Abstract

A negative-tone sensitive SiO2/TiO2 organic-inorganic hybrid sol-gel material was synthesized and characterized for fabrication of multilevel micro-optical elements by direct electron-beam lithography. The exposure was carried out by an in-house modified electron-beam writing system using LEO SEM-982 with Elphy Quantum exposure beam-blanking control system at 25keV. The hybrid Sol-Gel material demonstrated a superb sensitivity for doses between 0.22μC/cm2 and 0.33μC/cm2.

© 2002 Optical Society of America

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References

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Appl. Opt. (1)

Electron. Lett. (1)

J. T. Rantala, R. S. Penner, S. Honkanen, J. Vahakangas, M. Fallahi and N. Peyghambarian, �??Sol-Gel Hybrid Glass Diffractive Element by Direct Electron-Beam Exposure,�?? Electron. Lett. 34, 455-456 (1998).
[CrossRef]

J. Lightwave Technol. (1)

Opt. Commun. (2)

P. Coudray, P. Etienne, Y. Moreau, J. Porque, S.I. Najafi, �??Sol-gel channel waveguide on silicon: fast direct imprinting and low cost fabrication,�?? Opt. Commun. 143, 199-202 (1997).
[CrossRef]

P. �?yräs, J.T. Rantala, S. Honkanen, S.B. Memdes, N. Peyghambarian, �??Diffraction gratings in sol-gel films by direct contact printing using a UV-mercury lamp,�?? Opt. Commun. 162, 215-218 (1999).
[CrossRef]

Opt. Eng. (1)

H.J. Jiang, X.-C. Yuan, Y. C. Chan and G. L. Ng, �??Single-step Fabrication of Surface Relief Diffractive Optical Elements on Hybrid Sol-Gel Glass,�?? Opt. Eng. 40, 2017-2021 (2001).
[CrossRef]

Opt. Express (1)

Thin Solid Films (1)

J. T. Rantala, R. S. Penner, S. Honkanen, J. Vahakangas, M. Fallahi and N. Peyghambarian, �??Negative-tone Hybrid Sol-Gel Material for Electron-Beam Lithography,�?? Thin Solid Films 345, 185-187 (1999).
[CrossRef]

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Figures (3)

Fig. 1.
Fig. 1.

Sol-Gel film thickness after development in IPA or acetone and post-baking vs. exposure.

Fig. 2.
Fig. 2.

Sol-Gel film thickness after development in IPA vs. exposure for the different photo-inhibitor percentage.

Fig. 3.
Fig. 3.

4μm pitch blazed grating built in the hybrid sol-gel exposed @ 25keV

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