zhou, and L. Wang, “Aerial image based technique for measurement of lens aberrations up to 37th Zernike coefficient in lithographic tools under partial coherent illumination,” Opt. Express 17(21), 19278–19291 (2009).

[CrossRef]

J. K. Tyminski, T. Hagiwara, N. Kondo, and H. Irihama, “Aerial image sensor: in-situ scanner aberration monitor,” Proc. SPIE 6152, 61523D (2006).

[CrossRef]

F. Wang, X. Wang, and M. Ma, “Measurement technique for in situ characterizing aberrations of projection optics in lithographic tools,” Appl. Opt. 45(24), 6086–6093 (2006).

[PubMed]

L. Zavyalova, A. Bourov, and B. W. Smith, “Automated aberration extraction using phase wheel targets,” Proc. SPIE 5754, 1728–1737 (2005).

[CrossRef]

T. Hagiwara, N. Kondo, I. Hiroshi, K. Suzuki, and N. Magome, “Development of aerial image based aberration measurement technique,” Proc. SPIE 5754, 1659–1669 (2005).

[CrossRef]

Y. Granik and K. Adam, “Analytical approximations of the source intensity distributions,” Proc. SPIE 5992, 599255 (2005).

[CrossRef]

F. Schellenberg, “Resolution enhancement technology: The past, the present, and extensions for the future,” Proc. SPIE 5377, 1–20 (2004).

[CrossRef]

H. van der Laan, M. Dierichs, H. van Greevenbroek, E. McCoo, F. Stoffels, R. Pongers, and R. Willekers, “Aerial image measurement methods for fast aberration setup and illumination pupil verification,” Proc. SPIE 4346, 394–407 (2001).

[CrossRef]

H. Hopkins, “On the diffraction theory of optical images,” Proc. R. Soc. A 217(1130), 408–432 (1953).

[CrossRef]

F. Zernike, “Beugungstheorie des Schneidenverfahrens und seiner verbesserten form, der Phasenkontrastmethode,” Physica 1(7-12), 689–704 (1934).

[CrossRef]

Y. Granik and K. Adam, “Analytical approximations of the source intensity distributions,” Proc. SPIE 5992, 599255 (2005).

[CrossRef]

A. Engelen, M. Mulder, I. Bouchoms, S. Hansen, A. Bouma, A. Ngai, M. van Veen, and J. Zimmermann, “Imaging solutions for the 22nm node using 1.35NA,” Proc. SPIE 7274, 72741Q (2009).

[CrossRef]

A. Engelen, M. Mulder, I. Bouchoms, S. Hansen, A. Bouma, A. Ngai, M. van Veen, and J. Zimmermann, “Imaging solutions for the 22nm node using 1.35NA,” Proc. SPIE 7274, 72741Q (2009).

[CrossRef]

L. Zavyalova, A. Bourov, and B. W. Smith, “Automated aberration extraction using phase wheel targets,” Proc. SPIE 5754, 1728–1737 (2005).

[CrossRef]

M. Mulder, A. Engelen, O. Noordman, R. Kazinczi, G. Streutker, B. van Drieenhuizen, S. Hsu, K. Gronlund, M. Degünther, D. Jürgens, J. Eisenmenger, M. Patra, and A. Major, “Performance of a programmable illuminator for generation of freeform sources on high NA immersion systems,” Proc. SPIE 7520, 75200Y (2009).

[CrossRef]

H. van der Laan, M. Dierichs, H. van Greevenbroek, E. McCoo, F. Stoffels, R. Pongers, and R. Willekers, “Aerial image measurement methods for fast aberration setup and illumination pupil verification,” Proc. SPIE 4346, 394–407 (2001).

[CrossRef]

M. Mulder, A. Engelen, O. Noordman, R. Kazinczi, G. Streutker, B. van Drieenhuizen, S. Hsu, K. Gronlund, M. Degünther, D. Jürgens, J. Eisenmenger, M. Patra, and A. Major, “Performance of a programmable illuminator for generation of freeform sources on high NA immersion systems,” Proc. SPIE 7520, 75200Y (2009).

[CrossRef]

A. Engelen, M. Mulder, I. Bouchoms, S. Hansen, A. Bouma, A. Ngai, M. van Veen, and J. Zimmermann, “Imaging solutions for the 22nm node using 1.35NA,” Proc. SPIE 7274, 72741Q (2009).

[CrossRef]

M. Mulder, A. Engelen, O. Noordman, R. Kazinczi, G. Streutker, B. van Drieenhuizen, S. Hsu, K. Gronlund, M. Degünther, D. Jürgens, J. Eisenmenger, M. Patra, and A. Major, “Performance of a programmable illuminator for generation of freeform sources on high NA immersion systems,” Proc. SPIE 7520, 75200Y (2009).

[CrossRef]

Y. Granik and K. Adam, “Analytical approximations of the source intensity distributions,” Proc. SPIE 5992, 599255 (2005).

[CrossRef]

M. Mulder, A. Engelen, O. Noordman, R. Kazinczi, G. Streutker, B. van Drieenhuizen, S. Hsu, K. Gronlund, M. Degünther, D. Jürgens, J. Eisenmenger, M. Patra, and A. Major, “Performance of a programmable illuminator for generation of freeform sources on high NA immersion systems,” Proc. SPIE 7520, 75200Y (2009).

[CrossRef]

J. K. Tyminski, T. Hagiwara, N. Kondo, and H. Irihama, “Aerial image sensor: in-situ scanner aberration monitor,” Proc. SPIE 6152, 61523D (2006).

[CrossRef]

T. Hagiwara, N. Kondo, I. Hiroshi, K. Suzuki, and N. Magome, “Development of aerial image based aberration measurement technique,” Proc. SPIE 5754, 1659–1669 (2005).

[CrossRef]

A. Engelen, M. Mulder, I. Bouchoms, S. Hansen, A. Bouma, A. Ngai, M. van Veen, and J. Zimmermann, “Imaging solutions for the 22nm node using 1.35NA,” Proc. SPIE 7274, 72741Q (2009).

[CrossRef]

T. Hagiwara, N. Kondo, I. Hiroshi, K. Suzuki, and N. Magome, “Development of aerial image based aberration measurement technique,” Proc. SPIE 5754, 1659–1669 (2005).

[CrossRef]

H. Hopkins, “On the diffraction theory of optical images,” Proc. R. Soc. A 217(1130), 408–432 (1953).

[CrossRef]

M. Mulder, A. Engelen, O. Noordman, R. Kazinczi, G. Streutker, B. van Drieenhuizen, S. Hsu, K. Gronlund, M. Degünther, D. Jürgens, J. Eisenmenger, M. Patra, and A. Major, “Performance of a programmable illuminator for generation of freeform sources on high NA immersion systems,” Proc. SPIE 7520, 75200Y (2009).

[CrossRef]

J. K. Tyminski, T. Hagiwara, N. Kondo, and H. Irihama, “Aerial image sensor: in-situ scanner aberration monitor,” Proc. SPIE 6152, 61523D (2006).

[CrossRef]

M. Mulder, A. Engelen, O. Noordman, R. Kazinczi, G. Streutker, B. van Drieenhuizen, S. Hsu, K. Gronlund, M. Degünther, D. Jürgens, J. Eisenmenger, M. Patra, and A. Major, “Performance of a programmable illuminator for generation of freeform sources on high NA immersion systems,” Proc. SPIE 7520, 75200Y (2009).

[CrossRef]

M. Mulder, A. Engelen, O. Noordman, R. Kazinczi, G. Streutker, B. van Drieenhuizen, S. Hsu, K. Gronlund, M. Degünther, D. Jürgens, J. Eisenmenger, M. Patra, and A. Major, “Performance of a programmable illuminator for generation of freeform sources on high NA immersion systems,” Proc. SPIE 7520, 75200Y (2009).

[CrossRef]

J. K. Tyminski, T. Hagiwara, N. Kondo, and H. Irihama, “Aerial image sensor: in-situ scanner aberration monitor,” Proc. SPIE 6152, 61523D (2006).

[CrossRef]

T. Hagiwara, N. Kondo, I. Hiroshi, K. Suzuki, and N. Magome, “Development of aerial image based aberration measurement technique,” Proc. SPIE 5754, 1659–1669 (2005).

[CrossRef]

Q. Yuan, X. Wang, Z. Qiu, F. Wang, and M. Ma, “Even aberration measurement of lithographic projection system based on optimized phase-shifting marks,” Microelectron. Eng. 86(1), 78–82 (2009).

[CrossRef]

Q. Yuan, X. Wang, Z. Qiu, F. Wang, M. Ma, and L. He, “Coma measurement of projection optics in lithographic tools based on relative image displacements at multiple illumination settings,” Opt. Express 15(24), 15878–15885 (2007).

[CrossRef]
[PubMed]

F. Wang, X. Wang, and M. Ma, “Measurement technique for in situ characterizing aberrations of projection optics in lithographic tools,” Appl. Opt. 45(24), 6086–6093 (2006).

[PubMed]

T. Hagiwara, N. Kondo, I. Hiroshi, K. Suzuki, and N. Magome, “Development of aerial image based aberration measurement technique,” Proc. SPIE 5754, 1659–1669 (2005).

[CrossRef]

M. Mulder, A. Engelen, O. Noordman, R. Kazinczi, G. Streutker, B. van Drieenhuizen, S. Hsu, K. Gronlund, M. Degünther, D. Jürgens, J. Eisenmenger, M. Patra, and A. Major, “Performance of a programmable illuminator for generation of freeform sources on high NA immersion systems,” Proc. SPIE 7520, 75200Y (2009).

[CrossRef]

H. van der Laan, M. Dierichs, H. van Greevenbroek, E. McCoo, F. Stoffels, R. Pongers, and R. Willekers, “Aerial image measurement methods for fast aberration setup and illumination pupil verification,” Proc. SPIE 4346, 394–407 (2001).

[CrossRef]

M. Mulder, A. Engelen, O. Noordman, R. Kazinczi, G. Streutker, B. van Drieenhuizen, S. Hsu, K. Gronlund, M. Degünther, D. Jürgens, J. Eisenmenger, M. Patra, and A. Major, “Performance of a programmable illuminator for generation of freeform sources on high NA immersion systems,” Proc. SPIE 7520, 75200Y (2009).

[CrossRef]

A. Engelen, M. Mulder, I. Bouchoms, S. Hansen, A. Bouma, A. Ngai, M. van Veen, and J. Zimmermann, “Imaging solutions for the 22nm node using 1.35NA,” Proc. SPIE 7274, 72741Q (2009).

[CrossRef]

A. Engelen, M. Mulder, I. Bouchoms, S. Hansen, A. Bouma, A. Ngai, M. van Veen, and J. Zimmermann, “Imaging solutions for the 22nm node using 1.35NA,” Proc. SPIE 7274, 72741Q (2009).

[CrossRef]

M. Mulder, A. Engelen, O. Noordman, R. Kazinczi, G. Streutker, B. van Drieenhuizen, S. Hsu, K. Gronlund, M. Degünther, D. Jürgens, J. Eisenmenger, M. Patra, and A. Major, “Performance of a programmable illuminator for generation of freeform sources on high NA immersion systems,” Proc. SPIE 7520, 75200Y (2009).

[CrossRef]

M. Mulder, A. Engelen, O. Noordman, R. Kazinczi, G. Streutker, B. van Drieenhuizen, S. Hsu, K. Gronlund, M. Degünther, D. Jürgens, J. Eisenmenger, M. Patra, and A. Major, “Performance of a programmable illuminator for generation of freeform sources on high NA immersion systems,” Proc. SPIE 7520, 75200Y (2009).

[CrossRef]

H. van der Laan, M. Dierichs, H. van Greevenbroek, E. McCoo, F. Stoffels, R. Pongers, and R. Willekers, “Aerial image measurement methods for fast aberration setup and illumination pupil verification,” Proc. SPIE 4346, 394–407 (2001).

[CrossRef]

Q. Yuan, X. Wang, Z. Qiu, F. Wang, and M. Ma, “Even aberration measurement of lithographic projection system based on optimized phase-shifting marks,” Microelectron. Eng. 86(1), 78–82 (2009).

[CrossRef]

Z. Qiu, X. Wang, Q. Yuan, and F. Wang, “Coma measurement by use of an alternating phase-shifting mask mark with a specific phase width,” Appl. Opt. 48(2), 261–269 (2009).

[CrossRef]
[PubMed]

Z. Qiu, X. Wang, Q. Bi, Q. Yuan, B. Peng, and L. Duan, “Translational-symmetry alternating phase shifting mask grating mark used in a linear measurement model of lithographic projection lens aberrations,” Appl. Opt. 48(19), 3654–3663 (2009).

[CrossRef]
[PubMed]

Q. Yuan, X. Wang, Z. Qiu, F. Wang, M. Ma, and L. He, “Coma measurement of projection optics in lithographic tools based on relative image displacements at multiple illumination settings,” Opt. Express 15(24), 15878–15885 (2007).

[CrossRef]
[PubMed]

F. Schellenberg, “Resolution enhancement technology: The past, the present, and extensions for the future,” Proc. SPIE 5377, 1–20 (2004).

[CrossRef]

B. W. Smith and R. Schlief, “Understanding lens aberration and influences to lithographic imaging,” Proc. SPIE 4000, 294–306 (2000).

[CrossRef]

L. Zavyalova, A. Bourov, and B. W. Smith, “Automated aberration extraction using phase wheel targets,” Proc. SPIE 5754, 1728–1737 (2005).

[CrossRef]

B. W. Smith and R. Schlief, “Understanding lens aberration and influences to lithographic imaging,” Proc. SPIE 4000, 294–306 (2000).

[CrossRef]

H. van der Laan, M. Dierichs, H. van Greevenbroek, E. McCoo, F. Stoffels, R. Pongers, and R. Willekers, “Aerial image measurement methods for fast aberration setup and illumination pupil verification,” Proc. SPIE 4346, 394–407 (2001).

[CrossRef]

M. Mulder, A. Engelen, O. Noordman, R. Kazinczi, G. Streutker, B. van Drieenhuizen, S. Hsu, K. Gronlund, M. Degünther, D. Jürgens, J. Eisenmenger, M. Patra, and A. Major, “Performance of a programmable illuminator for generation of freeform sources on high NA immersion systems,” Proc. SPIE 7520, 75200Y (2009).

[CrossRef]

T. Hagiwara, N. Kondo, I. Hiroshi, K. Suzuki, and N. Magome, “Development of aerial image based aberration measurement technique,” Proc. SPIE 5754, 1659–1669 (2005).

[CrossRef]

J. K. Tyminski, T. Hagiwara, N. Kondo, and H. Irihama, “Aerial image sensor: in-situ scanner aberration monitor,” Proc. SPIE 6152, 61523D (2006).

[CrossRef]

H. van der Laan, M. Dierichs, H. van Greevenbroek, E. McCoo, F. Stoffels, R. Pongers, and R. Willekers, “Aerial image measurement methods for fast aberration setup and illumination pupil verification,” Proc. SPIE 4346, 394–407 (2001).

[CrossRef]

M. Mulder, A. Engelen, O. Noordman, R. Kazinczi, G. Streutker, B. van Drieenhuizen, S. Hsu, K. Gronlund, M. Degünther, D. Jürgens, J. Eisenmenger, M. Patra, and A. Major, “Performance of a programmable illuminator for generation of freeform sources on high NA immersion systems,” Proc. SPIE 7520, 75200Y (2009).

[CrossRef]

H. van der Laan, M. Dierichs, H. van Greevenbroek, E. McCoo, F. Stoffels, R. Pongers, and R. Willekers, “Aerial image measurement methods for fast aberration setup and illumination pupil verification,” Proc. SPIE 4346, 394–407 (2001).

[CrossRef]

A. Engelen, M. Mulder, I. Bouchoms, S. Hansen, A. Bouma, A. Ngai, M. van Veen, and J. Zimmermann, “Imaging solutions for the 22nm node using 1.35NA,” Proc. SPIE 7274, 72741Q (2009).

[CrossRef]

Q. Yuan, X. Wang, Z. Qiu, F. Wang, and M. Ma, “Even aberration measurement of lithographic projection system based on optimized phase-shifting marks,” Microelectron. Eng. 86(1), 78–82 (2009).

[CrossRef]

Z. Qiu, X. Wang, Q. Yuan, and F. Wang, “Coma measurement by use of an alternating phase-shifting mask mark with a specific phase width,” Appl. Opt. 48(2), 261–269 (2009).

[CrossRef]
[PubMed]

Q. Yuan, X. Wang, Z. Qiu, F. Wang, M. Ma, and L. He, “Coma measurement of projection optics in lithographic tools based on relative image displacements at multiple illumination settings,” Opt. Express 15(24), 15878–15885 (2007).

[CrossRef]
[PubMed]

F. Wang, X. Wang, and M. Ma, “Measurement technique for in situ characterizing aberrations of projection optics in lithographic tools,” Appl. Opt. 45(24), 6086–6093 (2006).

[PubMed]

Z. Qiu, X. Wang, Q. Bi, Q. Yuan, B. Peng, and L. Duan, “Translational-symmetry alternating phase shifting mask grating mark used in a linear measurement model of lithographic projection lens aberrations,” Appl. Opt. 48(19), 3654–3663 (2009).

[CrossRef]
[PubMed]

Z. Qiu, X. Wang, Q. Yuan, and F. Wang, “Coma measurement by use of an alternating phase-shifting mask mark with a specific phase width,” Appl. Opt. 48(2), 261–269 (2009).

[CrossRef]
[PubMed]

Q. Yuan, X. Wang, Z. Qiu, F. Wang, and M. Ma, “Even aberration measurement of lithographic projection system based on optimized phase-shifting marks,” Microelectron. Eng. 86(1), 78–82 (2009).

[CrossRef]

Q. Yuan, X. Wang, Z. Qiu, F. Wang, M. Ma, and L. He, “Coma measurement of projection optics in lithographic tools based on relative image displacements at multiple illumination settings,” Opt. Express 15(24), 15878–15885 (2007).

[CrossRef]
[PubMed]

F. Wang, X. Wang, and M. Ma, “Measurement technique for in situ characterizing aberrations of projection optics in lithographic tools,” Appl. Opt. 45(24), 6086–6093 (2006).

[PubMed]

H. van der Laan, M. Dierichs, H. van Greevenbroek, E. McCoo, F. Stoffels, R. Pongers, and R. Willekers, “Aerial image measurement methods for fast aberration setup and illumination pupil verification,” Proc. SPIE 4346, 394–407 (2001).

[CrossRef]

Q. Yuan, X. Wang, Z. Qiu, F. Wang, and M. Ma, “Even aberration measurement of lithographic projection system based on optimized phase-shifting marks,” Microelectron. Eng. 86(1), 78–82 (2009).

[CrossRef]

Z. Qiu, X. Wang, Q. Yuan, and F. Wang, “Coma measurement by use of an alternating phase-shifting mask mark with a specific phase width,” Appl. Opt. 48(2), 261–269 (2009).

[CrossRef]
[PubMed]

Z. Qiu, X. Wang, Q. Bi, Q. Yuan, B. Peng, and L. Duan, “Translational-symmetry alternating phase shifting mask grating mark used in a linear measurement model of lithographic projection lens aberrations,” Appl. Opt. 48(19), 3654–3663 (2009).

[CrossRef]
[PubMed]

Q. Yuan, X. Wang, Z. Qiu, F. Wang, M. Ma, and L. He, “Coma measurement of projection optics in lithographic tools based on relative image displacements at multiple illumination settings,” Opt. Express 15(24), 15878–15885 (2007).

[CrossRef]
[PubMed]

L. Zavyalova, A. Bourov, and B. W. Smith, “Automated aberration extraction using phase wheel targets,” Proc. SPIE 5754, 1728–1737 (2005).

[CrossRef]

F. Zernike, “Beugungstheorie des Schneidenverfahrens und seiner verbesserten form, der Phasenkontrastmethode,” Physica 1(7-12), 689–704 (1934).

[CrossRef]

A. Engelen, M. Mulder, I. Bouchoms, S. Hansen, A. Bouma, A. Ngai, M. van Veen, and J. Zimmermann, “Imaging solutions for the 22nm node using 1.35NA,” Proc. SPIE 7274, 72741Q (2009).

[CrossRef]

H. Nomura and T. Sato, “Techniques for measuring aberrations in lenses used in photolithography with printed patterns,” Appl. Opt. 38(13), 2800–2807 (1999).

[CrossRef]

H. Nomura, K. Tawarayama, and T. Kohno, “Aberration measurement from specific photolithographic images: a different approach,” Appl. Opt. 39(7), 1136–1147 (2000).

[CrossRef]

J. Sung, M. Pitchumani, and E. G. Johnson, “Aberration measurement of photolithographic lenses by use of hybrid diffractive photomasks,” Appl. Opt. 42(11), 1987–1995 (2003).

[CrossRef]
[PubMed]

F. Wang, X. Wang, and M. Ma, “Measurement technique for in situ characterizing aberrations of projection optics in lithographic tools,” Appl. Opt. 45(24), 6086–6093 (2006).

[PubMed]

Z. Qiu, X. Wang, Q. Bi, Q. Yuan, B. Peng, and L. Duan, “Translational-symmetry alternating phase shifting mask grating mark used in a linear measurement model of lithographic projection lens aberrations,” Appl. Opt. 48(19), 3654–3663 (2009).

[CrossRef]
[PubMed]

Z. Qiu, X. Wang, Q. Yuan, and F. Wang, “Coma measurement by use of an alternating phase-shifting mask mark with a specific phase width,” Appl. Opt. 48(2), 261–269 (2009).

[CrossRef]
[PubMed]

Q. Yuan, X. Wang, Z. Qiu, F. Wang, and M. Ma, “Even aberration measurement of lithographic projection system based on optimized phase-shifting marks,” Microelectron. Eng. 86(1), 78–82 (2009).

[CrossRef]

W. Liu, S. Liu, T. Zhou, and L. Wang, “Aerial image based technique for measurement of lens aberrations up to 37th Zernike coefficient in lithographic tools under partial coherent illumination,” Opt. Express 17(21), 19278–19291 (2009).

[CrossRef]

Q. Yuan, X. Wang, Z. Qiu, F. Wang, M. Ma, and L. He, “Coma measurement of projection optics in lithographic tools based on relative image displacements at multiple illumination settings,” Opt. Express 15(24), 15878–15885 (2007).

[CrossRef]
[PubMed]

F. Zernike, “Beugungstheorie des Schneidenverfahrens und seiner verbesserten form, der Phasenkontrastmethode,” Physica 1(7-12), 689–704 (1934).

[CrossRef]

H. Hopkins, “On the diffraction theory of optical images,” Proc. R. Soc. A 217(1130), 408–432 (1953).

[CrossRef]

H. van der Laan, M. Dierichs, H. van Greevenbroek, E. McCoo, F. Stoffels, R. Pongers, and R. Willekers, “Aerial image measurement methods for fast aberration setup and illumination pupil verification,” Proc. SPIE 4346, 394–407 (2001).

[CrossRef]

F. Schellenberg, “Resolution enhancement technology: The past, the present, and extensions for the future,” Proc. SPIE 5377, 1–20 (2004).

[CrossRef]

M. Mulder, A. Engelen, O. Noordman, R. Kazinczi, G. Streutker, B. van Drieenhuizen, S. Hsu, K. Gronlund, M. Degünther, D. Jürgens, J. Eisenmenger, M. Patra, and A. Major, “Performance of a programmable illuminator for generation of freeform sources on high NA immersion systems,” Proc. SPIE 7520, 75200Y (2009).

[CrossRef]

A. Engelen, M. Mulder, I. Bouchoms, S. Hansen, A. Bouma, A. Ngai, M. van Veen, and J. Zimmermann, “Imaging solutions for the 22nm node using 1.35NA,” Proc. SPIE 7274, 72741Q (2009).

[CrossRef]

Y. Granik and K. Adam, “Analytical approximations of the source intensity distributions,” Proc. SPIE 5992, 599255 (2005).

[CrossRef]

J. K. Tyminski, T. Hagiwara, N. Kondo, and H. Irihama, “Aerial image sensor: in-situ scanner aberration monitor,” Proc. SPIE 6152, 61523D (2006).

[CrossRef]

T. Hagiwara, N. Kondo, I. Hiroshi, K. Suzuki, and N. Magome, “Development of aerial image based aberration measurement technique,” Proc. SPIE 5754, 1659–1669 (2005).

[CrossRef]

B. W. Smith and R. Schlief, “Understanding lens aberration and influences to lithographic imaging,” Proc. SPIE 4000, 294–306 (2000).

[CrossRef]

L. Zavyalova, A. Bourov, and B. W. Smith, “Automated aberration extraction using phase wheel targets,” Proc. SPIE 5754, 1728–1737 (2005).

[CrossRef]

A. K. Wong, Resolution Enhancement Techniques, (SPIE Press, 2001).