Abstract

Abstract

Single layers and antireflection films were deposited by electron beam evaporation, ion assisted deposition and interrupted ion assisted deposition, respectively. Antireflection film of quite high laser damage threshold (18J/cm2) deposited by interrupted ion assisted deposition were got. The electric field distribution, weak absorption, and residual stress of films and their relations to damage threshold were investigated. It was shown that the laser induced damage threshold of film was the result of competition of disadvantages and advantages, and interrupted ion assisted deposition was one of the valuable methods for preparing high laser induced damage threshold films.

© 2007 Optical Society of America

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  1. M. Alvisia, M. D. Giulioa, S. G. Marroneb, M. R. Perronec, M. L. Protopapac, A. Valentinib, and L. Vasanellia, "HfO2 films with high laser damage threshold," Thin Solid Films 358, 250-258 (2000).
    [CrossRef]
  2. Y. Zhao, Y. Wang, H. Gong, J. Shao, and Z. Fan, "Annealing effects on structure and laser-induced damage threshold of Ta2O5/SiO2 dielectric mirrors," Appl. Surf. Sci. 210, 353-358 (2003).
    [CrossRef]
  3. Y. Zhao, T. Wang, D. Zhang, J. Shao and Z. Fan, "Laser conditioning and multi-shot laser damage accumulation effects of HfO2/SiO2 anti-reflective films," Appl. Surf. Sci. 245,335-339 (2005).
    [CrossRef]
  4. P. J. Martin, "Review of ion-based methods for optical film deposition," J. Mater. Sci. 21, 1-25 (1986).
    [CrossRef]
  5. M. Alvisi, F. D. Tomasi, M. R. Perrone, M. L. Protopapa, A. Rizzo, F. Sarto and S. Scaglione, "Laser damage dependence on structural and optical properties of ion-assisted HfO2 thin films," Thin Solid Films 396, 44-52 (2001).
    [CrossRef]
  6. R. R. Manory, T. Mori, I. Shimizu, S. Miyake and G. Kimmel, "Growth and structure control of HfO2-x films with cubic and tetragonal structures obtained by ion beam assisted deposition," J. Vac. Sci. Technol. A 20, 549-554 (2002).
  7. C. J. Stolz, F. Y. Genin and M. R. Kozlowski, "Influence of microstructure on laser damage threshold of IBS films," Proc. SPIE 2714, 351-359 (1996).
    [CrossRef]
  8. N. J. Bazin, J. E. Andrew, H. A. McInnes, and A. J. Morris, "Temperature effects on the LIDT of single- and multilayer sol-gel-derived thin film films," Proc. SPIE 4347, 127-138 (2000).
    [CrossRef]
  9. B. Andre, L. Poupinet and G. Ravel, "Evaporation and ion assisted deposition of HfO2 films- some key points for high power laser applications," J. Vac. Sci.Technol. A 18, 2372-2377 (2000).
  10. S. Wu and N. J. Dovichi, "Fresnel diffraction theory for steady-state thermal lens measurements in thin films," J. Appl. Phys. 67, 1170-1182 (1990).
    [CrossRef]
  11. S. Fan, H. He, J. Shao, Z. Fan, and D. Zhang, "Absorption measurement for films using surface thermal lensing technique," Proc. SPIE 5774, 531-534 (2004)
    [CrossRef]
  12. S. Shao, J. Shao, H. He, and Z. Fan, "Stress analysis of ZrO2/SiO2 multilayers deposited on different substrates with different thickness periods," Opt. Lett. 30, 2119-2121 (2005).
    [PubMed]
  13. ISO 11254-1:2000: Lasers and laser-related equipment -- Determination of laser-induced damage threshold of optical surfaces -- Part 1: 1-on-1 test
  14. W. Gao, W. Zhang, S. Fan, D. Zhang, J. Shao, and Z. Fan, "Effects of the Structure of HfO2 Thin Films on Its Laser-induced Damage Threshold," Acta Photonica Sin. 34, 176-179 (2005).

2005 (3)

Y. Zhao, T. Wang, D. Zhang, J. Shao and Z. Fan, "Laser conditioning and multi-shot laser damage accumulation effects of HfO2/SiO2 anti-reflective films," Appl. Surf. Sci. 245,335-339 (2005).
[CrossRef]

W. Gao, W. Zhang, S. Fan, D. Zhang, J. Shao, and Z. Fan, "Effects of the Structure of HfO2 Thin Films on Its Laser-induced Damage Threshold," Acta Photonica Sin. 34, 176-179 (2005).

S. Shao, J. Shao, H. He, and Z. Fan, "Stress analysis of ZrO2/SiO2 multilayers deposited on different substrates with different thickness periods," Opt. Lett. 30, 2119-2121 (2005).
[PubMed]

2004 (1)

S. Fan, H. He, J. Shao, Z. Fan, and D. Zhang, "Absorption measurement for films using surface thermal lensing technique," Proc. SPIE 5774, 531-534 (2004)
[CrossRef]

2003 (1)

Y. Zhao, Y. Wang, H. Gong, J. Shao, and Z. Fan, "Annealing effects on structure and laser-induced damage threshold of Ta2O5/SiO2 dielectric mirrors," Appl. Surf. Sci. 210, 353-358 (2003).
[CrossRef]

2002 (1)

R. R. Manory, T. Mori, I. Shimizu, S. Miyake and G. Kimmel, "Growth and structure control of HfO2-x films with cubic and tetragonal structures obtained by ion beam assisted deposition," J. Vac. Sci. Technol. A 20, 549-554 (2002).

2001 (1)

M. Alvisi, F. D. Tomasi, M. R. Perrone, M. L. Protopapa, A. Rizzo, F. Sarto and S. Scaglione, "Laser damage dependence on structural and optical properties of ion-assisted HfO2 thin films," Thin Solid Films 396, 44-52 (2001).
[CrossRef]

2000 (3)

N. J. Bazin, J. E. Andrew, H. A. McInnes, and A. J. Morris, "Temperature effects on the LIDT of single- and multilayer sol-gel-derived thin film films," Proc. SPIE 4347, 127-138 (2000).
[CrossRef]

B. Andre, L. Poupinet and G. Ravel, "Evaporation and ion assisted deposition of HfO2 films- some key points for high power laser applications," J. Vac. Sci.Technol. A 18, 2372-2377 (2000).

M. Alvisia, M. D. Giulioa, S. G. Marroneb, M. R. Perronec, M. L. Protopapac, A. Valentinib, and L. Vasanellia, "HfO2 films with high laser damage threshold," Thin Solid Films 358, 250-258 (2000).
[CrossRef]

1996 (1)

C. J. Stolz, F. Y. Genin and M. R. Kozlowski, "Influence of microstructure on laser damage threshold of IBS films," Proc. SPIE 2714, 351-359 (1996).
[CrossRef]

1990 (1)

S. Wu and N. J. Dovichi, "Fresnel diffraction theory for steady-state thermal lens measurements in thin films," J. Appl. Phys. 67, 1170-1182 (1990).
[CrossRef]

1986 (1)

P. J. Martin, "Review of ion-based methods for optical film deposition," J. Mater. Sci. 21, 1-25 (1986).
[CrossRef]

Alvisi, M.

M. Alvisi, F. D. Tomasi, M. R. Perrone, M. L. Protopapa, A. Rizzo, F. Sarto and S. Scaglione, "Laser damage dependence on structural and optical properties of ion-assisted HfO2 thin films," Thin Solid Films 396, 44-52 (2001).
[CrossRef]

Alvisia, M.

M. Alvisia, M. D. Giulioa, S. G. Marroneb, M. R. Perronec, M. L. Protopapac, A. Valentinib, and L. Vasanellia, "HfO2 films with high laser damage threshold," Thin Solid Films 358, 250-258 (2000).
[CrossRef]

Andre, B.

B. Andre, L. Poupinet and G. Ravel, "Evaporation and ion assisted deposition of HfO2 films- some key points for high power laser applications," J. Vac. Sci.Technol. A 18, 2372-2377 (2000).

Andrew, J. E.

N. J. Bazin, J. E. Andrew, H. A. McInnes, and A. J. Morris, "Temperature effects on the LIDT of single- and multilayer sol-gel-derived thin film films," Proc. SPIE 4347, 127-138 (2000).
[CrossRef]

Bazin, N. J.

N. J. Bazin, J. E. Andrew, H. A. McInnes, and A. J. Morris, "Temperature effects on the LIDT of single- and multilayer sol-gel-derived thin film films," Proc. SPIE 4347, 127-138 (2000).
[CrossRef]

Dovichi, N. J.

S. Wu and N. J. Dovichi, "Fresnel diffraction theory for steady-state thermal lens measurements in thin films," J. Appl. Phys. 67, 1170-1182 (1990).
[CrossRef]

Fan, S.

W. Gao, W. Zhang, S. Fan, D. Zhang, J. Shao, and Z. Fan, "Effects of the Structure of HfO2 Thin Films on Its Laser-induced Damage Threshold," Acta Photonica Sin. 34, 176-179 (2005).

S. Fan, H. He, J. Shao, Z. Fan, and D. Zhang, "Absorption measurement for films using surface thermal lensing technique," Proc. SPIE 5774, 531-534 (2004)
[CrossRef]

Fan, Z.

W. Gao, W. Zhang, S. Fan, D. Zhang, J. Shao, and Z. Fan, "Effects of the Structure of HfO2 Thin Films on Its Laser-induced Damage Threshold," Acta Photonica Sin. 34, 176-179 (2005).

S. Shao, J. Shao, H. He, and Z. Fan, "Stress analysis of ZrO2/SiO2 multilayers deposited on different substrates with different thickness periods," Opt. Lett. 30, 2119-2121 (2005).
[PubMed]

Y. Zhao, T. Wang, D. Zhang, J. Shao and Z. Fan, "Laser conditioning and multi-shot laser damage accumulation effects of HfO2/SiO2 anti-reflective films," Appl. Surf. Sci. 245,335-339 (2005).
[CrossRef]

S. Fan, H. He, J. Shao, Z. Fan, and D. Zhang, "Absorption measurement for films using surface thermal lensing technique," Proc. SPIE 5774, 531-534 (2004)
[CrossRef]

Y. Zhao, Y. Wang, H. Gong, J. Shao, and Z. Fan, "Annealing effects on structure and laser-induced damage threshold of Ta2O5/SiO2 dielectric mirrors," Appl. Surf. Sci. 210, 353-358 (2003).
[CrossRef]

Gao, W.

W. Gao, W. Zhang, S. Fan, D. Zhang, J. Shao, and Z. Fan, "Effects of the Structure of HfO2 Thin Films on Its Laser-induced Damage Threshold," Acta Photonica Sin. 34, 176-179 (2005).

Genin, F. Y.

C. J. Stolz, F. Y. Genin and M. R. Kozlowski, "Influence of microstructure on laser damage threshold of IBS films," Proc. SPIE 2714, 351-359 (1996).
[CrossRef]

Giulioa, M. D.

M. Alvisia, M. D. Giulioa, S. G. Marroneb, M. R. Perronec, M. L. Protopapac, A. Valentinib, and L. Vasanellia, "HfO2 films with high laser damage threshold," Thin Solid Films 358, 250-258 (2000).
[CrossRef]

Gong, H.

Y. Zhao, Y. Wang, H. Gong, J. Shao, and Z. Fan, "Annealing effects on structure and laser-induced damage threshold of Ta2O5/SiO2 dielectric mirrors," Appl. Surf. Sci. 210, 353-358 (2003).
[CrossRef]

He, H.

S. Shao, J. Shao, H. He, and Z. Fan, "Stress analysis of ZrO2/SiO2 multilayers deposited on different substrates with different thickness periods," Opt. Lett. 30, 2119-2121 (2005).
[PubMed]

S. Fan, H. He, J. Shao, Z. Fan, and D. Zhang, "Absorption measurement for films using surface thermal lensing technique," Proc. SPIE 5774, 531-534 (2004)
[CrossRef]

Kimmel, G.

R. R. Manory, T. Mori, I. Shimizu, S. Miyake and G. Kimmel, "Growth and structure control of HfO2-x films with cubic and tetragonal structures obtained by ion beam assisted deposition," J. Vac. Sci. Technol. A 20, 549-554 (2002).

Kozlowski, M. R.

C. J. Stolz, F. Y. Genin and M. R. Kozlowski, "Influence of microstructure on laser damage threshold of IBS films," Proc. SPIE 2714, 351-359 (1996).
[CrossRef]

Manory, R. R.

R. R. Manory, T. Mori, I. Shimizu, S. Miyake and G. Kimmel, "Growth and structure control of HfO2-x films with cubic and tetragonal structures obtained by ion beam assisted deposition," J. Vac. Sci. Technol. A 20, 549-554 (2002).

Marroneb, S. G.

M. Alvisia, M. D. Giulioa, S. G. Marroneb, M. R. Perronec, M. L. Protopapac, A. Valentinib, and L. Vasanellia, "HfO2 films with high laser damage threshold," Thin Solid Films 358, 250-258 (2000).
[CrossRef]

Martin, P. J.

P. J. Martin, "Review of ion-based methods for optical film deposition," J. Mater. Sci. 21, 1-25 (1986).
[CrossRef]

McInnes, H. A.

N. J. Bazin, J. E. Andrew, H. A. McInnes, and A. J. Morris, "Temperature effects on the LIDT of single- and multilayer sol-gel-derived thin film films," Proc. SPIE 4347, 127-138 (2000).
[CrossRef]

Miyake, S.

R. R. Manory, T. Mori, I. Shimizu, S. Miyake and G. Kimmel, "Growth and structure control of HfO2-x films with cubic and tetragonal structures obtained by ion beam assisted deposition," J. Vac. Sci. Technol. A 20, 549-554 (2002).

Mori, T.

R. R. Manory, T. Mori, I. Shimizu, S. Miyake and G. Kimmel, "Growth and structure control of HfO2-x films with cubic and tetragonal structures obtained by ion beam assisted deposition," J. Vac. Sci. Technol. A 20, 549-554 (2002).

Morris, A. J.

N. J. Bazin, J. E. Andrew, H. A. McInnes, and A. J. Morris, "Temperature effects on the LIDT of single- and multilayer sol-gel-derived thin film films," Proc. SPIE 4347, 127-138 (2000).
[CrossRef]

Perrone, M. R.

M. Alvisi, F. D. Tomasi, M. R. Perrone, M. L. Protopapa, A. Rizzo, F. Sarto and S. Scaglione, "Laser damage dependence on structural and optical properties of ion-assisted HfO2 thin films," Thin Solid Films 396, 44-52 (2001).
[CrossRef]

Perronec, M. R.

M. Alvisia, M. D. Giulioa, S. G. Marroneb, M. R. Perronec, M. L. Protopapac, A. Valentinib, and L. Vasanellia, "HfO2 films with high laser damage threshold," Thin Solid Films 358, 250-258 (2000).
[CrossRef]

Poupinet, L.

B. Andre, L. Poupinet and G. Ravel, "Evaporation and ion assisted deposition of HfO2 films- some key points for high power laser applications," J. Vac. Sci.Technol. A 18, 2372-2377 (2000).

Protopapa, M. L.

M. Alvisi, F. D. Tomasi, M. R. Perrone, M. L. Protopapa, A. Rizzo, F. Sarto and S. Scaglione, "Laser damage dependence on structural and optical properties of ion-assisted HfO2 thin films," Thin Solid Films 396, 44-52 (2001).
[CrossRef]

Protopapac, M. L.

M. Alvisia, M. D. Giulioa, S. G. Marroneb, M. R. Perronec, M. L. Protopapac, A. Valentinib, and L. Vasanellia, "HfO2 films with high laser damage threshold," Thin Solid Films 358, 250-258 (2000).
[CrossRef]

Ravel, G.

B. Andre, L. Poupinet and G. Ravel, "Evaporation and ion assisted deposition of HfO2 films- some key points for high power laser applications," J. Vac. Sci.Technol. A 18, 2372-2377 (2000).

Rizzo, A.

M. Alvisi, F. D. Tomasi, M. R. Perrone, M. L. Protopapa, A. Rizzo, F. Sarto and S. Scaglione, "Laser damage dependence on structural and optical properties of ion-assisted HfO2 thin films," Thin Solid Films 396, 44-52 (2001).
[CrossRef]

Sarto, F.

M. Alvisi, F. D. Tomasi, M. R. Perrone, M. L. Protopapa, A. Rizzo, F. Sarto and S. Scaglione, "Laser damage dependence on structural and optical properties of ion-assisted HfO2 thin films," Thin Solid Films 396, 44-52 (2001).
[CrossRef]

Scaglione, S.

M. Alvisi, F. D. Tomasi, M. R. Perrone, M. L. Protopapa, A. Rizzo, F. Sarto and S. Scaglione, "Laser damage dependence on structural and optical properties of ion-assisted HfO2 thin films," Thin Solid Films 396, 44-52 (2001).
[CrossRef]

Shao, J.

Y. Zhao, T. Wang, D. Zhang, J. Shao and Z. Fan, "Laser conditioning and multi-shot laser damage accumulation effects of HfO2/SiO2 anti-reflective films," Appl. Surf. Sci. 245,335-339 (2005).
[CrossRef]

W. Gao, W. Zhang, S. Fan, D. Zhang, J. Shao, and Z. Fan, "Effects of the Structure of HfO2 Thin Films on Its Laser-induced Damage Threshold," Acta Photonica Sin. 34, 176-179 (2005).

S. Shao, J. Shao, H. He, and Z. Fan, "Stress analysis of ZrO2/SiO2 multilayers deposited on different substrates with different thickness periods," Opt. Lett. 30, 2119-2121 (2005).
[PubMed]

S. Fan, H. He, J. Shao, Z. Fan, and D. Zhang, "Absorption measurement for films using surface thermal lensing technique," Proc. SPIE 5774, 531-534 (2004)
[CrossRef]

Y. Zhao, Y. Wang, H. Gong, J. Shao, and Z. Fan, "Annealing effects on structure and laser-induced damage threshold of Ta2O5/SiO2 dielectric mirrors," Appl. Surf. Sci. 210, 353-358 (2003).
[CrossRef]

Shao, S.

Shimizu, I.

R. R. Manory, T. Mori, I. Shimizu, S. Miyake and G. Kimmel, "Growth and structure control of HfO2-x films with cubic and tetragonal structures obtained by ion beam assisted deposition," J. Vac. Sci. Technol. A 20, 549-554 (2002).

Stolz, C. J.

C. J. Stolz, F. Y. Genin and M. R. Kozlowski, "Influence of microstructure on laser damage threshold of IBS films," Proc. SPIE 2714, 351-359 (1996).
[CrossRef]

Tomasi, F. D.

M. Alvisi, F. D. Tomasi, M. R. Perrone, M. L. Protopapa, A. Rizzo, F. Sarto and S. Scaglione, "Laser damage dependence on structural and optical properties of ion-assisted HfO2 thin films," Thin Solid Films 396, 44-52 (2001).
[CrossRef]

Valentinib, A.

M. Alvisia, M. D. Giulioa, S. G. Marroneb, M. R. Perronec, M. L. Protopapac, A. Valentinib, and L. Vasanellia, "HfO2 films with high laser damage threshold," Thin Solid Films 358, 250-258 (2000).
[CrossRef]

Vasanellia, L.

M. Alvisia, M. D. Giulioa, S. G. Marroneb, M. R. Perronec, M. L. Protopapac, A. Valentinib, and L. Vasanellia, "HfO2 films with high laser damage threshold," Thin Solid Films 358, 250-258 (2000).
[CrossRef]

Wang, T.

Y. Zhao, T. Wang, D. Zhang, J. Shao and Z. Fan, "Laser conditioning and multi-shot laser damage accumulation effects of HfO2/SiO2 anti-reflective films," Appl. Surf. Sci. 245,335-339 (2005).
[CrossRef]

Wang, Y.

Y. Zhao, Y. Wang, H. Gong, J. Shao, and Z. Fan, "Annealing effects on structure and laser-induced damage threshold of Ta2O5/SiO2 dielectric mirrors," Appl. Surf. Sci. 210, 353-358 (2003).
[CrossRef]

Wu, S.

S. Wu and N. J. Dovichi, "Fresnel diffraction theory for steady-state thermal lens measurements in thin films," J. Appl. Phys. 67, 1170-1182 (1990).
[CrossRef]

Zhang, D.

W. Gao, W. Zhang, S. Fan, D. Zhang, J. Shao, and Z. Fan, "Effects of the Structure of HfO2 Thin Films on Its Laser-induced Damage Threshold," Acta Photonica Sin. 34, 176-179 (2005).

Y. Zhao, T. Wang, D. Zhang, J. Shao and Z. Fan, "Laser conditioning and multi-shot laser damage accumulation effects of HfO2/SiO2 anti-reflective films," Appl. Surf. Sci. 245,335-339 (2005).
[CrossRef]

S. Fan, H. He, J. Shao, Z. Fan, and D. Zhang, "Absorption measurement for films using surface thermal lensing technique," Proc. SPIE 5774, 531-534 (2004)
[CrossRef]

Zhang, W.

W. Gao, W. Zhang, S. Fan, D. Zhang, J. Shao, and Z. Fan, "Effects of the Structure of HfO2 Thin Films on Its Laser-induced Damage Threshold," Acta Photonica Sin. 34, 176-179 (2005).

Zhao, Y.

Y. Zhao, T. Wang, D. Zhang, J. Shao and Z. Fan, "Laser conditioning and multi-shot laser damage accumulation effects of HfO2/SiO2 anti-reflective films," Appl. Surf. Sci. 245,335-339 (2005).
[CrossRef]

Y. Zhao, Y. Wang, H. Gong, J. Shao, and Z. Fan, "Annealing effects on structure and laser-induced damage threshold of Ta2O5/SiO2 dielectric mirrors," Appl. Surf. Sci. 210, 353-358 (2003).
[CrossRef]

Acta Photonica Sin. (1)

W. Gao, W. Zhang, S. Fan, D. Zhang, J. Shao, and Z. Fan, "Effects of the Structure of HfO2 Thin Films on Its Laser-induced Damage Threshold," Acta Photonica Sin. 34, 176-179 (2005).

Appl. Surf. Sci. (2)

Y. Zhao, Y. Wang, H. Gong, J. Shao, and Z. Fan, "Annealing effects on structure and laser-induced damage threshold of Ta2O5/SiO2 dielectric mirrors," Appl. Surf. Sci. 210, 353-358 (2003).
[CrossRef]

Y. Zhao, T. Wang, D. Zhang, J. Shao and Z. Fan, "Laser conditioning and multi-shot laser damage accumulation effects of HfO2/SiO2 anti-reflective films," Appl. Surf. Sci. 245,335-339 (2005).
[CrossRef]

J. Appl. Phys. (1)

S. Wu and N. J. Dovichi, "Fresnel diffraction theory for steady-state thermal lens measurements in thin films," J. Appl. Phys. 67, 1170-1182 (1990).
[CrossRef]

J. Mater. Sci. (1)

P. J. Martin, "Review of ion-based methods for optical film deposition," J. Mater. Sci. 21, 1-25 (1986).
[CrossRef]

J. Vac. Sci. Technol. A (1)

R. R. Manory, T. Mori, I. Shimizu, S. Miyake and G. Kimmel, "Growth and structure control of HfO2-x films with cubic and tetragonal structures obtained by ion beam assisted deposition," J. Vac. Sci. Technol. A 20, 549-554 (2002).

J.Vac. Sci.Technol. A (1)

B. Andre, L. Poupinet and G. Ravel, "Evaporation and ion assisted deposition of HfO2 films- some key points for high power laser applications," J. Vac. Sci.Technol. A 18, 2372-2377 (2000).

Opt. Lett. (1)

Proc. SPIE (3)

S. Fan, H. He, J. Shao, Z. Fan, and D. Zhang, "Absorption measurement for films using surface thermal lensing technique," Proc. SPIE 5774, 531-534 (2004)
[CrossRef]

C. J. Stolz, F. Y. Genin and M. R. Kozlowski, "Influence of microstructure on laser damage threshold of IBS films," Proc. SPIE 2714, 351-359 (1996).
[CrossRef]

N. J. Bazin, J. E. Andrew, H. A. McInnes, and A. J. Morris, "Temperature effects on the LIDT of single- and multilayer sol-gel-derived thin film films," Proc. SPIE 4347, 127-138 (2000).
[CrossRef]

Thin Solid Films (2)

M. Alvisia, M. D. Giulioa, S. G. Marroneb, M. R. Perronec, M. L. Protopapac, A. Valentinib, and L. Vasanellia, "HfO2 films with high laser damage threshold," Thin Solid Films 358, 250-258 (2000).
[CrossRef]

M. Alvisi, F. D. Tomasi, M. R. Perrone, M. L. Protopapa, A. Rizzo, F. Sarto and S. Scaglione, "Laser damage dependence on structural and optical properties of ion-assisted HfO2 thin films," Thin Solid Films 396, 44-52 (2001).
[CrossRef]

Other (1)

ISO 11254-1:2000: Lasers and laser-related equipment -- Determination of laser-induced damage threshold of optical surfaces -- Part 1: 1-on-1 test

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Figures (5)

Fig. 1.
Fig. 1.

The electric field distribution of single layers

Fig. 2.
Fig. 2.

The electric field distribution of antireflection film

Fig. 3.
Fig. 3.

Weak absorption of samples deposited by electron beam evaporation (full squares) and IBAD or IIAD (open squares).

Fig. 4.
Fig. 4.

Residual stress of samples

Fig. 5.
Fig. 5.

LIDTs of samples

Tables (1)

Tables Icon

Table.1 Preparation parameters of samples

Metrics