Abstract

We demonstrate low loss shallow-ridge silicon waveguides with an average propagation loss of 0.274 ± 0.008 dB/cm in the C-band (1530 nm - 1565 nm). These waveguides have a cross section of 0.25 µm by 2 µm and are fabricated by standard photolithography and dry etching. We also investigate a compact double-level taper which adiabatically couples light from these waveguides to silicon strip waveguides enabling tight bends.

© 2010 OSA

Full Article  |  PDF Article

References

  • View by:
  • |
  • |
  • |

  1. R. A. Soref, “The past, present and future of silicon photonics.” IEEE, J. Sel. Top. Quantm Electron. 12(6), 1678–1687 (2006).
    [CrossRef]
  2. D. A. B. Miller, “Optical interconnects to silicon,” IEEE J. Sel. Top. Quantum Electron. 6(6), 1312–1317 (2000).
    [CrossRef]
  3. B. Jalali, M. Paniccia, and G. Reed, “Silicon photonics,” IEEE Microw. Mag. 7(3), 58–68 (2006).
    [CrossRef]
  4. A. V. Krishnamoorthy, R. Ho, X. Zheng, H. Schwetman, J. Lexau, P. Koka, G. Li, I. Shubin, and J. E. Cunningham, “Computer systems based on silicon photonic interconnects,” Proc. IEEE 97, 1337–1361 (2009).
    [CrossRef]
  5. Q. Xu, B. Schmidt, S. Pradhan, and M. Lipson, “Micrometre-scale silicon electro-optic modulator,” Nature 435(7040), 325–327 (2005).
    [CrossRef] [PubMed]
  6. W. M. Green, M. J. Rooks, L. Sekaric, and Y. A. Vlasov, “Ultra-compact, low RF power, 10 Gb/s silicon Mach-Zehnder modulator,” Opt. Express 15(25), 17106–17113 (2007).
    [CrossRef] [PubMed]
  7. Y. A. Vlasov and S. J. McNab, “Losses in single-mode silicon-on-insulator strip waveguides and bends,” Opt. Express 12(8), 1622–1631 (2004).
    [CrossRef] [PubMed]
  8. M. Gnan, S. Thoms, D. S. Macintyre, R. M. De La Rue, and M. Sorel, “Fabrication of low-loss photonic wires in silicon-on-insulator using hydrogen silsesquioxane electron-beam resist,” Electron. Lett. 44(2), 115–116 (2008).
    [CrossRef]
  9. K. K. Lee, D. R. Lim, L. C. Kimerling, J. Shin, and F. Cerrina, “Fabrication of ultralow-loss Si/SiO(2) waveguides by roughness reduction,” Opt. Lett. 26(23), 1888–1890 (2001).
    [CrossRef]
  10. P. Dumon, W. Bogaerts, V. Wiaux, J. Wouters, S. Beckx, J. Van Campenhout, D. Taillaert, B. Luyssaert, P. Bienstman, D. Van Thourhout, and R. Baets, “Low-loss SOI photonic wires and ring resonators fabricated with deep UV lithography,” IEEE Photon. Technol. Lett. 16(5), 1328–1330 (2004).
    [CrossRef]
  11. T. Tsuchizawa, K. Yamada, H. Fukuda, T. Watanabe, M. Jun-ichi Takahashi, T. Takahashi, E. Shoji, S. Tamechika, Itabashi, and H. Morita, “Microphotonics devices based on silicon microfabrication technology,” IEEE J. Sel. Top. Quantum Electron. 11(1), 232–240 (2005).
    [CrossRef]
  12. W. Bogaerts, R. Baets, P. Dumon, V. Wiaux, S. Beckx, D. Taillaert, B. Luyssaert, J. Van Campenhout, P. Bienstman, and D. Van Thourhout, “Nanophotonic waveguides in silicon-on-insulator fabricated with CMOS technology,” J. Lightwave Technol. 23(1), 401–412 (2005).
    [CrossRef]
  13. T. Tsuchizawa, K. Yamada, H. Fukuda, T. Watanabe, S. Uchiyama, and S. Itabashi, “Low-loss Si wire waveguides and their application to thermooptic switches,” Jpn. J. Appl. Phys. 45(No. 8B), 6658–6662 (2006).
    [CrossRef]
  14. S. Lardenois, D. Pascal, L. Vivien, E. Cassan, S. Laval, R. Orobtchouk, M. Heitzmann, N. Bouzaida, and L. Mollard, “Low-loss submicrometer silicon-on-insulator rib waveguides and corner mirrors,” Opt. Lett. 28(13), 1150–1152 (2003).
    [CrossRef] [PubMed]
  15. M. A. Webster, R. M. Pafchek, G. Sukumaran, and T. L. Koch, “Low-loss quasi-planar ridge waveguides formed on thin silicon-on-insulator,” Appl. Phys. Lett. 87(23), 231108 (2005).
    [CrossRef]
  16. L. K. Rowe, M. Elsey, N. G. Tarr, A. P. Knights, and E. Post, “CMOS-compatible optical rib waveguides defined by local oxidation of silicon,” Electron. Lett. 43(7), 392–393 (2007).
    [CrossRef]
  17. F. Y. Gardes, G. T. Reed, A. P. Knights, G. Mashanovich, P. E. Jessop, L. Rowe, S. McFaul, D. Bruce, and N. G. Tarr, “Sub-micron optical waveguides for silicon photonics formed via the Local Oxidation of Silicon (LOCOS),” Proc. SPIE 6898, 4 (2008).
  18. R. Pafchek, R. Tummidi, J. Li, M. A. Webster, E. Chen, and T. L. Koch, “Low-loss silicon-on-insulator shallow-ridge TE and TM waveguides formed using thermal oxidation,” Appl. Opt. 48(5), 958–963 (2009).
    [CrossRef] [PubMed]
  19. J. Cardenas, C. B. Poitras, J. T. Robinson, K. Preston, L. Chen, and M. Lipson, “Low loss etchless silicon photonic waveguides,” Opt. Express 17(6), 4752–4757 (2009).
    [CrossRef] [PubMed]
  20. S. T. Peng and A. A. Oliner, “Guidance and leakage properties of a class of open dielectric waveguides: Part I Mathematical Formulations,” IEEE Trans. Microw. Theory Tech. 29(9), 843–855 (1981).
    [CrossRef]
  21. A. A. Oliner, S. T. Peng, T. I. Hsu, and A. Sanchez, “Guidance and leakage properties of a class of open dielectric waveguides: Part II – New physical effects,” IEEE Trans. Microw. Theory Tech. 29(9), 855–869 (1981).
    [CrossRef]
  22. Q. Xu, D. Fattal, and R. G. Beausoleil, “Silicon microring resonators with 1.5-microm radius,” Opt. Express 16(6), 4309–4315 (2008).
    [CrossRef] [PubMed]
  23. Rsoft Design Group, Inc., 400 Executive Boulevard, Suite 100, Ossining, N.Y. 10562, USA, www.rsoftdesign.com .
  24. M. R. Watts, W. A. Zortman, D. C. Trotter, R. W. Young, and A. L. Lentine, “Low-voltage, compact, depletion-mode, silicon Mach–Zehnder Modulator,” IEEE J. Sel. Top. Quantum Electron. 16(1), 159–164 (2010).
    [CrossRef]
  25. M. A. Foster, A. C. Turner, J. E. Sharping, B. S. Schmidt, M. Lipson, and A. L. Gaeta, “Broad-band optical parametric gain on a silicon photonic chip,” Nature 441(7096), 960–963 (2006).
    [CrossRef] [PubMed]
  26. L. Yin, Q. Lin, and G. P. Agrawal, “Soliton fission and supercontinuum generation in silicon waveguides,” Opt. Lett. 32(4), 391–393 (2007).
    [CrossRef] [PubMed]

2010 (1)

M. R. Watts, W. A. Zortman, D. C. Trotter, R. W. Young, and A. L. Lentine, “Low-voltage, compact, depletion-mode, silicon Mach–Zehnder Modulator,” IEEE J. Sel. Top. Quantum Electron. 16(1), 159–164 (2010).
[CrossRef]

2009 (3)

2008 (3)

Q. Xu, D. Fattal, and R. G. Beausoleil, “Silicon microring resonators with 1.5-microm radius,” Opt. Express 16(6), 4309–4315 (2008).
[CrossRef] [PubMed]

M. Gnan, S. Thoms, D. S. Macintyre, R. M. De La Rue, and M. Sorel, “Fabrication of low-loss photonic wires in silicon-on-insulator using hydrogen silsesquioxane electron-beam resist,” Electron. Lett. 44(2), 115–116 (2008).
[CrossRef]

F. Y. Gardes, G. T. Reed, A. P. Knights, G. Mashanovich, P. E. Jessop, L. Rowe, S. McFaul, D. Bruce, and N. G. Tarr, “Sub-micron optical waveguides for silicon photonics formed via the Local Oxidation of Silicon (LOCOS),” Proc. SPIE 6898, 4 (2008).

2007 (3)

2006 (4)

B. Jalali, M. Paniccia, and G. Reed, “Silicon photonics,” IEEE Microw. Mag. 7(3), 58–68 (2006).
[CrossRef]

M. A. Foster, A. C. Turner, J. E. Sharping, B. S. Schmidt, M. Lipson, and A. L. Gaeta, “Broad-band optical parametric gain on a silicon photonic chip,” Nature 441(7096), 960–963 (2006).
[CrossRef] [PubMed]

T. Tsuchizawa, K. Yamada, H. Fukuda, T. Watanabe, S. Uchiyama, and S. Itabashi, “Low-loss Si wire waveguides and their application to thermooptic switches,” Jpn. J. Appl. Phys. 45(No. 8B), 6658–6662 (2006).
[CrossRef]

R. A. Soref, “The past, present and future of silicon photonics.” IEEE, J. Sel. Top. Quantm Electron. 12(6), 1678–1687 (2006).
[CrossRef]

2005 (4)

Q. Xu, B. Schmidt, S. Pradhan, and M. Lipson, “Micrometre-scale silicon electro-optic modulator,” Nature 435(7040), 325–327 (2005).
[CrossRef] [PubMed]

T. Tsuchizawa, K. Yamada, H. Fukuda, T. Watanabe, M. Jun-ichi Takahashi, T. Takahashi, E. Shoji, S. Tamechika, Itabashi, and H. Morita, “Microphotonics devices based on silicon microfabrication technology,” IEEE J. Sel. Top. Quantum Electron. 11(1), 232–240 (2005).
[CrossRef]

M. A. Webster, R. M. Pafchek, G. Sukumaran, and T. L. Koch, “Low-loss quasi-planar ridge waveguides formed on thin silicon-on-insulator,” Appl. Phys. Lett. 87(23), 231108 (2005).
[CrossRef]

W. Bogaerts, R. Baets, P. Dumon, V. Wiaux, S. Beckx, D. Taillaert, B. Luyssaert, J. Van Campenhout, P. Bienstman, and D. Van Thourhout, “Nanophotonic waveguides in silicon-on-insulator fabricated with CMOS technology,” J. Lightwave Technol. 23(1), 401–412 (2005).
[CrossRef]

2004 (2)

Y. A. Vlasov and S. J. McNab, “Losses in single-mode silicon-on-insulator strip waveguides and bends,” Opt. Express 12(8), 1622–1631 (2004).
[CrossRef] [PubMed]

P. Dumon, W. Bogaerts, V. Wiaux, J. Wouters, S. Beckx, J. Van Campenhout, D. Taillaert, B. Luyssaert, P. Bienstman, D. Van Thourhout, and R. Baets, “Low-loss SOI photonic wires and ring resonators fabricated with deep UV lithography,” IEEE Photon. Technol. Lett. 16(5), 1328–1330 (2004).
[CrossRef]

2003 (1)

2001 (1)

2000 (1)

D. A. B. Miller, “Optical interconnects to silicon,” IEEE J. Sel. Top. Quantum Electron. 6(6), 1312–1317 (2000).
[CrossRef]

1981 (2)

S. T. Peng and A. A. Oliner, “Guidance and leakage properties of a class of open dielectric waveguides: Part I Mathematical Formulations,” IEEE Trans. Microw. Theory Tech. 29(9), 843–855 (1981).
[CrossRef]

A. A. Oliner, S. T. Peng, T. I. Hsu, and A. Sanchez, “Guidance and leakage properties of a class of open dielectric waveguides: Part II – New physical effects,” IEEE Trans. Microw. Theory Tech. 29(9), 855–869 (1981).
[CrossRef]

Agrawal, G. P.

Baets, R.

W. Bogaerts, R. Baets, P. Dumon, V. Wiaux, S. Beckx, D. Taillaert, B. Luyssaert, J. Van Campenhout, P. Bienstman, and D. Van Thourhout, “Nanophotonic waveguides in silicon-on-insulator fabricated with CMOS technology,” J. Lightwave Technol. 23(1), 401–412 (2005).
[CrossRef]

P. Dumon, W. Bogaerts, V. Wiaux, J. Wouters, S. Beckx, J. Van Campenhout, D. Taillaert, B. Luyssaert, P. Bienstman, D. Van Thourhout, and R. Baets, “Low-loss SOI photonic wires and ring resonators fabricated with deep UV lithography,” IEEE Photon. Technol. Lett. 16(5), 1328–1330 (2004).
[CrossRef]

Beausoleil, R. G.

Beckx, S.

W. Bogaerts, R. Baets, P. Dumon, V. Wiaux, S. Beckx, D. Taillaert, B. Luyssaert, J. Van Campenhout, P. Bienstman, and D. Van Thourhout, “Nanophotonic waveguides in silicon-on-insulator fabricated with CMOS technology,” J. Lightwave Technol. 23(1), 401–412 (2005).
[CrossRef]

P. Dumon, W. Bogaerts, V. Wiaux, J. Wouters, S. Beckx, J. Van Campenhout, D. Taillaert, B. Luyssaert, P. Bienstman, D. Van Thourhout, and R. Baets, “Low-loss SOI photonic wires and ring resonators fabricated with deep UV lithography,” IEEE Photon. Technol. Lett. 16(5), 1328–1330 (2004).
[CrossRef]

Bienstman, P.

W. Bogaerts, R. Baets, P. Dumon, V. Wiaux, S. Beckx, D. Taillaert, B. Luyssaert, J. Van Campenhout, P. Bienstman, and D. Van Thourhout, “Nanophotonic waveguides in silicon-on-insulator fabricated with CMOS technology,” J. Lightwave Technol. 23(1), 401–412 (2005).
[CrossRef]

P. Dumon, W. Bogaerts, V. Wiaux, J. Wouters, S. Beckx, J. Van Campenhout, D. Taillaert, B. Luyssaert, P. Bienstman, D. Van Thourhout, and R. Baets, “Low-loss SOI photonic wires and ring resonators fabricated with deep UV lithography,” IEEE Photon. Technol. Lett. 16(5), 1328–1330 (2004).
[CrossRef]

Bogaerts, W.

W. Bogaerts, R. Baets, P. Dumon, V. Wiaux, S. Beckx, D. Taillaert, B. Luyssaert, J. Van Campenhout, P. Bienstman, and D. Van Thourhout, “Nanophotonic waveguides in silicon-on-insulator fabricated with CMOS technology,” J. Lightwave Technol. 23(1), 401–412 (2005).
[CrossRef]

P. Dumon, W. Bogaerts, V. Wiaux, J. Wouters, S. Beckx, J. Van Campenhout, D. Taillaert, B. Luyssaert, P. Bienstman, D. Van Thourhout, and R. Baets, “Low-loss SOI photonic wires and ring resonators fabricated with deep UV lithography,” IEEE Photon. Technol. Lett. 16(5), 1328–1330 (2004).
[CrossRef]

Bouzaida, N.

Bruce, D.

F. Y. Gardes, G. T. Reed, A. P. Knights, G. Mashanovich, P. E. Jessop, L. Rowe, S. McFaul, D. Bruce, and N. G. Tarr, “Sub-micron optical waveguides for silicon photonics formed via the Local Oxidation of Silicon (LOCOS),” Proc. SPIE 6898, 4 (2008).

Cardenas, J.

Cassan, E.

Cerrina, F.

Chen, E.

Chen, L.

Cunningham, J. E.

A. V. Krishnamoorthy, R. Ho, X. Zheng, H. Schwetman, J. Lexau, P. Koka, G. Li, I. Shubin, and J. E. Cunningham, “Computer systems based on silicon photonic interconnects,” Proc. IEEE 97, 1337–1361 (2009).
[CrossRef]

De La Rue, R. M.

M. Gnan, S. Thoms, D. S. Macintyre, R. M. De La Rue, and M. Sorel, “Fabrication of low-loss photonic wires in silicon-on-insulator using hydrogen silsesquioxane electron-beam resist,” Electron. Lett. 44(2), 115–116 (2008).
[CrossRef]

Dumon, P.

W. Bogaerts, R. Baets, P. Dumon, V. Wiaux, S. Beckx, D. Taillaert, B. Luyssaert, J. Van Campenhout, P. Bienstman, and D. Van Thourhout, “Nanophotonic waveguides in silicon-on-insulator fabricated with CMOS technology,” J. Lightwave Technol. 23(1), 401–412 (2005).
[CrossRef]

P. Dumon, W. Bogaerts, V. Wiaux, J. Wouters, S. Beckx, J. Van Campenhout, D. Taillaert, B. Luyssaert, P. Bienstman, D. Van Thourhout, and R. Baets, “Low-loss SOI photonic wires and ring resonators fabricated with deep UV lithography,” IEEE Photon. Technol. Lett. 16(5), 1328–1330 (2004).
[CrossRef]

Elsey, M.

L. K. Rowe, M. Elsey, N. G. Tarr, A. P. Knights, and E. Post, “CMOS-compatible optical rib waveguides defined by local oxidation of silicon,” Electron. Lett. 43(7), 392–393 (2007).
[CrossRef]

Fattal, D.

Foster, M. A.

M. A. Foster, A. C. Turner, J. E. Sharping, B. S. Schmidt, M. Lipson, and A. L. Gaeta, “Broad-band optical parametric gain on a silicon photonic chip,” Nature 441(7096), 960–963 (2006).
[CrossRef] [PubMed]

Fukuda, H.

T. Tsuchizawa, K. Yamada, H. Fukuda, T. Watanabe, S. Uchiyama, and S. Itabashi, “Low-loss Si wire waveguides and their application to thermooptic switches,” Jpn. J. Appl. Phys. 45(No. 8B), 6658–6662 (2006).
[CrossRef]

T. Tsuchizawa, K. Yamada, H. Fukuda, T. Watanabe, M. Jun-ichi Takahashi, T. Takahashi, E. Shoji, S. Tamechika, Itabashi, and H. Morita, “Microphotonics devices based on silicon microfabrication technology,” IEEE J. Sel. Top. Quantum Electron. 11(1), 232–240 (2005).
[CrossRef]

Gaeta, A. L.

M. A. Foster, A. C. Turner, J. E. Sharping, B. S. Schmidt, M. Lipson, and A. L. Gaeta, “Broad-band optical parametric gain on a silicon photonic chip,” Nature 441(7096), 960–963 (2006).
[CrossRef] [PubMed]

Gardes, F. Y.

F. Y. Gardes, G. T. Reed, A. P. Knights, G. Mashanovich, P. E. Jessop, L. Rowe, S. McFaul, D. Bruce, and N. G. Tarr, “Sub-micron optical waveguides for silicon photonics formed via the Local Oxidation of Silicon (LOCOS),” Proc. SPIE 6898, 4 (2008).

Gnan, M.

M. Gnan, S. Thoms, D. S. Macintyre, R. M. De La Rue, and M. Sorel, “Fabrication of low-loss photonic wires in silicon-on-insulator using hydrogen silsesquioxane electron-beam resist,” Electron. Lett. 44(2), 115–116 (2008).
[CrossRef]

Green, W. M.

Heitzmann, M.

Ho, R.

A. V. Krishnamoorthy, R. Ho, X. Zheng, H. Schwetman, J. Lexau, P. Koka, G. Li, I. Shubin, and J. E. Cunningham, “Computer systems based on silicon photonic interconnects,” Proc. IEEE 97, 1337–1361 (2009).
[CrossRef]

Hsu, T. I.

A. A. Oliner, S. T. Peng, T. I. Hsu, and A. Sanchez, “Guidance and leakage properties of a class of open dielectric waveguides: Part II – New physical effects,” IEEE Trans. Microw. Theory Tech. 29(9), 855–869 (1981).
[CrossRef]

Itabashi,

T. Tsuchizawa, K. Yamada, H. Fukuda, T. Watanabe, M. Jun-ichi Takahashi, T. Takahashi, E. Shoji, S. Tamechika, Itabashi, and H. Morita, “Microphotonics devices based on silicon microfabrication technology,” IEEE J. Sel. Top. Quantum Electron. 11(1), 232–240 (2005).
[CrossRef]

Itabashi, S.

T. Tsuchizawa, K. Yamada, H. Fukuda, T. Watanabe, S. Uchiyama, and S. Itabashi, “Low-loss Si wire waveguides and their application to thermooptic switches,” Jpn. J. Appl. Phys. 45(No. 8B), 6658–6662 (2006).
[CrossRef]

Jalali, B.

B. Jalali, M. Paniccia, and G. Reed, “Silicon photonics,” IEEE Microw. Mag. 7(3), 58–68 (2006).
[CrossRef]

Jessop, P. E.

F. Y. Gardes, G. T. Reed, A. P. Knights, G. Mashanovich, P. E. Jessop, L. Rowe, S. McFaul, D. Bruce, and N. G. Tarr, “Sub-micron optical waveguides for silicon photonics formed via the Local Oxidation of Silicon (LOCOS),” Proc. SPIE 6898, 4 (2008).

Jun-ichi Takahashi, M.

T. Tsuchizawa, K. Yamada, H. Fukuda, T. Watanabe, M. Jun-ichi Takahashi, T. Takahashi, E. Shoji, S. Tamechika, Itabashi, and H. Morita, “Microphotonics devices based on silicon microfabrication technology,” IEEE J. Sel. Top. Quantum Electron. 11(1), 232–240 (2005).
[CrossRef]

Kimerling, L. C.

Knights, A. P.

F. Y. Gardes, G. T. Reed, A. P. Knights, G. Mashanovich, P. E. Jessop, L. Rowe, S. McFaul, D. Bruce, and N. G. Tarr, “Sub-micron optical waveguides for silicon photonics formed via the Local Oxidation of Silicon (LOCOS),” Proc. SPIE 6898, 4 (2008).

L. K. Rowe, M. Elsey, N. G. Tarr, A. P. Knights, and E. Post, “CMOS-compatible optical rib waveguides defined by local oxidation of silicon,” Electron. Lett. 43(7), 392–393 (2007).
[CrossRef]

Koch, T. L.

R. Pafchek, R. Tummidi, J. Li, M. A. Webster, E. Chen, and T. L. Koch, “Low-loss silicon-on-insulator shallow-ridge TE and TM waveguides formed using thermal oxidation,” Appl. Opt. 48(5), 958–963 (2009).
[CrossRef] [PubMed]

M. A. Webster, R. M. Pafchek, G. Sukumaran, and T. L. Koch, “Low-loss quasi-planar ridge waveguides formed on thin silicon-on-insulator,” Appl. Phys. Lett. 87(23), 231108 (2005).
[CrossRef]

Koka, P.

A. V. Krishnamoorthy, R. Ho, X. Zheng, H. Schwetman, J. Lexau, P. Koka, G. Li, I. Shubin, and J. E. Cunningham, “Computer systems based on silicon photonic interconnects,” Proc. IEEE 97, 1337–1361 (2009).
[CrossRef]

Krishnamoorthy, A. V.

A. V. Krishnamoorthy, R. Ho, X. Zheng, H. Schwetman, J. Lexau, P. Koka, G. Li, I. Shubin, and J. E. Cunningham, “Computer systems based on silicon photonic interconnects,” Proc. IEEE 97, 1337–1361 (2009).
[CrossRef]

Lardenois, S.

Laval, S.

Lee, K. K.

Lentine, A. L.

M. R. Watts, W. A. Zortman, D. C. Trotter, R. W. Young, and A. L. Lentine, “Low-voltage, compact, depletion-mode, silicon Mach–Zehnder Modulator,” IEEE J. Sel. Top. Quantum Electron. 16(1), 159–164 (2010).
[CrossRef]

Lexau, J.

A. V. Krishnamoorthy, R. Ho, X. Zheng, H. Schwetman, J. Lexau, P. Koka, G. Li, I. Shubin, and J. E. Cunningham, “Computer systems based on silicon photonic interconnects,” Proc. IEEE 97, 1337–1361 (2009).
[CrossRef]

Li, G.

A. V. Krishnamoorthy, R. Ho, X. Zheng, H. Schwetman, J. Lexau, P. Koka, G. Li, I. Shubin, and J. E. Cunningham, “Computer systems based on silicon photonic interconnects,” Proc. IEEE 97, 1337–1361 (2009).
[CrossRef]

Li, J.

Lim, D. R.

Lin, Q.

Lipson, M.

J. Cardenas, C. B. Poitras, J. T. Robinson, K. Preston, L. Chen, and M. Lipson, “Low loss etchless silicon photonic waveguides,” Opt. Express 17(6), 4752–4757 (2009).
[CrossRef] [PubMed]

M. A. Foster, A. C. Turner, J. E. Sharping, B. S. Schmidt, M. Lipson, and A. L. Gaeta, “Broad-band optical parametric gain on a silicon photonic chip,” Nature 441(7096), 960–963 (2006).
[CrossRef] [PubMed]

Q. Xu, B. Schmidt, S. Pradhan, and M. Lipson, “Micrometre-scale silicon electro-optic modulator,” Nature 435(7040), 325–327 (2005).
[CrossRef] [PubMed]

Luyssaert, B.

W. Bogaerts, R. Baets, P. Dumon, V. Wiaux, S. Beckx, D. Taillaert, B. Luyssaert, J. Van Campenhout, P. Bienstman, and D. Van Thourhout, “Nanophotonic waveguides in silicon-on-insulator fabricated with CMOS technology,” J. Lightwave Technol. 23(1), 401–412 (2005).
[CrossRef]

P. Dumon, W. Bogaerts, V. Wiaux, J. Wouters, S. Beckx, J. Van Campenhout, D. Taillaert, B. Luyssaert, P. Bienstman, D. Van Thourhout, and R. Baets, “Low-loss SOI photonic wires and ring resonators fabricated with deep UV lithography,” IEEE Photon. Technol. Lett. 16(5), 1328–1330 (2004).
[CrossRef]

Macintyre, D. S.

M. Gnan, S. Thoms, D. S. Macintyre, R. M. De La Rue, and M. Sorel, “Fabrication of low-loss photonic wires in silicon-on-insulator using hydrogen silsesquioxane electron-beam resist,” Electron. Lett. 44(2), 115–116 (2008).
[CrossRef]

Mashanovich, G.

F. Y. Gardes, G. T. Reed, A. P. Knights, G. Mashanovich, P. E. Jessop, L. Rowe, S. McFaul, D. Bruce, and N. G. Tarr, “Sub-micron optical waveguides for silicon photonics formed via the Local Oxidation of Silicon (LOCOS),” Proc. SPIE 6898, 4 (2008).

McFaul, S.

F. Y. Gardes, G. T. Reed, A. P. Knights, G. Mashanovich, P. E. Jessop, L. Rowe, S. McFaul, D. Bruce, and N. G. Tarr, “Sub-micron optical waveguides for silicon photonics formed via the Local Oxidation of Silicon (LOCOS),” Proc. SPIE 6898, 4 (2008).

McNab, S. J.

Miller, D. A. B.

D. A. B. Miller, “Optical interconnects to silicon,” IEEE J. Sel. Top. Quantum Electron. 6(6), 1312–1317 (2000).
[CrossRef]

Mollard, L.

Morita, H.

T. Tsuchizawa, K. Yamada, H. Fukuda, T. Watanabe, M. Jun-ichi Takahashi, T. Takahashi, E. Shoji, S. Tamechika, Itabashi, and H. Morita, “Microphotonics devices based on silicon microfabrication technology,” IEEE J. Sel. Top. Quantum Electron. 11(1), 232–240 (2005).
[CrossRef]

Oliner, A. A.

S. T. Peng and A. A. Oliner, “Guidance and leakage properties of a class of open dielectric waveguides: Part I Mathematical Formulations,” IEEE Trans. Microw. Theory Tech. 29(9), 843–855 (1981).
[CrossRef]

A. A. Oliner, S. T. Peng, T. I. Hsu, and A. Sanchez, “Guidance and leakage properties of a class of open dielectric waveguides: Part II – New physical effects,” IEEE Trans. Microw. Theory Tech. 29(9), 855–869 (1981).
[CrossRef]

Orobtchouk, R.

Pafchek, R.

Pafchek, R. M.

M. A. Webster, R. M. Pafchek, G. Sukumaran, and T. L. Koch, “Low-loss quasi-planar ridge waveguides formed on thin silicon-on-insulator,” Appl. Phys. Lett. 87(23), 231108 (2005).
[CrossRef]

Paniccia, M.

B. Jalali, M. Paniccia, and G. Reed, “Silicon photonics,” IEEE Microw. Mag. 7(3), 58–68 (2006).
[CrossRef]

Pascal, D.

Peng, S. T.

A. A. Oliner, S. T. Peng, T. I. Hsu, and A. Sanchez, “Guidance and leakage properties of a class of open dielectric waveguides: Part II – New physical effects,” IEEE Trans. Microw. Theory Tech. 29(9), 855–869 (1981).
[CrossRef]

S. T. Peng and A. A. Oliner, “Guidance and leakage properties of a class of open dielectric waveguides: Part I Mathematical Formulations,” IEEE Trans. Microw. Theory Tech. 29(9), 843–855 (1981).
[CrossRef]

Poitras, C. B.

Post, E.

L. K. Rowe, M. Elsey, N. G. Tarr, A. P. Knights, and E. Post, “CMOS-compatible optical rib waveguides defined by local oxidation of silicon,” Electron. Lett. 43(7), 392–393 (2007).
[CrossRef]

Pradhan, S.

Q. Xu, B. Schmidt, S. Pradhan, and M. Lipson, “Micrometre-scale silicon electro-optic modulator,” Nature 435(7040), 325–327 (2005).
[CrossRef] [PubMed]

Preston, K.

Reed, G.

B. Jalali, M. Paniccia, and G. Reed, “Silicon photonics,” IEEE Microw. Mag. 7(3), 58–68 (2006).
[CrossRef]

Reed, G. T.

F. Y. Gardes, G. T. Reed, A. P. Knights, G. Mashanovich, P. E. Jessop, L. Rowe, S. McFaul, D. Bruce, and N. G. Tarr, “Sub-micron optical waveguides for silicon photonics formed via the Local Oxidation of Silicon (LOCOS),” Proc. SPIE 6898, 4 (2008).

Robinson, J. T.

Rooks, M. J.

Rowe, L.

F. Y. Gardes, G. T. Reed, A. P. Knights, G. Mashanovich, P. E. Jessop, L. Rowe, S. McFaul, D. Bruce, and N. G. Tarr, “Sub-micron optical waveguides for silicon photonics formed via the Local Oxidation of Silicon (LOCOS),” Proc. SPIE 6898, 4 (2008).

Rowe, L. K.

L. K. Rowe, M. Elsey, N. G. Tarr, A. P. Knights, and E. Post, “CMOS-compatible optical rib waveguides defined by local oxidation of silicon,” Electron. Lett. 43(7), 392–393 (2007).
[CrossRef]

Sanchez, A.

A. A. Oliner, S. T. Peng, T. I. Hsu, and A. Sanchez, “Guidance and leakage properties of a class of open dielectric waveguides: Part II – New physical effects,” IEEE Trans. Microw. Theory Tech. 29(9), 855–869 (1981).
[CrossRef]

Schmidt, B.

Q. Xu, B. Schmidt, S. Pradhan, and M. Lipson, “Micrometre-scale silicon electro-optic modulator,” Nature 435(7040), 325–327 (2005).
[CrossRef] [PubMed]

Schmidt, B. S.

M. A. Foster, A. C. Turner, J. E. Sharping, B. S. Schmidt, M. Lipson, and A. L. Gaeta, “Broad-band optical parametric gain on a silicon photonic chip,” Nature 441(7096), 960–963 (2006).
[CrossRef] [PubMed]

Schwetman, H.

A. V. Krishnamoorthy, R. Ho, X. Zheng, H. Schwetman, J. Lexau, P. Koka, G. Li, I. Shubin, and J. E. Cunningham, “Computer systems based on silicon photonic interconnects,” Proc. IEEE 97, 1337–1361 (2009).
[CrossRef]

Sekaric, L.

Sharping, J. E.

M. A. Foster, A. C. Turner, J. E. Sharping, B. S. Schmidt, M. Lipson, and A. L. Gaeta, “Broad-band optical parametric gain on a silicon photonic chip,” Nature 441(7096), 960–963 (2006).
[CrossRef] [PubMed]

Shin, J.

Shoji, E.

T. Tsuchizawa, K. Yamada, H. Fukuda, T. Watanabe, M. Jun-ichi Takahashi, T. Takahashi, E. Shoji, S. Tamechika, Itabashi, and H. Morita, “Microphotonics devices based on silicon microfabrication technology,” IEEE J. Sel. Top. Quantum Electron. 11(1), 232–240 (2005).
[CrossRef]

Shubin, I.

A. V. Krishnamoorthy, R. Ho, X. Zheng, H. Schwetman, J. Lexau, P. Koka, G. Li, I. Shubin, and J. E. Cunningham, “Computer systems based on silicon photonic interconnects,” Proc. IEEE 97, 1337–1361 (2009).
[CrossRef]

Soref, R. A.

R. A. Soref, “The past, present and future of silicon photonics.” IEEE, J. Sel. Top. Quantm Electron. 12(6), 1678–1687 (2006).
[CrossRef]

Sorel, M.

M. Gnan, S. Thoms, D. S. Macintyre, R. M. De La Rue, and M. Sorel, “Fabrication of low-loss photonic wires in silicon-on-insulator using hydrogen silsesquioxane electron-beam resist,” Electron. Lett. 44(2), 115–116 (2008).
[CrossRef]

Sukumaran, G.

M. A. Webster, R. M. Pafchek, G. Sukumaran, and T. L. Koch, “Low-loss quasi-planar ridge waveguides formed on thin silicon-on-insulator,” Appl. Phys. Lett. 87(23), 231108 (2005).
[CrossRef]

Taillaert, D.

W. Bogaerts, R. Baets, P. Dumon, V. Wiaux, S. Beckx, D. Taillaert, B. Luyssaert, J. Van Campenhout, P. Bienstman, and D. Van Thourhout, “Nanophotonic waveguides in silicon-on-insulator fabricated with CMOS technology,” J. Lightwave Technol. 23(1), 401–412 (2005).
[CrossRef]

P. Dumon, W. Bogaerts, V. Wiaux, J. Wouters, S. Beckx, J. Van Campenhout, D. Taillaert, B. Luyssaert, P. Bienstman, D. Van Thourhout, and R. Baets, “Low-loss SOI photonic wires and ring resonators fabricated with deep UV lithography,” IEEE Photon. Technol. Lett. 16(5), 1328–1330 (2004).
[CrossRef]

Takahashi, T.

T. Tsuchizawa, K. Yamada, H. Fukuda, T. Watanabe, M. Jun-ichi Takahashi, T. Takahashi, E. Shoji, S. Tamechika, Itabashi, and H. Morita, “Microphotonics devices based on silicon microfabrication technology,” IEEE J. Sel. Top. Quantum Electron. 11(1), 232–240 (2005).
[CrossRef]

Tamechika, S.

T. Tsuchizawa, K. Yamada, H. Fukuda, T. Watanabe, M. Jun-ichi Takahashi, T. Takahashi, E. Shoji, S. Tamechika, Itabashi, and H. Morita, “Microphotonics devices based on silicon microfabrication technology,” IEEE J. Sel. Top. Quantum Electron. 11(1), 232–240 (2005).
[CrossRef]

Tarr, N. G.

F. Y. Gardes, G. T. Reed, A. P. Knights, G. Mashanovich, P. E. Jessop, L. Rowe, S. McFaul, D. Bruce, and N. G. Tarr, “Sub-micron optical waveguides for silicon photonics formed via the Local Oxidation of Silicon (LOCOS),” Proc. SPIE 6898, 4 (2008).

L. K. Rowe, M. Elsey, N. G. Tarr, A. P. Knights, and E. Post, “CMOS-compatible optical rib waveguides defined by local oxidation of silicon,” Electron. Lett. 43(7), 392–393 (2007).
[CrossRef]

Thoms, S.

M. Gnan, S. Thoms, D. S. Macintyre, R. M. De La Rue, and M. Sorel, “Fabrication of low-loss photonic wires in silicon-on-insulator using hydrogen silsesquioxane electron-beam resist,” Electron. Lett. 44(2), 115–116 (2008).
[CrossRef]

Trotter, D. C.

M. R. Watts, W. A. Zortman, D. C. Trotter, R. W. Young, and A. L. Lentine, “Low-voltage, compact, depletion-mode, silicon Mach–Zehnder Modulator,” IEEE J. Sel. Top. Quantum Electron. 16(1), 159–164 (2010).
[CrossRef]

Tsuchizawa, T.

T. Tsuchizawa, K. Yamada, H. Fukuda, T. Watanabe, S. Uchiyama, and S. Itabashi, “Low-loss Si wire waveguides and their application to thermooptic switches,” Jpn. J. Appl. Phys. 45(No. 8B), 6658–6662 (2006).
[CrossRef]

T. Tsuchizawa, K. Yamada, H. Fukuda, T. Watanabe, M. Jun-ichi Takahashi, T. Takahashi, E. Shoji, S. Tamechika, Itabashi, and H. Morita, “Microphotonics devices based on silicon microfabrication technology,” IEEE J. Sel. Top. Quantum Electron. 11(1), 232–240 (2005).
[CrossRef]

Tummidi, R.

Turner, A. C.

M. A. Foster, A. C. Turner, J. E. Sharping, B. S. Schmidt, M. Lipson, and A. L. Gaeta, “Broad-band optical parametric gain on a silicon photonic chip,” Nature 441(7096), 960–963 (2006).
[CrossRef] [PubMed]

Uchiyama, S.

T. Tsuchizawa, K. Yamada, H. Fukuda, T. Watanabe, S. Uchiyama, and S. Itabashi, “Low-loss Si wire waveguides and their application to thermooptic switches,” Jpn. J. Appl. Phys. 45(No. 8B), 6658–6662 (2006).
[CrossRef]

Van Campenhout, J.

W. Bogaerts, R. Baets, P. Dumon, V. Wiaux, S. Beckx, D. Taillaert, B. Luyssaert, J. Van Campenhout, P. Bienstman, and D. Van Thourhout, “Nanophotonic waveguides in silicon-on-insulator fabricated with CMOS technology,” J. Lightwave Technol. 23(1), 401–412 (2005).
[CrossRef]

P. Dumon, W. Bogaerts, V. Wiaux, J. Wouters, S. Beckx, J. Van Campenhout, D. Taillaert, B. Luyssaert, P. Bienstman, D. Van Thourhout, and R. Baets, “Low-loss SOI photonic wires and ring resonators fabricated with deep UV lithography,” IEEE Photon. Technol. Lett. 16(5), 1328–1330 (2004).
[CrossRef]

Van Thourhout, D.

W. Bogaerts, R. Baets, P. Dumon, V. Wiaux, S. Beckx, D. Taillaert, B. Luyssaert, J. Van Campenhout, P. Bienstman, and D. Van Thourhout, “Nanophotonic waveguides in silicon-on-insulator fabricated with CMOS technology,” J. Lightwave Technol. 23(1), 401–412 (2005).
[CrossRef]

P. Dumon, W. Bogaerts, V. Wiaux, J. Wouters, S. Beckx, J. Van Campenhout, D. Taillaert, B. Luyssaert, P. Bienstman, D. Van Thourhout, and R. Baets, “Low-loss SOI photonic wires and ring resonators fabricated with deep UV lithography,” IEEE Photon. Technol. Lett. 16(5), 1328–1330 (2004).
[CrossRef]

Vivien, L.

Vlasov, Y. A.

Watanabe, T.

T. Tsuchizawa, K. Yamada, H. Fukuda, T. Watanabe, S. Uchiyama, and S. Itabashi, “Low-loss Si wire waveguides and their application to thermooptic switches,” Jpn. J. Appl. Phys. 45(No. 8B), 6658–6662 (2006).
[CrossRef]

T. Tsuchizawa, K. Yamada, H. Fukuda, T. Watanabe, M. Jun-ichi Takahashi, T. Takahashi, E. Shoji, S. Tamechika, Itabashi, and H. Morita, “Microphotonics devices based on silicon microfabrication technology,” IEEE J. Sel. Top. Quantum Electron. 11(1), 232–240 (2005).
[CrossRef]

Watts, M. R.

M. R. Watts, W. A. Zortman, D. C. Trotter, R. W. Young, and A. L. Lentine, “Low-voltage, compact, depletion-mode, silicon Mach–Zehnder Modulator,” IEEE J. Sel. Top. Quantum Electron. 16(1), 159–164 (2010).
[CrossRef]

Webster, M. A.

R. Pafchek, R. Tummidi, J. Li, M. A. Webster, E. Chen, and T. L. Koch, “Low-loss silicon-on-insulator shallow-ridge TE and TM waveguides formed using thermal oxidation,” Appl. Opt. 48(5), 958–963 (2009).
[CrossRef] [PubMed]

M. A. Webster, R. M. Pafchek, G. Sukumaran, and T. L. Koch, “Low-loss quasi-planar ridge waveguides formed on thin silicon-on-insulator,” Appl. Phys. Lett. 87(23), 231108 (2005).
[CrossRef]

Wiaux, V.

W. Bogaerts, R. Baets, P. Dumon, V. Wiaux, S. Beckx, D. Taillaert, B. Luyssaert, J. Van Campenhout, P. Bienstman, and D. Van Thourhout, “Nanophotonic waveguides in silicon-on-insulator fabricated with CMOS technology,” J. Lightwave Technol. 23(1), 401–412 (2005).
[CrossRef]

P. Dumon, W. Bogaerts, V. Wiaux, J. Wouters, S. Beckx, J. Van Campenhout, D. Taillaert, B. Luyssaert, P. Bienstman, D. Van Thourhout, and R. Baets, “Low-loss SOI photonic wires and ring resonators fabricated with deep UV lithography,” IEEE Photon. Technol. Lett. 16(5), 1328–1330 (2004).
[CrossRef]

Wouters, J.

P. Dumon, W. Bogaerts, V. Wiaux, J. Wouters, S. Beckx, J. Van Campenhout, D. Taillaert, B. Luyssaert, P. Bienstman, D. Van Thourhout, and R. Baets, “Low-loss SOI photonic wires and ring resonators fabricated with deep UV lithography,” IEEE Photon. Technol. Lett. 16(5), 1328–1330 (2004).
[CrossRef]

Xu, Q.

Q. Xu, D. Fattal, and R. G. Beausoleil, “Silicon microring resonators with 1.5-microm radius,” Opt. Express 16(6), 4309–4315 (2008).
[CrossRef] [PubMed]

Q. Xu, B. Schmidt, S. Pradhan, and M. Lipson, “Micrometre-scale silicon electro-optic modulator,” Nature 435(7040), 325–327 (2005).
[CrossRef] [PubMed]

Yamada, K.

T. Tsuchizawa, K. Yamada, H. Fukuda, T. Watanabe, S. Uchiyama, and S. Itabashi, “Low-loss Si wire waveguides and their application to thermooptic switches,” Jpn. J. Appl. Phys. 45(No. 8B), 6658–6662 (2006).
[CrossRef]

T. Tsuchizawa, K. Yamada, H. Fukuda, T. Watanabe, M. Jun-ichi Takahashi, T. Takahashi, E. Shoji, S. Tamechika, Itabashi, and H. Morita, “Microphotonics devices based on silicon microfabrication technology,” IEEE J. Sel. Top. Quantum Electron. 11(1), 232–240 (2005).
[CrossRef]

Yin, L.

Young, R. W.

M. R. Watts, W. A. Zortman, D. C. Trotter, R. W. Young, and A. L. Lentine, “Low-voltage, compact, depletion-mode, silicon Mach–Zehnder Modulator,” IEEE J. Sel. Top. Quantum Electron. 16(1), 159–164 (2010).
[CrossRef]

Zheng, X.

A. V. Krishnamoorthy, R. Ho, X. Zheng, H. Schwetman, J. Lexau, P. Koka, G. Li, I. Shubin, and J. E. Cunningham, “Computer systems based on silicon photonic interconnects,” Proc. IEEE 97, 1337–1361 (2009).
[CrossRef]

Zortman, W. A.

M. R. Watts, W. A. Zortman, D. C. Trotter, R. W. Young, and A. L. Lentine, “Low-voltage, compact, depletion-mode, silicon Mach–Zehnder Modulator,” IEEE J. Sel. Top. Quantum Electron. 16(1), 159–164 (2010).
[CrossRef]

Appl. Opt. (1)

Appl. Phys. Lett. (1)

M. A. Webster, R. M. Pafchek, G. Sukumaran, and T. L. Koch, “Low-loss quasi-planar ridge waveguides formed on thin silicon-on-insulator,” Appl. Phys. Lett. 87(23), 231108 (2005).
[CrossRef]

Electron. Lett. (2)

L. K. Rowe, M. Elsey, N. G. Tarr, A. P. Knights, and E. Post, “CMOS-compatible optical rib waveguides defined by local oxidation of silicon,” Electron. Lett. 43(7), 392–393 (2007).
[CrossRef]

M. Gnan, S. Thoms, D. S. Macintyre, R. M. De La Rue, and M. Sorel, “Fabrication of low-loss photonic wires in silicon-on-insulator using hydrogen silsesquioxane electron-beam resist,” Electron. Lett. 44(2), 115–116 (2008).
[CrossRef]

IEEE J. Sel. Top. Quantum Electron. (3)

D. A. B. Miller, “Optical interconnects to silicon,” IEEE J. Sel. Top. Quantum Electron. 6(6), 1312–1317 (2000).
[CrossRef]

T. Tsuchizawa, K. Yamada, H. Fukuda, T. Watanabe, M. Jun-ichi Takahashi, T. Takahashi, E. Shoji, S. Tamechika, Itabashi, and H. Morita, “Microphotonics devices based on silicon microfabrication technology,” IEEE J. Sel. Top. Quantum Electron. 11(1), 232–240 (2005).
[CrossRef]

M. R. Watts, W. A. Zortman, D. C. Trotter, R. W. Young, and A. L. Lentine, “Low-voltage, compact, depletion-mode, silicon Mach–Zehnder Modulator,” IEEE J. Sel. Top. Quantum Electron. 16(1), 159–164 (2010).
[CrossRef]

IEEE Microw. Mag. (1)

B. Jalali, M. Paniccia, and G. Reed, “Silicon photonics,” IEEE Microw. Mag. 7(3), 58–68 (2006).
[CrossRef]

IEEE Photon. Technol. Lett. (1)

P. Dumon, W. Bogaerts, V. Wiaux, J. Wouters, S. Beckx, J. Van Campenhout, D. Taillaert, B. Luyssaert, P. Bienstman, D. Van Thourhout, and R. Baets, “Low-loss SOI photonic wires and ring resonators fabricated with deep UV lithography,” IEEE Photon. Technol. Lett. 16(5), 1328–1330 (2004).
[CrossRef]

IEEE Trans. Microw. Theory Tech. (2)

S. T. Peng and A. A. Oliner, “Guidance and leakage properties of a class of open dielectric waveguides: Part I Mathematical Formulations,” IEEE Trans. Microw. Theory Tech. 29(9), 843–855 (1981).
[CrossRef]

A. A. Oliner, S. T. Peng, T. I. Hsu, and A. Sanchez, “Guidance and leakage properties of a class of open dielectric waveguides: Part II – New physical effects,” IEEE Trans. Microw. Theory Tech. 29(9), 855–869 (1981).
[CrossRef]

IEEE, J. Sel. Top. Quantm Electron. (1)

R. A. Soref, “The past, present and future of silicon photonics.” IEEE, J. Sel. Top. Quantm Electron. 12(6), 1678–1687 (2006).
[CrossRef]

J. Lightwave Technol. (1)

Jpn. J. Appl. Phys. (1)

T. Tsuchizawa, K. Yamada, H. Fukuda, T. Watanabe, S. Uchiyama, and S. Itabashi, “Low-loss Si wire waveguides and their application to thermooptic switches,” Jpn. J. Appl. Phys. 45(No. 8B), 6658–6662 (2006).
[CrossRef]

Nature (2)

M. A. Foster, A. C. Turner, J. E. Sharping, B. S. Schmidt, M. Lipson, and A. L. Gaeta, “Broad-band optical parametric gain on a silicon photonic chip,” Nature 441(7096), 960–963 (2006).
[CrossRef] [PubMed]

Q. Xu, B. Schmidt, S. Pradhan, and M. Lipson, “Micrometre-scale silicon electro-optic modulator,” Nature 435(7040), 325–327 (2005).
[CrossRef] [PubMed]

Opt. Express (4)

Opt. Lett. (3)

Proc. IEEE (1)

A. V. Krishnamoorthy, R. Ho, X. Zheng, H. Schwetman, J. Lexau, P. Koka, G. Li, I. Shubin, and J. E. Cunningham, “Computer systems based on silicon photonic interconnects,” Proc. IEEE 97, 1337–1361 (2009).
[CrossRef]

Proc. SPIE (1)

F. Y. Gardes, G. T. Reed, A. P. Knights, G. Mashanovich, P. E. Jessop, L. Rowe, S. McFaul, D. Bruce, and N. G. Tarr, “Sub-micron optical waveguides for silicon photonics formed via the Local Oxidation of Silicon (LOCOS),” Proc. SPIE 6898, 4 (2008).

Other (1)

Rsoft Design Group, Inc., 400 Executive Boulevard, Suite 100, Ossining, N.Y. 10562, USA, www.rsoftdesign.com .

Cited By

OSA participates in CrossRef's Cited-By Linking service. Citing articles from OSA journals and other participating publishers are listed here.

Alert me when this article is cited.


Figures (5)

Fig. 1
Fig. 1

(a) Modal profile of the fundamental quasi-TE mode of the proposed waveguide. (b) Effective and group index change versus the etch depth. (c) 90° bending loss as a function of bending radius.

Fig. 2
Fig. 2

(a) Cross-section SEM image of a fabricated waveguide. The silicon waveguide core is located in the dashed-line box. (b) A top-view optical microscope image of a 64-cm long spiral waveguide. The waveguide has a total propagation loss about 17.5 dB.

Fig. 3
Fig. 3

(a) Insertion loss spectra for waveguides with different lengths on the same chip. The insertion loss is normalized to fiber-to-fiber power. (b) Linear fitting of insertion loss versus waveguide length at 1550 nm. Markers denote the measurement data and the red line is the linear fit. (c) Waveguide propagation loss as a function of wavelength in the C-band.

Fig. 4
Fig. 4

Average waveguide loss over the entire C-band for 9 chips on the same 6” SOI wafer. The error bars represent the standard deviation of the propagation loss in the C-band.

Fig. 5
Fig. 5

(a) Schematic top view of a double-level taper which couples light from shallow-ridge waveguides to narrow strip waveguides. The upper and bottom cladding are both oxide. (b) Field propagation in a taper with a length of 10 µm and cross-sectional field distributions at various propagation distances (5 µm, 13 µm, 20 µm). Input and output waveguides both have a length of 5 µm. (c) Simulated coupling loss of the double-level taper as a function of taper length.

Metrics