Abstract

Angular scatterometry, which has the advantage of good measurement precision, is an optical measurement technology based on the analysis of light scattered from periodic features, such as a linear grating, and is proposed as an alternative solution for overlay metrology. We present overlay measurements using an angular scatterometer and a bright-field microscope. A theoretical library based on rigorous coupled wave theory was created, and the reflected signatures measured by angular scatterometer were matched to the library to obtain structure parameters, including overlay, critical dimension (CD), and sidewall angle at the same time. The results reveal that angular scatterometer has a good precision and low tool-induced shift for overlay measurements, and has the potential for integrated metrology.

© 2006 Optical Society of America

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References

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  1. C. P. Ausschnitt, "A New Approach to Pattern Metrology," Proc. SPIE 5375, 51-65 (2004).
    [CrossRef]
  2. K. Lensing, C. Miller, G. Chudleigh, B. Swain, M. Laughery, A. Viswanathan, "Scatteromtry Feasibility Studies for 0.13-Micron Flash Memory Lithography Applications; Enabling Integrated Metrology," Proc. SPIE 5375, 307-316 (2004).
    [CrossRef]
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    [CrossRef]
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    [CrossRef]
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    [CrossRef]
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    [CrossRef]
  11. H. T. Huang, G. Rafhavendra, A. Sezginer, K. Johnson, F. Stanke, M. Zimmerman, C. Cheung, M. Miyagi, B. Singh, "Scatterometry-Based Overlay Metrology," Proc. SPIE 5038, 126-137 (2003).
    [CrossRef]

2004 (3)

C. P. Ausschnitt, "A New Approach to Pattern Metrology," Proc. SPIE 5375, 51-65 (2004).
[CrossRef]

K. Lensing, C. Miller, G. Chudleigh, B. Swain, M. Laughery, A. Viswanathan, "Scatteromtry Feasibility Studies for 0.13-Micron Flash Memory Lithography Applications; Enabling Integrated Metrology," Proc. SPIE 5375, 307-316 (2004).
[CrossRef]

D. S. L. Mui, H. Sasano, W. Liu, J. Yamartino, A. Skumanich, "In-tool process control for advanced patterning based on integrated metrology," Proc. SPIE 5378, 10-17 (2004).
[CrossRef]

2003 (4)

G. P. Kota, J. Luque, V. Vahedi, A. Khathuria, T. Dziura, A. Levy, "Advanced process control for polysilicon gate teching using integrated optical CD metrology," Proc. SPIE 5044, 90-96 (2003).
[CrossRef]

C. J. Raymond, M Littau, B Youn, C. J. Sohn, J. A. Kim, Y. S. Kang, "Applications of angular scatterometry for the measurement for multiply-periodic features," Proc. SPIE 5038, 577-584 (2003).
[CrossRef]

W. Yang, R. L. Webb, S. Rabello, J. Hu, J. Y. Lin, J. Heaton, M. Dusa, A. Boef, M. Schaar, A. Hunter," A novel diffraction based spectroscopic method for overlay metrology," Proc. SPIE 5038, 200-207 (2003).
[CrossRef]

H. T. Huang, G. Rafhavendra, A. Sezginer, K. Johnson, F. Stanke, M. Zimmerman, C. Cheung, M. Miyagi, B. Singh, "Scatterometry-Based Overlay Metrology," Proc. SPIE 5038, 126-137 (2003).
[CrossRef]

1996 (1)

C. J. Raymond, M. R. Murnance, S. L. Prins, S. S. H. Naqvi, JohnR. McNeil, J. W. Hosch, "Multi-parameter CD measurement using scatterometry," Proc. SPIE 2725, 698-709 (1996).
[CrossRef]

1995 (1)

1994 (1)

1981 (1)

Ausschnitt, C. P.

C. P. Ausschnitt, "A New Approach to Pattern Metrology," Proc. SPIE 5375, 51-65 (2004).
[CrossRef]

Boef, A.

W. Yang, R. L. Webb, S. Rabello, J. Hu, J. Y. Lin, J. Heaton, M. Dusa, A. Boef, M. Schaar, A. Hunter," A novel diffraction based spectroscopic method for overlay metrology," Proc. SPIE 5038, 200-207 (2003).
[CrossRef]

Chateau, N.

Cheung, C.

H. T. Huang, G. Rafhavendra, A. Sezginer, K. Johnson, F. Stanke, M. Zimmerman, C. Cheung, M. Miyagi, B. Singh, "Scatterometry-Based Overlay Metrology," Proc. SPIE 5038, 126-137 (2003).
[CrossRef]

Chudleigh, G.

K. Lensing, C. Miller, G. Chudleigh, B. Swain, M. Laughery, A. Viswanathan, "Scatteromtry Feasibility Studies for 0.13-Micron Flash Memory Lithography Applications; Enabling Integrated Metrology," Proc. SPIE 5375, 307-316 (2004).
[CrossRef]

Dusa, M.

W. Yang, R. L. Webb, S. Rabello, J. Hu, J. Y. Lin, J. Heaton, M. Dusa, A. Boef, M. Schaar, A. Hunter," A novel diffraction based spectroscopic method for overlay metrology," Proc. SPIE 5038, 200-207 (2003).
[CrossRef]

Dziura, T.

G. P. Kota, J. Luque, V. Vahedi, A. Khathuria, T. Dziura, A. Levy, "Advanced process control for polysilicon gate teching using integrated optical CD metrology," Proc. SPIE 5044, 90-96 (2003).
[CrossRef]

Gaylord, T. K.

Grann, E. B.

Heaton, J.

W. Yang, R. L. Webb, S. Rabello, J. Hu, J. Y. Lin, J. Heaton, M. Dusa, A. Boef, M. Schaar, A. Hunter," A novel diffraction based spectroscopic method for overlay metrology," Proc. SPIE 5038, 200-207 (2003).
[CrossRef]

Hu, J.

W. Yang, R. L. Webb, S. Rabello, J. Hu, J. Y. Lin, J. Heaton, M. Dusa, A. Boef, M. Schaar, A. Hunter," A novel diffraction based spectroscopic method for overlay metrology," Proc. SPIE 5038, 200-207 (2003).
[CrossRef]

Huang, H. T.

H. T. Huang, G. Rafhavendra, A. Sezginer, K. Johnson, F. Stanke, M. Zimmerman, C. Cheung, M. Miyagi, B. Singh, "Scatterometry-Based Overlay Metrology," Proc. SPIE 5038, 126-137 (2003).
[CrossRef]

Hugonin, J. P.

Hunter, A.

W. Yang, R. L. Webb, S. Rabello, J. Hu, J. Y. Lin, J. Heaton, M. Dusa, A. Boef, M. Schaar, A. Hunter," A novel diffraction based spectroscopic method for overlay metrology," Proc. SPIE 5038, 200-207 (2003).
[CrossRef]

John, S. S. H.

C. J. Raymond, M. R. Murnance, S. L. Prins, S. S. H. Naqvi, JohnR. McNeil, J. W. Hosch, "Multi-parameter CD measurement using scatterometry," Proc. SPIE 2725, 698-709 (1996).
[CrossRef]

Johnson, K.

H. T. Huang, G. Rafhavendra, A. Sezginer, K. Johnson, F. Stanke, M. Zimmerman, C. Cheung, M. Miyagi, B. Singh, "Scatterometry-Based Overlay Metrology," Proc. SPIE 5038, 126-137 (2003).
[CrossRef]

Kang, Y. S.

C. J. Raymond, M Littau, B Youn, C. J. Sohn, J. A. Kim, Y. S. Kang, "Applications of angular scatterometry for the measurement for multiply-periodic features," Proc. SPIE 5038, 577-584 (2003).
[CrossRef]

Khathuria, A.

G. P. Kota, J. Luque, V. Vahedi, A. Khathuria, T. Dziura, A. Levy, "Advanced process control for polysilicon gate teching using integrated optical CD metrology," Proc. SPIE 5044, 90-96 (2003).
[CrossRef]

Kim, J. A.

C. J. Raymond, M Littau, B Youn, C. J. Sohn, J. A. Kim, Y. S. Kang, "Applications of angular scatterometry for the measurement for multiply-periodic features," Proc. SPIE 5038, 577-584 (2003).
[CrossRef]

Kota, G. P.

G. P. Kota, J. Luque, V. Vahedi, A. Khathuria, T. Dziura, A. Levy, "Advanced process control for polysilicon gate teching using integrated optical CD metrology," Proc. SPIE 5044, 90-96 (2003).
[CrossRef]

Laughery, M.

K. Lensing, C. Miller, G. Chudleigh, B. Swain, M. Laughery, A. Viswanathan, "Scatteromtry Feasibility Studies for 0.13-Micron Flash Memory Lithography Applications; Enabling Integrated Metrology," Proc. SPIE 5375, 307-316 (2004).
[CrossRef]

Lensing, K.

K. Lensing, C. Miller, G. Chudleigh, B. Swain, M. Laughery, A. Viswanathan, "Scatteromtry Feasibility Studies for 0.13-Micron Flash Memory Lithography Applications; Enabling Integrated Metrology," Proc. SPIE 5375, 307-316 (2004).
[CrossRef]

Levy, A.

G. P. Kota, J. Luque, V. Vahedi, A. Khathuria, T. Dziura, A. Levy, "Advanced process control for polysilicon gate teching using integrated optical CD metrology," Proc. SPIE 5044, 90-96 (2003).
[CrossRef]

Lin, J. Y.

W. Yang, R. L. Webb, S. Rabello, J. Hu, J. Y. Lin, J. Heaton, M. Dusa, A. Boef, M. Schaar, A. Hunter," A novel diffraction based spectroscopic method for overlay metrology," Proc. SPIE 5038, 200-207 (2003).
[CrossRef]

Littau, M

C. J. Raymond, M Littau, B Youn, C. J. Sohn, J. A. Kim, Y. S. Kang, "Applications of angular scatterometry for the measurement for multiply-periodic features," Proc. SPIE 5038, 577-584 (2003).
[CrossRef]

Liu, W.

D. S. L. Mui, H. Sasano, W. Liu, J. Yamartino, A. Skumanich, "In-tool process control for advanced patterning based on integrated metrology," Proc. SPIE 5378, 10-17 (2004).
[CrossRef]

Luque, J.

G. P. Kota, J. Luque, V. Vahedi, A. Khathuria, T. Dziura, A. Levy, "Advanced process control for polysilicon gate teching using integrated optical CD metrology," Proc. SPIE 5044, 90-96 (2003).
[CrossRef]

Miller, C.

K. Lensing, C. Miller, G. Chudleigh, B. Swain, M. Laughery, A. Viswanathan, "Scatteromtry Feasibility Studies for 0.13-Micron Flash Memory Lithography Applications; Enabling Integrated Metrology," Proc. SPIE 5375, 307-316 (2004).
[CrossRef]

Miyagi, M.

H. T. Huang, G. Rafhavendra, A. Sezginer, K. Johnson, F. Stanke, M. Zimmerman, C. Cheung, M. Miyagi, B. Singh, "Scatterometry-Based Overlay Metrology," Proc. SPIE 5038, 126-137 (2003).
[CrossRef]

Moharam, M. G.

Mui, D. S. L.

D. S. L. Mui, H. Sasano, W. Liu, J. Yamartino, A. Skumanich, "In-tool process control for advanced patterning based on integrated metrology," Proc. SPIE 5378, 10-17 (2004).
[CrossRef]

Murnance, M. R.

C. J. Raymond, M. R. Murnance, S. L. Prins, S. S. H. Naqvi, JohnR. McNeil, J. W. Hosch, "Multi-parameter CD measurement using scatterometry," Proc. SPIE 2725, 698-709 (1996).
[CrossRef]

Naqvi, S. S. H.

C. J. Raymond, M. R. Murnance, S. L. Prins, S. S. H. Naqvi, JohnR. McNeil, J. W. Hosch, "Multi-parameter CD measurement using scatterometry," Proc. SPIE 2725, 698-709 (1996).
[CrossRef]

Pomment, D. A.

Prins, S. L.

C. J. Raymond, M. R. Murnance, S. L. Prins, S. S. H. Naqvi, JohnR. McNeil, J. W. Hosch, "Multi-parameter CD measurement using scatterometry," Proc. SPIE 2725, 698-709 (1996).
[CrossRef]

Rabello, S.

W. Yang, R. L. Webb, S. Rabello, J. Hu, J. Y. Lin, J. Heaton, M. Dusa, A. Boef, M. Schaar, A. Hunter," A novel diffraction based spectroscopic method for overlay metrology," Proc. SPIE 5038, 200-207 (2003).
[CrossRef]

Rafhavendra, G.

H. T. Huang, G. Rafhavendra, A. Sezginer, K. Johnson, F. Stanke, M. Zimmerman, C. Cheung, M. Miyagi, B. Singh, "Scatterometry-Based Overlay Metrology," Proc. SPIE 5038, 126-137 (2003).
[CrossRef]

Raymond, C. J.

C. J. Raymond, M Littau, B Youn, C. J. Sohn, J. A. Kim, Y. S. Kang, "Applications of angular scatterometry for the measurement for multiply-periodic features," Proc. SPIE 5038, 577-584 (2003).
[CrossRef]

C. J. Raymond, M. R. Murnance, S. L. Prins, S. S. H. Naqvi, JohnR. McNeil, J. W. Hosch, "Multi-parameter CD measurement using scatterometry," Proc. SPIE 2725, 698-709 (1996).
[CrossRef]

Sasano, H.

D. S. L. Mui, H. Sasano, W. Liu, J. Yamartino, A. Skumanich, "In-tool process control for advanced patterning based on integrated metrology," Proc. SPIE 5378, 10-17 (2004).
[CrossRef]

Schaar, M.

W. Yang, R. L. Webb, S. Rabello, J. Hu, J. Y. Lin, J. Heaton, M. Dusa, A. Boef, M. Schaar, A. Hunter," A novel diffraction based spectroscopic method for overlay metrology," Proc. SPIE 5038, 200-207 (2003).
[CrossRef]

Sezginer, A.

H. T. Huang, G. Rafhavendra, A. Sezginer, K. Johnson, F. Stanke, M. Zimmerman, C. Cheung, M. Miyagi, B. Singh, "Scatterometry-Based Overlay Metrology," Proc. SPIE 5038, 126-137 (2003).
[CrossRef]

Singh, B.

H. T. Huang, G. Rafhavendra, A. Sezginer, K. Johnson, F. Stanke, M. Zimmerman, C. Cheung, M. Miyagi, B. Singh, "Scatterometry-Based Overlay Metrology," Proc. SPIE 5038, 126-137 (2003).
[CrossRef]

Skumanich, A.

D. S. L. Mui, H. Sasano, W. Liu, J. Yamartino, A. Skumanich, "In-tool process control for advanced patterning based on integrated metrology," Proc. SPIE 5378, 10-17 (2004).
[CrossRef]

Sohn, C. J.

C. J. Raymond, M Littau, B Youn, C. J. Sohn, J. A. Kim, Y. S. Kang, "Applications of angular scatterometry for the measurement for multiply-periodic features," Proc. SPIE 5038, 577-584 (2003).
[CrossRef]

Stanke, F.

H. T. Huang, G. Rafhavendra, A. Sezginer, K. Johnson, F. Stanke, M. Zimmerman, C. Cheung, M. Miyagi, B. Singh, "Scatterometry-Based Overlay Metrology," Proc. SPIE 5038, 126-137 (2003).
[CrossRef]

Swain, B.

K. Lensing, C. Miller, G. Chudleigh, B. Swain, M. Laughery, A. Viswanathan, "Scatteromtry Feasibility Studies for 0.13-Micron Flash Memory Lithography Applications; Enabling Integrated Metrology," Proc. SPIE 5375, 307-316 (2004).
[CrossRef]

Vahedi, V.

G. P. Kota, J. Luque, V. Vahedi, A. Khathuria, T. Dziura, A. Levy, "Advanced process control for polysilicon gate teching using integrated optical CD metrology," Proc. SPIE 5044, 90-96 (2003).
[CrossRef]

Viswanathan, A.

K. Lensing, C. Miller, G. Chudleigh, B. Swain, M. Laughery, A. Viswanathan, "Scatteromtry Feasibility Studies for 0.13-Micron Flash Memory Lithography Applications; Enabling Integrated Metrology," Proc. SPIE 5375, 307-316 (2004).
[CrossRef]

Webb, R. L.

W. Yang, R. L. Webb, S. Rabello, J. Hu, J. Y. Lin, J. Heaton, M. Dusa, A. Boef, M. Schaar, A. Hunter," A novel diffraction based spectroscopic method for overlay metrology," Proc. SPIE 5038, 200-207 (2003).
[CrossRef]

Yamartino, J.

D. S. L. Mui, H. Sasano, W. Liu, J. Yamartino, A. Skumanich, "In-tool process control for advanced patterning based on integrated metrology," Proc. SPIE 5378, 10-17 (2004).
[CrossRef]

Yang, W.

W. Yang, R. L. Webb, S. Rabello, J. Hu, J. Y. Lin, J. Heaton, M. Dusa, A. Boef, M. Schaar, A. Hunter," A novel diffraction based spectroscopic method for overlay metrology," Proc. SPIE 5038, 200-207 (2003).
[CrossRef]

Youn, B

C. J. Raymond, M Littau, B Youn, C. J. Sohn, J. A. Kim, Y. S. Kang, "Applications of angular scatterometry for the measurement for multiply-periodic features," Proc. SPIE 5038, 577-584 (2003).
[CrossRef]

Zimmerman, M.

H. T. Huang, G. Rafhavendra, A. Sezginer, K. Johnson, F. Stanke, M. Zimmerman, C. Cheung, M. Miyagi, B. Singh, "Scatterometry-Based Overlay Metrology," Proc. SPIE 5038, 126-137 (2003).
[CrossRef]

J. Opt. Soc. Am. (1)

J. Opt. Soc. Am. A (2)

Proc. SPIE (8)

W. Yang, R. L. Webb, S. Rabello, J. Hu, J. Y. Lin, J. Heaton, M. Dusa, A. Boef, M. Schaar, A. Hunter," A novel diffraction based spectroscopic method for overlay metrology," Proc. SPIE 5038, 200-207 (2003).
[CrossRef]

H. T. Huang, G. Rafhavendra, A. Sezginer, K. Johnson, F. Stanke, M. Zimmerman, C. Cheung, M. Miyagi, B. Singh, "Scatterometry-Based Overlay Metrology," Proc. SPIE 5038, 126-137 (2003).
[CrossRef]

C. P. Ausschnitt, "A New Approach to Pattern Metrology," Proc. SPIE 5375, 51-65 (2004).
[CrossRef]

K. Lensing, C. Miller, G. Chudleigh, B. Swain, M. Laughery, A. Viswanathan, "Scatteromtry Feasibility Studies for 0.13-Micron Flash Memory Lithography Applications; Enabling Integrated Metrology," Proc. SPIE 5375, 307-316 (2004).
[CrossRef]

G. P. Kota, J. Luque, V. Vahedi, A. Khathuria, T. Dziura, A. Levy, "Advanced process control for polysilicon gate teching using integrated optical CD metrology," Proc. SPIE 5044, 90-96 (2003).
[CrossRef]

D. S. L. Mui, H. Sasano, W. Liu, J. Yamartino, A. Skumanich, "In-tool process control for advanced patterning based on integrated metrology," Proc. SPIE 5378, 10-17 (2004).
[CrossRef]

C. J. Raymond, M. R. Murnance, S. L. Prins, S. S. H. Naqvi, JohnR. McNeil, J. W. Hosch, "Multi-parameter CD measurement using scatterometry," Proc. SPIE 2725, 698-709 (1996).
[CrossRef]

C. J. Raymond, M Littau, B Youn, C. J. Sohn, J. A. Kim, Y. S. Kang, "Applications of angular scatterometry for the measurement for multiply-periodic features," Proc. SPIE 5038, 577-584 (2003).
[CrossRef]

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Figures (7)

Fig. 1.
Fig. 1.

Stacked grating schematic

Fig. 2.
Fig. 2.

Reticle design (a) Linear grating targets in both the X and Y directions (b) Configuration of reticle.

Fig. 3.
Fig. 3.

Simulation results of different overlay offset targets

Fig. 4.
Fig. 4.

The schematic of the angular scatterometry system

Fig. 5.
Fig. 5.

Measured signatures and corresponded matched signatures

Fig. 6.
Fig. 6.

Overlay measurement results

Fig. 7.
Fig. 7.

Precision 3σ, TIS ¯ and TIS 3σ of overlay measurement using angular scatterometer and bright-field microscope

Tables (3)

Tables Icon

Table 1. Stacked Grating Parameters

Tables Icon

Table 2. Library Match Results

Tables Icon

Table 3. Measurement Results

Equations (8)

Equations on this page are rendered with MathJax. Learn more.

[ f F ( i v ) ] [ b F ( i v ) ] = [ C ( z 0 ) ] 1 { t = 0 m 1 [ G l ] } [ C ( z m ) ] [ f L ( i v ) ] [ b L ( i v ) ]
[ G l ] = [ P l ( z l ) ] exp { ( z l + 1 z l ) [ D l ] } × [ P l ( z l + 1 ) ] 1
n 2 ( x , z ) = t = + n t ˜ exp [ it ( k x x + k z z ) ]
n ˜ 0 = n 1 2 ( 1 f ) + n 2 2 f , n ˜ t 0 = ( n 2 2 n 1 2 ) sin ( π tf ) π t
n ˜ 0 = n 1 2 ( 1 f ) + n 2 2 f , n ˜ t 0 = ( n 2 2 n 1 2 ) exp ( it 2 π Λ Δ OL ) sin ( π tf ) π t
Precision 3 σ = 3 × n = 1 10 ( OL n OL n ¯ ) 2 N 1 , OL n = ( OL n ( 180 ° ) OL n ( 0 ° ) ) 2
TIS ¯ = ( n = 1 10 TIS n ) N , TIS n = ( OL n ( 180 ° ) + OL n ( 0 ° ) ) 2
TIS 3 σ = 3 × n = 1 10 ( TIS n TIS n ¯ ) 2 N 1

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