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[Crossref]
T. Feigl, J. Heber, A. Gatto, and N. Kaiser, “Optics developments in the VUV - soft X-ray spectral region,” Nucl. Instrum. Methods Phys. Res. A 483, 351–356 (2002).
[Crossref]
W. Arens, D. Ristau, J. Ullmann, C. Zaczek, R. Thielsch, N. Kaiser, A. Duparre, O. Apel, K. Mann, R. H. Lauth, H. Bernitzki, J. Ebert, S. Schippel, and H. Heyer, “Properties of fluoride DUV excimer laser optics: influence of the number of dielectric layers,” Proc. SPIE 3902, 250–259 (2000).
[Crossref]
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A. Gatto, J. Heber, N. Kaiser, D. Ristau, S. Gunster, J. Kohlhaas, M. Marsi, M. Trovo, and R. P. Walker, “High-performance UV/VUV optics for the Storage Ring FEL at ELETTRA,” Nucl. Instrum. Methods Phys. Res. A 483, 357–362 (2002).
[Crossref]
M. Marsi, A. Locatelli, M. Trovo, R. P. Walker, M. E. Couprie, D. Garzella, L. Nahon, D. Nutarelli, E. Renault, A. Gatto, N. Kaiser, L. Giannessi, S. Gunster, D. Ristau, M. W. Poole, and A. Taleb-Ibrahimi, “UV/VUV free electron laser oscillators and applications in materials science,” Surf. Rev. Lett. 9, 599–607 (2002).
[Crossref]
T. Feigl, J. Heber, A. Gatto, and N. Kaiser, “Optics developments in the VUV - soft X-ray spectral region,” Nucl. Instrum. Methods Phys. Res. A 483, 351–356 (2002).
[Crossref]
W. Arens, D. Ristau, J. Ullmann, C. Zaczek, R. Thielsch, N. Kaiser, A. Duparre, O. Apel, K. Mann, R. H. Lauth, H. Bernitzki, J. Ebert, S. Schippel, and H. Heyer, “Properties of fluoride DUV excimer laser optics: influence of the number of dielectric layers,” Proc. SPIE 3902, 250–259 (2000).
[Crossref]
J. Ullmann, M. Mertin, H. Lauth, H. Bernitzki, K. Mann, R., D. Ristau, W. Arens, R. Thielsch, and N. Kaiser, “Coated optics for DUV excimer laser application,” Proc SPIE 3902, 514–527 (2000).
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A. Duparre, R. Thielsch, N. Kaiser, S. Jakobs, K. R. Mann, and E. Eva, “Surface finish and optical quality of CaF2 for UV lithography applications,” Proc SPIE 3334, 1048–1054 (1998).
[Crossref]
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[Crossref]
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H. Johansen and G. Kastner, “Surface quality and laser-damage behaviour of chemo-mechanically polished CaF2 single crystals characterized by scanning electron microscopy,” J. Mater. Sci. 33, 3839–3848 (1998).
[Crossref]
D. Ristau, W. Arens, S. Bosch, A. Duparre, E. Masetti, D. Jacob, G. Kiriakidis, F. Peiro, E. Quesnel, and A. V. Tikhonravov, “UV-optical and microstructural properties of MgF2-coatings deposited by IBS and PVD processes,” Proc. SPIE 3738, 436–445 (1999).
[Crossref]
A. Gatto, J. Heber, N. Kaiser, D. Ristau, S. Gunster, J. Kohlhaas, M. Marsi, M. Trovo, and R. P. Walker, “High-performance UV/VUV optics for the Storage Ring FEL at ELETTRA,” Nucl. Instrum. Methods Phys. Res. A 483, 357–362 (2002).
[Crossref]
J. Ullmann, M. Mertin, H. Lauth, H. Bernitzki, K. Mann, R., D. Ristau, W. Arens, R. Thielsch, and N. Kaiser, “Coated optics for DUV excimer laser application,” Proc SPIE 3902, 514–527 (2000).
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[Crossref]
H. Blaschke, W. Arens, D. Ristau, S. Martin, B. Li, and E. Welsch, “Thickness dependence of damage thresholds for 193-nm dielectric mirrors by predamage sensitive photothermal technique,” Proc. SPIE 3902, 242–249 (2000).
[Crossref]
V. Liberman, S. T. Palmacci, D. Hardy, M. Rothschild, and A. Grenville, “Controlled Contamination Studies in 193-nm Immersion Lithography,” Proc. SPIE 5754, 148–153 (2005).
[Crossref]
V. Liberman, M. Switkes, M. Rothschild, S. T. Palmacci, J. H. C. Sedlacek, D. E. Hardy, and A. Grenville, “Long-Term 193-nm Laser Irradiation of Thin-Film-Coated CaF2 in the Presence of H2O,” Proc SPIE 5754, 646–654 (2005).
[Crossref]
V. Liberman, M. Rothschild, J. H. C. Sedlacek, R. S. Uttaro, and A. Grenville, “Excimer-laser-induced densification of fused silica: laser-fluence and material-grade effects on the scaling law,” J. Non-Cryst. Solids 244, 159–171 (1999).
[Crossref]
V. Liberman, M. Rothschild, J. H. C. Sedlacek, R. S. Uttaro, A. Grenville, A. K. Bates, and C. Van Peski, “Excimer-laser-induced degradation of fused silica and calcium fluoride for 193-nm lithographic applications,” Opt. Lett. 24, 58–60 (1999).
[Crossref]
M. Marsi, A. Locatelli, M. Trovo, R. P. Walker, M. E. Couprie, D. Garzella, L. Nahon, D. Nutarelli, E. Renault, A. Gatto, N. Kaiser, L. Giannessi, S. Gunster, D. Ristau, M. W. Poole, and A. Taleb-Ibrahimi, “UV/VUV free electron laser oscillators and applications in materials science,” Surf. Rev. Lett. 9, 599–607 (2002).
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W. Arens, D. Ristau, J. Ullmann, C. Zaczek, R. Thielsch, N. Kaiser, A. Duparre, O. Apel, K. Mann, R. H. Lauth, H. Bernitzki, J. Ebert, S. Schippel, and H. Heyer, “Properties of fluoride DUV excimer laser optics: influence of the number of dielectric layers,” Proc. SPIE 3902, 250–259 (2000).
[Crossref]
J. Ullmann, M. Mertin, H. Lauth, H. Bernitzki, K. Mann, R., D. Ristau, W. Arens, R. Thielsch, and N. Kaiser, “Coated optics for DUV excimer laser application,” Proc SPIE 3902, 514–527 (2000).
[Crossref]
A. Duparre, R. Thielsch, N. Kaiser, S. Jakobs, K. R. Mann, and E. Eva, “Surface finish and optical quality of CaF2 for UV lithography applications,” Proc SPIE 3334, 1048–1054 (1998).
[Crossref]
A. Gatto, J. Heber, N. Kaiser, D. Ristau, S. Gunster, J. Kohlhaas, M. Marsi, M. Trovo, and R. P. Walker, “High-performance UV/VUV optics for the Storage Ring FEL at ELETTRA,” Nucl. Instrum. Methods Phys. Res. A 483, 357–362 (2002).
[Crossref]
M. Marsi, A. Locatelli, M. Trovo, R. P. Walker, M. E. Couprie, D. Garzella, L. Nahon, D. Nutarelli, E. Renault, A. Gatto, N. Kaiser, L. Giannessi, S. Gunster, D. Ristau, M. W. Poole, and A. Taleb-Ibrahimi, “UV/VUV free electron laser oscillators and applications in materials science,” Surf. Rev. Lett. 9, 599–607 (2002).
[Crossref]
H. Blaschke, W. Arens, D. Ristau, S. Martin, B. Li, and E. Welsch, “Thickness dependence of damage thresholds for 193-nm dielectric mirrors by predamage sensitive photothermal technique,” Proc. SPIE 3902, 242–249 (2000).
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[Crossref]
D. Ristau, W. Arens, S. Bosch, A. Duparre, E. Masetti, D. Jacob, G. Kiriakidis, F. Peiro, E. Quesnel, and A. V. Tikhonravov, “UV-optical and microstructural properties of MgF2-coatings deposited by IBS and PVD processes,” Proc. SPIE 3738, 436–445 (1999).
[Crossref]
N. Beermann, H. Blaschke, H. Ehlers, D. Ristau, D. Wulff-Molder, S. Jukresch, A. Matern, C. F. Strowitzki, A. Görtler, M. B. Gäbler, and N. Kaiser, “Long Term Tests of Resonator Optics in ArF Excimer Lasers,” in XVII International Symposium on Gas Flow and Chemical Lasers & High Power Lasers 2008, 2008),
J. Ullmann, M. Mertin, H. Lauth, H. Bernitzki, K. Mann, R., D. Ristau, W. Arens, R. Thielsch, and N. Kaiser, “Coated optics for DUV excimer laser application,” Proc SPIE 3902, 514–527 (2000).
[Crossref]
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M. Marsi, A. Locatelli, M. Trovo, R. P. Walker, M. E. Couprie, D. Garzella, L. Nahon, D. Nutarelli, E. Renault, A. Gatto, N. Kaiser, L. Giannessi, S. Gunster, D. Ristau, M. W. Poole, and A. Taleb-Ibrahimi, “UV/VUV free electron laser oscillators and applications in materials science,” Surf. Rev. Lett. 9, 599–607 (2002).
[Crossref]
M. Marsi, A. Locatelli, M. Trovo, R. P. Walker, M. E. Couprie, D. Garzella, L. Nahon, D. Nutarelli, E. Renault, A. Gatto, N. Kaiser, L. Giannessi, S. Gunster, D. Ristau, M. W. Poole, and A. Taleb-Ibrahimi, “UV/VUV free electron laser oscillators and applications in materials science,” Surf. Rev. Lett. 9, 599–607 (2002).
[Crossref]
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J. Ullmann, M. Mertin, H. Lauth, H. Bernitzki, K. Mann, R., D. Ristau, W. Arens, R. Thielsch, and N. Kaiser, “Coated optics for DUV excimer laser application,” Proc SPIE 3902, 514–527 (2000).
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[Crossref]
M. Marsi, A. Locatelli, M. Trovo, R. P. Walker, M. E. Couprie, D. Garzella, L. Nahon, D. Nutarelli, E. Renault, A. Gatto, N. Kaiser, L. Giannessi, S. Gunster, D. Ristau, M. W. Poole, and A. Taleb-Ibrahimi, “UV/VUV free electron laser oscillators and applications in materials science,” Surf. Rev. Lett. 9, 599–607 (2002).
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[Crossref]
J. Ullmann, M. Mertin, H. Lauth, H. Bernitzki, K. Mann, R., D. Ristau, W. Arens, R. Thielsch, and N. Kaiser, “Coated optics for DUV excimer laser application,” Proc SPIE 3902, 514–527 (2000).
[Crossref]
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A. Gatto, J. Heber, N. Kaiser, D. Ristau, S. Gunster, J. Kohlhaas, M. Marsi, M. Trovo, and R. P. Walker, “High-performance UV/VUV optics for the Storage Ring FEL at ELETTRA,” Nucl. Instrum. Methods Phys. Res. A 483, 357–362 (2002).
[Crossref]
M. Marsi, A. Locatelli, M. Trovo, R. P. Walker, M. E. Couprie, D. Garzella, L. Nahon, D. Nutarelli, E. Renault, A. Gatto, N. Kaiser, L. Giannessi, S. Gunster, D. Ristau, M. W. Poole, and A. Taleb-Ibrahimi, “UV/VUV free electron laser oscillators and applications in materials science,” Surf. Rev. Lett. 9, 599–607 (2002).
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H. Blaschke, W. Arens, D. Ristau, S. Martin, B. Li, and E. Welsch, “Thickness dependence of damage thresholds for 193-nm dielectric mirrors by predamage sensitive photothermal technique,” Proc. SPIE 3902, 242–249 (2000).
[Crossref]
E. Welsch, K. Ettrich, H. Blaschke, P. Thomsen-Schmidt, D. Schafer, and N. Kaiser, “Investigation of the absorption induced damage in ultraviolet dielectric thin films,” Opt. Eng. 36, 504–514 (1997).
[Crossref]
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[Crossref]
R. J. Rafac, A. Lukashev, and W. Zhang Kevin, “Method and apparatus for stabilizing optical dielectric coatings,” US Patent 20050008789 (2005).