Abstract

Holographic interference is widely used for fabrication of sinusoidal gratings in photosensitive optical material. We present variable surface profile gratings fabricated in photosensitive hybrid sol-gel glass by use of holographic interference. It is found by experiment that different surface profiles of gratings including sinusoidal, binary, and two-peak sinusoidal can be obtained by precise control of exposure time. The experimental results are helpful for researchers fabricating gratings by holographic interference.

© 2003 Optical Society of America

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References

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J. Lightwave Technol.

J. Phys. D

X.-C. Yuan, W. X. Yu, W. C. Cheong, and N. Q. Ngo, �??Improved linear response to UV exposure and its interpretation of SiO2/TiO2 hybrid sol-gel glass,�?? J. Phys. D 34, L81-L84 (2002).
[CrossRef]

Opt. Commun.

P. �?yräs, J. T. Rantala, S. Honkanen, S. B. Memdes, and N. Peyghambarian, �??Diffraction gratings in sol-gel films by direct contact printing using a UV-mercury lamp,�?? Opt. Commun. 162, 215-218 (1999).
[CrossRef]

H. J. Jiang, X.-C. Yuan, Y. Zhou, Y. C. Chan, and Y. L. Lam, �??Single-step fabrication of diffraction gratings on hybrid sol-gel glass using holographic interference lithography,�?? Opt. Commun. 185, 19-24 (2000).
[CrossRef]

Opt. Express

Thin Solid Films

J. T. Rantala, R. S. Penner, S. Honkanen, J. Vähäkangas, M. Fallahi, and N. Peyghambarian, �??Negative tone hybrid sol-gel material for electron-beam lithography,�?? Thin Solid Films 345, 185-187 (1999).
[CrossRef]

P. �?yräs, J. T. Rantala, R. Levy, M. R. Descour, S. Honkanen, and N. Peyghambarian, �??Multilevel structures in sol-gel thin films with a single UV-exposure using a gray-scale mask,�?? Thin Solid Films 352, 9-12 (1999).
[CrossRef]

D. Blanc and S. Pelissier, �??Fabrication of sub-micron period diffraction gratings in self-processing sol-gel glasses,�?? Thin Solid Films 384, 251-253 (2001).
[CrossRef]

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Figures (6)

Fig. 1.
Fig. 1.

Optical setup for fabrication of gratings with the holographic interference method.

Fig. 2.
Fig. 2.

1-µm pitch gratings with a perfect sinusoidal profile.

Fig. 3.
Fig. 3.

1-µm pitch grating fabricated with an exposure time of 1 min.

Fig. 4.
Fig. 4.

1-µm pitch grating fabricated with an exposure time of 3 min.

Fig. 5.
Fig. 5.

2-µm pitch grating fabricated with an exposure time of 3 min.

Fig. 6.
Fig. 6.

1-µm pitch grating scanned at the edge of the pattern area.

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