Abstract

A hybrid plasmonic waveguide with double low-index nano-slots is introduced. The fabrication is simple and compatible with the standard processes for SOI wafers. The theoretical investigation shows that the present hybrid plasmonic waveguide has a low loss and consequently a relatively long propagation distance (at the order of several tens of λ). For TE polarization, there is a strong field enhancement in the double nano-slots. More power is confined in the low-index nano-slots for a smaller core width. For a 50nm-wide hybrid plasmonic waveguide with double 10nm-wide slots, the power confinement factor in the nano-slots is as high as 85% and the effective area is as small as 0.007μm2 at 1550nm. Consequently, the power density in the nano-slots becomes very high, e.g., >120μm–2, which is very desired for many applications. For the present hybrid plasmonic waveguide, the lateral dimension could be less than 50nm and the calculated decoupled separation for two parallel identical waveguides is only 0.62μm, which is helpful to realize photonic integration circuits with ultra-high integration density.

© 2010 OSA

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2010 (4)

2009 (2)

M. Fujii, J. Leuthold, and W. Freude, “Dispersion relation and loss of subwavelength confined mode of metal-dielectric-gap optical waveguides,” IEEE Photon. Technol. Lett. 21(6), 362–364 (2009).
[CrossRef]

D. Dai and S. He, “A silicon-based hybrid plasmonic waveguide with a metal cap for a nano-scale light confinement,” Opt. Express 17(19), 16646–16653 (2009).
[CrossRef] [PubMed]

2008 (2)

D. X. Dai, L. Yang, and S. L. He, “Ultrasmall thermally tunable microring resonator with a submicrometer heater on Si nanowires,” IEEE J. Lightwave Technol. 26(6), 704–709 (2008).
[CrossRef]

R. F. Oulton, V. J. Sorger, D. A. Genov, D. F. P. Pile, and X. Zhang, “A hybrid plasmonic waveguide for subwavelength confinement and long-range propagation,” Nat. Photonics 2(8), 496–500 (2008).
[CrossRef]

2007 (1)

2006 (2)

L. Chen, J. Shakya, and M. Lipson, “Subwavelength confinement in an integrated metal slot waveguide on silicon,” Opt. Lett. 31(14), 2133–2135 (2006).
[CrossRef] [PubMed]

S. I. Bozhevolnyi, V. S. Volkov, E. Devaux, J. Y. Laluet, and T. W. Ebbesen, “Channel plasmon subwavelength waveguide components including interferometers and ring resonators,” Nature 440(7083), 508–511 (2006).
[CrossRef] [PubMed]

2005 (5)

G. Veronis and S. H. Fan, “Bends and splitters in metal-dielectric-metal subwavelength plasmonic waveguides,” Appl. Phys. Lett. 87(13), 131102 (2005).
[CrossRef]

T. Tsuchizawa, K. Yamada, H. Fukuda, T. Watanabe, J. Takahashi, M. Takahashi, T. Shoji, E. Tamechika, S. Itabashi, and H. Morita, “Microphotonics Devices Based on Silicon Microfabrication Technology,” IEEE J. Sel. Top. Quantum Electron. 11(1), 232–240 (2005).
[CrossRef]

F. Kusunoki, T. Yotsuya, J. Takahara, and T. Kobayashi, “Propagation properties of guided waves in index-guided two-dimensional optical waveguides,” Appl. Phys. Lett. 86(21), 211101 (2005).
[CrossRef]

K. Tanaka, M. Tanaka, and T. Sugiyama, “Simulation of practical nanometric optical circuits based on surface plasmon polariton gap waveguides,” Opt. Express 13(1), 256–266 (2005).
[CrossRef] [PubMed]

L. Liu, Z. H. Han, and S. L. He, “Novel surface plasmon waveguide for high integration,” Opt. Express 13(17), 6645–6650 (2005).
[CrossRef] [PubMed]

2004 (6)

Aitchison, J. S.

Alam, M. Z.

Almeida, V. R.

Anand, S.

L. Thylén, M. Qiu, and S. Anand, “Photonic crystals--a step towards integrated circuits for photonics,” ChemPhysChem 5(9), 1268–1283 (2004).
[CrossRef] [PubMed]

Barrios, C. A.

Bozhevolnyi, S. I.

S. I. Bozhevolnyi, V. S. Volkov, E. Devaux, J. Y. Laluet, and T. W. Ebbesen, “Channel plasmon subwavelength waveguide components including interferometers and ring resonators,” Nature 440(7083), 508–511 (2006).
[CrossRef] [PubMed]

Brongersma, M. L.

Catrysse, P. B.

Chen, L.

Dai, D.

Dai, D. X.

D. X. Dai, L. Yang, and S. L. He, “Ultrasmall thermally tunable microring resonator with a submicrometer heater on Si nanowires,” IEEE J. Lightwave Technol. 26(6), 704–709 (2008).
[CrossRef]

Devaux, E.

S. I. Bozhevolnyi, V. S. Volkov, E. Devaux, J. Y. Laluet, and T. W. Ebbesen, “Channel plasmon subwavelength waveguide components including interferometers and ring resonators,” Nature 440(7083), 508–511 (2006).
[CrossRef] [PubMed]

Ebbesen, T. W.

S. I. Bozhevolnyi, V. S. Volkov, E. Devaux, J. Y. Laluet, and T. W. Ebbesen, “Channel plasmon subwavelength waveguide components including interferometers and ring resonators,” Nature 440(7083), 508–511 (2006).
[CrossRef] [PubMed]

Fan, S. H.

G. Veronis and S. H. Fan, “Bends and splitters in metal-dielectric-metal subwavelength plasmonic waveguides,” Appl. Phys. Lett. 87(13), 131102 (2005).
[CrossRef]

Freude, W.

M. Fujii, J. Leuthold, and W. Freude, “Dispersion relation and loss of subwavelength confined mode of metal-dielectric-gap optical waveguides,” IEEE Photon. Technol. Lett. 21(6), 362–364 (2009).
[CrossRef]

Fujii, M.

M. Fujii, J. Leuthold, and W. Freude, “Dispersion relation and loss of subwavelength confined mode of metal-dielectric-gap optical waveguides,” IEEE Photon. Technol. Lett. 21(6), 362–364 (2009).
[CrossRef]

Fukuda, H.

T. Tsuchizawa, K. Yamada, H. Fukuda, T. Watanabe, J. Takahashi, M. Takahashi, T. Shoji, E. Tamechika, S. Itabashi, and H. Morita, “Microphotonics Devices Based on Silicon Microfabrication Technology,” IEEE J. Sel. Top. Quantum Electron. 11(1), 232–240 (2005).
[CrossRef]

T. Goto, Y. Katagiri, H. Fukuda, H. Shinojima, Y. Nakano, I. Kobayashi, and Y. Mitsuoka, “Propagation loss measurement for surface plasmon-polariton modes at metal waveguides on semiconductor substrates,” Appl. Phys. Lett. 84(6), 852–854 (2004).
[CrossRef]

Genov, D. A.

R. F. Oulton, V. J. Sorger, D. A. Genov, D. F. P. Pile, and X. Zhang, “A hybrid plasmonic waveguide for subwavelength confinement and long-range propagation,” Nat. Photonics 2(8), 496–500 (2008).
[CrossRef]

Goto, T.

T. Goto, Y. Katagiri, H. Fukuda, H. Shinojima, Y. Nakano, I. Kobayashi, and Y. Mitsuoka, “Propagation loss measurement for surface plasmon-polariton modes at metal waveguides on semiconductor substrates,” Appl. Phys. Lett. 84(6), 852–854 (2004).
[CrossRef]

Gramotnev, D. K.

Han, Z.

Han, Z. H.

He, S.

He, S. L.

D. X. Dai, L. Yang, and S. L. He, “Ultrasmall thermally tunable microring resonator with a submicrometer heater on Si nanowires,” IEEE J. Lightwave Technol. 26(6), 704–709 (2008).
[CrossRef]

L. Liu, Z. H. Han, and S. L. He, “Novel surface plasmon waveguide for high integration,” Opt. Express 13(17), 6645–6650 (2005).
[CrossRef] [PubMed]

Itabashi, S.

T. Tsuchizawa, K. Yamada, H. Fukuda, T. Watanabe, J. Takahashi, M. Takahashi, T. Shoji, E. Tamechika, S. Itabashi, and H. Morita, “Microphotonics Devices Based on Silicon Microfabrication Technology,” IEEE J. Sel. Top. Quantum Electron. 11(1), 232–240 (2005).
[CrossRef]

Ju, J. J.

Katagiri, Y.

T. Goto, Y. Katagiri, H. Fukuda, H. Shinojima, Y. Nakano, I. Kobayashi, and Y. Mitsuoka, “Propagation loss measurement for surface plasmon-polariton modes at metal waveguides on semiconductor substrates,” Appl. Phys. Lett. 84(6), 852–854 (2004).
[CrossRef]

Kim, J. T.

Kim, M. S.

Kobayashi, I.

T. Goto, Y. Katagiri, H. Fukuda, H. Shinojima, Y. Nakano, I. Kobayashi, and Y. Mitsuoka, “Propagation loss measurement for surface plasmon-polariton modes at metal waveguides on semiconductor substrates,” Appl. Phys. Lett. 84(6), 852–854 (2004).
[CrossRef]

Kobayashi, T.

F. Kusunoki, T. Yotsuya, J. Takahara, and T. Kobayashi, “Propagation properties of guided waves in index-guided two-dimensional optical waveguides,” Appl. Phys. Lett. 86(21), 211101 (2005).
[CrossRef]

Kusunoki, F.

F. Kusunoki, T. Yotsuya, J. Takahara, and T. Kobayashi, “Propagation properties of guided waves in index-guided two-dimensional optical waveguides,” Appl. Phys. Lett. 86(21), 211101 (2005).
[CrossRef]

Laluet, J. Y.

S. I. Bozhevolnyi, V. S. Volkov, E. Devaux, J. Y. Laluet, and T. W. Ebbesen, “Channel plasmon subwavelength waveguide components including interferometers and ring resonators,” Nature 440(7083), 508–511 (2006).
[CrossRef] [PubMed]

Leuthold, J.

M. Fujii, J. Leuthold, and W. Freude, “Dispersion relation and loss of subwavelength confined mode of metal-dielectric-gap optical waveguides,” IEEE Photon. Technol. Lett. 21(6), 362–364 (2009).
[CrossRef]

Li, Q.

Lipson, M.

Liu, L.

Meier, J.

Mitsuoka, Y.

T. Goto, Y. Katagiri, H. Fukuda, H. Shinojima, Y. Nakano, I. Kobayashi, and Y. Mitsuoka, “Propagation loss measurement for surface plasmon-polariton modes at metal waveguides on semiconductor substrates,” Appl. Phys. Lett. 84(6), 852–854 (2004).
[CrossRef]

Mojahedi, M.

Morita, H.

T. Tsuchizawa, K. Yamada, H. Fukuda, T. Watanabe, J. Takahashi, M. Takahashi, T. Shoji, E. Tamechika, S. Itabashi, and H. Morita, “Microphotonics Devices Based on Silicon Microfabrication Technology,” IEEE J. Sel. Top. Quantum Electron. 11(1), 232–240 (2005).
[CrossRef]

Nakano, Y.

T. Goto, Y. Katagiri, H. Fukuda, H. Shinojima, Y. Nakano, I. Kobayashi, and Y. Mitsuoka, “Propagation loss measurement for surface plasmon-polariton modes at metal waveguides on semiconductor substrates,” Appl. Phys. Lett. 84(6), 852–854 (2004).
[CrossRef]

Oulton, R. F.

R. F. Oulton, V. J. Sorger, D. A. Genov, D. F. P. Pile, and X. Zhang, “A hybrid plasmonic waveguide for subwavelength confinement and long-range propagation,” Nat. Photonics 2(8), 496–500 (2008).
[CrossRef]

Park, S.

Park, S. K.

Pile, D. F. P.

R. F. Oulton, V. J. Sorger, D. A. Genov, D. F. P. Pile, and X. Zhang, “A hybrid plasmonic waveguide for subwavelength confinement and long-range propagation,” Nat. Photonics 2(8), 496–500 (2008).
[CrossRef]

D. F. P. Pile and D. K. Gramotnev, “Channel plasmon-polariton in a triangular groove on a metal surface,” Opt. Lett. 29(10), 1069–1071 (2004).
[CrossRef] [PubMed]

Qiu, M.

Y. Song, J. Wang, Q. Li, M. Yan, and M. Qiu, “Broadband coupler between silicon waveguide and hybrid plasmonic waveguide,” Opt. Express 18(12), 13173–13179 (2010).
[CrossRef] [PubMed]

L. Thylén, M. Qiu, and S. Anand, “Photonic crystals--a step towards integrated circuits for photonics,” ChemPhysChem 5(9), 1268–1283 (2004).
[CrossRef] [PubMed]

Selker, M. D.

Shakya, J.

Shi, Y.

Shin, S.-Y.

Shinojima, H.

T. Goto, Y. Katagiri, H. Fukuda, H. Shinojima, Y. Nakano, I. Kobayashi, and Y. Mitsuoka, “Propagation loss measurement for surface plasmon-polariton modes at metal waveguides on semiconductor substrates,” Appl. Phys. Lett. 84(6), 852–854 (2004).
[CrossRef]

Shoji, T.

T. Tsuchizawa, K. Yamada, H. Fukuda, T. Watanabe, J. Takahashi, M. Takahashi, T. Shoji, E. Tamechika, S. Itabashi, and H. Morita, “Microphotonics Devices Based on Silicon Microfabrication Technology,” IEEE J. Sel. Top. Quantum Electron. 11(1), 232–240 (2005).
[CrossRef]

Song, Y.

Sorger, V. J.

R. F. Oulton, V. J. Sorger, D. A. Genov, D. F. P. Pile, and X. Zhang, “A hybrid plasmonic waveguide for subwavelength confinement and long-range propagation,” Nat. Photonics 2(8), 496–500 (2008).
[CrossRef]

Sugiyama, T.

Takahara, J.

F. Kusunoki, T. Yotsuya, J. Takahara, and T. Kobayashi, “Propagation properties of guided waves in index-guided two-dimensional optical waveguides,” Appl. Phys. Lett. 86(21), 211101 (2005).
[CrossRef]

Takahashi, J.

T. Tsuchizawa, K. Yamada, H. Fukuda, T. Watanabe, J. Takahashi, M. Takahashi, T. Shoji, E. Tamechika, S. Itabashi, and H. Morita, “Microphotonics Devices Based on Silicon Microfabrication Technology,” IEEE J. Sel. Top. Quantum Electron. 11(1), 232–240 (2005).
[CrossRef]

Takahashi, M.

T. Tsuchizawa, K. Yamada, H. Fukuda, T. Watanabe, J. Takahashi, M. Takahashi, T. Shoji, E. Tamechika, S. Itabashi, and H. Morita, “Microphotonics Devices Based on Silicon Microfabrication Technology,” IEEE J. Sel. Top. Quantum Electron. 11(1), 232–240 (2005).
[CrossRef]

Tamechika, E.

T. Tsuchizawa, K. Yamada, H. Fukuda, T. Watanabe, J. Takahashi, M. Takahashi, T. Shoji, E. Tamechika, S. Itabashi, and H. Morita, “Microphotonics Devices Based on Silicon Microfabrication Technology,” IEEE J. Sel. Top. Quantum Electron. 11(1), 232–240 (2005).
[CrossRef]

Tanaka, K.

Tanaka, M.

Thylén, L.

L. Thylén, M. Qiu, and S. Anand, “Photonic crystals--a step towards integrated circuits for photonics,” ChemPhysChem 5(9), 1268–1283 (2004).
[CrossRef] [PubMed]

Tsuchizawa, T.

T. Tsuchizawa, K. Yamada, H. Fukuda, T. Watanabe, J. Takahashi, M. Takahashi, T. Shoji, E. Tamechika, S. Itabashi, and H. Morita, “Microphotonics Devices Based on Silicon Microfabrication Technology,” IEEE J. Sel. Top. Quantum Electron. 11(1), 232–240 (2005).
[CrossRef]

Van, V.

Veronis, G.

G. Veronis and S. H. Fan, “Bends and splitters in metal-dielectric-metal subwavelength plasmonic waveguides,” Appl. Phys. Lett. 87(13), 131102 (2005).
[CrossRef]

Volkov, V. S.

S. I. Bozhevolnyi, V. S. Volkov, E. Devaux, J. Y. Laluet, and T. W. Ebbesen, “Channel plasmon subwavelength waveguide components including interferometers and ring resonators,” Nature 440(7083), 508–511 (2006).
[CrossRef] [PubMed]

Wang, B.

Wang, G. P.

Wang, J.

Watanabe, T.

T. Tsuchizawa, K. Yamada, H. Fukuda, T. Watanabe, J. Takahashi, M. Takahashi, T. Shoji, E. Tamechika, S. Itabashi, and H. Morita, “Microphotonics Devices Based on Silicon Microfabrication Technology,” IEEE J. Sel. Top. Quantum Electron. 11(1), 232–240 (2005).
[CrossRef]

Wu, M.

Xu, Q.

Yamada, K.

T. Tsuchizawa, K. Yamada, H. Fukuda, T. Watanabe, J. Takahashi, M. Takahashi, T. Shoji, E. Tamechika, S. Itabashi, and H. Morita, “Microphotonics Devices Based on Silicon Microfabrication Technology,” IEEE J. Sel. Top. Quantum Electron. 11(1), 232–240 (2005).
[CrossRef]

Yan, M.

Yang, L.

D. X. Dai, L. Yang, and S. L. He, “Ultrasmall thermally tunable microring resonator with a submicrometer heater on Si nanowires,” IEEE J. Lightwave Technol. 26(6), 704–709 (2008).
[CrossRef]

Yotsuya, T.

F. Kusunoki, T. Yotsuya, J. Takahara, and T. Kobayashi, “Propagation properties of guided waves in index-guided two-dimensional optical waveguides,” Appl. Phys. Lett. 86(21), 211101 (2005).
[CrossRef]

Zhang, X.

R. F. Oulton, V. J. Sorger, D. A. Genov, D. F. P. Pile, and X. Zhang, “A hybrid plasmonic waveguide for subwavelength confinement and long-range propagation,” Nat. Photonics 2(8), 496–500 (2008).
[CrossRef]

Zia, R.

Appl. Opt. (1)

Appl. Phys. Lett. (3)

T. Goto, Y. Katagiri, H. Fukuda, H. Shinojima, Y. Nakano, I. Kobayashi, and Y. Mitsuoka, “Propagation loss measurement for surface plasmon-polariton modes at metal waveguides on semiconductor substrates,” Appl. Phys. Lett. 84(6), 852–854 (2004).
[CrossRef]

F. Kusunoki, T. Yotsuya, J. Takahara, and T. Kobayashi, “Propagation properties of guided waves in index-guided two-dimensional optical waveguides,” Appl. Phys. Lett. 86(21), 211101 (2005).
[CrossRef]

G. Veronis and S. H. Fan, “Bends and splitters in metal-dielectric-metal subwavelength plasmonic waveguides,” Appl. Phys. Lett. 87(13), 131102 (2005).
[CrossRef]

ChemPhysChem (1)

L. Thylén, M. Qiu, and S. Anand, “Photonic crystals--a step towards integrated circuits for photonics,” ChemPhysChem 5(9), 1268–1283 (2004).
[CrossRef] [PubMed]

IEEE J. Lightwave Technol. (1)

D. X. Dai, L. Yang, and S. L. He, “Ultrasmall thermally tunable microring resonator with a submicrometer heater on Si nanowires,” IEEE J. Lightwave Technol. 26(6), 704–709 (2008).
[CrossRef]

IEEE J. Sel. Top. Quantum Electron. (1)

T. Tsuchizawa, K. Yamada, H. Fukuda, T. Watanabe, J. Takahashi, M. Takahashi, T. Shoji, E. Tamechika, S. Itabashi, and H. Morita, “Microphotonics Devices Based on Silicon Microfabrication Technology,” IEEE J. Sel. Top. Quantum Electron. 11(1), 232–240 (2005).
[CrossRef]

IEEE Photon. Technol. Lett. (1)

M. Fujii, J. Leuthold, and W. Freude, “Dispersion relation and loss of subwavelength confined mode of metal-dielectric-gap optical waveguides,” IEEE Photon. Technol. Lett. 21(6), 362–364 (2009).
[CrossRef]

J. Opt. Soc. Am. A (1)

Nat. Photonics (1)

R. F. Oulton, V. J. Sorger, D. A. Genov, D. F. P. Pile, and X. Zhang, “A hybrid plasmonic waveguide for subwavelength confinement and long-range propagation,” Nat. Photonics 2(8), 496–500 (2008).
[CrossRef]

Nature (1)

S. I. Bozhevolnyi, V. S. Volkov, E. Devaux, J. Y. Laluet, and T. W. Ebbesen, “Channel plasmon subwavelength waveguide components including interferometers and ring resonators,” Nature 440(7083), 508–511 (2006).
[CrossRef] [PubMed]

Opt. Express (7)

Opt. Lett. (4)

Other (1)

M. Z. Alam, J. Meier, J. S. Aitchison, and M. Mojahedi, “Super mode propagation in low index medium,” CLEO/QELS (2007).

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Figures (6)

Fig. 1
Fig. 1

The cross section of the present hybrid plasmonic waveguide with double low-index slots.

Fig. 2
Fig. 2

The proposed fabrication processes: (a) Form a ~100nm-thick SiO2 film; (b) E-beam lithography and dry etching; (c) Thermal oxidation: 10~50nm-thick SiO2; (d) Metal deposit: 100~200nm-thick.

Fig. 3
Fig. 3

The calculated field distribution for the major component Ex (x,y) of the quasi-TE fundamental mode of the present hybrid plasmonic waveguide with w co = 50nm and w SiO2 = 10nm. Here the field distributions Ex (x 0, y) and Ex (x, y 0) are also shown. It can be seen that the optical field at the 10nm-SiO2 nano-slots is enhanced greatly.

Fig. 4
Fig. 4

For the cases of w slot = 10nm, 20nm, 30nm, and 50nm, (a) the real part of the effective index of the quasi-TE fundamental mode; (b) the power confinement factor in the low-index slots P SiO2; (c) the power confinement factor in the Si rib P Si; (d) the normalized power density; (e) the effective areas A eff; (f) the propagation distance L prop. Here we choose a relatively thick SiO2 up-cladding h SiO2 = 300nm and h Si = 340nm.

Fig. 5
Fig. 5

(a) The propagation distance L prop as the core width wco varies for the cases of h SiO2 = 20, 50, 100, 150, 200, 250, and 300nm; (b) the propagation distance L prop as the thickness h SiO2 varies for the cases of w co = 100, 150, and 200nm. Here the slot width is fixed to w slot = 20nm and the Si rib height h Si = 340nm.

Fig. 6
Fig. 6

(a) The cross section for a coupling system with two parallel identical hybrid plasmonic waveguides; (b) the calculated coupling length L c as the waveguide core width w co varies for different separations s between the two waveguides (s = 200, 300, 400, 500, 600, 700, and 800nm); (c) the calculated coupling length L c as the separation s increases for a fixed core width w co = 50nm; The decoupled separation s dc is as small as 620nm.

Equations (3)

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A eff = S P ( x , y ) d x d y max [ P ( x , y ) ] ,
XT = 20 lg [ sin ( 0.5 π z / L c ) ] ,
L c > π 2 l 0 sin 1 ( 10 XT 0 / 20 ) L c(min) .

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