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[Crossref]
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[Crossref]
H. H. Bauer, M. Heller, and N. Kaiser, “Optical coatings for UV photolithography systems,” Proc. SPIE 2776, 353–365 (1996).
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P. Kelkar, B. Tirri, R. Wilklow, and D. Peterson, “Deposition and characterization of challenging DUV coatings,” Proc. SPIE 7606, 706708, 706708-8 (2008).
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B. Sassolas, Q. Benoît, R. Flaminio, D. Forest, J. Franc, M. Galimberti, A. Lacoudre, C. Michel, J. L. Montorio, N. Morgado, and L. Pinard, “Thickness uniformity improvement for the twin mirrors used in advanced gravitational wave detectors,” Proc. SPIE 8168, 81681Q, 81681Q-8 (2011).
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[Crossref]
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[Crossref]
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[PubMed]
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[Crossref]
B. Sassolas, R. Flaminio, J. Franc, C. Michel, J.-L. Montorio, N. Morgado, and L. Pinard, “Masking technique for coating thickness control on large and strongly curved aspherical optics,” Appl. Opt. 48(19), 3760–3765 (2009).
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[Crossref]
B. Sassolas, R. Flaminio, J. Franc, C. Michel, J.-L. Montorio, N. Morgado, and L. Pinard, “Masking technique for coating thickness control on large and strongly curved aspherical optics,” Appl. Opt. 48(19), 3760–3765 (2009).
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[PubMed]
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[Crossref]
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[Crossref]
[PubMed]
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[Crossref]
[PubMed]
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[Crossref]
[PubMed]
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[Crossref]
B. Sassolas, Q. Benoît, R. Flaminio, D. Forest, J. Franc, M. Galimberti, A. Lacoudre, C. Michel, J. L. Montorio, N. Morgado, and L. Pinard, “Thickness uniformity improvement for the twin mirrors used in advanced gravitational wave detectors,” Proc. SPIE 8168, 81681Q, 81681Q-8 (2011).
[Crossref]
C. C. Jaing, “Designs of masks in thickness uniformity,” Proc. SPIE 7655, 76551Q, 76551Q-8 (2010).
[Crossref]
H. H. Bauer, M. Heller, and N. Kaiser, “Optical coatings for UV photolithography systems,” Proc. SPIE 2776, 353–365 (1996).
[Crossref]
P. Kelkar, B. Tirri, R. Wilklow, and D. Peterson, “Deposition and characterization of challenging DUV coatings,” Proc. SPIE 7606, 706708, 706708-8 (2008).
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