H. Rong, et. al, “Low-threshold continuous-wave Raman silicon laser,” Nat. Photonics 1, 232 – 237 (2007).
[Crossref]
X. Chen, N. C. Panoiu, and R. M. Osgood, “Theory of Raman-mediated pulse amplification in silicon wire waveguides,” IEEE J. of Quantum Electron. 42, 160–170 (2006).
[Crossref]
F. Xia, L. Sekaric, and Y. Vlasov, “Ultracompact optical buffers on a silicon chip,” Nat. Photonics 1, 65–71 (2006).
[Crossref]
M. Hochberg, et al., “Terahertz All-Optical Modulation in Silicon-Polymer Hybrid System,” Nat. Mater. 5, 703 – 709 (2006).
[Crossref]
[PubMed]
L. C. Kimerling, et.al, “Electronic-Photonic integrated circuits on the CMOS platform,” Proc. SPIE 6125, 612502–1–10 (2006).
[Crossref]
T. Indukuri, P. Koonath, and B. Jalali, “Three-dimensional integration of metal-oxide-semiconductor transistor with subterranean photonics in silicon,” Appl. Phys. Lett. 88, 121108 (2006).
[Crossref]
K. Jia, et al, “Silicon-on-insulator-based optical demultiplexer employing turning-mirror-integrated arrayed-waveguide grating,” IEEE Photon. Technol. Lett. 17, 378–380 (2005).
[Crossref]
Q. Xu, B. Schmidt, S. Pradhan, and M. Lipson, “Micrometre-scale silicon electro-optic modulator,” Nature 435, 325–327 (2005).
[Crossref]
[PubMed]
Y. Kuo, et al, “Strong quantum-confined stark effect in germanium quantum-well structures on silicon,” Nature 437, 1334–1336 (2005).
[Crossref]
[PubMed]
S. Tyagi, et al. “A 65nm ultra low power logic platform technology using Uni-axial strained silicon transistors,” IEEE IEDM Tech. Digest245–247 (2005).
[Crossref]
T. Tsuchizawa, et al., “Microphotonics devices based on silicon microfabrication technology,” EEE J. Sel. Top. Quantum Electron. 11, 232–240 (2005).
[Crossref]
W. R. Davis, et al., “Demystifying 3D ICs: The pros and cons of going vertical,” IEEE Design and Test of Computers 22, 498–510 (2005).
[Crossref]
Y. A. Vlasov and S. J. McNab, “Losses in single-mode silicon-on-insulator strip waveguides and bends,” Opt. Express 21, 1622–1631 (2004).
[Crossref]
P. Dumon, et al. “Low-loss SOI photonic wires and ring resonators fabricated with deep UV lithography,” IEEE Photon. Technol. Lett. 16, 1328–1330 (2004).
[Crossref]
A. Polman, B. Min, J. Kalkman, T. J. Kippenberg, and K. Vahala, “Ultralow-threshold erbium-implanted toroidal microlaser on silicon,” Appl. Phys. Lett. 84, 1037–1039 (2004).
[Crossref]
M. Borselli, K. Srinivasan, P. Barclay, and O. Painter, “Rayleigh scattering, mode coupling, and optical loss in silicon microdisks,” Appl. Phys. Lett. 85, 3693–3695 (2004).
[Crossref]
O. Boyraz and B. Jalali, “Demonstration of a Silicon Raman Laser,” Opt. Express 12, 5269–5273 (2004).
[Crossref]
[PubMed]
T. K. Liang and H. K. Hsang, “Role of free carriers from two-photon absorption in Raman amplification in silicon-on-insulator waveguides,” Appl. Phys. Letts. 84, 2745–2747 (2004).
[Crossref]
P. Koonath, K. Kishima, T. Indukuri, and B. Jalali, “Sculpting of three-dimensional nano-optical structures in silicon,” Appl. Phys. Letts. 83, 4909–4911 (2003).
[Crossref]
M. Chen, et. al, “Dose-energy match for the formation of high-integrity buried oxide layers in low-dose separation-by-implantation-of-oxygen materials,” Appl. Phys. Letts. 80, 880–82 (2002).
[Crossref]
H. Ono and A. Ogura, “Evaulation of buried oxide formation in low dose SIMOX,” Appl. Surf. Sci. 159–160, 104–110(2000).
A. Fazio, “A high density high performance 180nm generation EtoxTM flash memory technology,” IEEE IEDM Tech. Digest267–270 (1999).
R. A. Soref, F. Namavar, E. Cortesi, L. Friedman, and R. Lareau, “Vertical 3D integration of silicon waveguides in a Si-SiO2-Si-SiO2-Si structure,” Proc SPIE 1389, 408–421 (1990).
[Crossref]
M. Borselli, K. Srinivasan, P. Barclay, and O. Painter, “Rayleigh scattering, mode coupling, and optical loss in silicon microdisks,” Appl. Phys. Lett. 85, 3693–3695 (2004).
[Crossref]
M. Borselli, K. Srinivasan, P. Barclay, and O. Painter, “Rayleigh scattering, mode coupling, and optical loss in silicon microdisks,” Appl. Phys. Lett. 85, 3693–3695 (2004).
[Crossref]
M. Chen, et. al, “Dose-energy match for the formation of high-integrity buried oxide layers in low-dose separation-by-implantation-of-oxygen materials,” Appl. Phys. Letts. 80, 880–82 (2002).
[Crossref]
X. Chen, N. C. Panoiu, and R. M. Osgood, “Theory of Raman-mediated pulse amplification in silicon wire waveguides,” IEEE J. of Quantum Electron. 42, 160–170 (2006).
[Crossref]
R. A. Soref, F. Namavar, E. Cortesi, L. Friedman, and R. Lareau, “Vertical 3D integration of silicon waveguides in a Si-SiO2-Si-SiO2-Si structure,” Proc SPIE 1389, 408–421 (1990).
[Crossref]
W. R. Davis, et al., “Demystifying 3D ICs: The pros and cons of going vertical,” IEEE Design and Test of Computers 22, 498–510 (2005).
[Crossref]
P. Dumon, et al. “Low-loss SOI photonic wires and ring resonators fabricated with deep UV lithography,” IEEE Photon. Technol. Lett. 16, 1328–1330 (2004).
[Crossref]
A. Fazio, “A high density high performance 180nm generation EtoxTM flash memory technology,” IEEE IEDM Tech. Digest267–270 (1999).
R. A. Soref, F. Namavar, E. Cortesi, L. Friedman, and R. Lareau, “Vertical 3D integration of silicon waveguides in a Si-SiO2-Si-SiO2-Si structure,” Proc SPIE 1389, 408–421 (1990).
[Crossref]
M. Hochberg, et al., “Terahertz All-Optical Modulation in Silicon-Polymer Hybrid System,” Nat. Mater. 5, 703 – 709 (2006).
[Crossref]
[PubMed]
T. K. Liang and H. K. Hsang, “Role of free carriers from two-photon absorption in Raman amplification in silicon-on-insulator waveguides,” Appl. Phys. Letts. 84, 2745–2747 (2004).
[Crossref]
T. Indukuri, P. Koonath, and B. Jalali, “Three-dimensional integration of metal-oxide-semiconductor transistor with subterranean photonics in silicon,” Appl. Phys. Lett. 88, 121108 (2006).
[Crossref]
P. Koonath, K. Kishima, T. Indukuri, and B. Jalali, “Sculpting of three-dimensional nano-optical structures in silicon,” Appl. Phys. Letts. 83, 4909–4911 (2003).
[Crossref]
T. Indukuri, P. Koonath, and B. Jalali, “Three-dimensional integration of metal-oxide-semiconductor transistor with subterranean photonics in silicon,” Appl. Phys. Lett. 88, 121108 (2006).
[Crossref]
O. Boyraz and B. Jalali, “Demonstration of a Silicon Raman Laser,” Opt. Express 12, 5269–5273 (2004).
[Crossref]
[PubMed]
P. Koonath, K. Kishima, T. Indukuri, and B. Jalali, “Sculpting of three-dimensional nano-optical structures in silicon,” Appl. Phys. Letts. 83, 4909–4911 (2003).
[Crossref]
K. Jia, et al, “Silicon-on-insulator-based optical demultiplexer employing turning-mirror-integrated arrayed-waveguide grating,” IEEE Photon. Technol. Lett. 17, 378–380 (2005).
[Crossref]
A. Polman, B. Min, J. Kalkman, T. J. Kippenberg, and K. Vahala, “Ultralow-threshold erbium-implanted toroidal microlaser on silicon,” Appl. Phys. Lett. 84, 1037–1039 (2004).
[Crossref]
L. C. Kimerling, et.al, “Electronic-Photonic integrated circuits on the CMOS platform,” Proc. SPIE 6125, 612502–1–10 (2006).
[Crossref]
A. Polman, B. Min, J. Kalkman, T. J. Kippenberg, and K. Vahala, “Ultralow-threshold erbium-implanted toroidal microlaser on silicon,” Appl. Phys. Lett. 84, 1037–1039 (2004).
[Crossref]
P. Koonath, K. Kishima, T. Indukuri, and B. Jalali, “Sculpting of three-dimensional nano-optical structures in silicon,” Appl. Phys. Letts. 83, 4909–4911 (2003).
[Crossref]
T. Indukuri, P. Koonath, and B. Jalali, “Three-dimensional integration of metal-oxide-semiconductor transistor with subterranean photonics in silicon,” Appl. Phys. Lett. 88, 121108 (2006).
[Crossref]
P. Koonath, K. Kishima, T. Indukuri, and B. Jalali, “Sculpting of three-dimensional nano-optical structures in silicon,” Appl. Phys. Letts. 83, 4909–4911 (2003).
[Crossref]
Y. Kuo, et al, “Strong quantum-confined stark effect in germanium quantum-well structures on silicon,” Nature 437, 1334–1336 (2005).
[Crossref]
[PubMed]
R. A. Soref, F. Namavar, E. Cortesi, L. Friedman, and R. Lareau, “Vertical 3D integration of silicon waveguides in a Si-SiO2-Si-SiO2-Si structure,” Proc SPIE 1389, 408–421 (1990).
[Crossref]
T. K. Liang and H. K. Hsang, “Role of free carriers from two-photon absorption in Raman amplification in silicon-on-insulator waveguides,” Appl. Phys. Letts. 84, 2745–2747 (2004).
[Crossref]
Q. Xu, B. Schmidt, S. Pradhan, and M. Lipson, “Micrometre-scale silicon electro-optic modulator,” Nature 435, 325–327 (2005).
[Crossref]
[PubMed]
Y. A. Vlasov and S. J. McNab, “Losses in single-mode silicon-on-insulator strip waveguides and bends,” Opt. Express 21, 1622–1631 (2004).
[Crossref]
A. Polman, B. Min, J. Kalkman, T. J. Kippenberg, and K. Vahala, “Ultralow-threshold erbium-implanted toroidal microlaser on silicon,” Appl. Phys. Lett. 84, 1037–1039 (2004).
[Crossref]
R. A. Soref, F. Namavar, E. Cortesi, L. Friedman, and R. Lareau, “Vertical 3D integration of silicon waveguides in a Si-SiO2-Si-SiO2-Si structure,” Proc SPIE 1389, 408–421 (1990).
[Crossref]
H. Ono and A. Ogura, “Evaulation of buried oxide formation in low dose SIMOX,” Appl. Surf. Sci. 159–160, 104–110(2000).
H. Ono and A. Ogura, “Evaulation of buried oxide formation in low dose SIMOX,” Appl. Surf. Sci. 159–160, 104–110(2000).
X. Chen, N. C. Panoiu, and R. M. Osgood, “Theory of Raman-mediated pulse amplification in silicon wire waveguides,” IEEE J. of Quantum Electron. 42, 160–170 (2006).
[Crossref]
M. Borselli, K. Srinivasan, P. Barclay, and O. Painter, “Rayleigh scattering, mode coupling, and optical loss in silicon microdisks,” Appl. Phys. Lett. 85, 3693–3695 (2004).
[Crossref]
X. Chen, N. C. Panoiu, and R. M. Osgood, “Theory of Raman-mediated pulse amplification in silicon wire waveguides,” IEEE J. of Quantum Electron. 42, 160–170 (2006).
[Crossref]
A. Polman, B. Min, J. Kalkman, T. J. Kippenberg, and K. Vahala, “Ultralow-threshold erbium-implanted toroidal microlaser on silicon,” Appl. Phys. Lett. 84, 1037–1039 (2004).
[Crossref]
Q. Xu, B. Schmidt, S. Pradhan, and M. Lipson, “Micrometre-scale silicon electro-optic modulator,” Nature 435, 325–327 (2005).
[Crossref]
[PubMed]
H. Rong, et. al, “Low-threshold continuous-wave Raman silicon laser,” Nat. Photonics 1, 232 – 237 (2007).
[Crossref]
Q. Xu, B. Schmidt, S. Pradhan, and M. Lipson, “Micrometre-scale silicon electro-optic modulator,” Nature 435, 325–327 (2005).
[Crossref]
[PubMed]
F. Xia, L. Sekaric, and Y. Vlasov, “Ultracompact optical buffers on a silicon chip,” Nat. Photonics 1, 65–71 (2006).
[Crossref]
R. A. Soref, F. Namavar, E. Cortesi, L. Friedman, and R. Lareau, “Vertical 3D integration of silicon waveguides in a Si-SiO2-Si-SiO2-Si structure,” Proc SPIE 1389, 408–421 (1990).
[Crossref]
M. Borselli, K. Srinivasan, P. Barclay, and O. Painter, “Rayleigh scattering, mode coupling, and optical loss in silicon microdisks,” Appl. Phys. Lett. 85, 3693–3695 (2004).
[Crossref]
T. Tsuchizawa, et al., “Microphotonics devices based on silicon microfabrication technology,” EEE J. Sel. Top. Quantum Electron. 11, 232–240 (2005).
[Crossref]
S. Tyagi, et al. “A 65nm ultra low power logic platform technology using Uni-axial strained silicon transistors,” IEEE IEDM Tech. Digest245–247 (2005).
[Crossref]
A. Polman, B. Min, J. Kalkman, T. J. Kippenberg, and K. Vahala, “Ultralow-threshold erbium-implanted toroidal microlaser on silicon,” Appl. Phys. Lett. 84, 1037–1039 (2004).
[Crossref]
F. Xia, L. Sekaric, and Y. Vlasov, “Ultracompact optical buffers on a silicon chip,” Nat. Photonics 1, 65–71 (2006).
[Crossref]
Y. A. Vlasov and S. J. McNab, “Losses in single-mode silicon-on-insulator strip waveguides and bends,” Opt. Express 21, 1622–1631 (2004).
[Crossref]
F. Xia, L. Sekaric, and Y. Vlasov, “Ultracompact optical buffers on a silicon chip,” Nat. Photonics 1, 65–71 (2006).
[Crossref]
Q. Xu, B. Schmidt, S. Pradhan, and M. Lipson, “Micrometre-scale silicon electro-optic modulator,” Nature 435, 325–327 (2005).
[Crossref]
[PubMed]
A. Polman, B. Min, J. Kalkman, T. J. Kippenberg, and K. Vahala, “Ultralow-threshold erbium-implanted toroidal microlaser on silicon,” Appl. Phys. Lett. 84, 1037–1039 (2004).
[Crossref]
M. Borselli, K. Srinivasan, P. Barclay, and O. Painter, “Rayleigh scattering, mode coupling, and optical loss in silicon microdisks,” Appl. Phys. Lett. 85, 3693–3695 (2004).
[Crossref]
T. Indukuri, P. Koonath, and B. Jalali, “Three-dimensional integration of metal-oxide-semiconductor transistor with subterranean photonics in silicon,” Appl. Phys. Lett. 88, 121108 (2006).
[Crossref]
T. K. Liang and H. K. Hsang, “Role of free carriers from two-photon absorption in Raman amplification in silicon-on-insulator waveguides,” Appl. Phys. Letts. 84, 2745–2747 (2004).
[Crossref]
P. Koonath, K. Kishima, T. Indukuri, and B. Jalali, “Sculpting of three-dimensional nano-optical structures in silicon,” Appl. Phys. Letts. 83, 4909–4911 (2003).
[Crossref]
M. Chen, et. al, “Dose-energy match for the formation of high-integrity buried oxide layers in low-dose separation-by-implantation-of-oxygen materials,” Appl. Phys. Letts. 80, 880–82 (2002).
[Crossref]
H. Ono and A. Ogura, “Evaulation of buried oxide formation in low dose SIMOX,” Appl. Surf. Sci. 159–160, 104–110(2000).
T. Tsuchizawa, et al., “Microphotonics devices based on silicon microfabrication technology,” EEE J. Sel. Top. Quantum Electron. 11, 232–240 (2005).
[Crossref]
W. R. Davis, et al., “Demystifying 3D ICs: The pros and cons of going vertical,” IEEE Design and Test of Computers 22, 498–510 (2005).
[Crossref]
A. Fazio, “A high density high performance 180nm generation EtoxTM flash memory technology,” IEEE IEDM Tech. Digest267–270 (1999).
S. Tyagi, et al. “A 65nm ultra low power logic platform technology using Uni-axial strained silicon transistors,” IEEE IEDM Tech. Digest245–247 (2005).
[Crossref]
X. Chen, N. C. Panoiu, and R. M. Osgood, “Theory of Raman-mediated pulse amplification in silicon wire waveguides,” IEEE J. of Quantum Electron. 42, 160–170 (2006).
[Crossref]
P. Dumon, et al. “Low-loss SOI photonic wires and ring resonators fabricated with deep UV lithography,” IEEE Photon. Technol. Lett. 16, 1328–1330 (2004).
[Crossref]
K. Jia, et al, “Silicon-on-insulator-based optical demultiplexer employing turning-mirror-integrated arrayed-waveguide grating,” IEEE Photon. Technol. Lett. 17, 378–380 (2005).
[Crossref]
M. Hochberg, et al., “Terahertz All-Optical Modulation in Silicon-Polymer Hybrid System,” Nat. Mater. 5, 703 – 709 (2006).
[Crossref]
[PubMed]
F. Xia, L. Sekaric, and Y. Vlasov, “Ultracompact optical buffers on a silicon chip,” Nat. Photonics 1, 65–71 (2006).
[Crossref]
H. Rong, et. al, “Low-threshold continuous-wave Raman silicon laser,” Nat. Photonics 1, 232 – 237 (2007).
[Crossref]
Q. Xu, B. Schmidt, S. Pradhan, and M. Lipson, “Micrometre-scale silicon electro-optic modulator,” Nature 435, 325–327 (2005).
[Crossref]
[PubMed]
Y. Kuo, et al, “Strong quantum-confined stark effect in germanium quantum-well structures on silicon,” Nature 437, 1334–1336 (2005).
[Crossref]
[PubMed]
R. A. Soref, F. Namavar, E. Cortesi, L. Friedman, and R. Lareau, “Vertical 3D integration of silicon waveguides in a Si-SiO2-Si-SiO2-Si structure,” Proc SPIE 1389, 408–421 (1990).
[Crossref]
L. C. Kimerling, et.al, “Electronic-Photonic integrated circuits on the CMOS platform,” Proc. SPIE 6125, 612502–1–10 (2006).
[Crossref]