Abstract
We have fabricated, characterized and theoretically analyzed the performance of bilayer (or stacked) metallic wire-grids. The samples with 100 nm period were fabricated with extreme-ultraviolet interference lithography. Transmission efficiency over 50% and extinction ratios higher than 40 dB were measured in the visible range with these devices. Simulations using a finite-difference time-domain algorithm are in agreement with the experimental results and show that the transmission spectra are governed by Fabry-Perot interference and near-field coupling between the two layers of the structure. The simple fabrication method involves only a single lithographic step without any etching and guarantees precise alignment and separation of the two wire-grids with respect to each other.
©2006 Optical Society of America
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