Abstract

A dynamic model of mastering for multilevel run-length limited read-only disc is built, and corresponding experiments on DVD are done to validate it. Results show that this model consists with real mastering process. Using the model, a preliminary write strategy for 4-level run-length limited read-only disc is calculated out. The readout signals of the disc optimizing by write strategy are very close to desired.

© 2007 Optical Society of America

Full Article  |  PDF Article

References

  • View by:
  • |
  • |
  • |

  1. Q. Zhang, Y. Ni, D. Xu, H. Hu, J. Song, and H. Hu, "Multilevel run-length limited recording on read-only disc," Jpn. J. Appl. Phys. 45, 4097-4101 (2006).
    [CrossRef]
  2. P. L. Put, H. P. Urbach, R. D. Morton, and J. J. Rusch, "Resolution limit of optical disc mastering," Jpn. J. Appl. Phys. 36, 539-548 (1997).
    [CrossRef]
  3. J. Song, Y. Ni, D. Xu, L. Pan, Q. Zhang, and H. Hu, "Modeling and realization of a multilevel read-only disc," Opt. Express 14, 1199-1207 (2006).
    [CrossRef] [PubMed]
  4. H. Hu, J. Pei, J. Xiong, Y. Ni, L. Pan and H. Hu, "DC-free four-ary (2, 8) run-length limited code for multi-level recording channels," Jpn. J. Appl. Phys. 45, 5786-5790 (2006).
    [CrossRef]
  5. B. Richards and E. Wolf, "Electromagnetic diffraction in optical systems II. Structure of the image field in an aplanatic system," Proc. R. Soc. Ser. A253, 358-379 (1959).
    [CrossRef]
  6. F. H. Dill, W. P. Hornberger, P. S. Hauge, and J. M. Shaw, "Characterization of positive photoresist," IEEE Trans. Electron Devices 22, 445-452 (1975).
    [CrossRef]
  7. D. J. Kim, W.G. Oldham, and A.R. Neureuther, "Development of positive photoresist," IEEE Trans. Electron Devices 31,1730-1736 (1984).
    [CrossRef]
  8. P. Trefonas and B. Daniels, "New principle for image enhancement in single layer positive photoresists," Proc. SPIE 771, 194-210 (1987).
  9. Y. Hirai, M. Sasago, M. Endo, D. Tsuji, and Y. Mano, "Process modeling for photoresist development and design of dlr/sd (double-layer resist by a single development) process," IEEE Trans.Comput-Aided Des. 6, 403-409 (1987).
    [CrossRef]
  10. P. L. Put, P. A. Kraakman, R. D. Morton, and J. Pasman, "Evaluation of photolithographic processes for high-density optical disc mastering," Proc. SPIE 1663, 336-348 (1992).
    [CrossRef]
  11. Q. Zhang, J. Xiong, and D. Xu, "A viterbi detector with feedback used in multilevel run-length-limited modulation optical recording," Jpn. J. Appl. Phys. 45, 6331-6333 (2006).
    [CrossRef]

2006 (4)

Q. Zhang, Y. Ni, D. Xu, H. Hu, J. Song, and H. Hu, "Multilevel run-length limited recording on read-only disc," Jpn. J. Appl. Phys. 45, 4097-4101 (2006).
[CrossRef]

J. Song, Y. Ni, D. Xu, L. Pan, Q. Zhang, and H. Hu, "Modeling and realization of a multilevel read-only disc," Opt. Express 14, 1199-1207 (2006).
[CrossRef] [PubMed]

H. Hu, J. Pei, J. Xiong, Y. Ni, L. Pan and H. Hu, "DC-free four-ary (2, 8) run-length limited code for multi-level recording channels," Jpn. J. Appl. Phys. 45, 5786-5790 (2006).
[CrossRef]

Q. Zhang, J. Xiong, and D. Xu, "A viterbi detector with feedback used in multilevel run-length-limited modulation optical recording," Jpn. J. Appl. Phys. 45, 6331-6333 (2006).
[CrossRef]

1997 (1)

P. L. Put, H. P. Urbach, R. D. Morton, and J. J. Rusch, "Resolution limit of optical disc mastering," Jpn. J. Appl. Phys. 36, 539-548 (1997).
[CrossRef]

1992 (1)

P. L. Put, P. A. Kraakman, R. D. Morton, and J. Pasman, "Evaluation of photolithographic processes for high-density optical disc mastering," Proc. SPIE 1663, 336-348 (1992).
[CrossRef]

1987 (2)

P. Trefonas and B. Daniels, "New principle for image enhancement in single layer positive photoresists," Proc. SPIE 771, 194-210 (1987).

Y. Hirai, M. Sasago, M. Endo, D. Tsuji, and Y. Mano, "Process modeling for photoresist development and design of dlr/sd (double-layer resist by a single development) process," IEEE Trans.Comput-Aided Des. 6, 403-409 (1987).
[CrossRef]

1984 (1)

D. J. Kim, W.G. Oldham, and A.R. Neureuther, "Development of positive photoresist," IEEE Trans. Electron Devices 31,1730-1736 (1984).
[CrossRef]

1975 (1)

F. H. Dill, W. P. Hornberger, P. S. Hauge, and J. M. Shaw, "Characterization of positive photoresist," IEEE Trans. Electron Devices 22, 445-452 (1975).
[CrossRef]

1959 (1)

B. Richards and E. Wolf, "Electromagnetic diffraction in optical systems II. Structure of the image field in an aplanatic system," Proc. R. Soc. Ser. A253, 358-379 (1959).
[CrossRef]

Daniels, B.

P. Trefonas and B. Daniels, "New principle for image enhancement in single layer positive photoresists," Proc. SPIE 771, 194-210 (1987).

Dill, F. H.

F. H. Dill, W. P. Hornberger, P. S. Hauge, and J. M. Shaw, "Characterization of positive photoresist," IEEE Trans. Electron Devices 22, 445-452 (1975).
[CrossRef]

Endo, M.

Y. Hirai, M. Sasago, M. Endo, D. Tsuji, and Y. Mano, "Process modeling for photoresist development and design of dlr/sd (double-layer resist by a single development) process," IEEE Trans.Comput-Aided Des. 6, 403-409 (1987).
[CrossRef]

Hauge, P. S.

F. H. Dill, W. P. Hornberger, P. S. Hauge, and J. M. Shaw, "Characterization of positive photoresist," IEEE Trans. Electron Devices 22, 445-452 (1975).
[CrossRef]

Hirai, Y.

Y. Hirai, M. Sasago, M. Endo, D. Tsuji, and Y. Mano, "Process modeling for photoresist development and design of dlr/sd (double-layer resist by a single development) process," IEEE Trans.Comput-Aided Des. 6, 403-409 (1987).
[CrossRef]

Hornberger, W. P.

F. H. Dill, W. P. Hornberger, P. S. Hauge, and J. M. Shaw, "Characterization of positive photoresist," IEEE Trans. Electron Devices 22, 445-452 (1975).
[CrossRef]

Hu, H.

H. Hu, J. Pei, J. Xiong, Y. Ni, L. Pan and H. Hu, "DC-free four-ary (2, 8) run-length limited code for multi-level recording channels," Jpn. J. Appl. Phys. 45, 5786-5790 (2006).
[CrossRef]

Q. Zhang, Y. Ni, D. Xu, H. Hu, J. Song, and H. Hu, "Multilevel run-length limited recording on read-only disc," Jpn. J. Appl. Phys. 45, 4097-4101 (2006).
[CrossRef]

Q. Zhang, Y. Ni, D. Xu, H. Hu, J. Song, and H. Hu, "Multilevel run-length limited recording on read-only disc," Jpn. J. Appl. Phys. 45, 4097-4101 (2006).
[CrossRef]

J. Song, Y. Ni, D. Xu, L. Pan, Q. Zhang, and H. Hu, "Modeling and realization of a multilevel read-only disc," Opt. Express 14, 1199-1207 (2006).
[CrossRef] [PubMed]

H. Hu, J. Pei, J. Xiong, Y. Ni, L. Pan and H. Hu, "DC-free four-ary (2, 8) run-length limited code for multi-level recording channels," Jpn. J. Appl. Phys. 45, 5786-5790 (2006).
[CrossRef]

Kim, D. J.

D. J. Kim, W.G. Oldham, and A.R. Neureuther, "Development of positive photoresist," IEEE Trans. Electron Devices 31,1730-1736 (1984).
[CrossRef]

Kraakman, P. A.

P. L. Put, P. A. Kraakman, R. D. Morton, and J. Pasman, "Evaluation of photolithographic processes for high-density optical disc mastering," Proc. SPIE 1663, 336-348 (1992).
[CrossRef]

Mano, Y.

Y. Hirai, M. Sasago, M. Endo, D. Tsuji, and Y. Mano, "Process modeling for photoresist development and design of dlr/sd (double-layer resist by a single development) process," IEEE Trans.Comput-Aided Des. 6, 403-409 (1987).
[CrossRef]

Morton, R. D.

P. L. Put, H. P. Urbach, R. D. Morton, and J. J. Rusch, "Resolution limit of optical disc mastering," Jpn. J. Appl. Phys. 36, 539-548 (1997).
[CrossRef]

P. L. Put, P. A. Kraakman, R. D. Morton, and J. Pasman, "Evaluation of photolithographic processes for high-density optical disc mastering," Proc. SPIE 1663, 336-348 (1992).
[CrossRef]

Neureuther, A.R.

D. J. Kim, W.G. Oldham, and A.R. Neureuther, "Development of positive photoresist," IEEE Trans. Electron Devices 31,1730-1736 (1984).
[CrossRef]

Ni, Y.

H. Hu, J. Pei, J. Xiong, Y. Ni, L. Pan and H. Hu, "DC-free four-ary (2, 8) run-length limited code for multi-level recording channels," Jpn. J. Appl. Phys. 45, 5786-5790 (2006).
[CrossRef]

Q. Zhang, Y. Ni, D. Xu, H. Hu, J. Song, and H. Hu, "Multilevel run-length limited recording on read-only disc," Jpn. J. Appl. Phys. 45, 4097-4101 (2006).
[CrossRef]

J. Song, Y. Ni, D. Xu, L. Pan, Q. Zhang, and H. Hu, "Modeling and realization of a multilevel read-only disc," Opt. Express 14, 1199-1207 (2006).
[CrossRef] [PubMed]

Oldham, W.G.

D. J. Kim, W.G. Oldham, and A.R. Neureuther, "Development of positive photoresist," IEEE Trans. Electron Devices 31,1730-1736 (1984).
[CrossRef]

Pan, L.

H. Hu, J. Pei, J. Xiong, Y. Ni, L. Pan and H. Hu, "DC-free four-ary (2, 8) run-length limited code for multi-level recording channels," Jpn. J. Appl. Phys. 45, 5786-5790 (2006).
[CrossRef]

J. Song, Y. Ni, D. Xu, L. Pan, Q. Zhang, and H. Hu, "Modeling and realization of a multilevel read-only disc," Opt. Express 14, 1199-1207 (2006).
[CrossRef] [PubMed]

Pasman, J.

P. L. Put, P. A. Kraakman, R. D. Morton, and J. Pasman, "Evaluation of photolithographic processes for high-density optical disc mastering," Proc. SPIE 1663, 336-348 (1992).
[CrossRef]

Pei, J.

H. Hu, J. Pei, J. Xiong, Y. Ni, L. Pan and H. Hu, "DC-free four-ary (2, 8) run-length limited code for multi-level recording channels," Jpn. J. Appl. Phys. 45, 5786-5790 (2006).
[CrossRef]

Put, P. L.

P. L. Put, H. P. Urbach, R. D. Morton, and J. J. Rusch, "Resolution limit of optical disc mastering," Jpn. J. Appl. Phys. 36, 539-548 (1997).
[CrossRef]

P. L. Put, P. A. Kraakman, R. D. Morton, and J. Pasman, "Evaluation of photolithographic processes for high-density optical disc mastering," Proc. SPIE 1663, 336-348 (1992).
[CrossRef]

Richards, B.

B. Richards and E. Wolf, "Electromagnetic diffraction in optical systems II. Structure of the image field in an aplanatic system," Proc. R. Soc. Ser. A253, 358-379 (1959).
[CrossRef]

Rusch, J. J.

P. L. Put, H. P. Urbach, R. D. Morton, and J. J. Rusch, "Resolution limit of optical disc mastering," Jpn. J. Appl. Phys. 36, 539-548 (1997).
[CrossRef]

Sasago, M.

Y. Hirai, M. Sasago, M. Endo, D. Tsuji, and Y. Mano, "Process modeling for photoresist development and design of dlr/sd (double-layer resist by a single development) process," IEEE Trans.Comput-Aided Des. 6, 403-409 (1987).
[CrossRef]

Shaw, J. M.

F. H. Dill, W. P. Hornberger, P. S. Hauge, and J. M. Shaw, "Characterization of positive photoresist," IEEE Trans. Electron Devices 22, 445-452 (1975).
[CrossRef]

Song, J.

J. Song, Y. Ni, D. Xu, L. Pan, Q. Zhang, and H. Hu, "Modeling and realization of a multilevel read-only disc," Opt. Express 14, 1199-1207 (2006).
[CrossRef] [PubMed]

Q. Zhang, Y. Ni, D. Xu, H. Hu, J. Song, and H. Hu, "Multilevel run-length limited recording on read-only disc," Jpn. J. Appl. Phys. 45, 4097-4101 (2006).
[CrossRef]

Trefonas, P.

P. Trefonas and B. Daniels, "New principle for image enhancement in single layer positive photoresists," Proc. SPIE 771, 194-210 (1987).

Tsuji, D.

Y. Hirai, M. Sasago, M. Endo, D. Tsuji, and Y. Mano, "Process modeling for photoresist development and design of dlr/sd (double-layer resist by a single development) process," IEEE Trans.Comput-Aided Des. 6, 403-409 (1987).
[CrossRef]

Urbach, H. P.

P. L. Put, H. P. Urbach, R. D. Morton, and J. J. Rusch, "Resolution limit of optical disc mastering," Jpn. J. Appl. Phys. 36, 539-548 (1997).
[CrossRef]

Wolf, E.

B. Richards and E. Wolf, "Electromagnetic diffraction in optical systems II. Structure of the image field in an aplanatic system," Proc. R. Soc. Ser. A253, 358-379 (1959).
[CrossRef]

Xiong, J.

H. Hu, J. Pei, J. Xiong, Y. Ni, L. Pan and H. Hu, "DC-free four-ary (2, 8) run-length limited code for multi-level recording channels," Jpn. J. Appl. Phys. 45, 5786-5790 (2006).
[CrossRef]

Q. Zhang, J. Xiong, and D. Xu, "A viterbi detector with feedback used in multilevel run-length-limited modulation optical recording," Jpn. J. Appl. Phys. 45, 6331-6333 (2006).
[CrossRef]

Xu, D.

Q. Zhang, J. Xiong, and D. Xu, "A viterbi detector with feedback used in multilevel run-length-limited modulation optical recording," Jpn. J. Appl. Phys. 45, 6331-6333 (2006).
[CrossRef]

J. Song, Y. Ni, D. Xu, L. Pan, Q. Zhang, and H. Hu, "Modeling and realization of a multilevel read-only disc," Opt. Express 14, 1199-1207 (2006).
[CrossRef] [PubMed]

Q. Zhang, Y. Ni, D. Xu, H. Hu, J. Song, and H. Hu, "Multilevel run-length limited recording on read-only disc," Jpn. J. Appl. Phys. 45, 4097-4101 (2006).
[CrossRef]

Zhang, Q.

J. Song, Y. Ni, D. Xu, L. Pan, Q. Zhang, and H. Hu, "Modeling and realization of a multilevel read-only disc," Opt. Express 14, 1199-1207 (2006).
[CrossRef] [PubMed]

Q. Zhang, J. Xiong, and D. Xu, "A viterbi detector with feedback used in multilevel run-length-limited modulation optical recording," Jpn. J. Appl. Phys. 45, 6331-6333 (2006).
[CrossRef]

Q. Zhang, Y. Ni, D. Xu, H. Hu, J. Song, and H. Hu, "Multilevel run-length limited recording on read-only disc," Jpn. J. Appl. Phys. 45, 4097-4101 (2006).
[CrossRef]

Comput-Aided Des. (1)

Y. Hirai, M. Sasago, M. Endo, D. Tsuji, and Y. Mano, "Process modeling for photoresist development and design of dlr/sd (double-layer resist by a single development) process," IEEE Trans.Comput-Aided Des. 6, 403-409 (1987).
[CrossRef]

IEEE Trans. Electron Devices (2)

F. H. Dill, W. P. Hornberger, P. S. Hauge, and J. M. Shaw, "Characterization of positive photoresist," IEEE Trans. Electron Devices 22, 445-452 (1975).
[CrossRef]

D. J. Kim, W.G. Oldham, and A.R. Neureuther, "Development of positive photoresist," IEEE Trans. Electron Devices 31,1730-1736 (1984).
[CrossRef]

Jpn. J. Appl. Phys. (4)

H. Hu, J. Pei, J. Xiong, Y. Ni, L. Pan and H. Hu, "DC-free four-ary (2, 8) run-length limited code for multi-level recording channels," Jpn. J. Appl. Phys. 45, 5786-5790 (2006).
[CrossRef]

Q. Zhang, J. Xiong, and D. Xu, "A viterbi detector with feedback used in multilevel run-length-limited modulation optical recording," Jpn. J. Appl. Phys. 45, 6331-6333 (2006).
[CrossRef]

Q. Zhang, Y. Ni, D. Xu, H. Hu, J. Song, and H. Hu, "Multilevel run-length limited recording on read-only disc," Jpn. J. Appl. Phys. 45, 4097-4101 (2006).
[CrossRef]

P. L. Put, H. P. Urbach, R. D. Morton, and J. J. Rusch, "Resolution limit of optical disc mastering," Jpn. J. Appl. Phys. 36, 539-548 (1997).
[CrossRef]

Opt. Express (1)

Proc. R. Soc. Ser. (1)

B. Richards and E. Wolf, "Electromagnetic diffraction in optical systems II. Structure of the image field in an aplanatic system," Proc. R. Soc. Ser. A253, 358-379 (1959).
[CrossRef]

Proc. SPIE (2)

P. Trefonas and B. Daniels, "New principle for image enhancement in single layer positive photoresists," Proc. SPIE 771, 194-210 (1987).

P. L. Put, P. A. Kraakman, R. D. Morton, and J. Pasman, "Evaluation of photolithographic processes for high-density optical disc mastering," Proc. SPIE 1663, 336-348 (1992).
[CrossRef]

Cited By

OSA participates in CrossRef's Cited-By Linking service. Citing articles from OSA journals and other participating publishers are listed here.

Alert me when this article is cited.


Figures (8)

Fig. 1.
Fig. 1.

Coordinates of the incidence laser.

Fig. 2.
Fig. 2.

Distribution of normalized light intensity on the focal plane.

Fig. 3.
Fig. 3.

The cross sections in the tangential direction through the center of the DVD patterns.

Fig. 4.
Fig. 4.

The cross sections in the tangential direction through the center of the pits.

Fig. 5.
Fig. 5.

Readout signals of a 4-level read-only disc without any optimizing.

Fig. 6.
Fig. 6.

The cross sections in the tangential direction through the center of the pits write with different power P0, 0.7P0 and 0.6P0.

Fig. 7.
Fig. 7.

The cross sections in the tangential direction through the center of the pits after optimizing by the write strategy.

Fig. 8.
Fig. 8.

Actual and simulated readout signals after optimizing by write strategy.

Tables (2)

Tables Icon

Table 1. Key parameters during the mastering process

Tables Icon

Table 2. Preliminary write strategy matrix for 4-level RLL read-only disc

Equations (11)

Equations on this page are rendered with MathJax. Learn more.

I ρ φ = A 2 8 π ( Q 0 2 + 2 Q 1 2 + Q 2 2 )
A = kfl 0 2 = π fl 0 λ
Q 0 ( ρ ) = 0 α cos 1 2 θ sin θ ( 1 + cos θ ) J 0 ( r sin θ sin α ) d θ Q 1 ( ρ ) = 0 α cos 1 2 θ sin 2 θ J 1 ( r sin θ sin α ) d θ Q 2 ( ρ ) = 0 α cos 1 2 θ sin θ ( 1 cos θ ) J 2 ( r sin θ sin α ) d θ } .
x = ρ cos φ k y = ρ sin φ k } .
M x y z t t = I x y z t M x y z t C
M x y z t = M x y z 0 e CE x y z
R ( h ) = h t = R 0 ( 1 M ( h ) ) q
E x y = I vt y P ( x vt ) d t
= I x y * P ( x ) v
P ( x ) = { 1 0 < x < vt 0 0 x < 0 , x > vt 0 .
h x y = R 0 ( 1 e CE x y ) q T

Metrics