B.-H. Liao, C.-C. Lee, C.-C. Jaing, and M.-C. Liu, “Optical and mechanical properties of AlF3 films produced by pulse magnetron sputtering of Al targets with CF4/O2 gas,” Opt. Rev. 16(4), 505–510 (2009).
[Crossref]
Z. Shi, V. Kochergin, and F. Wang, “193nm Superlens imaging structure for 20nm lithography node,” Opt. Express 17(14), 11309–11314 (2009).
[Crossref]
[PubMed]
M.-C. Liu, C.-C. Lee, B.-H. Liao, M. Kaneko, K. Nakahira, and Y. Takano, “Fluoride antireflection coatings deposited at 193 nm,” Appl. Opt. 47(13), C214–C218 (2008).
[Crossref]
[PubMed]
C.-C. Lee, B.-H. Liao, and M.-C. Liu, “Developing new manufacturing methods for the improvement of AlF3 thin films,” Opt. Express 16(10), 6904–6909 (2008).
[Crossref]
[PubMed]
M. Yang, A. Gatto, and N. Kaiser, “Highly reflecting aluminum-protected optical coatings for the vacuum-ultraviolet spectral range,” Appl. Opt. 45(1), 178–183 (2006).
[Crossref]
[PubMed]
T. Yoshida, K. Nishimoto, K. Sekine, and K. Etoh, “Fluoride antireflection coatings for deep ultraviolet optics deposited by ion-beam sputtering,” Appl. Opt. 45(7), 1375–1379 (2006).
[Crossref]
[PubMed]
A. Gatto, M. Yang, N. Kaiser, J. Heber, J. U. Schmidt, T. Sandner, H. Schenk, and H. Lakner, “High-performance coatings for micromechanical mirrors,” Appl. Opt. 45(7), 1602–1607 (2006).
[Crossref]
[PubMed]
Y. Taki, “Film structure and optical constants of magnetron-sputtered fluoride films for deep ultraviolet lithography,” Vacuum 74(3-4), 431–435 (2004).
[Crossref]
A. Duparre´, R. Thielsch, N. Kaiser, S. Jakobs, K. Mann, and E. Eva, “Surface finish and optical quality of CaF2 for UV lithography applications,” Proc. SPIE 3334, 1048–1054 (1998).
[Crossref]
U. Stamm, R. Paetzel, I. Bragin, J. Kleinschmidt, D. Basting, and F. Voss, “Recent developments in industrial excimer laser technology,” Proc. SPIE 3092, 485–492 (1997).
[Crossref]
J. J. Cullen, P. J. Neale, and M. P. Lesser, “Biological weighting function for the inhibition of phytoplankton photosynthesis by ultraviolet radiation,” Science 258(5082), 646–650 (1992).
[Crossref]
[PubMed]
M. J. Kushner, “A kinetic study of plasma-etching process. I. A model for the etching of Si and SiO2 in CnFm/H2 and CnFm/O2 plasmas,” J. Appl. Phys. 53(4), 2923–2938 (1982).
[Crossref]
U. Stamm, R. Paetzel, I. Bragin, J. Kleinschmidt, D. Basting, and F. Voss, “Recent developments in industrial excimer laser technology,” Proc. SPIE 3092, 485–492 (1997).
[Crossref]
U. Stamm, R. Paetzel, I. Bragin, J. Kleinschmidt, D. Basting, and F. Voss, “Recent developments in industrial excimer laser technology,” Proc. SPIE 3092, 485–492 (1997).
[Crossref]
J. J. Cullen, P. J. Neale, and M. P. Lesser, “Biological weighting function for the inhibition of phytoplankton photosynthesis by ultraviolet radiation,” Science 258(5082), 646–650 (1992).
[Crossref]
[PubMed]
A. Duparre´, R. Thielsch, N. Kaiser, S. Jakobs, K. Mann, and E. Eva, “Surface finish and optical quality of CaF2 for UV lithography applications,” Proc. SPIE 3334, 1048–1054 (1998).
[Crossref]
A. Duparre´, R. Thielsch, N. Kaiser, S. Jakobs, K. Mann, and E. Eva, “Surface finish and optical quality of CaF2 for UV lithography applications,” Proc. SPIE 3334, 1048–1054 (1998).
[Crossref]
A. Gatto, M. Yang, N. Kaiser, J. Heber, J. U. Schmidt, T. Sandner, H. Schenk, and H. Lakner, “High-performance coatings for micromechanical mirrors,” Appl. Opt. 45(7), 1602–1607 (2006).
[Crossref]
[PubMed]
M. Yang, A. Gatto, and N. Kaiser, “Highly reflecting aluminum-protected optical coatings for the vacuum-ultraviolet spectral range,” Appl. Opt. 45(1), 178–183 (2006).
[Crossref]
[PubMed]
A. Gatto, M. Yang, N. Kaiser, J. Heber, J. U. Schmidt, T. Sandner, H. Schenk, and H. Lakner, “High-performance coatings for micromechanical mirrors,” Appl. Opt. 45(7), 1602–1607 (2006).
[Crossref]
[PubMed]
B.-H. Liao, C.-C. Lee, C.-C. Jaing, and M.-C. Liu, “Optical and mechanical properties of AlF3 films produced by pulse magnetron sputtering of Al targets with CF4/O2 gas,” Opt. Rev. 16(4), 505–510 (2009).
[Crossref]
A. Duparre´, R. Thielsch, N. Kaiser, S. Jakobs, K. Mann, and E. Eva, “Surface finish and optical quality of CaF2 for UV lithography applications,” Proc. SPIE 3334, 1048–1054 (1998).
[Crossref]
M. Yang, A. Gatto, and N. Kaiser, “Highly reflecting aluminum-protected optical coatings for the vacuum-ultraviolet spectral range,” Appl. Opt. 45(1), 178–183 (2006).
[Crossref]
[PubMed]
A. Gatto, M. Yang, N. Kaiser, J. Heber, J. U. Schmidt, T. Sandner, H. Schenk, and H. Lakner, “High-performance coatings for micromechanical mirrors,” Appl. Opt. 45(7), 1602–1607 (2006).
[Crossref]
[PubMed]
A. Duparre´, R. Thielsch, N. Kaiser, S. Jakobs, K. Mann, and E. Eva, “Surface finish and optical quality of CaF2 for UV lithography applications,” Proc. SPIE 3334, 1048–1054 (1998).
[Crossref]
U. Stamm, R. Paetzel, I. Bragin, J. Kleinschmidt, D. Basting, and F. Voss, “Recent developments in industrial excimer laser technology,” Proc. SPIE 3092, 485–492 (1997).
[Crossref]
M. J. Kushner, “A kinetic study of plasma-etching process. I. A model for the etching of Si and SiO2 in CnFm/H2 and CnFm/O2 plasmas,” J. Appl. Phys. 53(4), 2923–2938 (1982).
[Crossref]
A. Gatto, M. Yang, N. Kaiser, J. Heber, J. U. Schmidt, T. Sandner, H. Schenk, and H. Lakner, “High-performance coatings for micromechanical mirrors,” Appl. Opt. 45(7), 1602–1607 (2006).
[Crossref]
[PubMed]
B.-H. Liao, C.-C. Lee, C.-C. Jaing, and M.-C. Liu, “Optical and mechanical properties of AlF3 films produced by pulse magnetron sputtering of Al targets with CF4/O2 gas,” Opt. Rev. 16(4), 505–510 (2009).
[Crossref]
M.-C. Liu, C.-C. Lee, B.-H. Liao, M. Kaneko, K. Nakahira, and Y. Takano, “Fluoride antireflection coatings deposited at 193 nm,” Appl. Opt. 47(13), C214–C218 (2008).
[Crossref]
[PubMed]
C.-C. Lee, B.-H. Liao, and M.-C. Liu, “Developing new manufacturing methods for the improvement of AlF3 thin films,” Opt. Express 16(10), 6904–6909 (2008).
[Crossref]
[PubMed]
J. J. Cullen, P. J. Neale, and M. P. Lesser, “Biological weighting function for the inhibition of phytoplankton photosynthesis by ultraviolet radiation,” Science 258(5082), 646–650 (1992).
[Crossref]
[PubMed]
B.-H. Liao, C.-C. Lee, C.-C. Jaing, and M.-C. Liu, “Optical and mechanical properties of AlF3 films produced by pulse magnetron sputtering of Al targets with CF4/O2 gas,” Opt. Rev. 16(4), 505–510 (2009).
[Crossref]
C.-C. Lee, B.-H. Liao, and M.-C. Liu, “Developing new manufacturing methods for the improvement of AlF3 thin films,” Opt. Express 16(10), 6904–6909 (2008).
[Crossref]
[PubMed]
M.-C. Liu, C.-C. Lee, B.-H. Liao, M. Kaneko, K. Nakahira, and Y. Takano, “Fluoride antireflection coatings deposited at 193 nm,” Appl. Opt. 47(13), C214–C218 (2008).
[Crossref]
[PubMed]
B.-H. Liao, C.-C. Lee, C.-C. Jaing, and M.-C. Liu, “Optical and mechanical properties of AlF3 films produced by pulse magnetron sputtering of Al targets with CF4/O2 gas,” Opt. Rev. 16(4), 505–510 (2009).
[Crossref]
M.-C. Liu, C.-C. Lee, B.-H. Liao, M. Kaneko, K. Nakahira, and Y. Takano, “Fluoride antireflection coatings deposited at 193 nm,” Appl. Opt. 47(13), C214–C218 (2008).
[Crossref]
[PubMed]
C.-C. Lee, B.-H. Liao, and M.-C. Liu, “Developing new manufacturing methods for the improvement of AlF3 thin films,” Opt. Express 16(10), 6904–6909 (2008).
[Crossref]
[PubMed]
A. Duparre´, R. Thielsch, N. Kaiser, S. Jakobs, K. Mann, and E. Eva, “Surface finish and optical quality of CaF2 for UV lithography applications,” Proc. SPIE 3334, 1048–1054 (1998).
[Crossref]
J. J. Cullen, P. J. Neale, and M. P. Lesser, “Biological weighting function for the inhibition of phytoplankton photosynthesis by ultraviolet radiation,” Science 258(5082), 646–650 (1992).
[Crossref]
[PubMed]
U. Stamm, R. Paetzel, I. Bragin, J. Kleinschmidt, D. Basting, and F. Voss, “Recent developments in industrial excimer laser technology,” Proc. SPIE 3092, 485–492 (1997).
[Crossref]
A. Gatto, M. Yang, N. Kaiser, J. Heber, J. U. Schmidt, T. Sandner, H. Schenk, and H. Lakner, “High-performance coatings for micromechanical mirrors,” Appl. Opt. 45(7), 1602–1607 (2006).
[Crossref]
[PubMed]
A. Gatto, M. Yang, N. Kaiser, J. Heber, J. U. Schmidt, T. Sandner, H. Schenk, and H. Lakner, “High-performance coatings for micromechanical mirrors,” Appl. Opt. 45(7), 1602–1607 (2006).
[Crossref]
[PubMed]
A. Gatto, M. Yang, N. Kaiser, J. Heber, J. U. Schmidt, T. Sandner, H. Schenk, and H. Lakner, “High-performance coatings for micromechanical mirrors,” Appl. Opt. 45(7), 1602–1607 (2006).
[Crossref]
[PubMed]
U. Stamm, R. Paetzel, I. Bragin, J. Kleinschmidt, D. Basting, and F. Voss, “Recent developments in industrial excimer laser technology,” Proc. SPIE 3092, 485–492 (1997).
[Crossref]
Y. Taki, “Film structure and optical constants of magnetron-sputtered fluoride films for deep ultraviolet lithography,” Vacuum 74(3-4), 431–435 (2004).
[Crossref]
A. Duparre´, R. Thielsch, N. Kaiser, S. Jakobs, K. Mann, and E. Eva, “Surface finish and optical quality of CaF2 for UV lithography applications,” Proc. SPIE 3334, 1048–1054 (1998).
[Crossref]
U. Stamm, R. Paetzel, I. Bragin, J. Kleinschmidt, D. Basting, and F. Voss, “Recent developments in industrial excimer laser technology,” Proc. SPIE 3092, 485–492 (1997).
[Crossref]
A. Gatto, M. Yang, N. Kaiser, J. Heber, J. U. Schmidt, T. Sandner, H. Schenk, and H. Lakner, “High-performance coatings for micromechanical mirrors,” Appl. Opt. 45(7), 1602–1607 (2006).
[Crossref]
[PubMed]
M. Yang, A. Gatto, and N. Kaiser, “Highly reflecting aluminum-protected optical coatings for the vacuum-ultraviolet spectral range,” Appl. Opt. 45(1), 178–183 (2006).
[Crossref]
[PubMed]
M. Yang, A. Gatto, and N. Kaiser, “Highly reflecting aluminum-protected optical coatings for the vacuum-ultraviolet spectral range,” Appl. Opt. 45(1), 178–183 (2006).
[Crossref]
[PubMed]
T. Yoshida, K. Nishimoto, K. Sekine, and K. Etoh, “Fluoride antireflection coatings for deep ultraviolet optics deposited by ion-beam sputtering,” Appl. Opt. 45(7), 1375–1379 (2006).
[Crossref]
[PubMed]
A. Gatto, M. Yang, N. Kaiser, J. Heber, J. U. Schmidt, T. Sandner, H. Schenk, and H. Lakner, “High-performance coatings for micromechanical mirrors,” Appl. Opt. 45(7), 1602–1607 (2006).
[Crossref]
[PubMed]
M.-C. Liu, C.-C. Lee, B.-H. Liao, M. Kaneko, K. Nakahira, and Y. Takano, “Fluoride antireflection coatings deposited at 193 nm,” Appl. Opt. 47(13), C214–C218 (2008).
[Crossref]
[PubMed]
M. J. Kushner, “A kinetic study of plasma-etching process. I. A model for the etching of Si and SiO2 in CnFm/H2 and CnFm/O2 plasmas,” J. Appl. Phys. 53(4), 2923–2938 (1982).
[Crossref]
C.-C. Lee, B.-H. Liao, and M.-C. Liu, “Developing new manufacturing methods for the improvement of AlF3 thin films,” Opt. Express 16(10), 6904–6909 (2008).
[Crossref]
[PubMed]
Z. Shi, V. Kochergin, and F. Wang, “193nm Superlens imaging structure for 20nm lithography node,” Opt. Express 17(14), 11309–11314 (2009).
[Crossref]
[PubMed]
B.-H. Liao, C.-C. Lee, C.-C. Jaing, and M.-C. Liu, “Optical and mechanical properties of AlF3 films produced by pulse magnetron sputtering of Al targets with CF4/O2 gas,” Opt. Rev. 16(4), 505–510 (2009).
[Crossref]
U. Stamm, R. Paetzel, I. Bragin, J. Kleinschmidt, D. Basting, and F. Voss, “Recent developments in industrial excimer laser technology,” Proc. SPIE 3092, 485–492 (1997).
[Crossref]
A. Duparre´, R. Thielsch, N. Kaiser, S. Jakobs, K. Mann, and E. Eva, “Surface finish and optical quality of CaF2 for UV lithography applications,” Proc. SPIE 3334, 1048–1054 (1998).
[Crossref]
J. J. Cullen, P. J. Neale, and M. P. Lesser, “Biological weighting function for the inhibition of phytoplankton photosynthesis by ultraviolet radiation,” Science 258(5082), 646–650 (1992).
[Crossref]
[PubMed]
Y. Taki, “Film structure and optical constants of magnetron-sputtered fluoride films for deep ultraviolet lithography,” Vacuum 74(3-4), 431–435 (2004).
[Crossref]