Abstract

The calculated data of propagation loss of the waveguide were incorrect. Corrected data show the actual results in the measurements. References and links

© 2004 Optical Society of America

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References

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  1. X. L. Wang, K. M. Wang, G. Fu, S. L. Li, D, Y. Shen, H, J. Ma and R. Nie, “Low propagation loss of the waveguides in fused quartz by oxygen ion implantation,” Opt. Express 20, 4675-4680 (2004), <a href="http://www.opticsexpress.org/abstract.cfm?URI=OPEX-12-20-4675">http://www.opticsexpress.org/abstract.cfm?URI=OPEX-12-20-4675</a>
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Figures (1)

Fig. 3.
Fig. 3.

Natural logarithm of the scattered intensity of light vs. propagation distance along the fused quartz waveguides formed by 3.0 MeV O+ ion implantation at the dose of 1×1015 ions/cm2 before and after different annealing treatments in air measured with the wavelengths of 633 nm, respectively. A, as implanted; B, after annealing at 320°C, 60min; C, after annealing at 450°C, 60min; D, after annealing at 500°C, 60min.

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