Abstract

A method based on admittance diagram called Admittance Real-time Monitoring, ARM, was proposed to monitor multilayer coatings. This optical monitoring method is highly sensitive and capable to compensate for thickness errors. The sensitivities of ARM were compared with that of the conventional method by using runsheet diagram. The in situ error compensation of ARM showed a great improvement in the optical performance when utilized in an anti-reflection coating process.

© 2008 Optical Society of America

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References

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  1. B. Vidal, A. Fornier, and E. Pelletier, “Optical monitoring of nonquarterwave multilayer filters,” Appl. Opt. 17, 1038–1047 (1978).
    [Crossref] [PubMed]
  2. H. A. Macleod, “Monitoring of optical coatings,” Appl. Opt. 2082–88 (1981).
    [Crossref] [PubMed]
  3. C. J. Van der Laan, “Optical monitoring of nonquarterwave stacks,” Appl. Opt. 25, 759 (1986).
    [Crossref]
  4. B. Bobbs and J. E. Rudisill, “Optical monitoring of nonquarterwave film thickness using a turning point method,” Appl. Opt. 26, 3136–3139 (1987).
    [Crossref] [PubMed]
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    [Crossref] [PubMed]
  6. C. C. Lee, K. Wu, C. C. Kuo, and S. H. Chen, “Improvement of the optical coating process by cutting layers with sensitive monitoring wavelengths,” Opt. Exp. 13, 4854–4861 (2006).
    [Crossref]
  7. C. Zhang, Y. Wang, and W. Lu, “Single-wavelength monitoring method for optical thin-film coating,” Opt. Eng. 43, 1439–1444 (2004).
    [Crossref]
  8. R. R. Willey, “Optical thickness monitoring sensitivity improvement using graphical methods,” Appl. Opt. 26, 729–737 (1987).
    [Crossref] [PubMed]
  9. H. A. Macleod and E. Pelletier, “Error compensation mechanisms in some thin film monitoring systems,” Opt. Acta 24, 907–930 (1977).
    [Crossref]
  10. J. Lee and R. W. Collins, “Real-time characterization of film growth on transparent substrates by rotatingcompensator multichannel ellipsometry,” Appl. Opt. 37, 4230–4238 (1998).
    [Crossref]
  11. S. Dligatch, R. Netterfield, and B. Martin, “Application of in-situ ellipsometry to the fabrication of multilayered coatings with sub-nanometre accuracy,” Thin Solid Films 455–456, 376–379 (2004).
    [Crossref]
  12. C. C. Lee, K. Wu, S. H. Chen, and S. J. Ma, “Optical monitoring and real time admittance loci calculation through polarization interferometer,” Opt. Exp. 15, 17536–17541 (2007).
    [Crossref]
  13. Y. J. Chen, “Optical monitoring of thin-film through admittance diagram,” Master Thesis of the National Central University, Taiwan (2004).
  14. B. J. Chun and C. K. Hwangbo, “Optical monitoring of nonquarterwave layers of dielectric multilayer filters using optical admittance,” Opt. Exp. 14, 2473–2480 (2006).
    [Crossref]

2007 (1)

C. C. Lee, K. Wu, S. H. Chen, and S. J. Ma, “Optical monitoring and real time admittance loci calculation through polarization interferometer,” Opt. Exp. 15, 17536–17541 (2007).
[Crossref]

2006 (2)

B. J. Chun and C. K. Hwangbo, “Optical monitoring of nonquarterwave layers of dielectric multilayer filters using optical admittance,” Opt. Exp. 14, 2473–2480 (2006).
[Crossref]

C. C. Lee, K. Wu, C. C. Kuo, and S. H. Chen, “Improvement of the optical coating process by cutting layers with sensitive monitoring wavelengths,” Opt. Exp. 13, 4854–4861 (2006).
[Crossref]

2004 (2)

C. Zhang, Y. Wang, and W. Lu, “Single-wavelength monitoring method for optical thin-film coating,” Opt. Eng. 43, 1439–1444 (2004).
[Crossref]

S. Dligatch, R. Netterfield, and B. Martin, “Application of in-situ ellipsometry to the fabrication of multilayered coatings with sub-nanometre accuracy,” Thin Solid Films 455–456, 376–379 (2004).
[Crossref]

1998 (1)

1987 (2)

1986 (1)

C. J. Van der Laan, “Optical monitoring of nonquarterwave stacks,” Appl. Opt. 25, 759 (1986).
[Crossref]

1985 (1)

1981 (1)

1978 (1)

1977 (1)

H. A. Macleod and E. Pelletier, “Error compensation mechanisms in some thin film monitoring systems,” Opt. Acta 24, 907–930 (1977).
[Crossref]

Bobbs, B.

Chen, S. H.

C. C. Lee, K. Wu, S. H. Chen, and S. J. Ma, “Optical monitoring and real time admittance loci calculation through polarization interferometer,” Opt. Exp. 15, 17536–17541 (2007).
[Crossref]

C. C. Lee, K. Wu, C. C. Kuo, and S. H. Chen, “Improvement of the optical coating process by cutting layers with sensitive monitoring wavelengths,” Opt. Exp. 13, 4854–4861 (2006).
[Crossref]

Chen, Y. J.

Y. J. Chen, “Optical monitoring of thin-film through admittance diagram,” Master Thesis of the National Central University, Taiwan (2004).

Chun, B. J.

B. J. Chun and C. K. Hwangbo, “Optical monitoring of nonquarterwave layers of dielectric multilayer filters using optical admittance,” Opt. Exp. 14, 2473–2480 (2006).
[Crossref]

Collins, R. W.

Dligatch, S.

S. Dligatch, R. Netterfield, and B. Martin, “Application of in-situ ellipsometry to the fabrication of multilayered coatings with sub-nanometre accuracy,” Thin Solid Films 455–456, 376–379 (2004).
[Crossref]

Fornier, A.

Hwangbo, C. K.

B. J. Chun and C. K. Hwangbo, “Optical monitoring of nonquarterwave layers of dielectric multilayer filters using optical admittance,” Opt. Exp. 14, 2473–2480 (2006).
[Crossref]

Kuo, C. C.

C. C. Lee, K. Wu, C. C. Kuo, and S. H. Chen, “Improvement of the optical coating process by cutting layers with sensitive monitoring wavelengths,” Opt. Exp. 13, 4854–4861 (2006).
[Crossref]

Lee, C. C.

C. C. Lee, K. Wu, S. H. Chen, and S. J. Ma, “Optical monitoring and real time admittance loci calculation through polarization interferometer,” Opt. Exp. 15, 17536–17541 (2007).
[Crossref]

C. C. Lee, K. Wu, C. C. Kuo, and S. H. Chen, “Improvement of the optical coating process by cutting layers with sensitive monitoring wavelengths,” Opt. Exp. 13, 4854–4861 (2006).
[Crossref]

Lee, J.

Lu, W.

C. Zhang, Y. Wang, and W. Lu, “Single-wavelength monitoring method for optical thin-film coating,” Opt. Eng. 43, 1439–1444 (2004).
[Crossref]

Ma, S. J.

C. C. Lee, K. Wu, S. H. Chen, and S. J. Ma, “Optical monitoring and real time admittance loci calculation through polarization interferometer,” Opt. Exp. 15, 17536–17541 (2007).
[Crossref]

Macleod, H. A.

H. A. Macleod, “Monitoring of optical coatings,” Appl. Opt. 2082–88 (1981).
[Crossref] [PubMed]

H. A. Macleod and E. Pelletier, “Error compensation mechanisms in some thin film monitoring systems,” Opt. Acta 24, 907–930 (1977).
[Crossref]

Martin, B.

S. Dligatch, R. Netterfield, and B. Martin, “Application of in-situ ellipsometry to the fabrication of multilayered coatings with sub-nanometre accuracy,” Thin Solid Films 455–456, 376–379 (2004).
[Crossref]

Netterfield, R.

S. Dligatch, R. Netterfield, and B. Martin, “Application of in-situ ellipsometry to the fabrication of multilayered coatings with sub-nanometre accuracy,” Thin Solid Films 455–456, 376–379 (2004).
[Crossref]

Pelletier, E.

B. Vidal, A. Fornier, and E. Pelletier, “Optical monitoring of nonquarterwave multilayer filters,” Appl. Opt. 17, 1038–1047 (1978).
[Crossref] [PubMed]

H. A. Macleod and E. Pelletier, “Error compensation mechanisms in some thin film monitoring systems,” Opt. Acta 24, 907–930 (1977).
[Crossref]

Rudisill, J. E.

Van der Laan, C. J.

C. J. Van der Laan, “Optical monitoring of nonquarterwave stacks,” Appl. Opt. 25, 759 (1986).
[Crossref]

Vidal, B.

Wang, Y.

C. Zhang, Y. Wang, and W. Lu, “Single-wavelength monitoring method for optical thin-film coating,” Opt. Eng. 43, 1439–1444 (2004).
[Crossref]

Willey, R. R.

Wu, K.

C. C. Lee, K. Wu, S. H. Chen, and S. J. Ma, “Optical monitoring and real time admittance loci calculation through polarization interferometer,” Opt. Exp. 15, 17536–17541 (2007).
[Crossref]

C. C. Lee, K. Wu, C. C. Kuo, and S. H. Chen, “Improvement of the optical coating process by cutting layers with sensitive monitoring wavelengths,” Opt. Exp. 13, 4854–4861 (2006).
[Crossref]

Zhang, C.

C. Zhang, Y. Wang, and W. Lu, “Single-wavelength monitoring method for optical thin-film coating,” Opt. Eng. 43, 1439–1444 (2004).
[Crossref]

Zhao, F.

Appl. Opt. (7)

Opt. Acta (1)

H. A. Macleod and E. Pelletier, “Error compensation mechanisms in some thin film monitoring systems,” Opt. Acta 24, 907–930 (1977).
[Crossref]

Opt. Eng. (1)

C. Zhang, Y. Wang, and W. Lu, “Single-wavelength monitoring method for optical thin-film coating,” Opt. Eng. 43, 1439–1444 (2004).
[Crossref]

Opt. Exp. (3)

B. J. Chun and C. K. Hwangbo, “Optical monitoring of nonquarterwave layers of dielectric multilayer filters using optical admittance,” Opt. Exp. 14, 2473–2480 (2006).
[Crossref]

C. C. Lee, K. Wu, S. H. Chen, and S. J. Ma, “Optical monitoring and real time admittance loci calculation through polarization interferometer,” Opt. Exp. 15, 17536–17541 (2007).
[Crossref]

C. C. Lee, K. Wu, C. C. Kuo, and S. H. Chen, “Improvement of the optical coating process by cutting layers with sensitive monitoring wavelengths,” Opt. Exp. 13, 4854–4861 (2006).
[Crossref]

Thin Solid Films (1)

S. Dligatch, R. Netterfield, and B. Martin, “Application of in-situ ellipsometry to the fabrication of multilayered coatings with sub-nanometre accuracy,” Thin Solid Films 455–456, 376–379 (2004).
[Crossref]

Other (1)

Y. J. Chen, “Optical monitoring of thin-film through admittance diagram,” Master Thesis of the National Central University, Taiwan (2004).

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Figures (8)

Fig. 1.
Fig. 1.

Definition of Sx and Sy.

Fig. 2.
Fig. 2.

Three curves reveal different Sy variation of runsheet diagram for the same material, H, but with different precoatings: none, HL and HLHL.

Fig. 3.
Fig. 3.

(a) Three curves reveal different Sx variation of admittance diagram for the same material, H, but with different precoating: none, HL and HLHL. (b) Three curves reveal different Sy variation of admittance diagram for the same material, H, but with different precoating: none, HL and HLHL.

Fig. 4.
Fig. 4.

Schematic drawing of monitoring system

Fig. 5.
Fig. 5.

The flow chart of monitoring program.

Fig. 6.
Fig. 6.

Runsheet of deposition (a) and simulation (b).

Fig. 7.
Fig. 7.

Some errors occurred at the first layer, b is the predicted termination point and B is the experimental point. Thin-solid line is the simulated loci. In experiment, thickness error was compensated resulting in a new locus, bold-dot.

Fig. 8.
Fig. 8.

Although a thickness error occurred at the first layer, the performance was compensated in the rest of layers by using ARM.

Equations (5)

Equations on this page are rendered with MathJax. Learn more.

T = T ( δ ) δ = 2 π λ nd
C = y 2 + y s 2 2 y s R = y 2 y s 2 2 y s
S x = Δ x W x S y = Δ y W y
S N : n X i n ( X max X min )
Stability = n ( X ¯ X i ) 2 n

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