H. Huang and F. L. Terry., “Spectroscopic ellipsometry and reflectometry from gratings (Scatterometry) for critical dimension measurement and in situ, real-time process monitoring,” Thin Solid Films 455-456, 828–836 (2004).
[Crossref]
X. Niu, N. Jakatdar, J. Bao, and C. J. Spanos, “Specular Spectroscopic Scatterometry,” IEEE Trans. Semicond. Manuf. 14(2), 97–111 (2001).
[Crossref]
H. Huang, W. Kong, and F. L. Terry., “Normal-incidence spectroscopic ellipsometry for critical dimension monitoring,” Appl. Phys. Lett. 78(25), 3983–3985 (2001).
[Crossref]
B. S. Stutzman, H. Huang, and F. L. Terry., “Two-channel spectroscopic reflectometry for in situ monitoring of blanket and patterned structures during reactive ion etching,” J. Vac. Sci. Technol. B 18(6), 2785–2793 (2000).
[Crossref]
E. Cuche, F. Bevilacqua, and C. Depeursinge, “Digital holography for quantitative phase-contrast imaging,” Opt. Lett. 24(5), 291–293 (1999).
[Crossref]
[PubMed]
L. Gallmann, D. H. Sutter, N. Matuschek, G. Steinmeyer, U. Keller, C. Iaconis, and I. A. Walmsley, “Characterization of sub-6-fs optical pulses with spectral phase interferometry for direct electric-field reconstruction,” Opt. Lett. 24(18), 1314–1316 (1999).
[Crossref]
[PubMed]
K. Oka and T. Kato, “Spectroscopic polarimetry with a channeled spectrum,” Opt. Lett. 24(21), 1475–1477 (1999).
[Crossref]
[PubMed]
M. G. Moharam, D. A. Pommet, E. B. Grann, and T. K. Gaylord, “Stable implementation of the rigorous coupled-wave anlysis for surface-relief gratings: enhanced transmittance matrix approach,” J. Opt. Soc. Am. 12(5), 1077–1086 (1995).
[Crossref]
M. G. Moharam, E. Grann, D. Pommet, and T. K. Gaylord, “Formulation for stable and efficient implementation of the rigorous coupled-wave analysis of binary grating,” J. Opt. Soc. Am. A 12(5), 1068–1076 (1995).
[Crossref]
X. Niu, N. Jakatdar, J. Bao, and C. J. Spanos, “Specular Spectroscopic Scatterometry,” IEEE Trans. Semicond. Manuf. 14(2), 97–111 (2001).
[Crossref]
M. G. Moharam, D. A. Pommet, E. B. Grann, and T. K. Gaylord, “Stable implementation of the rigorous coupled-wave anlysis for surface-relief gratings: enhanced transmittance matrix approach,” J. Opt. Soc. Am. 12(5), 1077–1086 (1995).
[Crossref]
M. G. Moharam, E. Grann, D. Pommet, and T. K. Gaylord, “Formulation for stable and efficient implementation of the rigorous coupled-wave analysis of binary grating,” J. Opt. Soc. Am. A 12(5), 1068–1076 (1995).
[Crossref]
M. G. Moharam, D. A. Pommet, E. B. Grann, and T. K. Gaylord, “Stable implementation of the rigorous coupled-wave anlysis for surface-relief gratings: enhanced transmittance matrix approach,” J. Opt. Soc. Am. 12(5), 1077–1086 (1995).
[Crossref]
H. Huang and F. L. Terry., “Spectroscopic ellipsometry and reflectometry from gratings (Scatterometry) for critical dimension measurement and in situ, real-time process monitoring,” Thin Solid Films 455-456, 828–836 (2004).
[Crossref]
H. Huang, W. Kong, and F. L. Terry., “Normal-incidence spectroscopic ellipsometry for critical dimension monitoring,” Appl. Phys. Lett. 78(25), 3983–3985 (2001).
[Crossref]
B. S. Stutzman, H. Huang, and F. L. Terry., “Two-channel spectroscopic reflectometry for in situ monitoring of blanket and patterned structures during reactive ion etching,” J. Vac. Sci. Technol. B 18(6), 2785–2793 (2000).
[Crossref]
X. Niu, N. Jakatdar, J. Bao, and C. J. Spanos, “Specular Spectroscopic Scatterometry,” IEEE Trans. Semicond. Manuf. 14(2), 97–111 (2001).
[Crossref]
D. G. Abdelsalam, R. Magnusson, and D. Kim, “Single-shot, dual-wavelength digital holography based on polarizing separation,” Appl. Opt. 50(19), 3360–3368 (2011).
[Crossref]
[PubMed]
D. Kim, S. Kim, H. J. Kong, and Y. Lee, “Measurement of the thickness profile of a transparent thin film deposited upon a pattern structure with an acousto-optic tunablefilter,” Opt. Lett. 27(21), 1893–1895 (2002).
[Crossref]
[PubMed]
H. Huang, W. Kong, and F. L. Terry., “Normal-incidence spectroscopic ellipsometry for critical dimension monitoring,” Appl. Phys. Lett. 78(25), 3983–3985 (2001).
[Crossref]
M. G. Moharam, D. A. Pommet, E. B. Grann, and T. K. Gaylord, “Stable implementation of the rigorous coupled-wave anlysis for surface-relief gratings: enhanced transmittance matrix approach,” J. Opt. Soc. Am. 12(5), 1077–1086 (1995).
[Crossref]
M. G. Moharam, E. Grann, D. Pommet, and T. K. Gaylord, “Formulation for stable and efficient implementation of the rigorous coupled-wave analysis of binary grating,” J. Opt. Soc. Am. A 12(5), 1068–1076 (1995).
[Crossref]
X. Niu, N. Jakatdar, J. Bao, and C. J. Spanos, “Specular Spectroscopic Scatterometry,” IEEE Trans. Semicond. Manuf. 14(2), 97–111 (2001).
[Crossref]
M. G. Moharam, D. A. Pommet, E. B. Grann, and T. K. Gaylord, “Stable implementation of the rigorous coupled-wave anlysis for surface-relief gratings: enhanced transmittance matrix approach,” J. Opt. Soc. Am. 12(5), 1077–1086 (1995).
[Crossref]
X. Niu, N. Jakatdar, J. Bao, and C. J. Spanos, “Specular Spectroscopic Scatterometry,” IEEE Trans. Semicond. Manuf. 14(2), 97–111 (2001).
[Crossref]
B. S. Stutzman, H. Huang, and F. L. Terry., “Two-channel spectroscopic reflectometry for in situ monitoring of blanket and patterned structures during reactive ion etching,” J. Vac. Sci. Technol. B 18(6), 2785–2793 (2000).
[Crossref]
H. Huang and F. L. Terry., “Spectroscopic ellipsometry and reflectometry from gratings (Scatterometry) for critical dimension measurement and in situ, real-time process monitoring,” Thin Solid Films 455-456, 828–836 (2004).
[Crossref]
H. Huang, W. Kong, and F. L. Terry., “Normal-incidence spectroscopic ellipsometry for critical dimension monitoring,” Appl. Phys. Lett. 78(25), 3983–3985 (2001).
[Crossref]
B. S. Stutzman, H. Huang, and F. L. Terry., “Two-channel spectroscopic reflectometry for in situ monitoring of blanket and patterned structures during reactive ion etching,” J. Vac. Sci. Technol. B 18(6), 2785–2793 (2000).
[Crossref]
H. Huang, W. Kong, and F. L. Terry., “Normal-incidence spectroscopic ellipsometry for critical dimension monitoring,” Appl. Phys. Lett. 78(25), 3983–3985 (2001).
[Crossref]
X. Niu, N. Jakatdar, J. Bao, and C. J. Spanos, “Specular Spectroscopic Scatterometry,” IEEE Trans. Semicond. Manuf. 14(2), 97–111 (2001).
[Crossref]
M. Takeda, H. Ina, and S. Kobayashi, “Fourier-transform method of fringe-pattern analysis for computer-based topography and interferometry,” J. Opt. Soc. Am. 72(1), 156–160 (1982).
[Crossref]
M. G. Moharam, D. A. Pommet, E. B. Grann, and T. K. Gaylord, “Stable implementation of the rigorous coupled-wave anlysis for surface-relief gratings: enhanced transmittance matrix approach,” J. Opt. Soc. Am. 12(5), 1077–1086 (1995).
[Crossref]
B. S. Stutzman, H. Huang, and F. L. Terry., “Two-channel spectroscopic reflectometry for in situ monitoring of blanket and patterned structures during reactive ion etching,” J. Vac. Sci. Technol. B 18(6), 2785–2793 (2000).
[Crossref]
E. Cuche, F. Bevilacqua, and C. Depeursinge, “Digital holography for quantitative phase-contrast imaging,” Opt. Lett. 24(5), 291–293 (1999).
[Crossref]
[PubMed]
L. Gallmann, D. H. Sutter, N. Matuschek, G. Steinmeyer, U. Keller, C. Iaconis, and I. A. Walmsley, “Characterization of sub-6-fs optical pulses with spectral phase interferometry for direct electric-field reconstruction,” Opt. Lett. 24(18), 1314–1316 (1999).
[Crossref]
[PubMed]
K. Oka and T. Kato, “Spectroscopic polarimetry with a channeled spectrum,” Opt. Lett. 24(21), 1475–1477 (1999).
[Crossref]
[PubMed]
D. Kim, S. Kim, H. J. Kong, and Y. Lee, “Measurement of the thickness profile of a transparent thin film deposited upon a pattern structure with an acousto-optic tunablefilter,” Opt. Lett. 27(21), 1893–1895 (2002).
[Crossref]
[PubMed]
H. Huang and F. L. Terry., “Spectroscopic ellipsometry and reflectometry from gratings (Scatterometry) for critical dimension measurement and in situ, real-time process monitoring,” Thin Solid Films 455-456, 828–836 (2004).
[Crossref]
The Levenberg-Marquardt algorithm is available as lsqnonlin function by a commercial S/W MATLAB.
W. Yang, J. Hu, R. Lowe-Webb, R. Korlahalli, D. Shivaprasad, H. Sasano, W. Liu, and D. S. Mui, “Line-profile and critical dimension measurements using a normal incidence optical metrology system ,” in Advanced Semiconductor Manufacturing 2002 IEEE/SEMI Conference and Workshop (IEEE, 2002), pp. 119–124.
A. Sezginer, “Scatterometry by phase sensitive reflectometer,” U.S. Patent no. 6,985,232 B2 (Jan. 10, 2006).