Abstract

We illustrate the propagation of light in a new type of coupling mask for lensless optical lithography. Our investigation shows how the different elements comprising such masks contribute to the definition of an optical path that allows the exposure of features in the 100-nm-size range in the photoresist.

© Optical Society of America

PDF Article

References

  • View by:
  • |

  1. H. Schmid, H. Biebuck, B. Michel and O.J.F. Martin, "Light-coupling masks for lensless, subwavelength optical lithography," Appl. Phys. Lett. 72, 2379-2381 (1998).
  2. H. Schmid, H. Biebuck, B. Michel, O. J. F. Martin and N. B. Piller, "Light-coupling masks: an alternative, lensless approach to high-resolution optical contact lithography," J. Vac. Sci. Technol. B in press (1998).
  3. Special issue on optical lithography, IBM J. Res. Develop. 41(1/2) (1997).
  4. H.A. Biebuyck, N.B. Larsen, E. Delamarche and B. Michel, "Lithography beyond light: microcontact printing with monolayer resists," IBM J. Res. Develop. 41, 159-170 (1997).
  5. N. B. Piller and O. J. F. Martin, "Increasing the performances of the coupled-dipole approxima- tion: A spectral approach," IEEE Trans. Antennas Propag. 46, 1126-1137 (1998).
  6. O. J. F. Martin and N. B. Piller, "Electromagnetic scattering in polarizable backgrounds," Phys. Rev. E 58, 3909-3915 (1998).
  7. Olivier J. F. Martin home page: http://www.ifh.ee.ethz.ch/~martin
  8. IBM Zurich Research Laboratory home page: http://www.zurich.ibm.com

Other (8)

H. Schmid, H. Biebuck, B. Michel and O.J.F. Martin, "Light-coupling masks for lensless, subwavelength optical lithography," Appl. Phys. Lett. 72, 2379-2381 (1998).

H. Schmid, H. Biebuck, B. Michel, O. J. F. Martin and N. B. Piller, "Light-coupling masks: an alternative, lensless approach to high-resolution optical contact lithography," J. Vac. Sci. Technol. B in press (1998).

Special issue on optical lithography, IBM J. Res. Develop. 41(1/2) (1997).

H.A. Biebuyck, N.B. Larsen, E. Delamarche and B. Michel, "Lithography beyond light: microcontact printing with monolayer resists," IBM J. Res. Develop. 41, 159-170 (1997).

N. B. Piller and O. J. F. Martin, "Increasing the performances of the coupled-dipole approxima- tion: A spectral approach," IEEE Trans. Antennas Propag. 46, 1126-1137 (1998).

O. J. F. Martin and N. B. Piller, "Electromagnetic scattering in polarizable backgrounds," Phys. Rev. E 58, 3909-3915 (1998).

Olivier J. F. Martin home page: http://www.ifh.ee.ethz.ch/~martin

IBM Zurich Research Laboratory home page: http://www.zurich.ibm.com

Supplementary Material (4)

» Media 1: MOV (1602 KB)     
» Media 2: MOV (1308 KB)     
» Media 3: MOV (1412 KB)     
» Media 4: MOV (1499 KB)     

Cited By

OSA participates in CrossRef's Cited-By Linking service. Citing articles from OSA journals and other participating publishers are listed here.

Alert me when this article is cited.


Metrics