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[Crossref]
S. W. Ahn, K. D. Lee, J. S. Kim, S. H. Kim, J. D. Park, S. H. Lee, and P. W. Yoon, “Fabrication of a 50 nm half-pitch wire grid polarizer using nanoimprint lithography,” Nanotechnology 16, 1874–1877 (2005).
[Crossref]
S. W. Ahn, K. D. Lee, J. S. Kim, S. H. Kim, S. H. Lee, J. D. Park, and P. W. Yoon, “Fabrication of subwavelength aluminum wire grating using nanoimprint lithography and reactive ion etching,” Microelecton. Eng. 78–79, 314–318 (2005).
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[Crossref]
L. Liao, D. Lim, A. Agarwal, X. Duan, K. Lee, and L. Kimerling, “Optical transmission losses in polycrystalline silicon strip waveguides: effects of waveguide dimensions, thermal treatment, hydrogen passivation, and wavelength,” J. Electron. Mater. 29, 1380–1386 (2000).
[Crossref]
S. W. Ahn, K. D. Lee, J. S. Kim, S. H. Kim, J. D. Park, S. H. Lee, and P. W. Yoon, “Fabrication of a 50 nm half-pitch wire grid polarizer using nanoimprint lithography,” Nanotechnology 16, 1874–1877 (2005).
[Crossref]
S. W. Ahn, K. D. Lee, J. S. Kim, S. H. Kim, S. H. Lee, J. D. Park, and P. W. Yoon, “Fabrication of subwavelength aluminum wire grating using nanoimprint lithography and reactive ion etching,” Microelecton. Eng. 78–79, 314–318 (2005).
[Crossref]
Y. Cho, Y. K. Choi, and S. H. Sohn, “Optical properties of neodymium-containing polymethylmethacrylate films for the organic light emitting diode color filter,” Appl. Phys. Lett. 89, 051102-1–051102-3 (2006).
[Crossref]
Y. Cho, Y. K. Choi, and S. H. Sohn, “Optical properties of neodymium-containing polymethylmethacrylate films for the organic light emitting diode color filter,” Appl. Phys. Lett. 89, 051102-1–051102-3 (2006).
[Crossref]
Z. Yu, P. Deshpande, W. Wu, J. Wang, and S. Y. Chou, “Reflective polarizer based on a stacked doublelayer subwavelength metal grating structure fabricated using nanoimprint lithography,” Appl. Phys. Lett. 77, 927–929 (2000).
[Crossref]
S. Y. Chou, P. R. Krauss, and P. J. Renstrom, “Imprint of sub-25 nm vias and trenches in polymers,” Appl. Phys. Lett. 67, 3114–3116 (1995).
[Crossref]
Z. Yu, P. Deshpande, W. Wu, J. Wang, and S. Y. Chou, “Reflective polarizer based on a stacked doublelayer subwavelength metal grating structure fabricated using nanoimprint lithography,” Appl. Phys. Lett. 77, 927–929 (2000).
[Crossref]
L. Liao, D. Lim, A. Agarwal, X. Duan, K. Lee, and L. Kimerling, “Optical transmission losses in polycrystalline silicon strip waveguides: effects of waveguide dimensions, thermal treatment, hydrogen passivation, and wavelength,” J. Electron. Mater. 29, 1380–1386 (2000).
[Crossref]
Y. Kanamori, M. Shimono, and K. Hane, “Fabrication of transmission color filters using silicon subwavelength gratings on quartz substrate,” IEEE Photon. Technol. Lett. 18, 2126–2128 (2006).
[Crossref]
Y. Kanamori, M. Shimono, and K. Hane, “Fabrication of transmission color filters using silicon subwavelength gratings on quartz substrate,” IEEE Photon. Technol. Lett. 18, 2126–2128 (2006).
[Crossref]
S. W. Ahn, K. D. Lee, J. S. Kim, S. H. Kim, J. D. Park, S. H. Lee, and P. W. Yoon, “Fabrication of a 50 nm half-pitch wire grid polarizer using nanoimprint lithography,” Nanotechnology 16, 1874–1877 (2005).
[Crossref]
S. W. Ahn, K. D. Lee, J. S. Kim, S. H. Kim, S. H. Lee, J. D. Park, and P. W. Yoon, “Fabrication of subwavelength aluminum wire grating using nanoimprint lithography and reactive ion etching,” Microelecton. Eng. 78–79, 314–318 (2005).
[Crossref]
H. S. Lee, Y. T. Yoon, S. S. Lee, S. H. Kim, and K. D. Lee, “Color filter based on a subwavelength patterned metal grating,” Opt. Exp. 15, 15457–15463 (2007).
[Crossref]
S. W. Ahn, K. D. Lee, J. S. Kim, S. H. Kim, S. H. Lee, J. D. Park, and P. W. Yoon, “Fabrication of subwavelength aluminum wire grating using nanoimprint lithography and reactive ion etching,” Microelecton. Eng. 78–79, 314–318 (2005).
[Crossref]
S. W. Ahn, K. D. Lee, J. S. Kim, S. H. Kim, J. D. Park, S. H. Lee, and P. W. Yoon, “Fabrication of a 50 nm half-pitch wire grid polarizer using nanoimprint lithography,” Nanotechnology 16, 1874–1877 (2005).
[Crossref]
L. Liao, D. Lim, A. Agarwal, X. Duan, K. Lee, and L. Kimerling, “Optical transmission losses in polycrystalline silicon strip waveguides: effects of waveguide dimensions, thermal treatment, hydrogen passivation, and wavelength,” J. Electron. Mater. 29, 1380–1386 (2000).
[Crossref]
S. Y. Chou, P. R. Krauss, and P. J. Renstrom, “Imprint of sub-25 nm vias and trenches in polymers,” Appl. Phys. Lett. 67, 3114–3116 (1995).
[Crossref]
H. S. Lee, Y. T. Yoon, S. S. Lee, S. H. Kim, and K. D. Lee, “Color filter based on a subwavelength patterned metal grating,” Opt. Exp. 15, 15457–15463 (2007).
[Crossref]
L. Liao, D. Lim, A. Agarwal, X. Duan, K. Lee, and L. Kimerling, “Optical transmission losses in polycrystalline silicon strip waveguides: effects of waveguide dimensions, thermal treatment, hydrogen passivation, and wavelength,” J. Electron. Mater. 29, 1380–1386 (2000).
[Crossref]
H. S. Lee, Y. T. Yoon, S. S. Lee, S. H. Kim, and K. D. Lee, “Color filter based on a subwavelength patterned metal grating,” Opt. Exp. 15, 15457–15463 (2007).
[Crossref]
S. W. Ahn, K. D. Lee, J. S. Kim, S. H. Kim, J. D. Park, S. H. Lee, and P. W. Yoon, “Fabrication of a 50 nm half-pitch wire grid polarizer using nanoimprint lithography,” Nanotechnology 16, 1874–1877 (2005).
[Crossref]
S. W. Ahn, K. D. Lee, J. S. Kim, S. H. Kim, S. H. Lee, J. D. Park, and P. W. Yoon, “Fabrication of subwavelength aluminum wire grating using nanoimprint lithography and reactive ion etching,” Microelecton. Eng. 78–79, 314–318 (2005).
[Crossref]
S. W. Ahn, K. D. Lee, J. S. Kim, S. H. Kim, J. D. Park, S. H. Lee, and P. W. Yoon, “Fabrication of a 50 nm half-pitch wire grid polarizer using nanoimprint lithography,” Nanotechnology 16, 1874–1877 (2005).
[Crossref]
S. W. Ahn, K. D. Lee, J. S. Kim, S. H. Kim, S. H. Lee, J. D. Park, and P. W. Yoon, “Fabrication of subwavelength aluminum wire grating using nanoimprint lithography and reactive ion etching,” Microelecton. Eng. 78–79, 314–318 (2005).
[Crossref]
H. S. Lee, Y. T. Yoon, S. S. Lee, S. H. Kim, and K. D. Lee, “Color filter based on a subwavelength patterned metal grating,” Opt. Exp. 15, 15457–15463 (2007).
[Crossref]
L. Liao, D. Lim, A. Agarwal, X. Duan, K. Lee, and L. Kimerling, “Optical transmission losses in polycrystalline silicon strip waveguides: effects of waveguide dimensions, thermal treatment, hydrogen passivation, and wavelength,” J. Electron. Mater. 29, 1380–1386 (2000).
[Crossref]
L. Liao, D. Lim, A. Agarwal, X. Duan, K. Lee, and L. Kimerling, “Optical transmission losses in polycrystalline silicon strip waveguides: effects of waveguide dimensions, thermal treatment, hydrogen passivation, and wavelength,” J. Electron. Mater. 29, 1380–1386 (2000).
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[Crossref]
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[Crossref]
S. W. Ahn, K. D. Lee, J. S. Kim, S. H. Kim, J. D. Park, S. H. Lee, and P. W. Yoon, “Fabrication of a 50 nm half-pitch wire grid polarizer using nanoimprint lithography,” Nanotechnology 16, 1874–1877 (2005).
[Crossref]
S. Y. Chou, P. R. Krauss, and P. J. Renstrom, “Imprint of sub-25 nm vias and trenches in polymers,” Appl. Phys. Lett. 67, 3114–3116 (1995).
[Crossref]
K. Seshan, Handbook of Thin Film Deposition Processes and Technologies (Noyes Publications, New York, USA, 2002), pp. 11–43.
Y. Kanamori, M. Shimono, and K. Hane, “Fabrication of transmission color filters using silicon subwavelength gratings on quartz substrate,” IEEE Photon. Technol. Lett. 18, 2126–2128 (2006).
[Crossref]
Y. Cho, Y. K. Choi, and S. H. Sohn, “Optical properties of neodymium-containing polymethylmethacrylate films for the organic light emitting diode color filter,” Appl. Phys. Lett. 89, 051102-1–051102-3 (2006).
[Crossref]
Z. Yu, P. Deshpande, W. Wu, J. Wang, and S. Y. Chou, “Reflective polarizer based on a stacked doublelayer subwavelength metal grating structure fabricated using nanoimprint lithography,” Appl. Phys. Lett. 77, 927–929 (2000).
[Crossref]
Z. Yu, P. Deshpande, W. Wu, J. Wang, and S. Y. Chou, “Reflective polarizer based on a stacked doublelayer subwavelength metal grating structure fabricated using nanoimprint lithography,” Appl. Phys. Lett. 77, 927–929 (2000).
[Crossref]
S. W. Ahn, K. D. Lee, J. S. Kim, S. H. Kim, J. D. Park, S. H. Lee, and P. W. Yoon, “Fabrication of a 50 nm half-pitch wire grid polarizer using nanoimprint lithography,” Nanotechnology 16, 1874–1877 (2005).
[Crossref]
S. W. Ahn, K. D. Lee, J. S. Kim, S. H. Kim, S. H. Lee, J. D. Park, and P. W. Yoon, “Fabrication of subwavelength aluminum wire grating using nanoimprint lithography and reactive ion etching,” Microelecton. Eng. 78–79, 314–318 (2005).
[Crossref]
H. S. Lee, Y. T. Yoon, S. S. Lee, S. H. Kim, and K. D. Lee, “Color filter based on a subwavelength patterned metal grating,” Opt. Exp. 15, 15457–15463 (2007).
[Crossref]
Z. Yu, P. Deshpande, W. Wu, J. Wang, and S. Y. Chou, “Reflective polarizer based on a stacked doublelayer subwavelength metal grating structure fabricated using nanoimprint lithography,” Appl. Phys. Lett. 77, 927–929 (2000).
[Crossref]
Y. Cho, Y. K. Choi, and S. H. Sohn, “Optical properties of neodymium-containing polymethylmethacrylate films for the organic light emitting diode color filter,” Appl. Phys. Lett. 89, 051102-1–051102-3 (2006).
[Crossref]
S. Y. Chou, P. R. Krauss, and P. J. Renstrom, “Imprint of sub-25 nm vias and trenches in polymers,” Appl. Phys. Lett. 67, 3114–3116 (1995).
[Crossref]
Z. Yu, P. Deshpande, W. Wu, J. Wang, and S. Y. Chou, “Reflective polarizer based on a stacked doublelayer subwavelength metal grating structure fabricated using nanoimprint lithography,” Appl. Phys. Lett. 77, 927–929 (2000).
[Crossref]
Y. Kanamori, M. Shimono, and K. Hane, “Fabrication of transmission color filters using silicon subwavelength gratings on quartz substrate,” IEEE Photon. Technol. Lett. 18, 2126–2128 (2006).
[Crossref]
L. Liao, D. Lim, A. Agarwal, X. Duan, K. Lee, and L. Kimerling, “Optical transmission losses in polycrystalline silicon strip waveguides: effects of waveguide dimensions, thermal treatment, hydrogen passivation, and wavelength,” J. Electron. Mater. 29, 1380–1386 (2000).
[Crossref]
S. W. Ahn, K. D. Lee, J. S. Kim, S. H. Kim, S. H. Lee, J. D. Park, and P. W. Yoon, “Fabrication of subwavelength aluminum wire grating using nanoimprint lithography and reactive ion etching,” Microelecton. Eng. 78–79, 314–318 (2005).
[Crossref]
S. W. Ahn, K. D. Lee, J. S. Kim, S. H. Kim, J. D. Park, S. H. Lee, and P. W. Yoon, “Fabrication of a 50 nm half-pitch wire grid polarizer using nanoimprint lithography,” Nanotechnology 16, 1874–1877 (2005).
[Crossref]
H. S. Lee, Y. T. Yoon, S. S. Lee, S. H. Kim, and K. D. Lee, “Color filter based on a subwavelength patterned metal grating,” Opt. Exp. 15, 15457–15463 (2007).
[Crossref]
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[Crossref]
[PubMed]
Y. Ding and R. Magnusson, “Doubly resonant single-layer bandpass optical filters,” Opt. Lett. 29, 1135–1137 (2004).
[Crossref]
[PubMed]
S. Tibuleac and R. Magnusson, “Narrow-linewidth bandpass filters with diffractive thin-film layers,” Opt. Lett. 26, 584–586 (2001).
[Crossref]
E. D. Palik, Handbook of Optical Constants of Solids /// (Academic Press, San Diego, USA, 1998), pp. 519–536.
K. Seshan, Handbook of Thin Film Deposition Processes and Technologies (Noyes Publications, New York, USA, 2002), pp. 11–43.