Abstract

We report an experimental study by photoluminescence, optical absorption and Electron Paramagnetic Resonance measurements on the effects of exposure of Ge-doped amorphous SiO2 to γ ray radiation at room temperature. We have evidenced that irradiation at doses of the order of 1 MGy is able to generate Ge-related defects, recognizable from their optical properties as twofold coordinated Ge centers. Until now, such centers, responsible for photosensitivity of Ge-doped SiO2, have been induced only in synthesis procedures of materials. The found result evidences a role played by γ radiation in generating photosensitive defects and could furnish a novel basis for photosensitive pattern writing through ionizing radiation.

© 2008 Optical Society of America

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    [CrossRef]
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    [CrossRef]
  7. M. Fujimaki, T. Watanabe, T. Katoh, T. Kasahara, N. Miyazaki, Y. Ohki, and H. Nishikawa, "Structures and generation mechanisms of paramagnetic centers and absorption bands responsible for Ge-doped SiO2 optical-fiber gratings," Phys. Rev. B 57, 3920-3926 (1998).
    [CrossRef]
  8. F. Messina, S. Agnello, R. Boscaino, M. Cannas, S. Grandi, and E. Quartarone, "Optical properties of Ge-oxygen deficient centers embedded in silica films," J. Non Cryst. Sol. 353, 670-673 (2007).
    [CrossRef]
  9. J. Albert, B. Malo, F. Bilodeau, D. C. Johnson, K. O. Hill, Y. Hibino, and M. Kawachi, "Photosensitivity in Ge-doped silica optical waveguides and fibers with 193-nm light from ArF excimer laser," Opt. Lett. 19, 387-389 (1994).
    [PubMed]
  10. M. Lancry, B. Poumellec, P. Niay, M. Douay, P. Cordier, and C. Depecker, "VUV and IR absorption spectra induced in H2-loaded and UV hyper-sensitized standard germanosilicate preform plates through exposure to ArF laser light," J. Non Cryst. Sol. 351, 3773-3783 (2005).
    [CrossRef]
  11. A. J. Cohen and H. L. Smith, "Ultraviolet and infrared absorption of fused germania," J. Phys. Chem. Solids 7, 301-306 (1958).
    [CrossRef]
  12. M. A. Vincenti, S. Almaviva, R. M. Montereali, H. J. Kalinowski, and R. N. Nogueira, "Permanent luminescent micropatterns photoinduced by low-power ultraviolet irradiation in lithium fluoride," Appl. Phys. Lett. 89, 241125 1-3 (2006).
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  13. J. Vitko Jr, "ESR studies of hydrogen hyperfine spectra in irradiated vitreous silica," J. Appl. Phys. 49, 5530-5535 (1978).
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  14. K. Awazu, K. Muta, and H. Kawazoe, "Formation mechanism of hydrogen-associated defect with an 11.9 mT doublet in electron spin resonance and red luminescence in 9SiO2:GeO2 fibers," J. Appl. Phys 74, 2237-2240 (1993).
    [CrossRef]
  15. J. Albert, B. Malo, K. O. Hill, D. C. Johnson, J. L. Brebner, and R. Leonelli, "Refractive-index changes in fused silica produced by heavy-ion implantation followed by photobleaching," Opt. Lett. 17, 1652-1654 (1992).
    [CrossRef] [PubMed]
  16. J. M. Verhaegen, J. L. Brebner, L. B. Allard, and J. Albert, "Ion implantation-induced strong photosensitivity in high-purity fused silica: Correlation of index changes with VUV color centers," Appl. Phys. Lett. 68, 3084-3086 (1996).
    [CrossRef]
  17. J. Albert, K. O. Hill, B. Malo, D. C. Johnson, J. L. Brebner, Y. B. Trudeau, and G. Kajrys, "Formation and bleaching of strong ultraviolet absorption bands in germanium implanted synthetic fused silica," Appl. Phys. Lett. 60, 148-150 (1992).
    [CrossRef]
  18. Y. Sakurai, K. Nagasawa, H, Nishikawa, and Y. Ohki, "Point defects in high purity silica induced by high-dose gamma irradiation," J. Appl. Phys. 75, 1372 -1377 (1994).
    [CrossRef]
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2007 (1)

F. Messina, S. Agnello, R. Boscaino, M. Cannas, S. Grandi, and E. Quartarone, "Optical properties of Ge-oxygen deficient centers embedded in silica films," J. Non Cryst. Sol. 353, 670-673 (2007).
[CrossRef]

2005 (1)

M. Lancry, B. Poumellec, P. Niay, M. Douay, P. Cordier, and C. Depecker, "VUV and IR absorption spectra induced in H2-loaded and UV hyper-sensitized standard germanosilicate preform plates through exposure to ArF laser light," J. Non Cryst. Sol. 351, 3773-3783 (2005).
[CrossRef]

1998 (1)

M. Fujimaki, T. Watanabe, T. Katoh, T. Kasahara, N. Miyazaki, Y. Ohki, and H. Nishikawa, "Structures and generation mechanisms of paramagnetic centers and absorption bands responsible for Ge-doped SiO2 optical-fiber gratings," Phys. Rev. B 57, 3920-3926 (1998).
[CrossRef]

1996 (1)

J. M. Verhaegen, J. L. Brebner, L. B. Allard, and J. Albert, "Ion implantation-induced strong photosensitivity in high-purity fused silica: Correlation of index changes with VUV color centers," Appl. Phys. Lett. 68, 3084-3086 (1996).
[CrossRef]

1994 (3)

Y. Sakurai, K. Nagasawa, H, Nishikawa, and Y. Ohki, "Point defects in high purity silica induced by high-dose gamma irradiation," J. Appl. Phys. 75, 1372 -1377 (1994).
[CrossRef]

J. Albert, B. Malo, F. Bilodeau, D. C. Johnson, K. O. Hill, Y. Hibino, and M. Kawachi, "Photosensitivity in Ge-doped silica optical waveguides and fibers with 193-nm light from ArF excimer laser," Opt. Lett. 19, 387-389 (1994).
[PubMed]

V. B. Neustruev, "Colour centres in germanosilicate glass and optical fibres," J. Phys. Condens. Matter 6, 6901-6936 (1994).
[CrossRef]

1993 (1)

K. Awazu, K. Muta, and H. Kawazoe, "Formation mechanism of hydrogen-associated defect with an 11.9 mT doublet in electron spin resonance and red luminescence in 9SiO2:GeO2 fibers," J. Appl. Phys 74, 2237-2240 (1993).
[CrossRef]

1992 (3)

L. Skuja, "Isoelectronic series of twofold coordinated Si, Ge, and Sn atoms in glassy SiO2: a luminescence study," J. Non Cryst. Sol. 149, 77-95 (1992).
[CrossRef]

J. Albert, B. Malo, K. O. Hill, D. C. Johnson, J. L. Brebner, and R. Leonelli, "Refractive-index changes in fused silica produced by heavy-ion implantation followed by photobleaching," Opt. Lett. 17, 1652-1654 (1992).
[CrossRef] [PubMed]

J. Albert, K. O. Hill, B. Malo, D. C. Johnson, J. L. Brebner, Y. B. Trudeau, and G. Kajrys, "Formation and bleaching of strong ultraviolet absorption bands in germanium implanted synthetic fused silica," Appl. Phys. Lett. 60, 148-150 (1992).
[CrossRef]

1990 (1)

K. Awazu, H. Kawazoe, and M. Yamane, "Simultaneous generation of optical absorption bands 5.14 and 0.452 eV in 9 SiO2:GeO2 glasses heated under H2 atmosphere," J. Appl. Phys 68, 2713-2718 (1990).
[CrossRef]

1978 (2)

K. O. Hill, Y. Fujii, D. C. Johnson, and B. S. Kawasaki, "Photosensitivity in optical fiber waveguides: Application to reflection filter fabrication," Appl. Phys. Lett. 32, 647-649 (1978).
[CrossRef]

J. Vitko Jr, "ESR studies of hydrogen hyperfine spectra in irradiated vitreous silica," J. Appl. Phys. 49, 5530-5535 (1978).
[CrossRef]

1958 (1)

A. J. Cohen and H. L. Smith, "Ultraviolet and infrared absorption of fused germania," J. Phys. Chem. Solids 7, 301-306 (1958).
[CrossRef]

Agnello, S.

F. Messina, S. Agnello, R. Boscaino, M. Cannas, S. Grandi, and E. Quartarone, "Optical properties of Ge-oxygen deficient centers embedded in silica films," J. Non Cryst. Sol. 353, 670-673 (2007).
[CrossRef]

Albert, J.

J. M. Verhaegen, J. L. Brebner, L. B. Allard, and J. Albert, "Ion implantation-induced strong photosensitivity in high-purity fused silica: Correlation of index changes with VUV color centers," Appl. Phys. Lett. 68, 3084-3086 (1996).
[CrossRef]

J. Albert, B. Malo, F. Bilodeau, D. C. Johnson, K. O. Hill, Y. Hibino, and M. Kawachi, "Photosensitivity in Ge-doped silica optical waveguides and fibers with 193-nm light from ArF excimer laser," Opt. Lett. 19, 387-389 (1994).
[PubMed]

J. Albert, K. O. Hill, B. Malo, D. C. Johnson, J. L. Brebner, Y. B. Trudeau, and G. Kajrys, "Formation and bleaching of strong ultraviolet absorption bands in germanium implanted synthetic fused silica," Appl. Phys. Lett. 60, 148-150 (1992).
[CrossRef]

J. Albert, B. Malo, K. O. Hill, D. C. Johnson, J. L. Brebner, and R. Leonelli, "Refractive-index changes in fused silica produced by heavy-ion implantation followed by photobleaching," Opt. Lett. 17, 1652-1654 (1992).
[CrossRef] [PubMed]

Allard, L. B.

J. M. Verhaegen, J. L. Brebner, L. B. Allard, and J. Albert, "Ion implantation-induced strong photosensitivity in high-purity fused silica: Correlation of index changes with VUV color centers," Appl. Phys. Lett. 68, 3084-3086 (1996).
[CrossRef]

Awazu, K.

K. Awazu, K. Muta, and H. Kawazoe, "Formation mechanism of hydrogen-associated defect with an 11.9 mT doublet in electron spin resonance and red luminescence in 9SiO2:GeO2 fibers," J. Appl. Phys 74, 2237-2240 (1993).
[CrossRef]

K. Awazu, H. Kawazoe, and M. Yamane, "Simultaneous generation of optical absorption bands 5.14 and 0.452 eV in 9 SiO2:GeO2 glasses heated under H2 atmosphere," J. Appl. Phys 68, 2713-2718 (1990).
[CrossRef]

Bilodeau, F.

Boscaino, R.

F. Messina, S. Agnello, R. Boscaino, M. Cannas, S. Grandi, and E. Quartarone, "Optical properties of Ge-oxygen deficient centers embedded in silica films," J. Non Cryst. Sol. 353, 670-673 (2007).
[CrossRef]

Brebner, J. L.

J. M. Verhaegen, J. L. Brebner, L. B. Allard, and J. Albert, "Ion implantation-induced strong photosensitivity in high-purity fused silica: Correlation of index changes with VUV color centers," Appl. Phys. Lett. 68, 3084-3086 (1996).
[CrossRef]

J. Albert, B. Malo, K. O. Hill, D. C. Johnson, J. L. Brebner, and R. Leonelli, "Refractive-index changes in fused silica produced by heavy-ion implantation followed by photobleaching," Opt. Lett. 17, 1652-1654 (1992).
[CrossRef] [PubMed]

J. Albert, K. O. Hill, B. Malo, D. C. Johnson, J. L. Brebner, Y. B. Trudeau, and G. Kajrys, "Formation and bleaching of strong ultraviolet absorption bands in germanium implanted synthetic fused silica," Appl. Phys. Lett. 60, 148-150 (1992).
[CrossRef]

Cannas, M.

F. Messina, S. Agnello, R. Boscaino, M. Cannas, S. Grandi, and E. Quartarone, "Optical properties of Ge-oxygen deficient centers embedded in silica films," J. Non Cryst. Sol. 353, 670-673 (2007).
[CrossRef]

Cohen, A. J.

A. J. Cohen and H. L. Smith, "Ultraviolet and infrared absorption of fused germania," J. Phys. Chem. Solids 7, 301-306 (1958).
[CrossRef]

Cordier, P.

M. Lancry, B. Poumellec, P. Niay, M. Douay, P. Cordier, and C. Depecker, "VUV and IR absorption spectra induced in H2-loaded and UV hyper-sensitized standard germanosilicate preform plates through exposure to ArF laser light," J. Non Cryst. Sol. 351, 3773-3783 (2005).
[CrossRef]

Depecker, C.

M. Lancry, B. Poumellec, P. Niay, M. Douay, P. Cordier, and C. Depecker, "VUV and IR absorption spectra induced in H2-loaded and UV hyper-sensitized standard germanosilicate preform plates through exposure to ArF laser light," J. Non Cryst. Sol. 351, 3773-3783 (2005).
[CrossRef]

Douay, M.

M. Lancry, B. Poumellec, P. Niay, M. Douay, P. Cordier, and C. Depecker, "VUV and IR absorption spectra induced in H2-loaded and UV hyper-sensitized standard germanosilicate preform plates through exposure to ArF laser light," J. Non Cryst. Sol. 351, 3773-3783 (2005).
[CrossRef]

Fujii, Y.

K. O. Hill, Y. Fujii, D. C. Johnson, and B. S. Kawasaki, "Photosensitivity in optical fiber waveguides: Application to reflection filter fabrication," Appl. Phys. Lett. 32, 647-649 (1978).
[CrossRef]

Fujimaki, M.

M. Fujimaki, T. Watanabe, T. Katoh, T. Kasahara, N. Miyazaki, Y. Ohki, and H. Nishikawa, "Structures and generation mechanisms of paramagnetic centers and absorption bands responsible for Ge-doped SiO2 optical-fiber gratings," Phys. Rev. B 57, 3920-3926 (1998).
[CrossRef]

Grandi, S.

F. Messina, S. Agnello, R. Boscaino, M. Cannas, S. Grandi, and E. Quartarone, "Optical properties of Ge-oxygen deficient centers embedded in silica films," J. Non Cryst. Sol. 353, 670-673 (2007).
[CrossRef]

Hibino, Y.

Hill, K. O.

J. Albert, B. Malo, F. Bilodeau, D. C. Johnson, K. O. Hill, Y. Hibino, and M. Kawachi, "Photosensitivity in Ge-doped silica optical waveguides and fibers with 193-nm light from ArF excimer laser," Opt. Lett. 19, 387-389 (1994).
[PubMed]

J. Albert, K. O. Hill, B. Malo, D. C. Johnson, J. L. Brebner, Y. B. Trudeau, and G. Kajrys, "Formation and bleaching of strong ultraviolet absorption bands in germanium implanted synthetic fused silica," Appl. Phys. Lett. 60, 148-150 (1992).
[CrossRef]

J. Albert, B. Malo, K. O. Hill, D. C. Johnson, J. L. Brebner, and R. Leonelli, "Refractive-index changes in fused silica produced by heavy-ion implantation followed by photobleaching," Opt. Lett. 17, 1652-1654 (1992).
[CrossRef] [PubMed]

K. O. Hill, Y. Fujii, D. C. Johnson, and B. S. Kawasaki, "Photosensitivity in optical fiber waveguides: Application to reflection filter fabrication," Appl. Phys. Lett. 32, 647-649 (1978).
[CrossRef]

Johnson, D. C.

J. Albert, B. Malo, F. Bilodeau, D. C. Johnson, K. O. Hill, Y. Hibino, and M. Kawachi, "Photosensitivity in Ge-doped silica optical waveguides and fibers with 193-nm light from ArF excimer laser," Opt. Lett. 19, 387-389 (1994).
[PubMed]

J. Albert, B. Malo, K. O. Hill, D. C. Johnson, J. L. Brebner, and R. Leonelli, "Refractive-index changes in fused silica produced by heavy-ion implantation followed by photobleaching," Opt. Lett. 17, 1652-1654 (1992).
[CrossRef] [PubMed]

J. Albert, K. O. Hill, B. Malo, D. C. Johnson, J. L. Brebner, Y. B. Trudeau, and G. Kajrys, "Formation and bleaching of strong ultraviolet absorption bands in germanium implanted synthetic fused silica," Appl. Phys. Lett. 60, 148-150 (1992).
[CrossRef]

K. O. Hill, Y. Fujii, D. C. Johnson, and B. S. Kawasaki, "Photosensitivity in optical fiber waveguides: Application to reflection filter fabrication," Appl. Phys. Lett. 32, 647-649 (1978).
[CrossRef]

Kajrys, G.

J. Albert, K. O. Hill, B. Malo, D. C. Johnson, J. L. Brebner, Y. B. Trudeau, and G. Kajrys, "Formation and bleaching of strong ultraviolet absorption bands in germanium implanted synthetic fused silica," Appl. Phys. Lett. 60, 148-150 (1992).
[CrossRef]

Kasahara, T.

M. Fujimaki, T. Watanabe, T. Katoh, T. Kasahara, N. Miyazaki, Y. Ohki, and H. Nishikawa, "Structures and generation mechanisms of paramagnetic centers and absorption bands responsible for Ge-doped SiO2 optical-fiber gratings," Phys. Rev. B 57, 3920-3926 (1998).
[CrossRef]

Katoh, T.

M. Fujimaki, T. Watanabe, T. Katoh, T. Kasahara, N. Miyazaki, Y. Ohki, and H. Nishikawa, "Structures and generation mechanisms of paramagnetic centers and absorption bands responsible for Ge-doped SiO2 optical-fiber gratings," Phys. Rev. B 57, 3920-3926 (1998).
[CrossRef]

Kawachi, M.

Kawasaki, B. S.

K. O. Hill, Y. Fujii, D. C. Johnson, and B. S. Kawasaki, "Photosensitivity in optical fiber waveguides: Application to reflection filter fabrication," Appl. Phys. Lett. 32, 647-649 (1978).
[CrossRef]

Kawazoe, H.

K. Awazu, K. Muta, and H. Kawazoe, "Formation mechanism of hydrogen-associated defect with an 11.9 mT doublet in electron spin resonance and red luminescence in 9SiO2:GeO2 fibers," J. Appl. Phys 74, 2237-2240 (1993).
[CrossRef]

K. Awazu, H. Kawazoe, and M. Yamane, "Simultaneous generation of optical absorption bands 5.14 and 0.452 eV in 9 SiO2:GeO2 glasses heated under H2 atmosphere," J. Appl. Phys 68, 2713-2718 (1990).
[CrossRef]

Lancry, M.

M. Lancry, B. Poumellec, P. Niay, M. Douay, P. Cordier, and C. Depecker, "VUV and IR absorption spectra induced in H2-loaded and UV hyper-sensitized standard germanosilicate preform plates through exposure to ArF laser light," J. Non Cryst. Sol. 351, 3773-3783 (2005).
[CrossRef]

Leonelli, R.

Malo, B.

Messina, F.

F. Messina, S. Agnello, R. Boscaino, M. Cannas, S. Grandi, and E. Quartarone, "Optical properties of Ge-oxygen deficient centers embedded in silica films," J. Non Cryst. Sol. 353, 670-673 (2007).
[CrossRef]

Miyazaki, N.

M. Fujimaki, T. Watanabe, T. Katoh, T. Kasahara, N. Miyazaki, Y. Ohki, and H. Nishikawa, "Structures and generation mechanisms of paramagnetic centers and absorption bands responsible for Ge-doped SiO2 optical-fiber gratings," Phys. Rev. B 57, 3920-3926 (1998).
[CrossRef]

Muta, K.

K. Awazu, K. Muta, and H. Kawazoe, "Formation mechanism of hydrogen-associated defect with an 11.9 mT doublet in electron spin resonance and red luminescence in 9SiO2:GeO2 fibers," J. Appl. Phys 74, 2237-2240 (1993).
[CrossRef]

Nagasawa, K.

Y. Sakurai, K. Nagasawa, H, Nishikawa, and Y. Ohki, "Point defects in high purity silica induced by high-dose gamma irradiation," J. Appl. Phys. 75, 1372 -1377 (1994).
[CrossRef]

Neustruev, V. B.

V. B. Neustruev, "Colour centres in germanosilicate glass and optical fibres," J. Phys. Condens. Matter 6, 6901-6936 (1994).
[CrossRef]

Niay, P.

M. Lancry, B. Poumellec, P. Niay, M. Douay, P. Cordier, and C. Depecker, "VUV and IR absorption spectra induced in H2-loaded and UV hyper-sensitized standard germanosilicate preform plates through exposure to ArF laser light," J. Non Cryst. Sol. 351, 3773-3783 (2005).
[CrossRef]

Nishikawa, H.

M. Fujimaki, T. Watanabe, T. Katoh, T. Kasahara, N. Miyazaki, Y. Ohki, and H. Nishikawa, "Structures and generation mechanisms of paramagnetic centers and absorption bands responsible for Ge-doped SiO2 optical-fiber gratings," Phys. Rev. B 57, 3920-3926 (1998).
[CrossRef]

Ohki, Y.

M. Fujimaki, T. Watanabe, T. Katoh, T. Kasahara, N. Miyazaki, Y. Ohki, and H. Nishikawa, "Structures and generation mechanisms of paramagnetic centers and absorption bands responsible for Ge-doped SiO2 optical-fiber gratings," Phys. Rev. B 57, 3920-3926 (1998).
[CrossRef]

Poumellec, B.

M. Lancry, B. Poumellec, P. Niay, M. Douay, P. Cordier, and C. Depecker, "VUV and IR absorption spectra induced in H2-loaded and UV hyper-sensitized standard germanosilicate preform plates through exposure to ArF laser light," J. Non Cryst. Sol. 351, 3773-3783 (2005).
[CrossRef]

Quartarone, E.

F. Messina, S. Agnello, R. Boscaino, M. Cannas, S. Grandi, and E. Quartarone, "Optical properties of Ge-oxygen deficient centers embedded in silica films," J. Non Cryst. Sol. 353, 670-673 (2007).
[CrossRef]

Sakurai, Y.

Y. Sakurai, K. Nagasawa, H, Nishikawa, and Y. Ohki, "Point defects in high purity silica induced by high-dose gamma irradiation," J. Appl. Phys. 75, 1372 -1377 (1994).
[CrossRef]

Skuja, L.

L. Skuja, "Isoelectronic series of twofold coordinated Si, Ge, and Sn atoms in glassy SiO2: a luminescence study," J. Non Cryst. Sol. 149, 77-95 (1992).
[CrossRef]

Smith, H. L.

A. J. Cohen and H. L. Smith, "Ultraviolet and infrared absorption of fused germania," J. Phys. Chem. Solids 7, 301-306 (1958).
[CrossRef]

Trudeau, Y. B.

J. Albert, K. O. Hill, B. Malo, D. C. Johnson, J. L. Brebner, Y. B. Trudeau, and G. Kajrys, "Formation and bleaching of strong ultraviolet absorption bands in germanium implanted synthetic fused silica," Appl. Phys. Lett. 60, 148-150 (1992).
[CrossRef]

Verhaegen, J. M.

J. M. Verhaegen, J. L. Brebner, L. B. Allard, and J. Albert, "Ion implantation-induced strong photosensitivity in high-purity fused silica: Correlation of index changes with VUV color centers," Appl. Phys. Lett. 68, 3084-3086 (1996).
[CrossRef]

Vitko, J.

J. Vitko Jr, "ESR studies of hydrogen hyperfine spectra in irradiated vitreous silica," J. Appl. Phys. 49, 5530-5535 (1978).
[CrossRef]

Watanabe, T.

M. Fujimaki, T. Watanabe, T. Katoh, T. Kasahara, N. Miyazaki, Y. Ohki, and H. Nishikawa, "Structures and generation mechanisms of paramagnetic centers and absorption bands responsible for Ge-doped SiO2 optical-fiber gratings," Phys. Rev. B 57, 3920-3926 (1998).
[CrossRef]

Yamane, M.

K. Awazu, H. Kawazoe, and M. Yamane, "Simultaneous generation of optical absorption bands 5.14 and 0.452 eV in 9 SiO2:GeO2 glasses heated under H2 atmosphere," J. Appl. Phys 68, 2713-2718 (1990).
[CrossRef]

Appl. Phys. Lett. (3)

K. O. Hill, Y. Fujii, D. C. Johnson, and B. S. Kawasaki, "Photosensitivity in optical fiber waveguides: Application to reflection filter fabrication," Appl. Phys. Lett. 32, 647-649 (1978).
[CrossRef]

J. M. Verhaegen, J. L. Brebner, L. B. Allard, and J. Albert, "Ion implantation-induced strong photosensitivity in high-purity fused silica: Correlation of index changes with VUV color centers," Appl. Phys. Lett. 68, 3084-3086 (1996).
[CrossRef]

J. Albert, K. O. Hill, B. Malo, D. C. Johnson, J. L. Brebner, Y. B. Trudeau, and G. Kajrys, "Formation and bleaching of strong ultraviolet absorption bands in germanium implanted synthetic fused silica," Appl. Phys. Lett. 60, 148-150 (1992).
[CrossRef]

J. Appl. Phys (2)

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Figures (4)

Fig. 1.
Fig. 1.

(a). OA spectra of sample A before and after γ irradiation to 1 MGy and that of the sample B are reported; (b) PL spectra under excitation energy 5.0 eV acquired on sample A γ-irradiated at 1 MGy and on sample B, normalized to the maximum at ~3.2 eV.

Fig. 2.
Fig. 2.

(a). normalized PL spectra of 3.2 eV band recorded on sample A γ irradiated at 1 MGy exciting at different energies, (b) variation of the peak position as function of excitation energy: (●) 1 MGy irradiated sample A, (○) sample B; in the inset the dependence of FWHM on excitation energy is reported: (●) 1 MGy irradiated sample A, (○) sample B.

Fig. 3.
Fig. 3.

PL emission at 3.2 eV as a function of time under pulsed excitation at 4.9 eV: (□) experimental data of 1 MGy irradiated sample A, (○) experimental data of sample B, the reported data are normalized to the maximum emission; the full lines represent best fits.

Fig. 4.
Fig. 4.

(a). EPR doublet (dashed line, magnified by a factor 200) associated to the H(II) defect as detected in sample A irradiated at 1 MGy; the central part of the spectrum (continuous line), reporting the region near g=2, is due to the superposition of Ge(1) and E’-Ge centers; (b). H(II) centers concentration as a function of the accumulated dose in sample A.

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