C.C. Gerry, “Enhanced generation of twin single-photon states via quantum interference in parametric down-conversion: Application to two-photon quantum photolithography,” Phys. Rev. A 67, 043801 (2003).

[Crossref]

K. Edamatsu, R. Shimizu, and T. Itoh, “Measurement of the photonic de Broglie wavelength of entangled photon pairs generated by spontaneous parametric down-conversion,” Phys. Rev. Lett. 89, 213601 (2002).

[Crossref]
[PubMed]

E. M. Nagasako, S. J. Bentley, R. W. Boyd, and G. S. Agarwal, “Parametric downconversion vs. optical parametric amplification: A comparison of their quantum statistics,” J. Mod. Opt. 49, 529–537 (2002).

[Crossref]

D. Korobkin and E. Yablonovitch, “Twofold spatial resolution enhancement by two-photon exposure of photographic film,” Opt. Eng. 41, 1729–1732 (2002).

[Crossref]

F. S. Cataliotti, R. Scheunemann, T. W. Hänsch, and M. Weitz, “Superresolution of pulsed multiphoton Raman transitions,” Phys. Rev. Lett. 87, 113601 (2001).

[Crossref]
[PubMed]

P. Kok, A. N. Boto, D. S. Abrams, C. P. Williams, S. L. Braunstein, and J. P. Dowling, “Quantuminterferometric optical lithography: Towards arbitrary two-dimensional patterns,” Phys. Rev. A 63, 063407 (2001).

[Crossref]

E. M. Nagasako, S. J. Bentley, R. W. Boyd, and G. S. Agarwal, “Nonclassical two-photon interferometry and lithography with high-gain optical parametric amplifiers,” Phys. Rev. A 64, 043802 (2001).

[Crossref]

M. D’Angelo, M. V. Chekhova, and Y. Shih, “Two-photon diffraction and quantum lithography,” Phys. Rev. Lett. 87, 013602 (2001).

[Crossref]

G. S. Agarwal, R. W. Boyd, E. M. Nagasako, and S. J. Bentley, “Comment on ‘Quantum interferometric optical lithography: Exploiting entanglement to beat the diffraction limit’,” Phys. Rev. Lett. 86, 1389 (2001).

[Crossref]
[PubMed]

G. Bjork, L.L. Sanchez-Soto, and J. Soderholm, “Entangled-state lithography: Tailoring any pattern with a single state,” Phys. Rev.Lett. 86, 4516–4519 (2001).

[Crossref]
[PubMed]

N. Boto, P. Kok, D. S. Abrams, S. L. Braunstein, C. P. Williams, and J. P. Dowling, “Quantum interferometric optical lithography: Exploiting entanglement to beat the diffraction limit,” Phys. Rev. Lett. 85, 2733–2736 (2000).

[Crossref]
[PubMed]

E. Yablonovitch and R. B. Vrijen, “Optical projection lithography at half the Rayleigh resolution limit by two-photon exposure,” Opt. Eng. 38, 334–338 (1999).

[Crossref]

E. J. S. Fonseca, C. H. Monken, and S. Pádua, “Measurement of the de Broglie wavelength of a multiphoton wave packet,” Phys. Rev. Lett. 82, 2868–2871 (1999).

[Crossref]

S. R. J. Brueck, S. H. Zaidi, X. Chen, and Z. Zhang, “Interferometric lithography —from periodic arrays to arbitrary patterns,” Microelectron. Eng. 42, 145–148 (1998).

[Crossref]

H. Ooki, M. Komatsu, and M. Shibuya, “A novel super-resolution technique for optical lithography—nonlinear multiple exposure method,” Jpn. J. Appl. Phys. 33, L177–L179 (1994).

[Crossref]

Lord Rayleigh, “Investigations in optics with special reference to the spectroscope,” Phil. Mag. 8, 261–274 (1879).

[Crossref]

P. Kok, A. N. Boto, D. S. Abrams, C. P. Williams, S. L. Braunstein, and J. P. Dowling, “Quantuminterferometric optical lithography: Towards arbitrary two-dimensional patterns,” Phys. Rev. A 63, 063407 (2001).

[Crossref]

N. Boto, P. Kok, D. S. Abrams, S. L. Braunstein, C. P. Williams, and J. P. Dowling, “Quantum interferometric optical lithography: Exploiting entanglement to beat the diffraction limit,” Phys. Rev. Lett. 85, 2733–2736 (2000).

[Crossref]
[PubMed]

E. M. Nagasako, S. J. Bentley, R. W. Boyd, and G. S. Agarwal, “Parametric downconversion vs. optical parametric amplification: A comparison of their quantum statistics,” J. Mod. Opt. 49, 529–537 (2002).

[Crossref]

G. S. Agarwal, R. W. Boyd, E. M. Nagasako, and S. J. Bentley, “Comment on ‘Quantum interferometric optical lithography: Exploiting entanglement to beat the diffraction limit’,” Phys. Rev. Lett. 86, 1389 (2001).

[Crossref]
[PubMed]

E. M. Nagasako, S. J. Bentley, R. W. Boyd, and G. S. Agarwal, “Nonclassical two-photon interferometry and lithography with high-gain optical parametric amplifiers,” Phys. Rev. A 64, 043802 (2001).

[Crossref]

E. M. Nagasako, S. J. Bentley, R. W. Boyd, and G. S. Agarwal, “Parametric downconversion vs. optical parametric amplification: A comparison of their quantum statistics,” J. Mod. Opt. 49, 529–537 (2002).

[Crossref]

E. M. Nagasako, S. J. Bentley, R. W. Boyd, and G. S. Agarwal, “Nonclassical two-photon interferometry and lithography with high-gain optical parametric amplifiers,” Phys. Rev. A 64, 043802 (2001).

[Crossref]

G. S. Agarwal, R. W. Boyd, E. M. Nagasako, and S. J. Bentley, “Comment on ‘Quantum interferometric optical lithography: Exploiting entanglement to beat the diffraction limit’,” Phys. Rev. Lett. 86, 1389 (2001).

[Crossref]
[PubMed]

G. Bjork, L.L. Sanchez-Soto, and J. Soderholm, “Entangled-state lithography: Tailoring any pattern with a single state,” Phys. Rev.Lett. 86, 4516–4519 (2001).

[Crossref]
[PubMed]

P. Kok, A. N. Boto, D. S. Abrams, C. P. Williams, S. L. Braunstein, and J. P. Dowling, “Quantuminterferometric optical lithography: Towards arbitrary two-dimensional patterns,” Phys. Rev. A 63, 063407 (2001).

[Crossref]

N. Boto, P. Kok, D. S. Abrams, S. L. Braunstein, C. P. Williams, and J. P. Dowling, “Quantum interferometric optical lithography: Exploiting entanglement to beat the diffraction limit,” Phys. Rev. Lett. 85, 2733–2736 (2000).

[Crossref]
[PubMed]

E. M. Nagasako, S. J. Bentley, R. W. Boyd, and G. S. Agarwal, “Parametric downconversion vs. optical parametric amplification: A comparison of their quantum statistics,” J. Mod. Opt. 49, 529–537 (2002).

[Crossref]

E. M. Nagasako, S. J. Bentley, R. W. Boyd, and G. S. Agarwal, “Nonclassical two-photon interferometry and lithography with high-gain optical parametric amplifiers,” Phys. Rev. A 64, 043802 (2001).

[Crossref]

G. S. Agarwal, R. W. Boyd, E. M. Nagasako, and S. J. Bentley, “Comment on ‘Quantum interferometric optical lithography: Exploiting entanglement to beat the diffraction limit’,” Phys. Rev. Lett. 86, 1389 (2001).

[Crossref]
[PubMed]

P. Kok, A. N. Boto, D. S. Abrams, C. P. Williams, S. L. Braunstein, and J. P. Dowling, “Quantuminterferometric optical lithography: Towards arbitrary two-dimensional patterns,” Phys. Rev. A 63, 063407 (2001).

[Crossref]

N. Boto, P. Kok, D. S. Abrams, S. L. Braunstein, C. P. Williams, and J. P. Dowling, “Quantum interferometric optical lithography: Exploiting entanglement to beat the diffraction limit,” Phys. Rev. Lett. 85, 2733–2736 (2000).

[Crossref]
[PubMed]

S. R. J. Brueck, S. H. Zaidi, X. Chen, and Z. Zhang, “Interferometric lithography —from periodic arrays to arbitrary patterns,” Microelectron. Eng. 42, 145–148 (1998).

[Crossref]

F. S. Cataliotti, R. Scheunemann, T. W. Hänsch, and M. Weitz, “Superresolution of pulsed multiphoton Raman transitions,” Phys. Rev. Lett. 87, 113601 (2001).

[Crossref]
[PubMed]

M. D’Angelo, M. V. Chekhova, and Y. Shih, “Two-photon diffraction and quantum lithography,” Phys. Rev. Lett. 87, 013602 (2001).

[Crossref]

S. R. J. Brueck, S. H. Zaidi, X. Chen, and Z. Zhang, “Interferometric lithography —from periodic arrays to arbitrary patterns,” Microelectron. Eng. 42, 145–148 (1998).

[Crossref]

M. D’Angelo, M. V. Chekhova, and Y. Shih, “Two-photon diffraction and quantum lithography,” Phys. Rev. Lett. 87, 013602 (2001).

[Crossref]

P. Kok, A. N. Boto, D. S. Abrams, C. P. Williams, S. L. Braunstein, and J. P. Dowling, “Quantuminterferometric optical lithography: Towards arbitrary two-dimensional patterns,” Phys. Rev. A 63, 063407 (2001).

[Crossref]

N. Boto, P. Kok, D. S. Abrams, S. L. Braunstein, C. P. Williams, and J. P. Dowling, “Quantum interferometric optical lithography: Exploiting entanglement to beat the diffraction limit,” Phys. Rev. Lett. 85, 2733–2736 (2000).

[Crossref]
[PubMed]

K. Edamatsu, R. Shimizu, and T. Itoh, “Measurement of the photonic de Broglie wavelength of entangled photon pairs generated by spontaneous parametric down-conversion,” Phys. Rev. Lett. 89, 213601 (2002).

[Crossref]
[PubMed]

E. J. S. Fonseca, C. H. Monken, and S. Pádua, “Measurement of the de Broglie wavelength of a multiphoton wave packet,” Phys. Rev. Lett. 82, 2868–2871 (1999).

[Crossref]

C.C. Gerry, “Enhanced generation of twin single-photon states via quantum interference in parametric down-conversion: Application to two-photon quantum photolithography,” Phys. Rev. A 67, 043801 (2003).

[Crossref]

F. S. Cataliotti, R. Scheunemann, T. W. Hänsch, and M. Weitz, “Superresolution of pulsed multiphoton Raman transitions,” Phys. Rev. Lett. 87, 113601 (2001).

[Crossref]
[PubMed]

K. Edamatsu, R. Shimizu, and T. Itoh, “Measurement of the photonic de Broglie wavelength of entangled photon pairs generated by spontaneous parametric down-conversion,” Phys. Rev. Lett. 89, 213601 (2002).

[Crossref]
[PubMed]

P. Kok, A. N. Boto, D. S. Abrams, C. P. Williams, S. L. Braunstein, and J. P. Dowling, “Quantuminterferometric optical lithography: Towards arbitrary two-dimensional patterns,” Phys. Rev. A 63, 063407 (2001).

[Crossref]

N. Boto, P. Kok, D. S. Abrams, S. L. Braunstein, C. P. Williams, and J. P. Dowling, “Quantum interferometric optical lithography: Exploiting entanglement to beat the diffraction limit,” Phys. Rev. Lett. 85, 2733–2736 (2000).

[Crossref]
[PubMed]

H. Ooki, M. Komatsu, and M. Shibuya, “A novel super-resolution technique for optical lithography—nonlinear multiple exposure method,” Jpn. J. Appl. Phys. 33, L177–L179 (1994).

[Crossref]

D. Korobkin and E. Yablonovitch, “Twofold spatial resolution enhancement by two-photon exposure of photographic film,” Opt. Eng. 41, 1729–1732 (2002).

[Crossref]

E. J. S. Fonseca, C. H. Monken, and S. Pádua, “Measurement of the de Broglie wavelength of a multiphoton wave packet,” Phys. Rev. Lett. 82, 2868–2871 (1999).

[Crossref]

E. M. Nagasako, S. J. Bentley, R. W. Boyd, and G. S. Agarwal, “Parametric downconversion vs. optical parametric amplification: A comparison of their quantum statistics,” J. Mod. Opt. 49, 529–537 (2002).

[Crossref]

E. M. Nagasako, S. J. Bentley, R. W. Boyd, and G. S. Agarwal, “Nonclassical two-photon interferometry and lithography with high-gain optical parametric amplifiers,” Phys. Rev. A 64, 043802 (2001).

[Crossref]

G. S. Agarwal, R. W. Boyd, E. M. Nagasako, and S. J. Bentley, “Comment on ‘Quantum interferometric optical lithography: Exploiting entanglement to beat the diffraction limit’,” Phys. Rev. Lett. 86, 1389 (2001).

[Crossref]
[PubMed]

H. Ooki, M. Komatsu, and M. Shibuya, “A novel super-resolution technique for optical lithography—nonlinear multiple exposure method,” Jpn. J. Appl. Phys. 33, L177–L179 (1994).

[Crossref]

E. J. S. Fonseca, C. H. Monken, and S. Pádua, “Measurement of the de Broglie wavelength of a multiphoton wave packet,” Phys. Rev. Lett. 82, 2868–2871 (1999).

[Crossref]

Lord Rayleigh, “Investigations in optics with special reference to the spectroscope,” Phil. Mag. 8, 261–274 (1879).

[Crossref]

G. Bjork, L.L. Sanchez-Soto, and J. Soderholm, “Entangled-state lithography: Tailoring any pattern with a single state,” Phys. Rev.Lett. 86, 4516–4519 (2001).

[Crossref]
[PubMed]

F. S. Cataliotti, R. Scheunemann, T. W. Hänsch, and M. Weitz, “Superresolution of pulsed multiphoton Raman transitions,” Phys. Rev. Lett. 87, 113601 (2001).

[Crossref]
[PubMed]

H. Ooki, M. Komatsu, and M. Shibuya, “A novel super-resolution technique for optical lithography—nonlinear multiple exposure method,” Jpn. J. Appl. Phys. 33, L177–L179 (1994).

[Crossref]

M. D’Angelo, M. V. Chekhova, and Y. Shih, “Two-photon diffraction and quantum lithography,” Phys. Rev. Lett. 87, 013602 (2001).

[Crossref]

K. Edamatsu, R. Shimizu, and T. Itoh, “Measurement of the photonic de Broglie wavelength of entangled photon pairs generated by spontaneous parametric down-conversion,” Phys. Rev. Lett. 89, 213601 (2002).

[Crossref]
[PubMed]

G. Bjork, L.L. Sanchez-Soto, and J. Soderholm, “Entangled-state lithography: Tailoring any pattern with a single state,” Phys. Rev.Lett. 86, 4516–4519 (2001).

[Crossref]
[PubMed]

E. Yablonovitch and R. B. Vrijen, “Optical projection lithography at half the Rayleigh resolution limit by two-photon exposure,” Opt. Eng. 38, 334–338 (1999).

[Crossref]

F. S. Cataliotti, R. Scheunemann, T. W. Hänsch, and M. Weitz, “Superresolution of pulsed multiphoton Raman transitions,” Phys. Rev. Lett. 87, 113601 (2001).

[Crossref]
[PubMed]

P. Kok, A. N. Boto, D. S. Abrams, C. P. Williams, S. L. Braunstein, and J. P. Dowling, “Quantuminterferometric optical lithography: Towards arbitrary two-dimensional patterns,” Phys. Rev. A 63, 063407 (2001).

[Crossref]

N. Boto, P. Kok, D. S. Abrams, S. L. Braunstein, C. P. Williams, and J. P. Dowling, “Quantum interferometric optical lithography: Exploiting entanglement to beat the diffraction limit,” Phys. Rev. Lett. 85, 2733–2736 (2000).

[Crossref]
[PubMed]

D. Korobkin and E. Yablonovitch, “Twofold spatial resolution enhancement by two-photon exposure of photographic film,” Opt. Eng. 41, 1729–1732 (2002).

[Crossref]

E. Yablonovitch and R. B. Vrijen, “Optical projection lithography at half the Rayleigh resolution limit by two-photon exposure,” Opt. Eng. 38, 334–338 (1999).

[Crossref]

S. R. J. Brueck, S. H. Zaidi, X. Chen, and Z. Zhang, “Interferometric lithography —from periodic arrays to arbitrary patterns,” Microelectron. Eng. 42, 145–148 (1998).

[Crossref]

S. R. J. Brueck, S. H. Zaidi, X. Chen, and Z. Zhang, “Interferometric lithography —from periodic arrays to arbitrary patterns,” Microelectron. Eng. 42, 145–148 (1998).

[Crossref]

E. M. Nagasako, S. J. Bentley, R. W. Boyd, and G. S. Agarwal, “Parametric downconversion vs. optical parametric amplification: A comparison of their quantum statistics,” J. Mod. Opt. 49, 529–537 (2002).

[Crossref]

H. Ooki, M. Komatsu, and M. Shibuya, “A novel super-resolution technique for optical lithography—nonlinear multiple exposure method,” Jpn. J. Appl. Phys. 33, L177–L179 (1994).

[Crossref]

S. R. J. Brueck, S. H. Zaidi, X. Chen, and Z. Zhang, “Interferometric lithography —from periodic arrays to arbitrary patterns,” Microelectron. Eng. 42, 145–148 (1998).

[Crossref]

E. Yablonovitch and R. B. Vrijen, “Optical projection lithography at half the Rayleigh resolution limit by two-photon exposure,” Opt. Eng. 38, 334–338 (1999).

[Crossref]

D. Korobkin and E. Yablonovitch, “Twofold spatial resolution enhancement by two-photon exposure of photographic film,” Opt. Eng. 41, 1729–1732 (2002).

[Crossref]

Lord Rayleigh, “Investigations in optics with special reference to the spectroscope,” Phil. Mag. 8, 261–274 (1879).

[Crossref]

E. M. Nagasako, S. J. Bentley, R. W. Boyd, and G. S. Agarwal, “Nonclassical two-photon interferometry and lithography with high-gain optical parametric amplifiers,” Phys. Rev. A 64, 043802 (2001).

[Crossref]

P. Kok, A. N. Boto, D. S. Abrams, C. P. Williams, S. L. Braunstein, and J. P. Dowling, “Quantuminterferometric optical lithography: Towards arbitrary two-dimensional patterns,” Phys. Rev. A 63, 063407 (2001).

[Crossref]

C.C. Gerry, “Enhanced generation of twin single-photon states via quantum interference in parametric down-conversion: Application to two-photon quantum photolithography,” Phys. Rev. A 67, 043801 (2003).

[Crossref]

M. D’Angelo, M. V. Chekhova, and Y. Shih, “Two-photon diffraction and quantum lithography,” Phys. Rev. Lett. 87, 013602 (2001).

[Crossref]

E. J. S. Fonseca, C. H. Monken, and S. Pádua, “Measurement of the de Broglie wavelength of a multiphoton wave packet,” Phys. Rev. Lett. 82, 2868–2871 (1999).

[Crossref]

K. Edamatsu, R. Shimizu, and T. Itoh, “Measurement of the photonic de Broglie wavelength of entangled photon pairs generated by spontaneous parametric down-conversion,” Phys. Rev. Lett. 89, 213601 (2002).

[Crossref]
[PubMed]

N. Boto, P. Kok, D. S. Abrams, S. L. Braunstein, C. P. Williams, and J. P. Dowling, “Quantum interferometric optical lithography: Exploiting entanglement to beat the diffraction limit,” Phys. Rev. Lett. 85, 2733–2736 (2000).

[Crossref]
[PubMed]

G. S. Agarwal, R. W. Boyd, E. M. Nagasako, and S. J. Bentley, “Comment on ‘Quantum interferometric optical lithography: Exploiting entanglement to beat the diffraction limit’,” Phys. Rev. Lett. 86, 1389 (2001).

[Crossref]
[PubMed]

F. S. Cataliotti, R. Scheunemann, T. W. Hänsch, and M. Weitz, “Superresolution of pulsed multiphoton Raman transitions,” Phys. Rev. Lett. 87, 113601 (2001).

[Crossref]
[PubMed]

G. Bjork, L.L. Sanchez-Soto, and J. Soderholm, “Entangled-state lithography: Tailoring any pattern with a single state,” Phys. Rev.Lett. 86, 4516–4519 (2001).

[Crossref]
[PubMed]