Abstract

An error was made in calculating the complex electric field vector for the diffracted beams. We have corrected the error and repeated the optimization to achieve a phase mask design bearing the same result. The overall approach remains unchanged.

© 2008 Optical Society of America

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References

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  1. J. W. Rinne, S. Gupta, and P. Wiltzius, "Inverse design for phase mask lithography," Opt. Express 16, 663-670 (2008), http://www.opticsinfobase.org/abstract.cfm?URI=oe-16-2-663.
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Figures (1)

Fig. 1.
Fig. 1.

The illustration in part (a) depicts the helix structure used as the target model. For clarity, we plot two turns of the helix and outline in bold a single primitive cell with dimensions a×a√3/2×c. Here, c/a describes the helices’ relative elongation and has a value of 2.2. Part (b) depicts the interference based structure that is produced by the optimized design shown in (c). The top portion of (c) represents a single unit cell of the phase mask’s relief profile. The primitive grating vectors are labeled by a 1 and a 2. Light pixels are raised and dark pixels are recessed. The polarization ellipse is given in the bottom portion of (c).

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