Abstract

The calculated data of propagation loss of the waveguide were incorrect. Corrected data show the actual results in the measurements. References and links

©2004 Optical Society of America

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References

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  1. X. L. Wang, K. M. Wang, G. Fu, S. L. Li, D, Y. Shen, H, J. Ma, and R. Nie, “Low propagation loss of the waveguides in fused quartz by oxygen ion implantation,” Opt. Express. 20, 4675–4680 (2004), http://www.opticsexpress.org/abstract.cfm?URI=OPEX-12-20-4675
    [Crossref]

2004 (1)

X. L. Wang, K. M. Wang, G. Fu, S. L. Li, D, Y. Shen, H, J. Ma, and R. Nie, “Low propagation loss of the waveguides in fused quartz by oxygen ion implantation,” Opt. Express. 20, 4675–4680 (2004), http://www.opticsexpress.org/abstract.cfm?URI=OPEX-12-20-4675
[Crossref]

Fu, G.

X. L. Wang, K. M. Wang, G. Fu, S. L. Li, D, Y. Shen, H, J. Ma, and R. Nie, “Low propagation loss of the waveguides in fused quartz by oxygen ion implantation,” Opt. Express. 20, 4675–4680 (2004), http://www.opticsexpress.org/abstract.cfm?URI=OPEX-12-20-4675
[Crossref]

Li, S. L.

X. L. Wang, K. M. Wang, G. Fu, S. L. Li, D, Y. Shen, H, J. Ma, and R. Nie, “Low propagation loss of the waveguides in fused quartz by oxygen ion implantation,” Opt. Express. 20, 4675–4680 (2004), http://www.opticsexpress.org/abstract.cfm?URI=OPEX-12-20-4675
[Crossref]

Ma, H, J.

X. L. Wang, K. M. Wang, G. Fu, S. L. Li, D, Y. Shen, H, J. Ma, and R. Nie, “Low propagation loss of the waveguides in fused quartz by oxygen ion implantation,” Opt. Express. 20, 4675–4680 (2004), http://www.opticsexpress.org/abstract.cfm?URI=OPEX-12-20-4675
[Crossref]

Nie, R.

X. L. Wang, K. M. Wang, G. Fu, S. L. Li, D, Y. Shen, H, J. Ma, and R. Nie, “Low propagation loss of the waveguides in fused quartz by oxygen ion implantation,” Opt. Express. 20, 4675–4680 (2004), http://www.opticsexpress.org/abstract.cfm?URI=OPEX-12-20-4675
[Crossref]

Shen, D, Y.

X. L. Wang, K. M. Wang, G. Fu, S. L. Li, D, Y. Shen, H, J. Ma, and R. Nie, “Low propagation loss of the waveguides in fused quartz by oxygen ion implantation,” Opt. Express. 20, 4675–4680 (2004), http://www.opticsexpress.org/abstract.cfm?URI=OPEX-12-20-4675
[Crossref]

Wang, K. M.

X. L. Wang, K. M. Wang, G. Fu, S. L. Li, D, Y. Shen, H, J. Ma, and R. Nie, “Low propagation loss of the waveguides in fused quartz by oxygen ion implantation,” Opt. Express. 20, 4675–4680 (2004), http://www.opticsexpress.org/abstract.cfm?URI=OPEX-12-20-4675
[Crossref]

Wang, X. L.

X. L. Wang, K. M. Wang, G. Fu, S. L. Li, D, Y. Shen, H, J. Ma, and R. Nie, “Low propagation loss of the waveguides in fused quartz by oxygen ion implantation,” Opt. Express. 20, 4675–4680 (2004), http://www.opticsexpress.org/abstract.cfm?URI=OPEX-12-20-4675
[Crossref]

Opt. Express. (1)

X. L. Wang, K. M. Wang, G. Fu, S. L. Li, D, Y. Shen, H, J. Ma, and R. Nie, “Low propagation loss of the waveguides in fused quartz by oxygen ion implantation,” Opt. Express. 20, 4675–4680 (2004), http://www.opticsexpress.org/abstract.cfm?URI=OPEX-12-20-4675
[Crossref]

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Figures (1)

Fig. 3.
Fig. 3.

Natural logarithm of the scattered intensity of light vs. propagation distance along the fused quartz waveguides formed by 3.0 MeV O+ ion implantation at the dose of 1×1015 ions/cm2 before and after different annealing treatments in air measured with the wavelengths of 633 nm, respectively. A, as implanted; B, after annealing at 320°C, 60min; C, after annealing at 450°C, 60min; D, after annealing at 500°C, 60min.

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