Abstract

Fabrication and evaluation of diamond binary diffractive fan-out elements is demonstrated. The diffractive optical elements (DOEs) are designed for two different wavelengths, 633 nm and 10.6 µm. The DOE splits an incident beam into 16 spots that form a ring pattern. The surface reliefs were fabricated by photolithographic methods followed by plasma etching, which produced well-defined patterns with smooth surfaces. One DOE was optically evaluated with a HeNe laser, operating at a wavelength of 633 nm, and showed good performance. The DOE designed for a wavelength at 10.6 µm was tested together with a carbon dioxide laser. The light pattern was used to microstructure a 10 mm thick PMMA piece with very good results.

© 2002 Optical Society of America

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References

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Appl. Opt.

Appl. Phys. A

S. Gloor, V. Romano, W. Luthy, H. P. Weber, V. V. Kononenko, S. M. Pimenov, V. I. Konov and A. V. Khomich, �??Antireflection structures written by excimer laser on CVD diamond,�?? Appl. Phys. A 70, 547-550 (2000).
[CrossRef]

Diamond and Related Mater.

C. J. Brierley, C. M. Beck, G. R. Kennedy, J. Metcalfe and D. Wheatley, �??The potential of CVD diamond as a replacement for ZnSe in CO/sub 2/ laser optics,�?? Diamond and Related Mater. 8, 8-9 (1999).
[CrossRef]

Opt. Lett.

Solid State Technol.

J. D. Hunn and C. P. Christensen, �??Ion beam and laser-assisted micromachining of single crystal diamond,�?? Solid State Technol. 37, 57-60 (1994).

Other

B. Dischler and C. Wild, Low-Pressure Synthetic Diamond (Springer, Berlin Heidelberg, 1998).
[CrossRef]

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Figures (5)

Fig. 1.
Fig. 1.

(left) Calculated phase-relief for the DOE generating 16 spots forming a ring pattern. The phase difference between the red and the white areas is π rad. The area of the phase pattern is 1280×1280 µm. (right) Generated light pattern, calculated from the phase-relief.

Fig. 2.
Fig. 2.

SEM picture of the plasma etched diamond DOE (etch depth 3.84 µm).

Fig. 3.
Fig. 3.

(left) Image showing the intensity distribution in the far field for red light and (right) green light. The distance between the diamond DOE and the image plane is 5.92 m and the diameter of the ring is 10.5 cm (red light) and 9 cm (green light).

Fig. 4.
Fig. 4.

Schematic picture of the experimental setup used to microstructure PMMA with a CO2 laser/diamond DOE combination.

Fig. 5.
Fig. 5.

Picture of a PMMA sample microstructured with a CO2-laser together with a diamond fan-out element. The picture shows four different exposures (exposure time 0.5 s) with slightly varying distance between the DOE and PMMA sample. The patterns at the top left and bottom right are non-optimal due to a slight tilting of the DOE during exposure.

Tables (1)

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Table 1. Properties of CVD diamond substrates (used for the DOE fabrication) and ZnSe

Equations (2)

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D o = λ o 2 ( n diamond 1 )
U = I max I min I max + I min

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