D. S. Abrams and L. Pang, “Fast inverse lithography technology,” Proc. SPIE 6154, 534–542 (2006).

C. Hung, B. Zhang, E. Guo, L. Pang, Y. Liu, K. Wang, and G. Dai, “Pushing the lithography limit: Applying inverse lithography technology (ILT) at the 65nm generation,” Proc. SPIE 6154, 61541M (2006).

[Crossref]

L. Pang, Y. Liu, and D. Abrams, “Inverse lithography technology (ILT): What is the impact to the photomask industry?” Proc. SPIE 6283, 62830X (2006).

[Crossref]

A. Poonawala and P. Milanfar, “OPC and PSM design using inverse lithography: A nonlinear optimization approach,” Proc. SPIE textbf 6154, 61543H (2006).

[Crossref]

A. Poonawala and P. Milanfar, “Prewarping techniques in imaging: Applications in nanotechnology and biotechnology,” Proc. SPIE 5674, 114–127 (2005).

[Crossref]

Y. Granik, “Solving inverse problems of optimal microlithography,” Proc. SPIE 5754, 506–526 (2004).

[Crossref]

C. A. Mack, “30 years of lithography simulation,” Proc. SPIE 5754, 1–12 (2004).

[Crossref]

F. Schellenberg, “Resolution enhancement technology: The past, the present, and extensions for the future,” Proc. SPIE 5377, 1–20 (2004).

[Crossref]

P. Berman, A. Kahng, D. Vidhani, H. Wang, and A. Zelikovsky, “Optimal phase conflict removal for layout of dark field alternating phase shifting masks,” IEEE Trans. Computer-Aided Design of Integrated Circuits and Systems 19, 175–187 (2000).

[Crossref]

A. Moniwa and T. Terasawa, “Heuristic method for phase-conflict minimization in automatic phase-shift mask design,” Jpn. J. Appl. Phys. 34, 6584–6589 (1995).

[Crossref]

S. Sherif, B. Saleh, and R. Leone, “Binary image synthesis using mixed linear integer programming,” IEEE Trans. Image Process. 4, 1252–1257 (1995).

[Crossref]
[PubMed]

N. Cobb and A. Zakhor, “Fast sparse aerial image calculation for OPC,” Proc. SPIE 2621, 534–545 (1995).

[Crossref]

Y. Liu and A. Zakhor, “Binary and phase-shifting image design for optical lithography,” IEEE Trans. Semicond. Manuf. 5, 138–151 (1992).

[Crossref]

Y. Liu and A. Zakhor, “Optimal binary image design for optical lithography,” Proc. SPIE 1264, 410–412 (1990).

B. Saleh and S. Sayegh, “Reductions of errors of microphotographic reproductions by optical corrections of original masks,” Opt. Eng. 20, 781–784 (1981).

L. Pang, Y. Liu, and D. Abrams, “Inverse lithography technology (ILT): What is the impact to the photomask industry?” Proc. SPIE 6283, 62830X (2006).

[Crossref]

D. S. Abrams and L. Pang, “Fast inverse lithography technology,” Proc. SPIE 6154, 534–542 (2006).

P. Berman, A. Kahng, D. Vidhani, H. Wang, and A. Zelikovsky, “Optimal phase conflict removal for layout of dark field alternating phase shifting masks,” IEEE Trans. Computer-Aided Design of Integrated Circuits and Systems 19, 175–187 (2000).

[Crossref]

S. H. Chan, A. K. Wong, and E. Y. Lam, “Inverse synthesis of phase-shifting mask for optical lithography,” in “OSA Topical Meeting in Signal Recovery and Synthesis,” (2007), p. SMD3.

S. H. Chan and E. Y. Lam, “Inverse image problem of designing phase shifting masks in optical lithography,” in “IEEE International Conference on Image Processing,” (2008).

N. Cobb and A. Zakhor, “Fast sparse aerial image calculation for OPC,” Proc. SPIE 2621, 534–545 (1995).

[Crossref]

C. Hung, B. Zhang, E. Guo, L. Pang, Y. Liu, K. Wang, and G. Dai, “Pushing the lithography limit: Applying inverse lithography technology (ILT) at the 65nm generation,” Proc. SPIE 6154, 61541M (2006).

[Crossref]

J. Plummer, M. Deal, and P. Griffin, Silicon VLSI Technology — Fundamentals, Practice and Modeling (Prentice Hall, 2000).

P. E. Gill, W. Murray, and M. H. Wright, Practical optimization (Academic Press, London, 1986).

J. W. Goodman, Statistical Optics (Wiley-Interscience, 1985).

J. W. Goodman, Introduction to Fourier Optics (Roberts and Company Publisher, Englewood, Colo, 2005), 3rd ed.

Y. Granik, “Solving inverse problems of optimal microlithography,” Proc. SPIE 5754, 506–526 (2004).

[Crossref]

J. Plummer, M. Deal, and P. Griffin, Silicon VLSI Technology — Fundamentals, Practice and Modeling (Prentice Hall, 2000).

C. Hung, B. Zhang, E. Guo, L. Pang, Y. Liu, K. Wang, and G. Dai, “Pushing the lithography limit: Applying inverse lithography technology (ILT) at the 65nm generation,” Proc. SPIE 6154, 61541M (2006).

[Crossref]

D. Halliday, R. Resnick, and K. S. Krane, Physics, (John Wiley and Sons, New York, 2002), 2nd ed., Vol. 2.

C. Hung, B. Zhang, E. Guo, L. Pang, Y. Liu, K. Wang, and G. Dai, “Pushing the lithography limit: Applying inverse lithography technology (ILT) at the 65nm generation,” Proc. SPIE 6154, 61541M (2006).

[Crossref]

P. Berman, A. Kahng, D. Vidhani, H. Wang, and A. Zelikovsky, “Optimal phase conflict removal for layout of dark field alternating phase shifting masks,” IEEE Trans. Computer-Aided Design of Integrated Circuits and Systems 19, 175–187 (2000).

[Crossref]

D. Halliday, R. Resnick, and K. S. Krane, Physics, (John Wiley and Sons, New York, 2002), 2nd ed., Vol. 2.

S. H. Chan and E. Y. Lam, “Inverse image problem of designing phase shifting masks in optical lithography,” in “IEEE International Conference on Image Processing,” (2008).

S. H. Chan, A. K. Wong, and E. Y. Lam, “Inverse synthesis of phase-shifting mask for optical lithography,” in “OSA Topical Meeting in Signal Recovery and Synthesis,” (2007), p. SMD3.

S. Sherif, B. Saleh, and R. Leone, “Binary image synthesis using mixed linear integer programming,” IEEE Trans. Image Process. 4, 1252–1257 (1995).

[Crossref]
[PubMed]

C. Hung, B. Zhang, E. Guo, L. Pang, Y. Liu, K. Wang, and G. Dai, “Pushing the lithography limit: Applying inverse lithography technology (ILT) at the 65nm generation,” Proc. SPIE 6154, 61541M (2006).

[Crossref]

L. Pang, Y. Liu, and D. Abrams, “Inverse lithography technology (ILT): What is the impact to the photomask industry?” Proc. SPIE 6283, 62830X (2006).

[Crossref]

Y. Liu and A. Zakhor, “Binary and phase-shifting image design for optical lithography,” IEEE Trans. Semicond. Manuf. 5, 138–151 (1992).

[Crossref]

Y. Liu and A. Zakhor, “Optimal binary image design for optical lithography,” Proc. SPIE 1264, 410–412 (1990).

C. A. Mack, “30 years of lithography simulation,” Proc. SPIE 5754, 1–12 (2004).

[Crossref]

A. Poonawala and P. Milanfar, “Mask design for optical microlithography — an inverse imaging problem,” IEEE Trans. Image Process. 16, 774–788 (2007).

[Crossref]
[PubMed]

A. Poonawala and P. Milanfar, “OPC and PSM design using inverse lithography: A nonlinear optimization approach,” Proc. SPIE textbf 6154, 61543H (2006).

[Crossref]

A. Poonawala and P. Milanfar, “Prewarping techniques in imaging: Applications in nanotechnology and biotechnology,” Proc. SPIE 5674, 114–127 (2005).

[Crossref]

M. Minoux, Mathematical programming theory and algorithms (John Wiley and Sons, Chichester, 1986).

A. Moniwa and T. Terasawa, “Heuristic method for phase-conflict minimization in automatic phase-shift mask design,” Jpn. J. Appl. Phys. 34, 6584–6589 (1995).

[Crossref]

P. E. Gill, W. Murray, and M. H. Wright, Practical optimization (Academic Press, London, 1986).

L. Pang, Y. Liu, and D. Abrams, “Inverse lithography technology (ILT): What is the impact to the photomask industry?” Proc. SPIE 6283, 62830X (2006).

[Crossref]

D. S. Abrams and L. Pang, “Fast inverse lithography technology,” Proc. SPIE 6154, 534–542 (2006).

C. Hung, B. Zhang, E. Guo, L. Pang, Y. Liu, K. Wang, and G. Dai, “Pushing the lithography limit: Applying inverse lithography technology (ILT) at the 65nm generation,” Proc. SPIE 6154, 61541M (2006).

[Crossref]

J. Plummer, M. Deal, and P. Griffin, Silicon VLSI Technology — Fundamentals, Practice and Modeling (Prentice Hall, 2000).

A. Poonawala and P. Milanfar, “Mask design for optical microlithography — an inverse imaging problem,” IEEE Trans. Image Process. 16, 774–788 (2007).

[Crossref]
[PubMed]

A. Poonawala and P. Milanfar, “OPC and PSM design using inverse lithography: A nonlinear optimization approach,” Proc. SPIE textbf 6154, 61543H (2006).

[Crossref]

A. Poonawala and P. Milanfar, “Prewarping techniques in imaging: Applications in nanotechnology and biotechnology,” Proc. SPIE 5674, 114–127 (2005).

[Crossref]

D. Halliday, R. Resnick, and K. S. Krane, Physics, (John Wiley and Sons, New York, 2002), 2nd ed., Vol. 2.

W. Rudin, Principles of Mathematical Analysis (McGraw-Hill, 1976).

S. Sherif, B. Saleh, and R. Leone, “Binary image synthesis using mixed linear integer programming,” IEEE Trans. Image Process. 4, 1252–1257 (1995).

[Crossref]
[PubMed]

K. Nashold and B. Saleh, “Image construction through diffraction-limited high-contrast imaging systems: An iterative approach,” J. Opt. Soc. Am. A 2, 635–643 (1985).

[Crossref]

B. Saleh and S. Sayegh, “Reductions of errors of microphotographic reproductions by optical corrections of original masks,” Opt. Eng. 20, 781–784 (1981).

B. Saleh and S. Sayegh, “Reductions of errors of microphotographic reproductions by optical corrections of original masks,” Opt. Eng. 20, 781–784 (1981).

F. Schellenberg, “Resolution enhancement technology: The past, the present, and extensions for the future,” Proc. SPIE 5377, 1–20 (2004).

[Crossref]

L. G. Shapiro and G. C. Stockman, Computer Vision (Prentice Hall, 2001).

S. Sherif, B. Saleh, and R. Leone, “Binary image synthesis using mixed linear integer programming,” IEEE Trans. Image Process. 4, 1252–1257 (1995).

[Crossref]
[PubMed]

L. G. Shapiro and G. C. Stockman, Computer Vision (Prentice Hall, 2001).

A. Moniwa and T. Terasawa, “Heuristic method for phase-conflict minimization in automatic phase-shift mask design,” Jpn. J. Appl. Phys. 34, 6584–6589 (1995).

[Crossref]

P. Berman, A. Kahng, D. Vidhani, H. Wang, and A. Zelikovsky, “Optimal phase conflict removal for layout of dark field alternating phase shifting masks,” IEEE Trans. Computer-Aided Design of Integrated Circuits and Systems 19, 175–187 (2000).

[Crossref]

P. Berman, A. Kahng, D. Vidhani, H. Wang, and A. Zelikovsky, “Optimal phase conflict removal for layout of dark field alternating phase shifting masks,” IEEE Trans. Computer-Aided Design of Integrated Circuits and Systems 19, 175–187 (2000).

[Crossref]

C. Hung, B. Zhang, E. Guo, L. Pang, Y. Liu, K. Wang, and G. Dai, “Pushing the lithography limit: Applying inverse lithography technology (ILT) at the 65nm generation,” Proc. SPIE 6154, 61541M (2006).

[Crossref]

S. H. Chan, A. K. Wong, and E. Y. Lam, “Inverse synthesis of phase-shifting mask for optical lithography,” in “OSA Topical Meeting in Signal Recovery and Synthesis,” (2007), p. SMD3.

A. K.-K. Wong, Resolution enhancement techniques in optical lithography (SPIE Press, Bellingham, Washington, 2001).

[Crossref]

P. E. Gill, W. Murray, and M. H. Wright, Practical optimization (Academic Press, London, 1986).

N. Cobb and A. Zakhor, “Fast sparse aerial image calculation for OPC,” Proc. SPIE 2621, 534–545 (1995).

[Crossref]

Y. Liu and A. Zakhor, “Binary and phase-shifting image design for optical lithography,” IEEE Trans. Semicond. Manuf. 5, 138–151 (1992).

[Crossref]

Y. Liu and A. Zakhor, “Optimal binary image design for optical lithography,” Proc. SPIE 1264, 410–412 (1990).

P. Berman, A. Kahng, D. Vidhani, H. Wang, and A. Zelikovsky, “Optimal phase conflict removal for layout of dark field alternating phase shifting masks,” IEEE Trans. Computer-Aided Design of Integrated Circuits and Systems 19, 175–187 (2000).

[Crossref]

C. Hung, B. Zhang, E. Guo, L. Pang, Y. Liu, K. Wang, and G. Dai, “Pushing the lithography limit: Applying inverse lithography technology (ILT) at the 65nm generation,” Proc. SPIE 6154, 61541M (2006).

[Crossref]

P. Berman, A. Kahng, D. Vidhani, H. Wang, and A. Zelikovsky, “Optimal phase conflict removal for layout of dark field alternating phase shifting masks,” IEEE Trans. Computer-Aided Design of Integrated Circuits and Systems 19, 175–187 (2000).

[Crossref]

A. Poonawala and P. Milanfar, “Mask design for optical microlithography — an inverse imaging problem,” IEEE Trans. Image Process. 16, 774–788 (2007).

[Crossref]
[PubMed]

S. Sherif, B. Saleh, and R. Leone, “Binary image synthesis using mixed linear integer programming,” IEEE Trans. Image Process. 4, 1252–1257 (1995).

[Crossref]
[PubMed]

Y. Liu and A. Zakhor, “Binary and phase-shifting image design for optical lithography,” IEEE Trans. Semicond. Manuf. 5, 138–151 (1992).

[Crossref]

A. Moniwa and T. Terasawa, “Heuristic method for phase-conflict minimization in automatic phase-shift mask design,” Jpn. J. Appl. Phys. 34, 6584–6589 (1995).

[Crossref]

B. Saleh and S. Sayegh, “Reductions of errors of microphotographic reproductions by optical corrections of original masks,” Opt. Eng. 20, 781–784 (1981).

Y. Granik, “Solving inverse problems of optimal microlithography,” Proc. SPIE 5754, 506–526 (2004).

[Crossref]

D. S. Abrams and L. Pang, “Fast inverse lithography technology,” Proc. SPIE 6154, 534–542 (2006).

C. Hung, B. Zhang, E. Guo, L. Pang, Y. Liu, K. Wang, and G. Dai, “Pushing the lithography limit: Applying inverse lithography technology (ILT) at the 65nm generation,” Proc. SPIE 6154, 61541M (2006).

[Crossref]

L. Pang, Y. Liu, and D. Abrams, “Inverse lithography technology (ILT): What is the impact to the photomask industry?” Proc. SPIE 6283, 62830X (2006).

[Crossref]

A. Poonawala and P. Milanfar, “Prewarping techniques in imaging: Applications in nanotechnology and biotechnology,” Proc. SPIE 5674, 114–127 (2005).

[Crossref]

A. Poonawala and P. Milanfar, “OPC and PSM design using inverse lithography: A nonlinear optimization approach,” Proc. SPIE textbf 6154, 61543H (2006).

[Crossref]

C. A. Mack, “30 years of lithography simulation,” Proc. SPIE 5754, 1–12 (2004).

[Crossref]

F. Schellenberg, “Resolution enhancement technology: The past, the present, and extensions for the future,” Proc. SPIE 5377, 1–20 (2004).

[Crossref]

Y. Liu and A. Zakhor, “Optimal binary image design for optical lithography,” Proc. SPIE 1264, 410–412 (1990).

N. Cobb and A. Zakhor, “Fast sparse aerial image calculation for OPC,” Proc. SPIE 2621, 534–545 (1995).

[Crossref]

A. K.-K. Wong, Resolution enhancement techniques in optical lithography (SPIE Press, Bellingham, Washington, 2001).

[Crossref]

S. H. Chan, A. K. Wong, and E. Y. Lam, “Inverse synthesis of phase-shifting mask for optical lithography,” in “OSA Topical Meeting in Signal Recovery and Synthesis,” (2007), p. SMD3.

J. Plummer, M. Deal, and P. Griffin, Silicon VLSI Technology — Fundamentals, Practice and Modeling (Prentice Hall, 2000).

J. W. Goodman, Statistical Optics (Wiley-Interscience, 1985).

J. W. Goodman, Introduction to Fourier Optics (Roberts and Company Publisher, Englewood, Colo, 2005), 3rd ed.

L. G. Shapiro and G. C. Stockman, Computer Vision (Prentice Hall, 2001).

D. Halliday, R. Resnick, and K. S. Krane, Physics, (John Wiley and Sons, New York, 2002), 2nd ed., Vol. 2.

S. H. Chan and E. Y. Lam, “Inverse image problem of designing phase shifting masks in optical lithography,” in “IEEE International Conference on Image Processing,” (2008).

P. E. Gill, W. Murray, and M. H. Wright, Practical optimization (Academic Press, London, 1986).

W. Rudin, Principles of Mathematical Analysis (McGraw-Hill, 1976).

M. Minoux, Mathematical programming theory and algorithms (John Wiley and Sons, Chichester, 1986).