Abstract

We present the results of an optical and chemical, depth and surface study of Al/Mo/SiC periodic multilayers, designed as high reflectivity coatings for the extreme ultra-violet (EUV) range. In comparison to the previously studied Al/SiC system, the introduction of Mo as a third material in the multilayer structure allows us to decrease In comparison to the previously studied Al/SiC system with a reflectance of 37% at near normal incidence around 17 nm, the introduction of Mo as a third material in the multilayer structure allows us to decrease the interfacial roughness and achieve an EUV reflectivity of 53.4%, measured with synchrotron radiation. This is the first report of a reflectivity higher than 50% around 17 nm. Time-of-flight secondary ion mass spectrometry (ToF-SIMS) and x-ray photoelectron spectroscopy (XPS) measurements are performed on the Al/Mo/SiC system in order to analyze the individual layers within the stack. ToF-SIMS and XPS results give evidence that the first SiC layer is partially oxidized, but the O atoms do not reach the first Mo and Al layers. We use these results to properly describe the multilayer stack and discuss the possible reasons for the difference between the measured and simulated EUV reflectivity values.

© 2010 OSA

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    [CrossRef]
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    [CrossRef] [PubMed]
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    [CrossRef]
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    [CrossRef]
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  14. M. Yuan, J.-T. Lu, and G. Kong, “Effect of SiO2:Na2O molar ratio of sodium silicate on the corrosion resistance of silicate conversion coatings,” Surf. Coat. Tech. 204(8), 1229–1235 (2010).
    [CrossRef]
  15. S. Tanuma, C. J. Powell, and D. R. Penn, “Calculations of electron inelastic mean free paths. V. Data for 14 organic compounds over the 50-2000 eV range,” Surf. Interface Anal. 21(3), 165–176 (1994).
    [CrossRef]
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    [CrossRef]
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  18. E. Meltchakov, C. Hecquet, M. Roulliay, S. Rossi, Y. Menesguen, A. Jérome, F. Bridou, F. Varniere, M.-F. Ravet-Krill, and F. Delmotte, “Development of Al-based multilayer optics for EUV,” Appl. Phys., A Mater. Sci. Process. 98(1), 111–117 (2010).
    [CrossRef]
  19. P. Jonnard, K. Le Guen, M.-H. Hu, J.-M. André, E. Meltchakov, C. Hecquet, F. Delmotte, and A. Galtayries, “Optical, chemical and depth characterization of Al/SiC periodic multilayers”, Proc. SPIE 7360, 7360O1–7360–O9 (2009).

2010

A. Galtayries, M.-H. Hu, K. Le Guen, J.-M. André, P. Jonnard, E. Meltchakov, C. Hecquet, and F. Delmotte, “Nanometer designed Al/SiC periodic multilayers: characterization by a multi-technique approach,” Surf. Interface Anal. 42(6-7), 653–657 (2010).
[CrossRef]

M. Yuan, J.-T. Lu, and G. Kong, “Effect of SiO2:Na2O molar ratio of sodium silicate on the corrosion resistance of silicate conversion coatings,” Surf. Coat. Tech. 204(8), 1229–1235 (2010).
[CrossRef]

E. Meltchakov, C. Hecquet, M. Roulliay, S. Rossi, Y. Menesguen, A. Jérome, F. Bridou, F. Varniere, M.-F. Ravet-Krill, and F. Delmotte, “Development of Al-based multilayer optics for EUV,” Appl. Phys., A Mater. Sci. Process. 98(1), 111–117 (2010).
[CrossRef]

2009

A. Aquila, F. Salmassi, Y. Liu, and E. M. Gullikson, “Tri-material multilayer coatings with high reflectivity and wide bandwidth for 25 to 50 nm extreme ultraviolet light,” Opt. Express 17(24), 22102–22107 (2009).
[CrossRef] [PubMed]

P. Jonnard, K. Le Guen, M.-H. Hu, J.-M. André, E. Meltchakov, C. Hecquet, F. Delmotte, and A. Galtayries, “Optical, chemical and depth characterization of Al/SiC periodic multilayers,” Proc. SPIE 7360, O1–O9 (2009).

2008

2005

2004

S. Nannarone, F. Borgatti, A. DeLuisa, B. P. Doyle, G. C. Gazzadi, A. Giglia, P. Finetti, N. Mahne, L. Pasquali, M. Pedio, G. Selvaggi, G. Naletto, M. G. Pelizzo, and G. Tondello, “The BEAR beamline at ELETTRA,” AIP Conf. Proc. 705, 450–453 (2004).
[CrossRef]

S. A. Yulin, F. Schaefers, T. Feigl, and N. Kaiser, “Enhanced reflectivity and stability of Sc/Si multilayers,” Proc. SPIE 5193, 155–163 (2004).
[CrossRef]

2003

1998

D. L. Windt, “IMD - Software for modeling the optical properties of multilayer films,” Comput. Phys. 12(4), 360–370 (1998).
[CrossRef]

1997

A. Galtayries, S. Wisniewski, and J. Grimblot, “Formation of thin oxide and sulphide films on polycrystalline molybdenum foils: characterization by XPS and surface potential variations,” J. Electron Spectrosc. Relat. Phenom. 87(1), 31–44 (1997).
[CrossRef]

1995

1994

S. Tanuma, C. J. Powell, and D. R. Penn, “Calculations of electron inelastic mean free paths. V. Data for 14 organic compounds over the 50-2000 eV range,” Surf. Interface Anal. 21(3), 165–176 (1994).
[CrossRef]

1989

K. Domen and T. J. Chuang, “Laser-induced photodissociation and desoprtion. 1. CH2I2 adsorbed on Al2O3,” J. Chem. Phys. 90(6), 3318–3331 (1989).
[CrossRef]

1986

Y. Mizokawa, K. M. Geib, and C. W. Wilmsen, “Characterization of β-SiC surfaces and the Au/SiC interface,” J. Vac. Sci. Technol. A 4(3), 1696–1700 (1986).
[CrossRef]

1985

1976

J. H. Scofield, “Hartree-Slater subshell photoionization cross-sections at 1254 and 1487 eV,” J. Electron Spectrosc. Relat. Phenom. 8(2), 129–137 (1976).
[CrossRef]

Alameda, J.

Alford, C.

André, J.-M.

A. Galtayries, M.-H. Hu, K. Le Guen, J.-M. André, P. Jonnard, E. Meltchakov, C. Hecquet, and F. Delmotte, “Nanometer designed Al/SiC periodic multilayers: characterization by a multi-technique approach,” Surf. Interface Anal. 42(6-7), 653–657 (2010).
[CrossRef]

P. Jonnard, K. Le Guen, M.-H. Hu, J.-M. André, E. Meltchakov, C. Hecquet, F. Delmotte, and A. Galtayries, “Optical, chemical and depth characterization of Al/SiC periodic multilayers,” Proc. SPIE 7360, O1–O9 (2009).

Aquila, A.

Bajt, S.

Barbee,, T. W.

Bionta, R.

Borgatti, F.

S. Nannarone, F. Borgatti, A. DeLuisa, B. P. Doyle, G. C. Gazzadi, A. Giglia, P. Finetti, N. Mahne, L. Pasquali, M. Pedio, G. Selvaggi, G. Naletto, M. G. Pelizzo, and G. Tondello, “The BEAR beamline at ELETTRA,” AIP Conf. Proc. 705, 450–453 (2004).
[CrossRef]

Bridou, F.

E. Meltchakov, C. Hecquet, M. Roulliay, S. Rossi, Y. Menesguen, A. Jérome, F. Bridou, F. Varniere, M.-F. Ravet-Krill, and F. Delmotte, “Development of Al-based multilayer optics for EUV,” Appl. Phys., A Mater. Sci. Process. 98(1), 111–117 (2010).
[CrossRef]

J. Gautier, F. Delmotte, M. Roulliay, F. Bridou, M.-F. Ravet, and A. Jérome, “Study of normal incidence of three-component multilayer mirrors in the range 20-40 nm,” Appl. Opt. 44(3), 384–390 (2005).
[CrossRef] [PubMed]

Chapman, H. N.

Chuang, T. J.

K. Domen and T. J. Chuang, “Laser-induced photodissociation and desoprtion. 1. CH2I2 adsorbed on Al2O3,” J. Chem. Phys. 90(6), 3318–3331 (1989).
[CrossRef]

Delmotte, F.

E. Meltchakov, C. Hecquet, M. Roulliay, S. Rossi, Y. Menesguen, A. Jérome, F. Bridou, F. Varniere, M.-F. Ravet-Krill, and F. Delmotte, “Development of Al-based multilayer optics for EUV,” Appl. Phys., A Mater. Sci. Process. 98(1), 111–117 (2010).
[CrossRef]

A. Galtayries, M.-H. Hu, K. Le Guen, J.-M. André, P. Jonnard, E. Meltchakov, C. Hecquet, and F. Delmotte, “Nanometer designed Al/SiC periodic multilayers: characterization by a multi-technique approach,” Surf. Interface Anal. 42(6-7), 653–657 (2010).
[CrossRef]

P. Jonnard, K. Le Guen, M.-H. Hu, J.-M. André, E. Meltchakov, C. Hecquet, F. Delmotte, and A. Galtayries, “Optical, chemical and depth characterization of Al/SiC periodic multilayers,” Proc. SPIE 7360, O1–O9 (2009).

J. Gautier, F. Delmotte, M. Roulliay, F. Bridou, M.-F. Ravet, and A. Jérome, “Study of normal incidence of three-component multilayer mirrors in the range 20-40 nm,” Appl. Opt. 44(3), 384–390 (2005).
[CrossRef] [PubMed]

DeLuisa, A.

S. Nannarone, F. Borgatti, A. DeLuisa, B. P. Doyle, G. C. Gazzadi, A. Giglia, P. Finetti, N. Mahne, L. Pasquali, M. Pedio, G. Selvaggi, G. Naletto, M. G. Pelizzo, and G. Tondello, “The BEAR beamline at ELETTRA,” AIP Conf. Proc. 705, 450–453 (2004).
[CrossRef]

Domen, K.

K. Domen and T. J. Chuang, “Laser-induced photodissociation and desoprtion. 1. CH2I2 adsorbed on Al2O3,” J. Chem. Phys. 90(6), 3318–3331 (1989).
[CrossRef]

Doyle, B. P.

S. Nannarone, F. Borgatti, A. DeLuisa, B. P. Doyle, G. C. Gazzadi, A. Giglia, P. Finetti, N. Mahne, L. Pasquali, M. Pedio, G. Selvaggi, G. Naletto, M. G. Pelizzo, and G. Tondello, “The BEAR beamline at ELETTRA,” AIP Conf. Proc. 705, 450–453 (2004).
[CrossRef]

Feigl, T.

S. A. Yulin, F. Schaefers, T. Feigl, and N. Kaiser, “Enhanced reflectivity and stability of Sc/Si multilayers,” Proc. SPIE 5193, 155–163 (2004).
[CrossRef]

Finetti, P.

S. Nannarone, F. Borgatti, A. DeLuisa, B. P. Doyle, G. C. Gazzadi, A. Giglia, P. Finetti, N. Mahne, L. Pasquali, M. Pedio, G. Selvaggi, G. Naletto, M. G. Pelizzo, and G. Tondello, “The BEAR beamline at ELETTRA,” AIP Conf. Proc. 705, 450–453 (2004).
[CrossRef]

Galtayries, A.

A. Galtayries, M.-H. Hu, K. Le Guen, J.-M. André, P. Jonnard, E. Meltchakov, C. Hecquet, and F. Delmotte, “Nanometer designed Al/SiC periodic multilayers: characterization by a multi-technique approach,” Surf. Interface Anal. 42(6-7), 653–657 (2010).
[CrossRef]

P. Jonnard, K. Le Guen, M.-H. Hu, J.-M. André, E. Meltchakov, C. Hecquet, F. Delmotte, and A. Galtayries, “Optical, chemical and depth characterization of Al/SiC periodic multilayers,” Proc. SPIE 7360, O1–O9 (2009).

A. Galtayries, S. Wisniewski, and J. Grimblot, “Formation of thin oxide and sulphide films on polycrystalline molybdenum foils: characterization by XPS and surface potential variations,” J. Electron Spectrosc. Relat. Phenom. 87(1), 31–44 (1997).
[CrossRef]

Gautier, J.

Gazzadi, G. C.

S. Nannarone, F. Borgatti, A. DeLuisa, B. P. Doyle, G. C. Gazzadi, A. Giglia, P. Finetti, N. Mahne, L. Pasquali, M. Pedio, G. Selvaggi, G. Naletto, M. G. Pelizzo, and G. Tondello, “The BEAR beamline at ELETTRA,” AIP Conf. Proc. 705, 450–453 (2004).
[CrossRef]

Geib, K. M.

Y. Mizokawa, K. M. Geib, and C. W. Wilmsen, “Characterization of β-SiC surfaces and the Au/SiC interface,” J. Vac. Sci. Technol. A 4(3), 1696–1700 (1986).
[CrossRef]

Giglia, A.

S. Nannarone, F. Borgatti, A. DeLuisa, B. P. Doyle, G. C. Gazzadi, A. Giglia, P. Finetti, N. Mahne, L. Pasquali, M. Pedio, G. Selvaggi, G. Naletto, M. G. Pelizzo, and G. Tondello, “The BEAR beamline at ELETTRA,” AIP Conf. Proc. 705, 450–453 (2004).
[CrossRef]

Grantham, S.

Grimblot, J.

A. Galtayries, S. Wisniewski, and J. Grimblot, “Formation of thin oxide and sulphide films on polycrystalline molybdenum foils: characterization by XPS and surface potential variations,” J. Electron Spectrosc. Relat. Phenom. 87(1), 31–44 (1997).
[CrossRef]

Gullikson, E.

Gullikson, E. M.

Hecquet, C.

A. Galtayries, M.-H. Hu, K. Le Guen, J.-M. André, P. Jonnard, E. Meltchakov, C. Hecquet, and F. Delmotte, “Nanometer designed Al/SiC periodic multilayers: characterization by a multi-technique approach,” Surf. Interface Anal. 42(6-7), 653–657 (2010).
[CrossRef]

E. Meltchakov, C. Hecquet, M. Roulliay, S. Rossi, Y. Menesguen, A. Jérome, F. Bridou, F. Varniere, M.-F. Ravet-Krill, and F. Delmotte, “Development of Al-based multilayer optics for EUV,” Appl. Phys., A Mater. Sci. Process. 98(1), 111–117 (2010).
[CrossRef]

P. Jonnard, K. Le Guen, M.-H. Hu, J.-M. André, E. Meltchakov, C. Hecquet, F. Delmotte, and A. Galtayries, “Optical, chemical and depth characterization of Al/SiC periodic multilayers,” Proc. SPIE 7360, O1–O9 (2009).

Hettrick, M. C.

Hu, M.-H.

A. Galtayries, M.-H. Hu, K. Le Guen, J.-M. André, P. Jonnard, E. Meltchakov, C. Hecquet, and F. Delmotte, “Nanometer designed Al/SiC periodic multilayers: characterization by a multi-technique approach,” Surf. Interface Anal. 42(6-7), 653–657 (2010).
[CrossRef]

P. Jonnard, K. Le Guen, M.-H. Hu, J.-M. André, E. Meltchakov, C. Hecquet, F. Delmotte, and A. Galtayries, “Optical, chemical and depth characterization of Al/SiC periodic multilayers,” Proc. SPIE 7360, O1–O9 (2009).

Jérome, A.

E. Meltchakov, C. Hecquet, M. Roulliay, S. Rossi, Y. Menesguen, A. Jérome, F. Bridou, F. Varniere, M.-F. Ravet-Krill, and F. Delmotte, “Development of Al-based multilayer optics for EUV,” Appl. Phys., A Mater. Sci. Process. 98(1), 111–117 (2010).
[CrossRef]

J. Gautier, F. Delmotte, M. Roulliay, F. Bridou, M.-F. Ravet, and A. Jérome, “Study of normal incidence of three-component multilayer mirrors in the range 20-40 nm,” Appl. Opt. 44(3), 384–390 (2005).
[CrossRef] [PubMed]

Jonnard, P.

A. Galtayries, M.-H. Hu, K. Le Guen, J.-M. André, P. Jonnard, E. Meltchakov, C. Hecquet, and F. Delmotte, “Nanometer designed Al/SiC periodic multilayers: characterization by a multi-technique approach,” Surf. Interface Anal. 42(6-7), 653–657 (2010).
[CrossRef]

P. Jonnard, K. Le Guen, M.-H. Hu, J.-M. André, E. Meltchakov, C. Hecquet, F. Delmotte, and A. Galtayries, “Optical, chemical and depth characterization of Al/SiC periodic multilayers,” Proc. SPIE 7360, O1–O9 (2009).

Kaiser, N.

S. A. Yulin, F. Schaefers, T. Feigl, and N. Kaiser, “Enhanced reflectivity and stability of Sc/Si multilayers,” Proc. SPIE 5193, 155–163 (2004).
[CrossRef]

Kong, G.

M. Yuan, J.-T. Lu, and G. Kong, “Effect of SiO2:Na2O molar ratio of sodium silicate on the corrosion resistance of silicate conversion coatings,” Surf. Coat. Tech. 204(8), 1229–1235 (2010).
[CrossRef]

Kortright, J.

Le Guen, K.

A. Galtayries, M.-H. Hu, K. Le Guen, J.-M. André, P. Jonnard, E. Meltchakov, C. Hecquet, and F. Delmotte, “Nanometer designed Al/SiC periodic multilayers: characterization by a multi-technique approach,” Surf. Interface Anal. 42(6-7), 653–657 (2010).
[CrossRef]

P. Jonnard, K. Le Guen, M.-H. Hu, J.-M. André, E. Meltchakov, C. Hecquet, F. Delmotte, and A. Galtayries, “Optical, chemical and depth characterization of Al/SiC periodic multilayers,” Proc. SPIE 7360, O1–O9 (2009).

Liu, Y.

Lu, J.-T.

M. Yuan, J.-T. Lu, and G. Kong, “Effect of SiO2:Na2O molar ratio of sodium silicate on the corrosion resistance of silicate conversion coatings,” Surf. Coat. Tech. 204(8), 1229–1235 (2010).
[CrossRef]

Mahne, N.

S. Nannarone, F. Borgatti, A. DeLuisa, B. P. Doyle, G. C. Gazzadi, A. Giglia, P. Finetti, N. Mahne, L. Pasquali, M. Pedio, G. Selvaggi, G. Naletto, M. G. Pelizzo, and G. Tondello, “The BEAR beamline at ELETTRA,” AIP Conf. Proc. 705, 450–453 (2004).
[CrossRef]

Makowiecki, D.

Malinowski, M.

Meltchakov, E.

A. Galtayries, M.-H. Hu, K. Le Guen, J.-M. André, P. Jonnard, E. Meltchakov, C. Hecquet, and F. Delmotte, “Nanometer designed Al/SiC periodic multilayers: characterization by a multi-technique approach,” Surf. Interface Anal. 42(6-7), 653–657 (2010).
[CrossRef]

E. Meltchakov, C. Hecquet, M. Roulliay, S. Rossi, Y. Menesguen, A. Jérome, F. Bridou, F. Varniere, M.-F. Ravet-Krill, and F. Delmotte, “Development of Al-based multilayer optics for EUV,” Appl. Phys., A Mater. Sci. Process. 98(1), 111–117 (2010).
[CrossRef]

P. Jonnard, K. Le Guen, M.-H. Hu, J.-M. André, E. Meltchakov, C. Hecquet, F. Delmotte, and A. Galtayries, “Optical, chemical and depth characterization of Al/SiC periodic multilayers,” Proc. SPIE 7360, O1–O9 (2009).

Menesguen, Y.

E. Meltchakov, C. Hecquet, M. Roulliay, S. Rossi, Y. Menesguen, A. Jérome, F. Bridou, F. Varniere, M.-F. Ravet-Krill, and F. Delmotte, “Development of Al-based multilayer optics for EUV,” Appl. Phys., A Mater. Sci. Process. 98(1), 111–117 (2010).
[CrossRef]

Mizokawa, Y.

Y. Mizokawa, K. M. Geib, and C. W. Wilmsen, “Characterization of β-SiC surfaces and the Au/SiC interface,” J. Vac. Sci. Technol. A 4(3), 1696–1700 (1986).
[CrossRef]

Monaco, G.

Mrowka, S.

Naletto, G.

S. Nannarone, F. Borgatti, A. DeLuisa, B. P. Doyle, G. C. Gazzadi, A. Giglia, P. Finetti, N. Mahne, L. Pasquali, M. Pedio, G. Selvaggi, G. Naletto, M. G. Pelizzo, and G. Tondello, “The BEAR beamline at ELETTRA,” AIP Conf. Proc. 705, 450–453 (2004).
[CrossRef]

Nannarone, S.

S. Nannarone, F. Borgatti, A. DeLuisa, B. P. Doyle, G. C. Gazzadi, A. Giglia, P. Finetti, N. Mahne, L. Pasquali, M. Pedio, G. Selvaggi, G. Naletto, M. G. Pelizzo, and G. Tondello, “The BEAR beamline at ELETTRA,” AIP Conf. Proc. 705, 450–453 (2004).
[CrossRef]

Nguyen, N.

Nicolosi, P.

Pasquali, L.

S. Nannarone, F. Borgatti, A. DeLuisa, B. P. Doyle, G. C. Gazzadi, A. Giglia, P. Finetti, N. Mahne, L. Pasquali, M. Pedio, G. Selvaggi, G. Naletto, M. G. Pelizzo, and G. Tondello, “The BEAR beamline at ELETTRA,” AIP Conf. Proc. 705, 450–453 (2004).
[CrossRef]

Pedio, M.

S. Nannarone, F. Borgatti, A. DeLuisa, B. P. Doyle, G. C. Gazzadi, A. Giglia, P. Finetti, N. Mahne, L. Pasquali, M. Pedio, G. Selvaggi, G. Naletto, M. G. Pelizzo, and G. Tondello, “The BEAR beamline at ELETTRA,” AIP Conf. Proc. 705, 450–453 (2004).
[CrossRef]

Pelizzo, M. G.

M. G. Pelizzo, M. Suman, G. Monaco, P. Nicolosi, and D. L. Windt, “High performance EUV multilayer structures insensitive to capping layer optical parameters,” Opt. Express 16(19), 15228–15237 (2008).
[CrossRef] [PubMed]

S. Nannarone, F. Borgatti, A. DeLuisa, B. P. Doyle, G. C. Gazzadi, A. Giglia, P. Finetti, N. Mahne, L. Pasquali, M. Pedio, G. Selvaggi, G. Naletto, M. G. Pelizzo, and G. Tondello, “The BEAR beamline at ELETTRA,” AIP Conf. Proc. 705, 450–453 (2004).
[CrossRef]

Penn, D. R.

S. Tanuma, C. J. Powell, and D. R. Penn, “Calculations of electron inelastic mean free paths. V. Data for 14 organic compounds over the 50-2000 eV range,” Surf. Interface Anal. 21(3), 165–176 (1994).
[CrossRef]

Powell, C. J.

S. Tanuma, C. J. Powell, and D. R. Penn, “Calculations of electron inelastic mean free paths. V. Data for 14 organic compounds over the 50-2000 eV range,” Surf. Interface Anal. 21(3), 165–176 (1994).
[CrossRef]

Ravet, M.-F.

Ravet-Krill, M.-F.

E. Meltchakov, C. Hecquet, M. Roulliay, S. Rossi, Y. Menesguen, A. Jérome, F. Bridou, F. Varniere, M.-F. Ravet-Krill, and F. Delmotte, “Development of Al-based multilayer optics for EUV,” Appl. Phys., A Mater. Sci. Process. 98(1), 111–117 (2010).
[CrossRef]

Robinson, J. C.

Rossi, S.

E. Meltchakov, C. Hecquet, M. Roulliay, S. Rossi, Y. Menesguen, A. Jérome, F. Bridou, F. Varniere, M.-F. Ravet-Krill, and F. Delmotte, “Development of Al-based multilayer optics for EUV,” Appl. Phys., A Mater. Sci. Process. 98(1), 111–117 (2010).
[CrossRef]

Roulliay, M.

E. Meltchakov, C. Hecquet, M. Roulliay, S. Rossi, Y. Menesguen, A. Jérome, F. Bridou, F. Varniere, M.-F. Ravet-Krill, and F. Delmotte, “Development of Al-based multilayer optics for EUV,” Appl. Phys., A Mater. Sci. Process. 98(1), 111–117 (2010).
[CrossRef]

J. Gautier, F. Delmotte, M. Roulliay, F. Bridou, M.-F. Ravet, and A. Jérome, “Study of normal incidence of three-component multilayer mirrors in the range 20-40 nm,” Appl. Opt. 44(3), 384–390 (2005).
[CrossRef] [PubMed]

Salmassi, F.

Schaefers, F.

S. A. Yulin, F. Schaefers, T. Feigl, and N. Kaiser, “Enhanced reflectivity and stability of Sc/Si multilayers,” Proc. SPIE 5193, 155–163 (2004).
[CrossRef]

Scofield, J. H.

J. H. Scofield, “Hartree-Slater subshell photoionization cross-sections at 1254 and 1487 eV,” J. Electron Spectrosc. Relat. Phenom. 8(2), 129–137 (1976).
[CrossRef]

Selvaggi, G.

S. Nannarone, F. Borgatti, A. DeLuisa, B. P. Doyle, G. C. Gazzadi, A. Giglia, P. Finetti, N. Mahne, L. Pasquali, M. Pedio, G. Selvaggi, G. Naletto, M. G. Pelizzo, and G. Tondello, “The BEAR beamline at ELETTRA,” AIP Conf. Proc. 705, 450–453 (2004).
[CrossRef]

Skulina, K.

Soufli, R.

Suman, M.

Tanuma, S.

S. Tanuma, C. J. Powell, and D. R. Penn, “Calculations of electron inelastic mean free paths. V. Data for 14 organic compounds over the 50-2000 eV range,” Surf. Interface Anal. 21(3), 165–176 (1994).
[CrossRef]

Tarrio, C.

Tondello, G.

S. Nannarone, F. Borgatti, A. DeLuisa, B. P. Doyle, G. C. Gazzadi, A. Giglia, P. Finetti, N. Mahne, L. Pasquali, M. Pedio, G. Selvaggi, G. Naletto, M. G. Pelizzo, and G. Tondello, “The BEAR beamline at ELETTRA,” AIP Conf. Proc. 705, 450–453 (2004).
[CrossRef]

Underwood, J.

Varniere, F.

E. Meltchakov, C. Hecquet, M. Roulliay, S. Rossi, Y. Menesguen, A. Jérome, F. Bridou, F. Varniere, M.-F. Ravet-Krill, and F. Delmotte, “Development of Al-based multilayer optics for EUV,” Appl. Phys., A Mater. Sci. Process. 98(1), 111–117 (2010).
[CrossRef]

Wilmsen, C. W.

Y. Mizokawa, K. M. Geib, and C. W. Wilmsen, “Characterization of β-SiC surfaces and the Au/SiC interface,” J. Vac. Sci. Technol. A 4(3), 1696–1700 (1986).
[CrossRef]

Windt, D. L.

Wisniewski, S.

A. Galtayries, S. Wisniewski, and J. Grimblot, “Formation of thin oxide and sulphide films on polycrystalline molybdenum foils: characterization by XPS and surface potential variations,” J. Electron Spectrosc. Relat. Phenom. 87(1), 31–44 (1997).
[CrossRef]

Yuan, M.

M. Yuan, J.-T. Lu, and G. Kong, “Effect of SiO2:Na2O molar ratio of sodium silicate on the corrosion resistance of silicate conversion coatings,” Surf. Coat. Tech. 204(8), 1229–1235 (2010).
[CrossRef]

Yulin, S. A.

S. A. Yulin, F. Schaefers, T. Feigl, and N. Kaiser, “Enhanced reflectivity and stability of Sc/Si multilayers,” Proc. SPIE 5193, 155–163 (2004).
[CrossRef]

AIP Conf. Proc.

S. Nannarone, F. Borgatti, A. DeLuisa, B. P. Doyle, G. C. Gazzadi, A. Giglia, P. Finetti, N. Mahne, L. Pasquali, M. Pedio, G. Selvaggi, G. Naletto, M. G. Pelizzo, and G. Tondello, “The BEAR beamline at ELETTRA,” AIP Conf. Proc. 705, 450–453 (2004).
[CrossRef]

Appl. Opt.

Appl. Phys., A Mater. Sci. Process.

E. Meltchakov, C. Hecquet, M. Roulliay, S. Rossi, Y. Menesguen, A. Jérome, F. Bridou, F. Varniere, M.-F. Ravet-Krill, and F. Delmotte, “Development of Al-based multilayer optics for EUV,” Appl. Phys., A Mater. Sci. Process. 98(1), 111–117 (2010).
[CrossRef]

Comput. Phys.

D. L. Windt, “IMD - Software for modeling the optical properties of multilayer films,” Comput. Phys. 12(4), 360–370 (1998).
[CrossRef]

J. Chem. Phys.

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[CrossRef]

J. Electron Spectrosc. Relat. Phenom.

J. H. Scofield, “Hartree-Slater subshell photoionization cross-sections at 1254 and 1487 eV,” J. Electron Spectrosc. Relat. Phenom. 8(2), 129–137 (1976).
[CrossRef]

A. Galtayries, S. Wisniewski, and J. Grimblot, “Formation of thin oxide and sulphide films on polycrystalline molybdenum foils: characterization by XPS and surface potential variations,” J. Electron Spectrosc. Relat. Phenom. 87(1), 31–44 (1997).
[CrossRef]

J. Vac. Sci. Technol. A

Y. Mizokawa, K. M. Geib, and C. W. Wilmsen, “Characterization of β-SiC surfaces and the Au/SiC interface,” J. Vac. Sci. Technol. A 4(3), 1696–1700 (1986).
[CrossRef]

Opt. Express

Proc. SPIE

S. A. Yulin, F. Schaefers, T. Feigl, and N. Kaiser, “Enhanced reflectivity and stability of Sc/Si multilayers,” Proc. SPIE 5193, 155–163 (2004).
[CrossRef]

P. Jonnard, K. Le Guen, M.-H. Hu, J.-M. André, E. Meltchakov, C. Hecquet, F. Delmotte, and A. Galtayries, “Optical, chemical and depth characterization of Al/SiC periodic multilayers,” Proc. SPIE 7360, O1–O9 (2009).

Surf. Coat. Tech.

M. Yuan, J.-T. Lu, and G. Kong, “Effect of SiO2:Na2O molar ratio of sodium silicate on the corrosion resistance of silicate conversion coatings,” Surf. Coat. Tech. 204(8), 1229–1235 (2010).
[CrossRef]

Surf. Interface Anal.

S. Tanuma, C. J. Powell, and D. R. Penn, “Calculations of electron inelastic mean free paths. V. Data for 14 organic compounds over the 50-2000 eV range,” Surf. Interface Anal. 21(3), 165–176 (1994).
[CrossRef]

A. Galtayries, M.-H. Hu, K. Le Guen, J.-M. André, P. Jonnard, E. Meltchakov, C. Hecquet, and F. Delmotte, “Nanometer designed Al/SiC periodic multilayers: characterization by a multi-technique approach,” Surf. Interface Anal. 42(6-7), 653–657 (2010).
[CrossRef]

Other

P. Jonnard, K. Le Guen, M.-H. Hu, J.-M. André, E. Meltchakov, C. Hecquet, F. Delmotte, and A. Galtayries, “Optical, chemical and depth characterization of Al/SiC periodic multilayers”, Proc. SPIE 7360, 7360O1–7360–O9 (2009).

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Figures (6)

Fig. 1
Fig. 1

Experimental (bottom lines) and simulated (top lines) EUV reflectivity curves of the Al/Mo/SiC multilayers: Al/Mo/SiC_15 (dotted lines) Al/Mo/SiC_25 (solid lines).

Fig. 2
Fig. 2

(a)– Schematic representation of the two ultimate periods of the multilayered stack. (b)– the Si-, O- and Al- ion depth profiles (ToF-SIMS) of the Al/Mo/SiC_15 sample. The numbers 1, 5, 10 and 15 above and below the profiles refer to the Al/Mo/SiC trilayer period as counted from the surface.

Fig. 3
Fig. 3

The Si-, Al- and Mo- ion depth profiles (ToF-SIMS) of the second, third and fourth periods of Al/Mo/SiC_15. The Mo- profile intensity has been multiplied by a factor 4 for comparison. The numbers 2, 3 and 4 refer to the Al/Mo/SiC trilayer period as counted from the air/surface interface.

Fig. 4
Fig. 4

The Si-, Al- and Mo- ion depth profiles (ToF-SIMS) of the second, third and fourth periods of Al/Mo/SiC_25. The numbers 2, 3 and 4 refer to the Al/Mo/SiC trilayer period as counted from the surface.

Fig. 5
Fig. 5

The O-, SiC-, Al-, Mo- and SiO2 - ion depth profiles (ToF-SIMS) of the first and second periods of Al/Mo/SiC_25. The numbers 1 and 2 refer to the Al/Mo/SiC trilayer period as counted from the surface.

Fig. 6
Fig. 6

Surface characterization (XPS) of Al/Mo/SiC_15. Solid bold line: experiment; solid lines: components obtained from the decomposition of the core level; dashed line: recomposed signal.

Tables (3)

Tables Icon

Table 1 Interfacial roughness values at the three interfaces of the Al/Mo/SiC multilayers derived from the fit of the reflectivity curves measured at 0.154 nm. The values are given ± 0.2 nm

Tables Icon

Table 2 Equations of the XPS equivalent thicknesses of the layers in the first period multilayer (period 1) where λ represents the inelastic mean free path (calculated from the TPP-2M formula [15]), θ the take-off angle, N the atomic density; σ the photoemission cross section [16] and I the peak intensity

Tables Icon

Table 3 Comparison of experimental and simulated reflectivity values (R) for Al/Mo/SiC_15 and Al/Mo/SiC_25. Simulation results from individual or combined simulation case (see text for details)

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