This work presents a theoretical study of using the interference of multiple
counter-propagating evanescent waves as a lithography technique to print
periodic two dimensional features. The formulation of the three dimensional
Cartesian space expression of an evanescent wave is presented. In this work, the
evanescent wave is generated by the total internal reflection of a plane wave at
the interface between a incident dielectric material and a weakly absorbing
transmission medium. The influences of polarization, incident angle and the
phase shifting of the incident plane waves on the evanescent wave interference
are studied. Numerical simulation results suggest that this technique enables
fabrication of periodic two dimensional features with resolution less than one
third the wavelength of the irradiation source.
© 2007 Optical Society of America
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