Abstract

Fused silica gratings with periods of 154 nm, 266 nm, and 550 nm have been fabricated by the method of two-beam interferometric laser induced backside wet etching (TWIN-LIBWE). The spatially filtered pulses at 266nm were splitted into two parts and interfered at an incident angle of 60°, 30°, and 14°, respectively, on the backside surface of a fused silica plate contacting with the liquid absorber. The morphology of the etched gratings was characterized by atomic force microscope. According to our knowledge, the produced 154 nm period is the smallest grating constant generated by laser techniques directly in fused silica at present.

© 2006 Optical Society of America

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  1. J. Wang, H. Niino, and A. Yabe, "One-step microfabrication of fused silica by laser ablation of an organic solution," Appl. Phys. A 68, 111-113 (1999).
    [CrossRef]
  2. K. Zimmer, A. Braun, and R. Böhme, "Etching of fused silica and glass with excimer laser at 351 nm," Appl. Surf. Sci. 208-209, 199-204 (2003).
    [CrossRef]
  3. G. Kopitkovas, T. Lippert, C. David, A. Wokaun, and J. Gobrecht, "Fabrication of micro-optical elements in quartz by laser induced backside wet etching," Microelectron. Eng. 67-68, 438-444 (2003).
    [CrossRef]
  4. G. Kopitkovas, T. Lippert, C. David, A. Wokaun, and J. Gobrecht, "Surface micromachining of UV transparent materials," Thin Solid Films 453-454, 31-35 (2004).
    [CrossRef]
  5. Cs. Vass, B. Hopp, T. Smausz, and F. Ignácz, "Experiments and numerical calculations for the interpretation of the backside wet etching of fused silica," Thin Solid Films 453-454,121-126 (2004).
    [CrossRef]
  6. Cs. Vass, T. Smausz, and B. Hopp, J. Phys. D. "Wet etching of fused silica: a multiplex study," Appl. Phys. 37, 2449-2454 (2004).
  7. X. Ding, Y. Kawaguchi, H. Niino, and A. Yabe, "Laser-induced high-quality etching of fused silica using a novel aqueous medium," Appl. Phys. A 75 641-645 (2002).
    [CrossRef]
  8. H. Niino, Y. Yasui, X. Ding, A. Narazaki, T. Sato, Y. Kawaguchi, and A. Yabe, "Surface micro-fabrication of silica glass by excimer laser irradiation of organic solvent," J. Photochem. Photobiol. A: Chem. 158, 179-182 (2003).
    [CrossRef]
  9. X. Ding, Y. Kawaguchi, T. Sato, A. Narazaki, R. Kurosaki, and H. Niino, "Micron- and submicron-sized surface patterning of silica glass by LIBWE method," J. Photochem. Photobiol. A: Chem. 166, 129-133 (2004).
    [CrossRef]
  10. R. Böhme, D. Spemann, and K. Zimmer, "Surface characterization of backside-etched transparent dielectrics," Thin Solid Films 453-454, 127-132 (2004).
    [CrossRef]
  11. K. Zimmer, R. Böhme, A. Braun, B. Rauschenbach, and F. Bigl, "Excimer laser-induced etching of sub-micron surface relief gratings in fused silica using phase grating projection," Appl. Phys. A 74, 453-456 (2002).
    [CrossRef]
  12. R. Böhme, J. Zajadacz, K. Zimmer, and B. Rauschenbach, "Topography and roughness evolution of microstructured surfaces at laser-induced backside wet etching," Appl. Phys. A 80, 433-438 (2005).
    [CrossRef]
  13. J. Ihlemann, S. Müller, S. Puschmann, D. Schäfer, M. Wei, J. Li, and P. R. Herman, "Fabrication of submicron gratings in fused silica by F2-laser ablation," Appl. Phys. A 76, 751-753 (2003).
    [CrossRef]
  14. H. M. Phillips, D. L. Callahan, R. Sauerbrey, G. Szabó, and Z. Bor, "Sub-100 nm lines produced by direct laser ablation in polyimide," Appl. Phys. Lett. 58/24, 2761-2763 (1991).
    [CrossRef]
  15. Cs. Vass, K. Osvay, M. Csete, and B. Hopp, "Fabrication of 550 nm gratings in fused silica by laser induced backside wet etching technique," submitted to the Appl. Surf. Sci. (E-MRS 2006, Spring Meeting)

2005

R. Böhme, J. Zajadacz, K. Zimmer, and B. Rauschenbach, "Topography and roughness evolution of microstructured surfaces at laser-induced backside wet etching," Appl. Phys. A 80, 433-438 (2005).
[CrossRef]

2004

X. Ding, Y. Kawaguchi, T. Sato, A. Narazaki, R. Kurosaki, and H. Niino, "Micron- and submicron-sized surface patterning of silica glass by LIBWE method," J. Photochem. Photobiol. A: Chem. 166, 129-133 (2004).
[CrossRef]

R. Böhme, D. Spemann, and K. Zimmer, "Surface characterization of backside-etched transparent dielectrics," Thin Solid Films 453-454, 127-132 (2004).
[CrossRef]

G. Kopitkovas, T. Lippert, C. David, A. Wokaun, and J. Gobrecht, "Surface micromachining of UV transparent materials," Thin Solid Films 453-454, 31-35 (2004).
[CrossRef]

Cs. Vass, B. Hopp, T. Smausz, and F. Ignácz, "Experiments and numerical calculations for the interpretation of the backside wet etching of fused silica," Thin Solid Films 453-454,121-126 (2004).
[CrossRef]

Cs. Vass, T. Smausz, and B. Hopp, J. Phys. D. "Wet etching of fused silica: a multiplex study," Appl. Phys. 37, 2449-2454 (2004).

2003

K. Zimmer, A. Braun, and R. Böhme, "Etching of fused silica and glass with excimer laser at 351 nm," Appl. Surf. Sci. 208-209, 199-204 (2003).
[CrossRef]

G. Kopitkovas, T. Lippert, C. David, A. Wokaun, and J. Gobrecht, "Fabrication of micro-optical elements in quartz by laser induced backside wet etching," Microelectron. Eng. 67-68, 438-444 (2003).
[CrossRef]

H. Niino, Y. Yasui, X. Ding, A. Narazaki, T. Sato, Y. Kawaguchi, and A. Yabe, "Surface micro-fabrication of silica glass by excimer laser irradiation of organic solvent," J. Photochem. Photobiol. A: Chem. 158, 179-182 (2003).
[CrossRef]

J. Ihlemann, S. Müller, S. Puschmann, D. Schäfer, M. Wei, J. Li, and P. R. Herman, "Fabrication of submicron gratings in fused silica by F2-laser ablation," Appl. Phys. A 76, 751-753 (2003).
[CrossRef]

2002

K. Zimmer, R. Böhme, A. Braun, B. Rauschenbach, and F. Bigl, "Excimer laser-induced etching of sub-micron surface relief gratings in fused silica using phase grating projection," Appl. Phys. A 74, 453-456 (2002).
[CrossRef]

X. Ding, Y. Kawaguchi, H. Niino, and A. Yabe, "Laser-induced high-quality etching of fused silica using a novel aqueous medium," Appl. Phys. A 75 641-645 (2002).
[CrossRef]

1999

J. Wang, H. Niino, and A. Yabe, "One-step microfabrication of fused silica by laser ablation of an organic solution," Appl. Phys. A 68, 111-113 (1999).
[CrossRef]

1991

H. M. Phillips, D. L. Callahan, R. Sauerbrey, G. Szabó, and Z. Bor, "Sub-100 nm lines produced by direct laser ablation in polyimide," Appl. Phys. Lett. 58/24, 2761-2763 (1991).
[CrossRef]

Bigl, F.

K. Zimmer, R. Böhme, A. Braun, B. Rauschenbach, and F. Bigl, "Excimer laser-induced etching of sub-micron surface relief gratings in fused silica using phase grating projection," Appl. Phys. A 74, 453-456 (2002).
[CrossRef]

Böhme, R.

R. Böhme, J. Zajadacz, K. Zimmer, and B. Rauschenbach, "Topography and roughness evolution of microstructured surfaces at laser-induced backside wet etching," Appl. Phys. A 80, 433-438 (2005).
[CrossRef]

R. Böhme, D. Spemann, and K. Zimmer, "Surface characterization of backside-etched transparent dielectrics," Thin Solid Films 453-454, 127-132 (2004).
[CrossRef]

K. Zimmer, A. Braun, and R. Böhme, "Etching of fused silica and glass with excimer laser at 351 nm," Appl. Surf. Sci. 208-209, 199-204 (2003).
[CrossRef]

K. Zimmer, R. Böhme, A. Braun, B. Rauschenbach, and F. Bigl, "Excimer laser-induced etching of sub-micron surface relief gratings in fused silica using phase grating projection," Appl. Phys. A 74, 453-456 (2002).
[CrossRef]

Bor, Z.

H. M. Phillips, D. L. Callahan, R. Sauerbrey, G. Szabó, and Z. Bor, "Sub-100 nm lines produced by direct laser ablation in polyimide," Appl. Phys. Lett. 58/24, 2761-2763 (1991).
[CrossRef]

Braun, A.

K. Zimmer, A. Braun, and R. Böhme, "Etching of fused silica and glass with excimer laser at 351 nm," Appl. Surf. Sci. 208-209, 199-204 (2003).
[CrossRef]

K. Zimmer, R. Böhme, A. Braun, B. Rauschenbach, and F. Bigl, "Excimer laser-induced etching of sub-micron surface relief gratings in fused silica using phase grating projection," Appl. Phys. A 74, 453-456 (2002).
[CrossRef]

Callahan, D. L.

H. M. Phillips, D. L. Callahan, R. Sauerbrey, G. Szabó, and Z. Bor, "Sub-100 nm lines produced by direct laser ablation in polyimide," Appl. Phys. Lett. 58/24, 2761-2763 (1991).
[CrossRef]

David, C.

G. Kopitkovas, T. Lippert, C. David, A. Wokaun, and J. Gobrecht, "Surface micromachining of UV transparent materials," Thin Solid Films 453-454, 31-35 (2004).
[CrossRef]

G. Kopitkovas, T. Lippert, C. David, A. Wokaun, and J. Gobrecht, "Fabrication of micro-optical elements in quartz by laser induced backside wet etching," Microelectron. Eng. 67-68, 438-444 (2003).
[CrossRef]

Ding, X.

X. Ding, Y. Kawaguchi, T. Sato, A. Narazaki, R. Kurosaki, and H. Niino, "Micron- and submicron-sized surface patterning of silica glass by LIBWE method," J. Photochem. Photobiol. A: Chem. 166, 129-133 (2004).
[CrossRef]

H. Niino, Y. Yasui, X. Ding, A. Narazaki, T. Sato, Y. Kawaguchi, and A. Yabe, "Surface micro-fabrication of silica glass by excimer laser irradiation of organic solvent," J. Photochem. Photobiol. A: Chem. 158, 179-182 (2003).
[CrossRef]

X. Ding, Y. Kawaguchi, H. Niino, and A. Yabe, "Laser-induced high-quality etching of fused silica using a novel aqueous medium," Appl. Phys. A 75 641-645 (2002).
[CrossRef]

Gobrecht, J.

G. Kopitkovas, T. Lippert, C. David, A. Wokaun, and J. Gobrecht, "Surface micromachining of UV transparent materials," Thin Solid Films 453-454, 31-35 (2004).
[CrossRef]

G. Kopitkovas, T. Lippert, C. David, A. Wokaun, and J. Gobrecht, "Fabrication of micro-optical elements in quartz by laser induced backside wet etching," Microelectron. Eng. 67-68, 438-444 (2003).
[CrossRef]

Herman, P. R.

J. Ihlemann, S. Müller, S. Puschmann, D. Schäfer, M. Wei, J. Li, and P. R. Herman, "Fabrication of submicron gratings in fused silica by F2-laser ablation," Appl. Phys. A 76, 751-753 (2003).
[CrossRef]

Ihlemann, J.

J. Ihlemann, S. Müller, S. Puschmann, D. Schäfer, M. Wei, J. Li, and P. R. Herman, "Fabrication of submicron gratings in fused silica by F2-laser ablation," Appl. Phys. A 76, 751-753 (2003).
[CrossRef]

Kawaguchi, Y.

X. Ding, Y. Kawaguchi, T. Sato, A. Narazaki, R. Kurosaki, and H. Niino, "Micron- and submicron-sized surface patterning of silica glass by LIBWE method," J. Photochem. Photobiol. A: Chem. 166, 129-133 (2004).
[CrossRef]

H. Niino, Y. Yasui, X. Ding, A. Narazaki, T. Sato, Y. Kawaguchi, and A. Yabe, "Surface micro-fabrication of silica glass by excimer laser irradiation of organic solvent," J. Photochem. Photobiol. A: Chem. 158, 179-182 (2003).
[CrossRef]

X. Ding, Y. Kawaguchi, H. Niino, and A. Yabe, "Laser-induced high-quality etching of fused silica using a novel aqueous medium," Appl. Phys. A 75 641-645 (2002).
[CrossRef]

Kopitkovas, G.

G. Kopitkovas, T. Lippert, C. David, A. Wokaun, and J. Gobrecht, "Surface micromachining of UV transparent materials," Thin Solid Films 453-454, 31-35 (2004).
[CrossRef]

G. Kopitkovas, T. Lippert, C. David, A. Wokaun, and J. Gobrecht, "Fabrication of micro-optical elements in quartz by laser induced backside wet etching," Microelectron. Eng. 67-68, 438-444 (2003).
[CrossRef]

Kurosaki, R.

X. Ding, Y. Kawaguchi, T. Sato, A. Narazaki, R. Kurosaki, and H. Niino, "Micron- and submicron-sized surface patterning of silica glass by LIBWE method," J. Photochem. Photobiol. A: Chem. 166, 129-133 (2004).
[CrossRef]

Li, J.

J. Ihlemann, S. Müller, S. Puschmann, D. Schäfer, M. Wei, J. Li, and P. R. Herman, "Fabrication of submicron gratings in fused silica by F2-laser ablation," Appl. Phys. A 76, 751-753 (2003).
[CrossRef]

Lippert, T.

G. Kopitkovas, T. Lippert, C. David, A. Wokaun, and J. Gobrecht, "Surface micromachining of UV transparent materials," Thin Solid Films 453-454, 31-35 (2004).
[CrossRef]

G. Kopitkovas, T. Lippert, C. David, A. Wokaun, and J. Gobrecht, "Fabrication of micro-optical elements in quartz by laser induced backside wet etching," Microelectron. Eng. 67-68, 438-444 (2003).
[CrossRef]

Müller, S.

J. Ihlemann, S. Müller, S. Puschmann, D. Schäfer, M. Wei, J. Li, and P. R. Herman, "Fabrication of submicron gratings in fused silica by F2-laser ablation," Appl. Phys. A 76, 751-753 (2003).
[CrossRef]

Narazaki, A.

X. Ding, Y. Kawaguchi, T. Sato, A. Narazaki, R. Kurosaki, and H. Niino, "Micron- and submicron-sized surface patterning of silica glass by LIBWE method," J. Photochem. Photobiol. A: Chem. 166, 129-133 (2004).
[CrossRef]

H. Niino, Y. Yasui, X. Ding, A. Narazaki, T. Sato, Y. Kawaguchi, and A. Yabe, "Surface micro-fabrication of silica glass by excimer laser irradiation of organic solvent," J. Photochem. Photobiol. A: Chem. 158, 179-182 (2003).
[CrossRef]

Niino, H.

X. Ding, Y. Kawaguchi, T. Sato, A. Narazaki, R. Kurosaki, and H. Niino, "Micron- and submicron-sized surface patterning of silica glass by LIBWE method," J. Photochem. Photobiol. A: Chem. 166, 129-133 (2004).
[CrossRef]

H. Niino, Y. Yasui, X. Ding, A. Narazaki, T. Sato, Y. Kawaguchi, and A. Yabe, "Surface micro-fabrication of silica glass by excimer laser irradiation of organic solvent," J. Photochem. Photobiol. A: Chem. 158, 179-182 (2003).
[CrossRef]

X. Ding, Y. Kawaguchi, H. Niino, and A. Yabe, "Laser-induced high-quality etching of fused silica using a novel aqueous medium," Appl. Phys. A 75 641-645 (2002).
[CrossRef]

J. Wang, H. Niino, and A. Yabe, "One-step microfabrication of fused silica by laser ablation of an organic solution," Appl. Phys. A 68, 111-113 (1999).
[CrossRef]

Phillips, H. M.

H. M. Phillips, D. L. Callahan, R. Sauerbrey, G. Szabó, and Z. Bor, "Sub-100 nm lines produced by direct laser ablation in polyimide," Appl. Phys. Lett. 58/24, 2761-2763 (1991).
[CrossRef]

Puschmann, S.

J. Ihlemann, S. Müller, S. Puschmann, D. Schäfer, M. Wei, J. Li, and P. R. Herman, "Fabrication of submicron gratings in fused silica by F2-laser ablation," Appl. Phys. A 76, 751-753 (2003).
[CrossRef]

Rauschenbach, B.

R. Böhme, J. Zajadacz, K. Zimmer, and B. Rauschenbach, "Topography and roughness evolution of microstructured surfaces at laser-induced backside wet etching," Appl. Phys. A 80, 433-438 (2005).
[CrossRef]

K. Zimmer, R. Böhme, A. Braun, B. Rauschenbach, and F. Bigl, "Excimer laser-induced etching of sub-micron surface relief gratings in fused silica using phase grating projection," Appl. Phys. A 74, 453-456 (2002).
[CrossRef]

Sato, T.

X. Ding, Y. Kawaguchi, T. Sato, A. Narazaki, R. Kurosaki, and H. Niino, "Micron- and submicron-sized surface patterning of silica glass by LIBWE method," J. Photochem. Photobiol. A: Chem. 166, 129-133 (2004).
[CrossRef]

H. Niino, Y. Yasui, X. Ding, A. Narazaki, T. Sato, Y. Kawaguchi, and A. Yabe, "Surface micro-fabrication of silica glass by excimer laser irradiation of organic solvent," J. Photochem. Photobiol. A: Chem. 158, 179-182 (2003).
[CrossRef]

Sauerbrey, R.

H. M. Phillips, D. L. Callahan, R. Sauerbrey, G. Szabó, and Z. Bor, "Sub-100 nm lines produced by direct laser ablation in polyimide," Appl. Phys. Lett. 58/24, 2761-2763 (1991).
[CrossRef]

Schäfer, D.

J. Ihlemann, S. Müller, S. Puschmann, D. Schäfer, M. Wei, J. Li, and P. R. Herman, "Fabrication of submicron gratings in fused silica by F2-laser ablation," Appl. Phys. A 76, 751-753 (2003).
[CrossRef]

Spemann, D.

R. Böhme, D. Spemann, and K. Zimmer, "Surface characterization of backside-etched transparent dielectrics," Thin Solid Films 453-454, 127-132 (2004).
[CrossRef]

Szabó, G.

H. M. Phillips, D. L. Callahan, R. Sauerbrey, G. Szabó, and Z. Bor, "Sub-100 nm lines produced by direct laser ablation in polyimide," Appl. Phys. Lett. 58/24, 2761-2763 (1991).
[CrossRef]

Wang, J.

J. Wang, H. Niino, and A. Yabe, "One-step microfabrication of fused silica by laser ablation of an organic solution," Appl. Phys. A 68, 111-113 (1999).
[CrossRef]

Wei, M.

J. Ihlemann, S. Müller, S. Puschmann, D. Schäfer, M. Wei, J. Li, and P. R. Herman, "Fabrication of submicron gratings in fused silica by F2-laser ablation," Appl. Phys. A 76, 751-753 (2003).
[CrossRef]

Wokaun, A.

G. Kopitkovas, T. Lippert, C. David, A. Wokaun, and J. Gobrecht, "Surface micromachining of UV transparent materials," Thin Solid Films 453-454, 31-35 (2004).
[CrossRef]

G. Kopitkovas, T. Lippert, C. David, A. Wokaun, and J. Gobrecht, "Fabrication of micro-optical elements in quartz by laser induced backside wet etching," Microelectron. Eng. 67-68, 438-444 (2003).
[CrossRef]

Yabe, A.

H. Niino, Y. Yasui, X. Ding, A. Narazaki, T. Sato, Y. Kawaguchi, and A. Yabe, "Surface micro-fabrication of silica glass by excimer laser irradiation of organic solvent," J. Photochem. Photobiol. A: Chem. 158, 179-182 (2003).
[CrossRef]

X. Ding, Y. Kawaguchi, H. Niino, and A. Yabe, "Laser-induced high-quality etching of fused silica using a novel aqueous medium," Appl. Phys. A 75 641-645 (2002).
[CrossRef]

J. Wang, H. Niino, and A. Yabe, "One-step microfabrication of fused silica by laser ablation of an organic solution," Appl. Phys. A 68, 111-113 (1999).
[CrossRef]

Yasui, Y.

H. Niino, Y. Yasui, X. Ding, A. Narazaki, T. Sato, Y. Kawaguchi, and A. Yabe, "Surface micro-fabrication of silica glass by excimer laser irradiation of organic solvent," J. Photochem. Photobiol. A: Chem. 158, 179-182 (2003).
[CrossRef]

Zajadacz, J.

R. Böhme, J. Zajadacz, K. Zimmer, and B. Rauschenbach, "Topography and roughness evolution of microstructured surfaces at laser-induced backside wet etching," Appl. Phys. A 80, 433-438 (2005).
[CrossRef]

Zimmer, K.

R. Böhme, J. Zajadacz, K. Zimmer, and B. Rauschenbach, "Topography and roughness evolution of microstructured surfaces at laser-induced backside wet etching," Appl. Phys. A 80, 433-438 (2005).
[CrossRef]

R. Böhme, D. Spemann, and K. Zimmer, "Surface characterization of backside-etched transparent dielectrics," Thin Solid Films 453-454, 127-132 (2004).
[CrossRef]

K. Zimmer, A. Braun, and R. Böhme, "Etching of fused silica and glass with excimer laser at 351 nm," Appl. Surf. Sci. 208-209, 199-204 (2003).
[CrossRef]

K. Zimmer, R. Böhme, A. Braun, B. Rauschenbach, and F. Bigl, "Excimer laser-induced etching of sub-micron surface relief gratings in fused silica using phase grating projection," Appl. Phys. A 74, 453-456 (2002).
[CrossRef]

Appl. Phys.

Cs. Vass, T. Smausz, and B. Hopp, J. Phys. D. "Wet etching of fused silica: a multiplex study," Appl. Phys. 37, 2449-2454 (2004).

Appl. Phys. A

X. Ding, Y. Kawaguchi, H. Niino, and A. Yabe, "Laser-induced high-quality etching of fused silica using a novel aqueous medium," Appl. Phys. A 75 641-645 (2002).
[CrossRef]

J. Wang, H. Niino, and A. Yabe, "One-step microfabrication of fused silica by laser ablation of an organic solution," Appl. Phys. A 68, 111-113 (1999).
[CrossRef]

K. Zimmer, R. Böhme, A. Braun, B. Rauschenbach, and F. Bigl, "Excimer laser-induced etching of sub-micron surface relief gratings in fused silica using phase grating projection," Appl. Phys. A 74, 453-456 (2002).
[CrossRef]

R. Böhme, J. Zajadacz, K. Zimmer, and B. Rauschenbach, "Topography and roughness evolution of microstructured surfaces at laser-induced backside wet etching," Appl. Phys. A 80, 433-438 (2005).
[CrossRef]

J. Ihlemann, S. Müller, S. Puschmann, D. Schäfer, M. Wei, J. Li, and P. R. Herman, "Fabrication of submicron gratings in fused silica by F2-laser ablation," Appl. Phys. A 76, 751-753 (2003).
[CrossRef]

Appl. Phys. Lett.

H. M. Phillips, D. L. Callahan, R. Sauerbrey, G. Szabó, and Z. Bor, "Sub-100 nm lines produced by direct laser ablation in polyimide," Appl. Phys. Lett. 58/24, 2761-2763 (1991).
[CrossRef]

Appl. Surf. Sci.

K. Zimmer, A. Braun, and R. Böhme, "Etching of fused silica and glass with excimer laser at 351 nm," Appl. Surf. Sci. 208-209, 199-204 (2003).
[CrossRef]

J. Photochem. Photobiol. A: Chem.

H. Niino, Y. Yasui, X. Ding, A. Narazaki, T. Sato, Y. Kawaguchi, and A. Yabe, "Surface micro-fabrication of silica glass by excimer laser irradiation of organic solvent," J. Photochem. Photobiol. A: Chem. 158, 179-182 (2003).
[CrossRef]

X. Ding, Y. Kawaguchi, T. Sato, A. Narazaki, R. Kurosaki, and H. Niino, "Micron- and submicron-sized surface patterning of silica glass by LIBWE method," J. Photochem. Photobiol. A: Chem. 166, 129-133 (2004).
[CrossRef]

Microelectron. Eng.

G. Kopitkovas, T. Lippert, C. David, A. Wokaun, and J. Gobrecht, "Fabrication of micro-optical elements in quartz by laser induced backside wet etching," Microelectron. Eng. 67-68, 438-444 (2003).
[CrossRef]

Thin Solid Films

G. Kopitkovas, T. Lippert, C. David, A. Wokaun, and J. Gobrecht, "Surface micromachining of UV transparent materials," Thin Solid Films 453-454, 31-35 (2004).
[CrossRef]

Cs. Vass, B. Hopp, T. Smausz, and F. Ignácz, "Experiments and numerical calculations for the interpretation of the backside wet etching of fused silica," Thin Solid Films 453-454,121-126 (2004).
[CrossRef]

R. Böhme, D. Spemann, and K. Zimmer, "Surface characterization of backside-etched transparent dielectrics," Thin Solid Films 453-454, 127-132 (2004).
[CrossRef]

Other

Cs. Vass, K. Osvay, M. Csete, and B. Hopp, "Fabrication of 550 nm gratings in fused silica by laser induced backside wet etching technique," submitted to the Appl. Surf. Sci. (E-MRS 2006, Spring Meeting)

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Figures (4)

Fig. 1.
Fig. 1.

The scheme of the experimental setup

Fig. 2.
Fig. 2.

AFM image of the best quality grating having 550 nm period

Fig. 3.
Fig. 3.

AFM image about a grating having 266 nm period

Fig. 4.
Fig. 4.

AFM image about a grating having 154 nm period

Tables (1)

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Table 1. The parameters of the produced gratings

Equations (1)

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p = λ air 2 sin θ air

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