Abstract

We have designed and tested a-periodic multilayer structures containing protective capping layers in order to obtain improved stability with respect to any possible changes of the capping layer optical properties (due to oxidation and contamination, for example)-while simultaneously maximizing the EUV reflection efficiency for specific applications, and in particular for EUV lithography. Such coatings may be particularly useful in EUV lithographic apparatus, because they provide both high integrated photon flux and higher stability to the harsh operating environment, which can affect seriously the performance of the multilayer-coated projector system optics. In this work, an evolutive algorithm has been developed in order to design these a-periodic structures, which have been proven to have also the property of stable performance with respect to random layer thickness errors that might occur during coating deposition. Prototypes have been fabricated, and tested with EUV and X-ray reflectometry, and secondary electron spectroscopy. The experimental results clearly show improved performance of our new a-periodic coatings design compared with standard periodic multilayer structures.

© 2008 Optical Society of America

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  1. J. Hollensheada and L. Klebanoff, “Modeling radiation-induced carbon contamination of extreme ultraviolet optics,” J. Vac. Sci. Technol. B 24, 64–82 (2006).
    [Crossref]
  2. M. E. Malinowski, C. Steinhaus, W. M. Clift, L. E. Klebanoff, S. Mrowka, and R. Soufli “Controlling contamination in Mo/Si mutilayer mirrors by Si surface capping modifications,” Proc. SPIE 4688, 442–453 (2002).
    [Crossref]
  3. K. Motai, H. Oizumi, S. Miyagaki, I. Nishiyama, A. Izumi, T. Ueno, Y. Miyazaki, and A. Namiki., “Atomic hydrogen cleaning of Ru-capped EUV multilayer mirror,” Proc. SPIE 6517, 65170F1–65170F8 (2007).
  4. S. Bajt, Z. R. Dai, E. J. Nelson, M. A. Wall, J. Alameda, N. Nguyen, S. Baker, J. C. Robinson, J. S. Taylor, M. Clift, A. Aquila, E. M. Gullikson, and N. V. Ginger Edwards “Oxidation resistance of Ru-capped EUV multilayers,” Proc. SPIE 5751, 118–127 (2005).
    [Crossref]
  5. M. Singh and J. J. M. Braat, “ Capping layers for extreme-ultraviolet multilayer interference coatings,” Opt. Lett. 26, 259–261 (2001).
    [Crossref]
  6. S. B. Hill, I. Ermanoski, C. Tarrio, T. B. Lucatorto, T. E. Madey, S. Bajt, M. Fang, and M. Chandhok “Critical parameters influencing the EUV-induced damage of Ru-capped multilayer mirrors,” Proc. SPIE 6517, 65170G (2007).
    [Crossref]
  7. M. Suman, M. G. Pelizzo, P. Nicolosi, and D. L. Windt, “Aperiodic multilayers with enhanced reflectivity for extreme ultraviolet lithography,” Appl. Opt. 47, 2906–2914 (2008).
    [Crossref] [PubMed]
  8. M. Suman, F. Frassetto, P. Nicolosi, and M.-G. Pelizzo, “Design of a-periodic multilayer structures for attosecond pulses in the EUV,” Appl. Opt. 46, 8159–8169 (2007).
    [Crossref] [PubMed]
  9. I. L. Beigman, A. S. Pirozhkov, and E. N. Ragozin, “Reflection of few-cycle x-ray pulses by aperiodic multilayer structures,” J. Opt. A 4, 433–439 (2002).
    [Crossref]
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    [Crossref] [PubMed]
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    [Crossref] [PubMed]
  13. A. Wonisch, Th. Westerwalbesloh, W. Hachmann, and N. Kabachnik, “Aperiodic nanometer multilayer systems as optical key components for attosecond electron spectroscopy,” Thin Solid Films 464–465, 473–477 (2004).
    [Crossref]
  14. Z. S. Wang, H. C. Wang, J. T. Zhu, F. L. Wang, Z. X. Gu, L. Y. Chen, A. G. Michette, A. K. Powell, S. J. Pfauntsch, and F. Schäfers, “Broad angular multilayer analyzer for soft X-rays,” Opt. Express 14, 2533–2538 (2006).
    [Crossref] [PubMed]
  15. A.L. Aquila, F. Salmassi, F. Dollar, Y. Liu, and E.M. Gullikson “Developments in realistic design for aperiodic Mo/Si multilayer mirrors,” Opt. Express 14, 10073–10078 (2006).
    [Crossref] [PubMed]
  16. M. Singh and J. J. M. Braat, “Design of multilayer extreme ultraviolet mirrors for enhanced reflectivity,” Appl. Opt. 39, 2189–2197 (2000).
    [Crossref]
  17. B. A. M. Hansson and H. M. Hertz, “Liquid-jet laser-plasma extreme ultraviolet sources: from droplets to filaments,” J. Phys. D: Appl. Phys. 37, 3233–3243 (2004).
    [Crossref]
  18. D. L. Windt and W. K. Waskiewicz, “Multilayer facilities for EUV lithography,” J. Vac. Sci. Technol. B 12, 3826–3832 (1994).
    [Crossref]
  19. S. Bajt, J.B. Alameda, T. W. Barbee, W. M. Clift, J. A. Folta, B. B. Kaufmann, and E. A. Spiller, “Improved reflectance and stability of Mo/Si multilayers,” Opt. Eng. 41, 1797–1804 (2002).
    [Crossref]

2008 (1)

2007 (3)

M. Suman, F. Frassetto, P. Nicolosi, and M.-G. Pelizzo, “Design of a-periodic multilayer structures for attosecond pulses in the EUV,” Appl. Opt. 46, 8159–8169 (2007).
[Crossref] [PubMed]

S. B. Hill, I. Ermanoski, C. Tarrio, T. B. Lucatorto, T. E. Madey, S. Bajt, M. Fang, and M. Chandhok “Critical parameters influencing the EUV-induced damage of Ru-capped multilayer mirrors,” Proc. SPIE 6517, 65170G (2007).
[Crossref]

K. Motai, H. Oizumi, S. Miyagaki, I. Nishiyama, A. Izumi, T. Ueno, Y. Miyazaki, and A. Namiki., “Atomic hydrogen cleaning of Ru-capped EUV multilayer mirror,” Proc. SPIE 6517, 65170F1–65170F8 (2007).

2006 (5)

2005 (2)

S. Bajt, Z. R. Dai, E. J. Nelson, M. A. Wall, J. Alameda, N. Nguyen, S. Baker, J. C. Robinson, J. S. Taylor, M. Clift, A. Aquila, E. M. Gullikson, and N. V. Ginger Edwards “Oxidation resistance of Ru-capped EUV multilayers,” Proc. SPIE 5751, 118–127 (2005).
[Crossref]

A.-S. Morlens, P. Balcou, P. Zeitoun, C. Valentin, V. Laude, and S. Kazamias, “Compression of attosecond harmonic pulses by extreme-ultraviolet chirped mirrors,” Opt. Lett. 30, 1554–1556 (2005).
[Crossref] [PubMed]

2004 (2)

A. Wonisch, Th. Westerwalbesloh, W. Hachmann, and N. Kabachnik, “Aperiodic nanometer multilayer systems as optical key components for attosecond electron spectroscopy,” Thin Solid Films 464–465, 473–477 (2004).
[Crossref]

B. A. M. Hansson and H. M. Hertz, “Liquid-jet laser-plasma extreme ultraviolet sources: from droplets to filaments,” J. Phys. D: Appl. Phys. 37, 3233–3243 (2004).
[Crossref]

2002 (3)

S. Bajt, J.B. Alameda, T. W. Barbee, W. M. Clift, J. A. Folta, B. B. Kaufmann, and E. A. Spiller, “Improved reflectance and stability of Mo/Si multilayers,” Opt. Eng. 41, 1797–1804 (2002).
[Crossref]

I. L. Beigman, A. S. Pirozhkov, and E. N. Ragozin, “Reflection of few-cycle x-ray pulses by aperiodic multilayer structures,” J. Opt. A 4, 433–439 (2002).
[Crossref]

M. E. Malinowski, C. Steinhaus, W. M. Clift, L. E. Klebanoff, S. Mrowka, and R. Soufli “Controlling contamination in Mo/Si mutilayer mirrors by Si surface capping modifications,” Proc. SPIE 4688, 442–453 (2002).
[Crossref]

2001 (1)

2000 (1)

1994 (1)

D. L. Windt and W. K. Waskiewicz, “Multilayer facilities for EUV lithography,” J. Vac. Sci. Technol. B 12, 3826–3832 (1994).
[Crossref]

Alameda, J.

S. Bajt, Z. R. Dai, E. J. Nelson, M. A. Wall, J. Alameda, N. Nguyen, S. Baker, J. C. Robinson, J. S. Taylor, M. Clift, A. Aquila, E. M. Gullikson, and N. V. Ginger Edwards “Oxidation resistance of Ru-capped EUV multilayers,” Proc. SPIE 5751, 118–127 (2005).
[Crossref]

Alameda, J.B.

S. Bajt, J.B. Alameda, T. W. Barbee, W. M. Clift, J. A. Folta, B. B. Kaufmann, and E. A. Spiller, “Improved reflectance and stability of Mo/Si multilayers,” Opt. Eng. 41, 1797–1804 (2002).
[Crossref]

Aquila, A.

S. Bajt, Z. R. Dai, E. J. Nelson, M. A. Wall, J. Alameda, N. Nguyen, S. Baker, J. C. Robinson, J. S. Taylor, M. Clift, A. Aquila, E. M. Gullikson, and N. V. Ginger Edwards “Oxidation resistance of Ru-capped EUV multilayers,” Proc. SPIE 5751, 118–127 (2005).
[Crossref]

Aquila, A.L.

Bajt, S.

S. B. Hill, I. Ermanoski, C. Tarrio, T. B. Lucatorto, T. E. Madey, S. Bajt, M. Fang, and M. Chandhok “Critical parameters influencing the EUV-induced damage of Ru-capped multilayer mirrors,” Proc. SPIE 6517, 65170G (2007).
[Crossref]

S. Bajt, Z. R. Dai, E. J. Nelson, M. A. Wall, J. Alameda, N. Nguyen, S. Baker, J. C. Robinson, J. S. Taylor, M. Clift, A. Aquila, E. M. Gullikson, and N. V. Ginger Edwards “Oxidation resistance of Ru-capped EUV multilayers,” Proc. SPIE 5751, 118–127 (2005).
[Crossref]

S. Bajt, J.B. Alameda, T. W. Barbee, W. M. Clift, J. A. Folta, B. B. Kaufmann, and E. A. Spiller, “Improved reflectance and stability of Mo/Si multilayers,” Opt. Eng. 41, 1797–1804 (2002).
[Crossref]

Baker, S.

S. Bajt, Z. R. Dai, E. J. Nelson, M. A. Wall, J. Alameda, N. Nguyen, S. Baker, J. C. Robinson, J. S. Taylor, M. Clift, A. Aquila, E. M. Gullikson, and N. V. Ginger Edwards “Oxidation resistance of Ru-capped EUV multilayers,” Proc. SPIE 5751, 118–127 (2005).
[Crossref]

Balcou, P.

Barbee, T. W.

S. Bajt, J.B. Alameda, T. W. Barbee, W. M. Clift, J. A. Folta, B. B. Kaufmann, and E. A. Spiller, “Improved reflectance and stability of Mo/Si multilayers,” Opt. Eng. 41, 1797–1804 (2002).
[Crossref]

Beigman, I. L.

I. L. Beigman, A. S. Pirozhkov, and E. N. Ragozin, “Reflection of few-cycle x-ray pulses by aperiodic multilayer structures,” J. Opt. A 4, 433–439 (2002).
[Crossref]

Boyko, O.

Braat, J. J. M.

Chandhok, M.

S. B. Hill, I. Ermanoski, C. Tarrio, T. B. Lucatorto, T. E. Madey, S. Bajt, M. Fang, and M. Chandhok “Critical parameters influencing the EUV-induced damage of Ru-capped multilayer mirrors,” Proc. SPIE 6517, 65170G (2007).
[Crossref]

Chen, L. Y.

Clift, M.

S. Bajt, Z. R. Dai, E. J. Nelson, M. A. Wall, J. Alameda, N. Nguyen, S. Baker, J. C. Robinson, J. S. Taylor, M. Clift, A. Aquila, E. M. Gullikson, and N. V. Ginger Edwards “Oxidation resistance of Ru-capped EUV multilayers,” Proc. SPIE 5751, 118–127 (2005).
[Crossref]

Clift, W. M.

M. E. Malinowski, C. Steinhaus, W. M. Clift, L. E. Klebanoff, S. Mrowka, and R. Soufli “Controlling contamination in Mo/Si mutilayer mirrors by Si surface capping modifications,” Proc. SPIE 4688, 442–453 (2002).
[Crossref]

S. Bajt, J.B. Alameda, T. W. Barbee, W. M. Clift, J. A. Folta, B. B. Kaufmann, and E. A. Spiller, “Improved reflectance and stability of Mo/Si multilayers,” Opt. Eng. 41, 1797–1804 (2002).
[Crossref]

Dai, Z. R.

S. Bajt, Z. R. Dai, E. J. Nelson, M. A. Wall, J. Alameda, N. Nguyen, S. Baker, J. C. Robinson, J. S. Taylor, M. Clift, A. Aquila, E. M. Gullikson, and N. V. Ginger Edwards “Oxidation resistance of Ru-capped EUV multilayers,” Proc. SPIE 5751, 118–127 (2005).
[Crossref]

Delmotte, F.

Dollar, F.

Drescher, M.

Ermanoski, I.

S. B. Hill, I. Ermanoski, C. Tarrio, T. B. Lucatorto, T. E. Madey, S. Bajt, M. Fang, and M. Chandhok “Critical parameters influencing the EUV-induced damage of Ru-capped multilayer mirrors,” Proc. SPIE 6517, 65170G (2007).
[Crossref]

Fang, M.

S. B. Hill, I. Ermanoski, C. Tarrio, T. B. Lucatorto, T. E. Madey, S. Bajt, M. Fang, and M. Chandhok “Critical parameters influencing the EUV-induced damage of Ru-capped multilayer mirrors,” Proc. SPIE 6517, 65170G (2007).
[Crossref]

Folta, J. A.

S. Bajt, J.B. Alameda, T. W. Barbee, W. M. Clift, J. A. Folta, B. B. Kaufmann, and E. A. Spiller, “Improved reflectance and stability of Mo/Si multilayers,” Opt. Eng. 41, 1797–1804 (2002).
[Crossref]

Frassetto, F.

Gautier, J.

Ginger Edwards, N. V.

S. Bajt, Z. R. Dai, E. J. Nelson, M. A. Wall, J. Alameda, N. Nguyen, S. Baker, J. C. Robinson, J. S. Taylor, M. Clift, A. Aquila, E. M. Gullikson, and N. V. Ginger Edwards “Oxidation resistance of Ru-capped EUV multilayers,” Proc. SPIE 5751, 118–127 (2005).
[Crossref]

Gu, Z. X.

Gullikson, E. M.

S. Bajt, Z. R. Dai, E. J. Nelson, M. A. Wall, J. Alameda, N. Nguyen, S. Baker, J. C. Robinson, J. S. Taylor, M. Clift, A. Aquila, E. M. Gullikson, and N. V. Ginger Edwards “Oxidation resistance of Ru-capped EUV multilayers,” Proc. SPIE 5751, 118–127 (2005).
[Crossref]

Gullikson, E.M.

Gustafsson, E.

Hachmann, W.

A. Wonisch, Th. Westerwalbesloh, W. Hachmann, and N. Kabachnik, “Aperiodic nanometer multilayer systems as optical key components for attosecond electron spectroscopy,” Thin Solid Films 464–465, 473–477 (2004).
[Crossref]

Hansson, B. A. M.

B. A. M. Hansson and H. M. Hertz, “Liquid-jet laser-plasma extreme ultraviolet sources: from droplets to filaments,” J. Phys. D: Appl. Phys. 37, 3233–3243 (2004).
[Crossref]

Heinzmann, U.

Hertz, H. M.

B. A. M. Hansson and H. M. Hertz, “Liquid-jet laser-plasma extreme ultraviolet sources: from droplets to filaments,” J. Phys. D: Appl. Phys. 37, 3233–3243 (2004).
[Crossref]

Hill, S. B.

S. B. Hill, I. Ermanoski, C. Tarrio, T. B. Lucatorto, T. E. Madey, S. Bajt, M. Fang, and M. Chandhok “Critical parameters influencing the EUV-induced damage of Ru-capped multilayer mirrors,” Proc. SPIE 6517, 65170G (2007).
[Crossref]

Hollensheada, J.

J. Hollensheada and L. Klebanoff, “Modeling radiation-induced carbon contamination of extreme ultraviolet optics,” J. Vac. Sci. Technol. B 24, 64–82 (2006).
[Crossref]

Izumi, A.

K. Motai, H. Oizumi, S. Miyagaki, I. Nishiyama, A. Izumi, T. Ueno, Y. Miyazaki, and A. Namiki., “Atomic hydrogen cleaning of Ru-capped EUV multilayer mirror,” Proc. SPIE 6517, 65170F1–65170F8 (2007).

Kabachnik, N.

A. Wonisch, Th. Westerwalbesloh, W. Hachmann, and N. Kabachnik, “Aperiodic nanometer multilayer systems as optical key components for attosecond electron spectroscopy,” Thin Solid Films 464–465, 473–477 (2004).
[Crossref]

Kabachnik, N. M.

Kaufmann, B. B.

S. Bajt, J.B. Alameda, T. W. Barbee, W. M. Clift, J. A. Folta, B. B. Kaufmann, and E. A. Spiller, “Improved reflectance and stability of Mo/Si multilayers,” Opt. Eng. 41, 1797–1804 (2002).
[Crossref]

Kazamias, S.

Klebanoff, L.

J. Hollensheada and L. Klebanoff, “Modeling radiation-induced carbon contamination of extreme ultraviolet optics,” J. Vac. Sci. Technol. B 24, 64–82 (2006).
[Crossref]

Klebanoff, L. E.

M. E. Malinowski, C. Steinhaus, W. M. Clift, L. E. Klebanoff, S. Mrowka, and R. Soufli “Controlling contamination in Mo/Si mutilayer mirrors by Si surface capping modifications,” Proc. SPIE 4688, 442–453 (2002).
[Crossref]

Kleineberg, U.

Krausz, F.

L’Huillier, A.

Laude, V.

Liu, Y.

López-Martens, R.

Lucatorto, T. B.

S. B. Hill, I. Ermanoski, C. Tarrio, T. B. Lucatorto, T. E. Madey, S. Bajt, M. Fang, and M. Chandhok “Critical parameters influencing the EUV-induced damage of Ru-capped multilayer mirrors,” Proc. SPIE 6517, 65170G (2007).
[Crossref]

Madey, T. E.

S. B. Hill, I. Ermanoski, C. Tarrio, T. B. Lucatorto, T. E. Madey, S. Bajt, M. Fang, and M. Chandhok “Critical parameters influencing the EUV-induced damage of Ru-capped multilayer mirrors,” Proc. SPIE 6517, 65170G (2007).
[Crossref]

Malinowski, M. E.

M. E. Malinowski, C. Steinhaus, W. M. Clift, L. E. Klebanoff, S. Mrowka, and R. Soufli “Controlling contamination in Mo/Si mutilayer mirrors by Si surface capping modifications,” Proc. SPIE 4688, 442–453 (2002).
[Crossref]

Michette, A. G.

Miyagaki, S.

K. Motai, H. Oizumi, S. Miyagaki, I. Nishiyama, A. Izumi, T. Ueno, Y. Miyazaki, and A. Namiki., “Atomic hydrogen cleaning of Ru-capped EUV multilayer mirror,” Proc. SPIE 6517, 65170F1–65170F8 (2007).

Miyazaki, Y.

K. Motai, H. Oizumi, S. Miyagaki, I. Nishiyama, A. Izumi, T. Ueno, Y. Miyazaki, and A. Namiki., “Atomic hydrogen cleaning of Ru-capped EUV multilayer mirror,” Proc. SPIE 6517, 65170F1–65170F8 (2007).

Morlens, A. S.

Morlens, A.-S.

Motai, K.

K. Motai, H. Oizumi, S. Miyagaki, I. Nishiyama, A. Izumi, T. Ueno, Y. Miyazaki, and A. Namiki., “Atomic hydrogen cleaning of Ru-capped EUV multilayer mirror,” Proc. SPIE 6517, 65170F1–65170F8 (2007).

Mrowka, S.

M. E. Malinowski, C. Steinhaus, W. M. Clift, L. E. Klebanoff, S. Mrowka, and R. Soufli “Controlling contamination in Mo/Si mutilayer mirrors by Si surface capping modifications,” Proc. SPIE 4688, 442–453 (2002).
[Crossref]

Namiki, A.

K. Motai, H. Oizumi, S. Miyagaki, I. Nishiyama, A. Izumi, T. Ueno, Y. Miyazaki, and A. Namiki., “Atomic hydrogen cleaning of Ru-capped EUV multilayer mirror,” Proc. SPIE 6517, 65170F1–65170F8 (2007).

Nelson, E. J.

S. Bajt, Z. R. Dai, E. J. Nelson, M. A. Wall, J. Alameda, N. Nguyen, S. Baker, J. C. Robinson, J. S. Taylor, M. Clift, A. Aquila, E. M. Gullikson, and N. V. Ginger Edwards “Oxidation resistance of Ru-capped EUV multilayers,” Proc. SPIE 5751, 118–127 (2005).
[Crossref]

Neuhusler, U.

Nguyen, N.

S. Bajt, Z. R. Dai, E. J. Nelson, M. A. Wall, J. Alameda, N. Nguyen, S. Baker, J. C. Robinson, J. S. Taylor, M. Clift, A. Aquila, E. M. Gullikson, and N. V. Ginger Edwards “Oxidation resistance of Ru-capped EUV multilayers,” Proc. SPIE 5751, 118–127 (2005).
[Crossref]

Nicolosi, P.

Nishiyama, I.

K. Motai, H. Oizumi, S. Miyagaki, I. Nishiyama, A. Izumi, T. Ueno, Y. Miyazaki, and A. Namiki., “Atomic hydrogen cleaning of Ru-capped EUV multilayer mirror,” Proc. SPIE 6517, 65170F1–65170F8 (2007).

Oizumi, H.

K. Motai, H. Oizumi, S. Miyagaki, I. Nishiyama, A. Izumi, T. Ueno, Y. Miyazaki, and A. Namiki., “Atomic hydrogen cleaning of Ru-capped EUV multilayer mirror,” Proc. SPIE 6517, 65170F1–65170F8 (2007).

Pelizzo, M. G.

Pelizzo, M.-G.

Pfauntsch, S. J.

Pirozhkov, A. S.

I. L. Beigman, A. S. Pirozhkov, and E. N. Ragozin, “Reflection of few-cycle x-ray pulses by aperiodic multilayer structures,” J. Opt. A 4, 433–439 (2002).
[Crossref]

Powell, A. K.

Ragozin, E. N.

I. L. Beigman, A. S. Pirozhkov, and E. N. Ragozin, “Reflection of few-cycle x-ray pulses by aperiodic multilayer structures,” J. Opt. A 4, 433–439 (2002).
[Crossref]

Ravet, M.-F.

Remetter, T.

Robinson, J. C.

S. Bajt, Z. R. Dai, E. J. Nelson, M. A. Wall, J. Alameda, N. Nguyen, S. Baker, J. C. Robinson, J. S. Taylor, M. Clift, A. Aquila, E. M. Gullikson, and N. V. Ginger Edwards “Oxidation resistance of Ru-capped EUV multilayers,” Proc. SPIE 5751, 118–127 (2005).
[Crossref]

Salmassi, F.

Schäfers, F.

Singh, M.

Soufli, R.

M. E. Malinowski, C. Steinhaus, W. M. Clift, L. E. Klebanoff, S. Mrowka, and R. Soufli “Controlling contamination in Mo/Si mutilayer mirrors by Si surface capping modifications,” Proc. SPIE 4688, 442–453 (2002).
[Crossref]

Spiller, E. A.

S. Bajt, J.B. Alameda, T. W. Barbee, W. M. Clift, J. A. Folta, B. B. Kaufmann, and E. A. Spiller, “Improved reflectance and stability of Mo/Si multilayers,” Opt. Eng. 41, 1797–1804 (2002).
[Crossref]

Steinhaus, C.

M. E. Malinowski, C. Steinhaus, W. M. Clift, L. E. Klebanoff, S. Mrowka, and R. Soufli “Controlling contamination in Mo/Si mutilayer mirrors by Si surface capping modifications,” Proc. SPIE 4688, 442–453 (2002).
[Crossref]

Suman, M.

Tarrio, C.

S. B. Hill, I. Ermanoski, C. Tarrio, T. B. Lucatorto, T. E. Madey, S. Bajt, M. Fang, and M. Chandhok “Critical parameters influencing the EUV-induced damage of Ru-capped multilayer mirrors,” Proc. SPIE 6517, 65170G (2007).
[Crossref]

Taylor, J. S.

S. Bajt, Z. R. Dai, E. J. Nelson, M. A. Wall, J. Alameda, N. Nguyen, S. Baker, J. C. Robinson, J. S. Taylor, M. Clift, A. Aquila, E. M. Gullikson, and N. V. Ginger Edwards “Oxidation resistance of Ru-capped EUV multilayers,” Proc. SPIE 5751, 118–127 (2005).
[Crossref]

Ueno, T.

K. Motai, H. Oizumi, S. Miyagaki, I. Nishiyama, A. Izumi, T. Ueno, Y. Miyazaki, and A. Namiki., “Atomic hydrogen cleaning of Ru-capped EUV multilayer mirror,” Proc. SPIE 6517, 65170F1–65170F8 (2007).

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[Crossref]

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[Crossref]

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Opt. Express (2)

Opt. Lett. (3)

Proc. SPIE (3)

K. Motai, H. Oizumi, S. Miyagaki, I. Nishiyama, A. Izumi, T. Ueno, Y. Miyazaki, and A. Namiki., “Atomic hydrogen cleaning of Ru-capped EUV multilayer mirror,” Proc. SPIE 6517, 65170F1–65170F8 (2007).

S. Bajt, Z. R. Dai, E. J. Nelson, M. A. Wall, J. Alameda, N. Nguyen, S. Baker, J. C. Robinson, J. S. Taylor, M. Clift, A. Aquila, E. M. Gullikson, and N. V. Ginger Edwards “Oxidation resistance of Ru-capped EUV multilayers,” Proc. SPIE 5751, 118–127 (2005).
[Crossref]

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[Crossref]

Proc. SPIE 4688 (1)

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[Crossref]

Thin Solid Films (1)

A. Wonisch, Th. Westerwalbesloh, W. Hachmann, and N. Kabachnik, “Aperiodic nanometer multilayer systems as optical key components for attosecond electron spectroscopy,” Thin Solid Films 464–465, 473–477 (2004).
[Crossref]

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Figures (8)

Fig.1. .
Fig.1. .

Schematic representation of the standing wave into a multilayer structure

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Fig. 2.
Fig. 2.

The typical spectrum emitted by a tin laser plasma, the shadowed area corresponds to the spectral components utilized by multilayer optics for the EUV lithography.

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Fig. 3.
Fig. 3.

A-periodic structure layers thickness: in gray a-Si, in black Mo. The abscissa represents the increasing period number starting from the most external to the internal layer.

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Fig. 4.
Fig. 4.

Theoretical calculations of the reflectivity curves: case a) standard periodic ML, case b) a-periodic chaotic ML; in both cases: continuous line, MLs with Ru/Mo capping layer; dash dotted line, ML with Pt/Mo capping layer; and dashed line, ML with a-Si/Mo capping layer.

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Fig. 5.
Fig. 5.

Experimental reflectivity curves: case a) standard periodic ML, case b) a-periodic chaotic ML; in both cases: continuous line, MLs with Ru/Mo capping layer; dash dotted line, ML with Pt/Mo capping layer; and dashed line, ML with a-Si/Mo capping layer.

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Fig. 6.
Fig. 6.

X-ray reflectance (XRR) measured from 0 to 6 deg (grazing) using Cu Kα (1.54Å) radiation. The structures considered are periodic (case (a)) and a-periodic (case (b)) over-coated by Ru/Mo capping layer. In both cases in gray the measured data and in black the fitting result.

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Fig. 7.
Fig. 7.

Experimental reflectivity curves measured at ELETTRA and RXO. In the case (a) a-periodic and periodic structures with Ru/Mo capping layer, in the case (b) a-periodic and periodic structures with Pt/Mo capping layer; in both cases: continuous black line, a-periodic structure measured at ELETTRA; dashed black line, a-periodic structure measured at RXO; continuous gray line, periodic structure measured at ELETTRA; and dashed gray line, periodic structure measured at RXO.

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Fig. 8.
Fig. 8.

Experimental (continuous line) results of photoemission compared with theoretical (dash dotted line) prediction of the standing wave intensity in the top of the ML, see text. In sub section (a) the periodic case over capped by ruthenium, in sub section (b) the a-periodic case over capped by ruthenium, in sub section (c) the periodic case over capped by platinum and in sub section d) the a-periodic case over capped by platinum.

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Tables (2)

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Table 1. Peak reflectance values for the six samples: italic, values measured at RXOLLC and underlined, values measured at ELETTRA.

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Table 2. The ratio between the total secondary electron yield signals taken at the reflectivity peak.

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