Abstract

A method based on admittance diagram called Admittance Real-time Monitoring, ARM, was proposed to monitor multilayer coatings. This optical monitoring method is highly sensitive and capable to compensate for thickness errors. The sensitivities of ARM were compared with that of the conventional method by using runsheet diagram. The in situ error compensation of ARM showed a great improvement in the optical performance when utilized in an anti-reflection coating process.

© 2008 Optical Society of America

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References

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    [CrossRef] [PubMed]
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    [CrossRef] [PubMed]
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    [CrossRef]
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    [CrossRef] [PubMed]
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    [CrossRef]
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    [CrossRef]
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    [CrossRef] [PubMed]
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    [CrossRef]
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    [CrossRef]
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    [CrossRef]
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    [CrossRef]

2007

2006

2004

C. Zhang, Y. Wang, and W. Lu, "Single-wavelength monitoring method for optical thin-film coating," Opt. Eng. 43, 1439-1444 (2004).
[CrossRef]

S. Dligatch, R. Netterfield, and B. Martin, "Application of in-situ ellipsometry to the fabrication of multi-layered coatings with sub-nanometre accuracy," Thin Solid Films 455-456, 376-379 (2004).
[CrossRef]

1998

1987

1986

C. J. Van der Laan, "Optical monitoring of nonquarterwave stacks," Appl. Opt. 25, 759 (1986).
[CrossRef]

1985

1981

1978

1977

H. A. Macleod and E. Pelletier, "Error compensation mechanisms in some thin film monitoring systems," Opt. Acta 24, 907-930 (1977).
[CrossRef]

Bobbs, B.

Chen, S. H.

Chun, B. J.

Collins, R. W.

Dligatch, S.

S. Dligatch, R. Netterfield, and B. Martin, "Application of in-situ ellipsometry to the fabrication of multi-layered coatings with sub-nanometre accuracy," Thin Solid Films 455-456, 376-379 (2004).
[CrossRef]

Fornier, A.

Hwangbo, C. K.

Kuo, C. C.

Lee, C. C.

Lee, J.

Lu, W.

C. Zhang, Y. Wang, and W. Lu, "Single-wavelength monitoring method for optical thin-film coating," Opt. Eng. 43, 1439-1444 (2004).
[CrossRef]

Ma, S. J.

Macleod, H. A.

H. A. Macleod, "Monitoring of optical coatings," Appl. Opt. 20,82-88 (1981).
[CrossRef] [PubMed]

H. A. Macleod and E. Pelletier, "Error compensation mechanisms in some thin film monitoring systems," Opt. Acta 24, 907-930 (1977).
[CrossRef]

Martin, B.

S. Dligatch, R. Netterfield, and B. Martin, "Application of in-situ ellipsometry to the fabrication of multi-layered coatings with sub-nanometre accuracy," Thin Solid Films 455-456, 376-379 (2004).
[CrossRef]

Netterfield, R.

S. Dligatch, R. Netterfield, and B. Martin, "Application of in-situ ellipsometry to the fabrication of multi-layered coatings with sub-nanometre accuracy," Thin Solid Films 455-456, 376-379 (2004).
[CrossRef]

Pelletier, E.

B. Vidal, A. Fornier, and E. Pelletier, "Optical monitoring of nonquarterwave multilayer filters," Appl. Opt. 17, 1038-1047 (1978).
[CrossRef] [PubMed]

H. A. Macleod and E. Pelletier, "Error compensation mechanisms in some thin film monitoring systems," Opt. Acta 24, 907-930 (1977).
[CrossRef]

Rudisill, J. E.

Van der Laan, C. J.

C. J. Van der Laan, "Optical monitoring of nonquarterwave stacks," Appl. Opt. 25, 759 (1986).
[CrossRef]

Vidal, B.

Wang, Y.

C. Zhang, Y. Wang, and W. Lu, "Single-wavelength monitoring method for optical thin-film coating," Opt. Eng. 43, 1439-1444 (2004).
[CrossRef]

Willey, R. R.

Wu, K.

Zhang, C.

C. Zhang, Y. Wang, and W. Lu, "Single-wavelength monitoring method for optical thin-film coating," Opt. Eng. 43, 1439-1444 (2004).
[CrossRef]

Zhao, F.

Appl. Opt.

Opt. Acta

H. A. Macleod and E. Pelletier, "Error compensation mechanisms in some thin film monitoring systems," Opt. Acta 24, 907-930 (1977).
[CrossRef]

Opt. Eng.

C. Zhang, Y. Wang, and W. Lu, "Single-wavelength monitoring method for optical thin-film coating," Opt. Eng. 43, 1439-1444 (2004).
[CrossRef]

Opt. Express

Thin Solid Films

S. Dligatch, R. Netterfield, and B. Martin, "Application of in-situ ellipsometry to the fabrication of multi-layered coatings with sub-nanometre accuracy," Thin Solid Films 455-456, 376-379 (2004).
[CrossRef]

Other

Y. J. Chen, "Optical monitoring of thin-film through admittance diagram," Master Thesis of the National Central University, Taiwan (2004).

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Figures (8)

Fig. 1.
Fig. 1.

Definition of Sx and Sy.

Fig. 2.
Fig. 2.

Three curves reveal different Sy variation of runsheet diagram for the same material, H, but with different precoatings: none, HL and HLHL.

Fig. 3.
Fig. 3.

(a) Three curves reveal different Sx variation of admittance diagram for the same material, H, but with different precoating: none, HL and HLHL. (b) Three curves reveal different Sy variation of admittance diagram for the same material, H, but with different precoating: none, HL and HLHL.

Fig. 4.
Fig. 4.

Schematic drawing of monitoring system

Fig. 5.
Fig. 5.

The flow chart of monitoring program.

Fig. 6.
Fig. 6.

Runsheet of deposition (a) and simulation (b).

Fig. 7.
Fig. 7.

Some errors occurred at the first layer, b is the predicted termination point and B is the experimental point. Thin-solid line is the simulated loci. In experiment, thickness error was compensated resulting in a new locus, bold-dot.

Fig. 8.
Fig. 8.

Although a thickness error occurred at the first layer, the performance was compensated in the rest of layers by using ARM.

Equations (5)

Equations on this page are rendered with MathJax. Learn more.

T = T ( δ ) δ = 2 π λ nd
C = y 2 + y s 2 2 y s R = y 2 y s 2 2 y s
S x = Δ x W x S y = Δ y W y
S N : n X i n ( X max X min )
Stability = n ( X ¯ X i ) 2 n

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