Abstract

The interferogram of a high index phase mask of 200 nm period under normal incidence of a collimated beam at 244 nm wavelength with substantially suppressed zeroth order produces a 100 nm period grating in a resist film under immersion. The paper describes the phase mask design, its fabrication, the effect of electron-beam lithographic stitching errors and optical assessment of the fabricated sub-cutoff grating.

© 2010 OSA

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2010 (1)

2009 (2)

E. Gamet, F. Pigeon, and O. Parriaux, “Duty cycle tolerant binary gratings for fabricable short period phase masks,” J. Europ. Opt. Soc. Rap. Public. 4, 09047 (2009).
[CrossRef]

M. El Kodadi, S. Soulan, M. Besacier, and P. Schiavone, “Resist trimming etch process control using dynamic scatterometry,” Microelectron. Eng. 86(4-6), 1040–1042 (2009).
[CrossRef]

2008 (3)

2007 (3)

M. Daimon and A. Masumura, “Measurement of the refractive index of distilled water from the near-infrared region to the ultraviolet region,” Appl. Opt. 46(18), 3811–3820 (2007).
[CrossRef] [PubMed]

E. Gamet, A. V. Tishchenko, and O. Parriaux, “Cancellation of the zeroth order in a phase mask by mode interplay in a high index contrast binary grating,” Appl. Opt. 46(27), 6719–6726 (2007).
[CrossRef] [PubMed]

P. A. Zimmerman, C. Peski, B. Rice, J. Byers, N. J. Turro, X. Lei, J. L. Gejo, V. Liberman, S. Palmacci, M. Rothchild, A. Whitker, I. Blakey, L. Chen, B. Dargaville, and H. Liu, “Status of High-Index Materials for Generation-Three 193nm Immersion Lithography,” J. Photopolym. Sci. Technol. 20(5), 643–650 (2007).
[CrossRef]

2006 (1)

E. Gamet, Y. Jourlin, S. Pelissier, R. Min, S. Reynaud, C. Veillas, J. C. Pommier, and O. Parriaux, “Flying phase mask for the printing of long submicron-period stitchingless gratings,” Microelectron. Eng. 83(4-9), 734–737 (2006).
[CrossRef]

2005 (2)

D. Mawet, P. Riaud, J. Surdej, and J. Baudrand, “Subwavelength surface-relief gratings for stellar coronagraphy,” Appl. Opt. 44(34), 7313–7321 (2005).
[CrossRef] [PubMed]

A. V. Tishchenko, “Phenomenological representation of deep and high contrast lamellar gratings by means of the modal method,” Opt. Quantum Electron. 37(1-3), 309–330 (2005).
[CrossRef]

2004 (1)

A. Gombert, B. Bläsi, C. Bühler, P. Nitz, J. Mick, W. Hoßfeld, and M. Niggemann, “Some application cases and related manufacturing techniques for optically functional microstructures on large areas,” Opt. Eng. 43(11), 2525–2533 (2004).
[CrossRef]

2003 (1)

G. C. Chen, P. T. Konkola, R. K. Heilmann, and M. L. Schattenburg, “Nanomater-accurate grating fabrication with scanning beam interference lithography,” Proc. SPIE 4936, 126–134 (2003).
[CrossRef]

2002 (1)

T. Sato, K. Miura, N. Ishino, Y. Ohtera, T. Tamamura, and S. Kawakami, “Photonic crystals for the visible range fabricated by autocloning technique and their application,” Opt. Quantum Electron. 34(1/3), 63–70 (2002).
[CrossRef]

1998 (1)

1995 (1)

Ahn, M.

Baudrand, J.

Besacier, M.

M. El Kodadi, S. Soulan, M. Besacier, and P. Schiavone, “Resist trimming etch process control using dynamic scatterometry,” Microelectron. Eng. 86(4-6), 1040–1042 (2009).
[CrossRef]

Blakey, I.

P. A. Zimmerman, C. Peski, B. Rice, J. Byers, N. J. Turro, X. Lei, J. L. Gejo, V. Liberman, S. Palmacci, M. Rothchild, A. Whitker, I. Blakey, L. Chen, B. Dargaville, and H. Liu, “Status of High-Index Materials for Generation-Three 193nm Immersion Lithography,” J. Photopolym. Sci. Technol. 20(5), 643–650 (2007).
[CrossRef]

Bläsi, B.

A. Gombert, B. Bläsi, C. Bühler, P. Nitz, J. Mick, W. Hoßfeld, and M. Niggemann, “Some application cases and related manufacturing techniques for optically functional microstructures on large areas,” Opt. Eng. 43(11), 2525–2533 (2004).
[CrossRef]

Bühler, C.

A. Gombert, B. Bläsi, C. Bühler, P. Nitz, J. Mick, W. Hoßfeld, and M. Niggemann, “Some application cases and related manufacturing techniques for optically functional microstructures on large areas,” Opt. Eng. 43(11), 2525–2533 (2004).
[CrossRef]

Byers, J.

P. A. Zimmerman, C. Peski, B. Rice, J. Byers, N. J. Turro, X. Lei, J. L. Gejo, V. Liberman, S. Palmacci, M. Rothchild, A. Whitker, I. Blakey, L. Chen, B. Dargaville, and H. Liu, “Status of High-Index Materials for Generation-Three 193nm Immersion Lithography,” J. Photopolym. Sci. Technol. 20(5), 643–650 (2007).
[CrossRef]

Chang, C.-H.

Chen, G. C.

G. C. Chen, P. T. Konkola, R. K. Heilmann, and M. L. Schattenburg, “Nanomater-accurate grating fabrication with scanning beam interference lithography,” Proc. SPIE 4936, 126–134 (2003).
[CrossRef]

Chen, L.

P. A. Zimmerman, C. Peski, B. Rice, J. Byers, N. J. Turro, X. Lei, J. L. Gejo, V. Liberman, S. Palmacci, M. Rothchild, A. Whitker, I. Blakey, L. Chen, B. Dargaville, and H. Liu, “Status of High-Index Materials for Generation-Three 193nm Immersion Lithography,” J. Photopolym. Sci. Technol. 20(5), 643–650 (2007).
[CrossRef]

Daimon, M.

Dargaville, B.

P. A. Zimmerman, C. Peski, B. Rice, J. Byers, N. J. Turro, X. Lei, J. L. Gejo, V. Liberman, S. Palmacci, M. Rothchild, A. Whitker, I. Blakey, L. Chen, B. Dargaville, and H. Liu, “Status of High-Index Materials for Generation-Three 193nm Immersion Lithography,” J. Photopolym. Sci. Technol. 20(5), 643–650 (2007).
[CrossRef]

Djurišic, A. B.

El Kodadi, M.

M. El Kodadi, S. Soulan, M. Besacier, and P. Schiavone, “Resist trimming etch process control using dynamic scatterometry,” Microelectron. Eng. 86(4-6), 1040–1042 (2009).
[CrossRef]

Fehrembach, A. L.

Gamet, E.

E. Gamet, F. Pigeon, and O. Parriaux, “Duty cycle tolerant binary gratings for fabricable short period phase masks,” J. Europ. Opt. Soc. Rap. Public. 4, 09047 (2009).
[CrossRef]

E. Gamet, A. V. Tishchenko, and O. Parriaux, “Cancellation of the zeroth order in a phase mask by mode interplay in a high index contrast binary grating,” Appl. Opt. 46(27), 6719–6726 (2007).
[CrossRef] [PubMed]

E. Gamet, Y. Jourlin, S. Pelissier, R. Min, S. Reynaud, C. Veillas, J. C. Pommier, and O. Parriaux, “Flying phase mask for the printing of long submicron-period stitchingless gratings,” Microelectron. Eng. 83(4-9), 734–737 (2006).
[CrossRef]

Gejo, J. L.

P. A. Zimmerman, C. Peski, B. Rice, J. Byers, N. J. Turro, X. Lei, J. L. Gejo, V. Liberman, S. Palmacci, M. Rothchild, A. Whitker, I. Blakey, L. Chen, B. Dargaville, and H. Liu, “Status of High-Index Materials for Generation-Three 193nm Immersion Lithography,” J. Photopolym. Sci. Technol. 20(5), 643–650 (2007).
[CrossRef]

Gombert, A.

A. Gombert, B. Bläsi, C. Bühler, P. Nitz, J. Mick, W. Hoßfeld, and M. Niggemann, “Some application cases and related manufacturing techniques for optically functional microstructures on large areas,” Opt. Eng. 43(11), 2525–2533 (2004).
[CrossRef]

Gullikson, E. M.

Hara, S. I.

K. Sakai, Y. Iwasaki, S. Mori, A. Yamada, M. Ogusu, K. Yamashita, T. Nishikawara, S. I. Hara, and Y. Watanabe, “Feasibility Study on Immersion System Using High-Index Materials,” Jpn. J. Appl. Phys. 47(6), 4853–4861 (2008).
[CrossRef]

Heilmann, R. K.

Heine, C.

Hoßfeld, W.

A. Gombert, B. Bläsi, C. Bühler, P. Nitz, J. Mick, W. Hoßfeld, and M. Niggemann, “Some application cases and related manufacturing techniques for optically functional microstructures on large areas,” Opt. Eng. 43(11), 2525–2533 (2004).
[CrossRef]

Ishino, N.

T. Sato, K. Miura, N. Ishino, Y. Ohtera, T. Tamamura, and S. Kawakami, “Photonic crystals for the visible range fabricated by autocloning technique and their application,” Opt. Quantum Electron. 34(1/3), 63–70 (2002).
[CrossRef]

Iwasaki, Y.

K. Sakai, Y. Iwasaki, S. Mori, A. Yamada, M. Ogusu, K. Yamashita, T. Nishikawara, S. I. Hara, and Y. Watanabe, “Feasibility Study on Immersion System Using High-Index Materials,” Jpn. J. Appl. Phys. 47(6), 4853–4861 (2008).
[CrossRef]

Jourlin, Y.

E. Gamet, Y. Jourlin, S. Pelissier, R. Min, S. Reynaud, C. Veillas, J. C. Pommier, and O. Parriaux, “Flying phase mask for the printing of long submicron-period stitchingless gratings,” Microelectron. Eng. 83(4-9), 734–737 (2006).
[CrossRef]

Kawakami, S.

T. Sato, K. Miura, N. Ishino, Y. Ohtera, T. Tamamura, and S. Kawakami, “Photonic crystals for the visible range fabricated by autocloning technique and their application,” Opt. Quantum Electron. 34(1/3), 63–70 (2002).
[CrossRef]

Konkola, P. T.

G. C. Chen, P. T. Konkola, R. K. Heilmann, and M. L. Schattenburg, “Nanomater-accurate grating fabrication with scanning beam interference lithography,” Proc. SPIE 4936, 126–134 (2003).
[CrossRef]

Lei, X.

P. A. Zimmerman, C. Peski, B. Rice, J. Byers, N. J. Turro, X. Lei, J. L. Gejo, V. Liberman, S. Palmacci, M. Rothchild, A. Whitker, I. Blakey, L. Chen, B. Dargaville, and H. Liu, “Status of High-Index Materials for Generation-Three 193nm Immersion Lithography,” J. Photopolym. Sci. Technol. 20(5), 643–650 (2007).
[CrossRef]

Lemarchand, F.

Li, E. H.

Liberman, V.

P. A. Zimmerman, C. Peski, B. Rice, J. Byers, N. J. Turro, X. Lei, J. L. Gejo, V. Liberman, S. Palmacci, M. Rothchild, A. Whitker, I. Blakey, L. Chen, B. Dargaville, and H. Liu, “Status of High-Index Materials for Generation-Three 193nm Immersion Lithography,” J. Photopolym. Sci. Technol. 20(5), 643–650 (2007).
[CrossRef]

Liu, H.

P. A. Zimmerman, C. Peski, B. Rice, J. Byers, N. J. Turro, X. Lei, J. L. Gejo, V. Liberman, S. Palmacci, M. Rothchild, A. Whitker, I. Blakey, L. Chen, B. Dargaville, and H. Liu, “Status of High-Index Materials for Generation-Three 193nm Immersion Lithography,” J. Photopolym. Sci. Technol. 20(5), 643–650 (2007).
[CrossRef]

Masumura, A.

Mawet, D.

Mick, J.

A. Gombert, B. Bläsi, C. Bühler, P. Nitz, J. Mick, W. Hoßfeld, and M. Niggemann, “Some application cases and related manufacturing techniques for optically functional microstructures on large areas,” Opt. Eng. 43(11), 2525–2533 (2004).
[CrossRef]

Min, R.

E. Gamet, Y. Jourlin, S. Pelissier, R. Min, S. Reynaud, C. Veillas, J. C. Pommier, and O. Parriaux, “Flying phase mask for the printing of long submicron-period stitchingless gratings,” Microelectron. Eng. 83(4-9), 734–737 (2006).
[CrossRef]

Miura, K.

T. Sato, K. Miura, N. Ishino, Y. Ohtera, T. Tamamura, and S. Kawakami, “Photonic crystals for the visible range fabricated by autocloning technique and their application,” Opt. Quantum Electron. 34(1/3), 63–70 (2002).
[CrossRef]

Morf, R. H.

Mori, S.

K. Sakai, Y. Iwasaki, S. Mori, A. Yamada, M. Ogusu, K. Yamashita, T. Nishikawara, S. I. Hara, and Y. Watanabe, “Feasibility Study on Immersion System Using High-Index Materials,” Jpn. J. Appl. Phys. 47(6), 4853–4861 (2008).
[CrossRef]

Niggemann, M.

A. Gombert, B. Bläsi, C. Bühler, P. Nitz, J. Mick, W. Hoßfeld, and M. Niggemann, “Some application cases and related manufacturing techniques for optically functional microstructures on large areas,” Opt. Eng. 43(11), 2525–2533 (2004).
[CrossRef]

Nishikawara, T.

K. Sakai, Y. Iwasaki, S. Mori, A. Yamada, M. Ogusu, K. Yamashita, T. Nishikawara, S. I. Hara, and Y. Watanabe, “Feasibility Study on Immersion System Using High-Index Materials,” Jpn. J. Appl. Phys. 47(6), 4853–4861 (2008).
[CrossRef]

Nitz, P.

A. Gombert, B. Bläsi, C. Bühler, P. Nitz, J. Mick, W. Hoßfeld, and M. Niggemann, “Some application cases and related manufacturing techniques for optically functional microstructures on large areas,” Opt. Eng. 43(11), 2525–2533 (2004).
[CrossRef]

Ogusu, M.

K. Sakai, Y. Iwasaki, S. Mori, A. Yamada, M. Ogusu, K. Yamashita, T. Nishikawara, S. I. Hara, and Y. Watanabe, “Feasibility Study on Immersion System Using High-Index Materials,” Jpn. J. Appl. Phys. 47(6), 4853–4861 (2008).
[CrossRef]

Ohtera, Y.

T. Sato, K. Miura, N. Ishino, Y. Ohtera, T. Tamamura, and S. Kawakami, “Photonic crystals for the visible range fabricated by autocloning technique and their application,” Opt. Quantum Electron. 34(1/3), 63–70 (2002).
[CrossRef]

Palmacci, S.

P. A. Zimmerman, C. Peski, B. Rice, J. Byers, N. J. Turro, X. Lei, J. L. Gejo, V. Liberman, S. Palmacci, M. Rothchild, A. Whitker, I. Blakey, L. Chen, B. Dargaville, and H. Liu, “Status of High-Index Materials for Generation-Three 193nm Immersion Lithography,” J. Photopolym. Sci. Technol. 20(5), 643–650 (2007).
[CrossRef]

Parriaux, O.

E. Gamet, F. Pigeon, and O. Parriaux, “Duty cycle tolerant binary gratings for fabricable short period phase masks,” J. Europ. Opt. Soc. Rap. Public. 4, 09047 (2009).
[CrossRef]

E. Gamet, A. V. Tishchenko, and O. Parriaux, “Cancellation of the zeroth order in a phase mask by mode interplay in a high index contrast binary grating,” Appl. Opt. 46(27), 6719–6726 (2007).
[CrossRef] [PubMed]

E. Gamet, Y. Jourlin, S. Pelissier, R. Min, S. Reynaud, C. Veillas, J. C. Pommier, and O. Parriaux, “Flying phase mask for the printing of long submicron-period stitchingless gratings,” Microelectron. Eng. 83(4-9), 734–737 (2006).
[CrossRef]

Pelissier, S.

E. Gamet, Y. Jourlin, S. Pelissier, R. Min, S. Reynaud, C. Veillas, J. C. Pommier, and O. Parriaux, “Flying phase mask for the printing of long submicron-period stitchingless gratings,” Microelectron. Eng. 83(4-9), 734–737 (2006).
[CrossRef]

Peski, C.

P. A. Zimmerman, C. Peski, B. Rice, J. Byers, N. J. Turro, X. Lei, J. L. Gejo, V. Liberman, S. Palmacci, M. Rothchild, A. Whitker, I. Blakey, L. Chen, B. Dargaville, and H. Liu, “Status of High-Index Materials for Generation-Three 193nm Immersion Lithography,” J. Photopolym. Sci. Technol. 20(5), 643–650 (2007).
[CrossRef]

Pigeon, F.

E. Gamet, F. Pigeon, and O. Parriaux, “Duty cycle tolerant binary gratings for fabricable short period phase masks,” J. Europ. Opt. Soc. Rap. Public. 4, 09047 (2009).
[CrossRef]

Pommier, J. C.

E. Gamet, Y. Jourlin, S. Pelissier, R. Min, S. Reynaud, C. Veillas, J. C. Pommier, and O. Parriaux, “Flying phase mask for the printing of long submicron-period stitchingless gratings,” Microelectron. Eng. 83(4-9), 734–737 (2006).
[CrossRef]

Reynaud, S.

E. Gamet, Y. Jourlin, S. Pelissier, R. Min, S. Reynaud, C. Veillas, J. C. Pommier, and O. Parriaux, “Flying phase mask for the printing of long submicron-period stitchingless gratings,” Microelectron. Eng. 83(4-9), 734–737 (2006).
[CrossRef]

Riaud, P.

Rice, B.

P. A. Zimmerman, C. Peski, B. Rice, J. Byers, N. J. Turro, X. Lei, J. L. Gejo, V. Liberman, S. Palmacci, M. Rothchild, A. Whitker, I. Blakey, L. Chen, B. Dargaville, and H. Liu, “Status of High-Index Materials for Generation-Three 193nm Immersion Lithography,” J. Photopolym. Sci. Technol. 20(5), 643–650 (2007).
[CrossRef]

Rothchild, M.

P. A. Zimmerman, C. Peski, B. Rice, J. Byers, N. J. Turro, X. Lei, J. L. Gejo, V. Liberman, S. Palmacci, M. Rothchild, A. Whitker, I. Blakey, L. Chen, B. Dargaville, and H. Liu, “Status of High-Index Materials for Generation-Three 193nm Immersion Lithography,” J. Photopolym. Sci. Technol. 20(5), 643–650 (2007).
[CrossRef]

Sakai, K.

K. Sakai, Y. Iwasaki, S. Mori, A. Yamada, M. Ogusu, K. Yamashita, T. Nishikawara, S. I. Hara, and Y. Watanabe, “Feasibility Study on Immersion System Using High-Index Materials,” Jpn. J. Appl. Phys. 47(6), 4853–4861 (2008).
[CrossRef]

Sato, T.

T. Sato, K. Miura, N. Ishino, Y. Ohtera, T. Tamamura, and S. Kawakami, “Photonic crystals for the visible range fabricated by autocloning technique and their application,” Opt. Quantum Electron. 34(1/3), 63–70 (2002).
[CrossRef]

Schattenburg, M. L.

Schiavone, P.

M. El Kodadi, S. Soulan, M. Besacier, and P. Schiavone, “Resist trimming etch process control using dynamic scatterometry,” Microelectron. Eng. 86(4-6), 1040–1042 (2009).
[CrossRef]

Sentenac, A.

Soulan, S.

M. El Kodadi, S. Soulan, M. Besacier, and P. Schiavone, “Resist trimming etch process control using dynamic scatterometry,” Microelectron. Eng. 86(4-6), 1040–1042 (2009).
[CrossRef]

Surdej, J.

Talneau, A.

Tamamura, T.

T. Sato, K. Miura, N. Ishino, Y. Ohtera, T. Tamamura, and S. Kawakami, “Photonic crystals for the visible range fabricated by autocloning technique and their application,” Opt. Quantum Electron. 34(1/3), 63–70 (2002).
[CrossRef]

Tishchenko, A. V.

E. Gamet, A. V. Tishchenko, and O. Parriaux, “Cancellation of the zeroth order in a phase mask by mode interplay in a high index contrast binary grating,” Appl. Opt. 46(27), 6719–6726 (2007).
[CrossRef] [PubMed]

A. V. Tishchenko, “Phenomenological representation of deep and high contrast lamellar gratings by means of the modal method,” Opt. Quantum Electron. 37(1-3), 309–330 (2005).
[CrossRef]

Turro, N. J.

P. A. Zimmerman, C. Peski, B. Rice, J. Byers, N. J. Turro, X. Lei, J. L. Gejo, V. Liberman, S. Palmacci, M. Rothchild, A. Whitker, I. Blakey, L. Chen, B. Dargaville, and H. Liu, “Status of High-Index Materials for Generation-Three 193nm Immersion Lithography,” J. Photopolym. Sci. Technol. 20(5), 643–650 (2007).
[CrossRef]

Veillas, C.

E. Gamet, Y. Jourlin, S. Pelissier, R. Min, S. Reynaud, C. Veillas, J. C. Pommier, and O. Parriaux, “Flying phase mask for the printing of long submicron-period stitchingless gratings,” Microelectron. Eng. 83(4-9), 734–737 (2006).
[CrossRef]

Watanabe, Y.

K. Sakai, Y. Iwasaki, S. Mori, A. Yamada, M. Ogusu, K. Yamashita, T. Nishikawara, S. I. Hara, and Y. Watanabe, “Feasibility Study on Immersion System Using High-Index Materials,” Jpn. J. Appl. Phys. 47(6), 4853–4861 (2008).
[CrossRef]

Whitker, A.

P. A. Zimmerman, C. Peski, B. Rice, J. Byers, N. J. Turro, X. Lei, J. L. Gejo, V. Liberman, S. Palmacci, M. Rothchild, A. Whitker, I. Blakey, L. Chen, B. Dargaville, and H. Liu, “Status of High-Index Materials for Generation-Three 193nm Immersion Lithography,” J. Photopolym. Sci. Technol. 20(5), 643–650 (2007).
[CrossRef]

Yamada, A.

K. Sakai, Y. Iwasaki, S. Mori, A. Yamada, M. Ogusu, K. Yamashita, T. Nishikawara, S. I. Hara, and Y. Watanabe, “Feasibility Study on Immersion System Using High-Index Materials,” Jpn. J. Appl. Phys. 47(6), 4853–4861 (2008).
[CrossRef]

Yamashita, K.

K. Sakai, Y. Iwasaki, S. Mori, A. Yamada, M. Ogusu, K. Yamashita, T. Nishikawara, S. I. Hara, and Y. Watanabe, “Feasibility Study on Immersion System Using High-Index Materials,” Jpn. J. Appl. Phys. 47(6), 4853–4861 (2008).
[CrossRef]

Zhao, Y.

Zimmerman, P. A.

P. A. Zimmerman, C. Peski, B. Rice, J. Byers, N. J. Turro, X. Lei, J. L. Gejo, V. Liberman, S. Palmacci, M. Rothchild, A. Whitker, I. Blakey, L. Chen, B. Dargaville, and H. Liu, “Status of High-Index Materials for Generation-Three 193nm Immersion Lithography,” J. Photopolym. Sci. Technol. 20(5), 643–650 (2007).
[CrossRef]

Appl. Opt. (6)

J. Europ. Opt. Soc. Rap. Public. (1)

E. Gamet, F. Pigeon, and O. Parriaux, “Duty cycle tolerant binary gratings for fabricable short period phase masks,” J. Europ. Opt. Soc. Rap. Public. 4, 09047 (2009).
[CrossRef]

J. Photopolym. Sci. Technol. (1)

P. A. Zimmerman, C. Peski, B. Rice, J. Byers, N. J. Turro, X. Lei, J. L. Gejo, V. Liberman, S. Palmacci, M. Rothchild, A. Whitker, I. Blakey, L. Chen, B. Dargaville, and H. Liu, “Status of High-Index Materials for Generation-Three 193nm Immersion Lithography,” J. Photopolym. Sci. Technol. 20(5), 643–650 (2007).
[CrossRef]

Jpn. J. Appl. Phys. (1)

K. Sakai, Y. Iwasaki, S. Mori, A. Yamada, M. Ogusu, K. Yamashita, T. Nishikawara, S. I. Hara, and Y. Watanabe, “Feasibility Study on Immersion System Using High-Index Materials,” Jpn. J. Appl. Phys. 47(6), 4853–4861 (2008).
[CrossRef]

Microelectron. Eng. (2)

M. El Kodadi, S. Soulan, M. Besacier, and P. Schiavone, “Resist trimming etch process control using dynamic scatterometry,” Microelectron. Eng. 86(4-6), 1040–1042 (2009).
[CrossRef]

E. Gamet, Y. Jourlin, S. Pelissier, R. Min, S. Reynaud, C. Veillas, J. C. Pommier, and O. Parriaux, “Flying phase mask for the printing of long submicron-period stitchingless gratings,” Microelectron. Eng. 83(4-9), 734–737 (2006).
[CrossRef]

Opt. Eng. (1)

A. Gombert, B. Bläsi, C. Bühler, P. Nitz, J. Mick, W. Hoßfeld, and M. Niggemann, “Some application cases and related manufacturing techniques for optically functional microstructures on large areas,” Opt. Eng. 43(11), 2525–2533 (2004).
[CrossRef]

Opt. Express (1)

Opt. Lett. (1)

Opt. Quantum Electron. (2)

A. V. Tishchenko, “Phenomenological representation of deep and high contrast lamellar gratings by means of the modal method,” Opt. Quantum Electron. 37(1-3), 309–330 (2005).
[CrossRef]

T. Sato, K. Miura, N. Ishino, Y. Ohtera, T. Tamamura, and S. Kawakami, “Photonic crystals for the visible range fabricated by autocloning technique and their application,” Opt. Quantum Electron. 34(1/3), 63–70 (2002).
[CrossRef]

Proc. SPIE (1)

G. C. Chen, P. T. Konkola, R. K. Heilmann, and M. L. Schattenburg, “Nanomater-accurate grating fabrication with scanning beam interference lithography,” Proc. SPIE 4936, 126–134 (2003).
[CrossRef]

Other (6)

T. Moser, H. Glur, V. Romano, F. Pigeon, O. Parriaux, M. A. Ahmed, and T. Graf, “Polarization-selective grating mirror used in the generation of radial polarization” Applied Phys. B: lasers and optics 80, pp 707–713, (2005).

C. Pentico, E. Gardner, D. Hansen, R. Perkins, “New, high performance, durable polarizers for projection displays,” SID 01 Digest, pp. 1287–1289 (2001)

A. P. Rasmussen, A. Aquila, J. Bookbinder, C. Chang, E. Gullikson, R. K. Heilmann, S. M. Kahn, F. Paerels, and M. L. Schattenburg, “Grating arrays for high-throughput soft X-ray spectrometers”, Proc. SPIE 5168, Optics for EUV, X-ray, and Gamma-ray Astronomy (SPIE, Bellingham, WA), eds. O. Citterio and S.L. O'Dell, 248–259 (2004).

http://www.itrs.net/ (March 2010)

N. Lyndin, “MC Grating Software Development Company,” http://www.mcgrating.com/ (March 2010).

Y. Jourlin, Y. Bourgin, S. Reynaud, O. Parriaux, A. Talneau, P. Karvinen, N. Passilly, and A. Md, Zain, R. M. De La Rue, “DUV phase mask for 100 nm period grating printing”, Proc. SPIE 6992, (2008).

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Figures (8)

Fig. 1
Fig. 1

Sketch of a monolithic SiO2 phase mask illuminated under normal incidence.

Fig. 2
Fig. 2

Sketch of a high refractive index silica-based phase mask.

Fig. 3
Fig. 3

Top-left: 0th (dashed line) and + 1/-1st order (solid line) efficiency versus the high refractive index layer thickness of the optimized structure with 0.32 line/space ratio. Top-right: 0th (dashed line) and + 1/-1st order (solid line) efficiency versus the high index line width of the optimized structure with 151 nm Si3N4 thickness. Bottom: Power distribution in the interferogram versus the abscissa under the 200 nm period phase mask.

Fig. 5
Fig. 5

Profile of a Si3N4 phase mask obtained by AFM.

Fig. 6
Fig. 6

Profile of the same phase mask as in Fig. 5 obtained by a SEM scan.

Fig. 4
Fig. 4

Picture of +/−1st diffracted order observed in the phase mask far field through a drop of distilled water.

Fig. 7
Fig. 7

Representation of the orders diffracted by a 100 nm period resist grating on a fused silica substrate under near-grazing incidence of a beam at 244 nm wavelength with a trapped –1st transmitted order.

Fig. 8
Fig. 8

AFM scan of a 100 nm period grating in a deep UV photoresist. Left: the grating profile; Right: the 2D scan.

Tables (1)

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Table 1 Phase mask grating specifications.

Equations (2)

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2λn>2p>λn
2πλ(ne0ne2)d=3.932

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