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[CrossRef]

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[CrossRef]

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[CrossRef]

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[CrossRef]

C. Hung, B. Zhang, E. Guo, L. Pang, Y. Liu, K. Wang, and G. Dai, “Pushing the lithography limit: Applying inverse lithography technology (ILT) at the 65nm generation,” Proc. SPIE 6154, 61541M (2006).

[CrossRef]

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[CrossRef]

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[CrossRef]

W. Huang, C. Lin, C. Kuo, C. Huang, J. Lin, J. Chen, R. Liu, Y. Ku, and B. Lin, “Two threshold resist models for optical proximity correction,” Proc. SPIE 5377, 1536–1543 (2001).

[CrossRef]

C. Hung, B. Zhang, E. Guo, L. Pang, Y. Liu, K. Wang, and G. Dai, “Pushing the lithography limit: Applying inverse lithography technology (ILT) at the 65nm generation,” Proc. SPIE 6154, 61541M (2006).

[CrossRef]

W. Huang, C. Lin, C. Kuo, C. Huang, J. Lin, J. Chen, R. Liu, Y. Ku, and B. Lin, “Two threshold resist models for optical proximity correction,” Proc. SPIE 5377, 1536–1543 (2001).

[CrossRef]

W. Huang, C. Lin, C. Kuo, C. Huang, J. Lin, J. Chen, R. Liu, Y. Ku, and B. Lin, “Two threshold resist models for optical proximity correction,” Proc. SPIE 5377, 1536–1543 (2001).

[CrossRef]

W. Huang, C. Lin, C. Kuo, C. Huang, J. Lin, J. Chen, R. Liu, Y. Ku, and B. Lin, “Two threshold resist models for optical proximity correction,” Proc. SPIE 5377, 1536–1543 (2001).

[CrossRef]

W. Huang, C. Lin, C. Kuo, C. Huang, J. Lin, J. Chen, R. Liu, Y. Ku, and B. Lin, “Two threshold resist models for optical proximity correction,” Proc. SPIE 5377, 1536–1543 (2001).

[CrossRef]

W. Huang, C. Lin, C. Kuo, C. Huang, J. Lin, J. Chen, R. Liu, Y. Ku, and B. Lin, “Two threshold resist models for optical proximity correction,” Proc. SPIE 5377, 1536–1543 (2001).

[CrossRef]

W. Huang, C. Lin, C. Kuo, C. Huang, J. Lin, J. Chen, R. Liu, Y. Ku, and B. Lin, “Two threshold resist models for optical proximity correction,” Proc. SPIE 5377, 1536–1543 (2001).

[CrossRef]

L. Pang, Y. Liu, and D. Abrams, “Inverse lithography technology (ILT): What is the impact to the photomask industry?” Proc. SPIE 6283, 62830X (2006).

[CrossRef]

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[CrossRef]

L. Pang, Y. Liu, and D. Abrams, “Inverse lithography technology (ILT): What is the impact to the photomask industry?” Proc. SPIE 6283, 62830X (2006).

[CrossRef]

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S. Sherif, B. Saleh, and R. De Leone, “Binary image synthesis using mixed linear integer programming,” IEEE Trans. Image Process. 4(9), 1252–1257 (1995).

[CrossRef]
[PubMed]

C. Hung, B. Zhang, E. Guo, L. Pang, Y. Liu, K. Wang, and G. Dai, “Pushing the lithography limit: Applying inverse lithography technology (ILT) at the 65nm generation,” Proc. SPIE 6154, 61541M (2006).

[CrossRef]

J.-C. Yu, P. Yu, and H.-Y. Chao, “Model-based sub-resolution assist features using an inverse lithography method,” Proc. SPIE 7140, 714014 (2008).

[CrossRef]

J.-C. Yu, P. Yu, and H.-Y. Chao, “Model-based sub-resolution assist features using an inverse lithography method,” Proc. SPIE 7140, 714014 (2008).

[CrossRef]

C. Hung, B. Zhang, E. Guo, L. Pang, Y. Liu, K. Wang, and G. Dai, “Pushing the lithography limit: Applying inverse lithography technology (ILT) at the 65nm generation,” Proc. SPIE 6154, 61541M (2006).

[CrossRef]

S. Sherif, B. Saleh, and R. De Leone, “Binary image synthesis using mixed linear integer programming,” IEEE Trans. Image Process. 4(9), 1252–1257 (1995).

[CrossRef]
[PubMed]

A. Poonawala and P. Milanfar, “Mask design for optical microlithography--an inverse imaging problem,” IEEE Trans. Image Process. 16(3), 774–788 (2007).

[CrossRef]
[PubMed]

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[CrossRef]

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[CrossRef]
[PubMed]

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[CrossRef]
[PubMed]

W. Huang, C. Lin, C. Kuo, C. Huang, J. Lin, J. Chen, R. Liu, Y. Ku, and B. Lin, “Two threshold resist models for optical proximity correction,” Proc. SPIE 5377, 1536–1543 (2001).

[CrossRef]

D. S. Abrams and L. Pang, “Fast inverse lithography technology,” Proc. SPIE 6154, 534–542 (2006).

C. Hung, B. Zhang, E. Guo, L. Pang, Y. Liu, K. Wang, and G. Dai, “Pushing the lithography limit: Applying inverse lithography technology (ILT) at the 65nm generation,” Proc. SPIE 6154, 61541M (2006).

[CrossRef]

L. Pang, Y. Liu, and D. Abrams, “Inverse lithography technology (ILT): What is the impact to the photomask industry?” Proc. SPIE 6283, 62830X (2006).

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