Abstract

An extensively modified laser-lithography system specially developed for realization of micro-optical profiles on non-planar surfaces is presented. This extended system offers new possibilities of fabricating micro-optical elements without the technology related restriction of surface shape that existed so far. A diffractive lens on a convex spherical substrate is designed and fabricated as an example for hybrid achromatic refractive-diffractive elements to demonstrate the functionality of the system and the wide range of possible new applications.

©2007 Optical Society of America

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References

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  1. M. T. Gale, M. Rossi, J. Pedersen, and H. Schütz, “Fabrication of continuous-relief micro-optical elements by direct laser writing in photoresist,” Opt. Eng. 33,3556–3566 (1994).
    [Crossref]
  2. Y. Xie, Z. Lu, F. Li, J. Zhao, and Z. Weng, “Lithographic fabrication of large diffractive optical elements on a concave lens surface,” Opt. Express 10,1043–1047 (2002).
    [PubMed]
  3. Y. Xie, Z. Lu, and F. Li, “Lithographic fabrication of large curved hologram by laser writer,” Opt. Express 12, 1810–1814 (2004).
    [Crossref] [PubMed]
  4. U. D. Zeitner and P. Dannberg, “Double-sided hybrid microoptical elements combining functions of multistage optical systems,” Proc. SPIE Vol. 4440 Lithographic and Micromachining Techniques for Optical Component Fabrication, pp.44–50, (2001).
    [Crossref]
  5. T. Stone and N. George, “Hybrid diffractive-refractive lenses and achromats, ” Appl. Opt. 27,2960–2971 (1988).
    [Crossref] [PubMed]
  6. C. G. Blough, M. Rossi, S.K. Mack, and R.L. Michaels, “Single-point diamond turning and replication of visible and near-infrared diffractive optical elements,” Appl. Opt. 36,4648–4654 (1997).
    [Crossref] [PubMed]
  7. X. Feng and L. Sun, “Mathematical model of spin-coated photoresist on a spherical substrate,” Opt. Express 13,7070–7075 (2005).
    [Crossref] [PubMed]
  8. C. Londoño and P. Clark, “Modeling diffraction efficiency effects when designing hybrid diffractive lens systems,” Appl. Opt. 31,2248–2252 (1992).
    [Crossref] [PubMed]

2005 (1)

2004 (1)

2002 (1)

2001 (1)

U. D. Zeitner and P. Dannberg, “Double-sided hybrid microoptical elements combining functions of multistage optical systems,” Proc. SPIE Vol. 4440 Lithographic and Micromachining Techniques for Optical Component Fabrication, pp.44–50, (2001).
[Crossref]

1997 (1)

1994 (1)

M. T. Gale, M. Rossi, J. Pedersen, and H. Schütz, “Fabrication of continuous-relief micro-optical elements by direct laser writing in photoresist,” Opt. Eng. 33,3556–3566 (1994).
[Crossref]

1992 (1)

1988 (1)

Blough, C. G.

Clark, P.

Dannberg, P.

U. D. Zeitner and P. Dannberg, “Double-sided hybrid microoptical elements combining functions of multistage optical systems,” Proc. SPIE Vol. 4440 Lithographic and Micromachining Techniques for Optical Component Fabrication, pp.44–50, (2001).
[Crossref]

Feng, X.

Gale, M. T.

M. T. Gale, M. Rossi, J. Pedersen, and H. Schütz, “Fabrication of continuous-relief micro-optical elements by direct laser writing in photoresist,” Opt. Eng. 33,3556–3566 (1994).
[Crossref]

George, N.

Li, F.

Londoño, C.

Lu, Z.

Mack, S.K.

Michaels, R.L.

Pedersen, J.

M. T. Gale, M. Rossi, J. Pedersen, and H. Schütz, “Fabrication of continuous-relief micro-optical elements by direct laser writing in photoresist,” Opt. Eng. 33,3556–3566 (1994).
[Crossref]

Rossi, M.

C. G. Blough, M. Rossi, S.K. Mack, and R.L. Michaels, “Single-point diamond turning and replication of visible and near-infrared diffractive optical elements,” Appl. Opt. 36,4648–4654 (1997).
[Crossref] [PubMed]

M. T. Gale, M. Rossi, J. Pedersen, and H. Schütz, “Fabrication of continuous-relief micro-optical elements by direct laser writing in photoresist,” Opt. Eng. 33,3556–3566 (1994).
[Crossref]

Schütz, H.

M. T. Gale, M. Rossi, J. Pedersen, and H. Schütz, “Fabrication of continuous-relief micro-optical elements by direct laser writing in photoresist,” Opt. Eng. 33,3556–3566 (1994).
[Crossref]

Stone, T.

Sun, L.

Weng, Z.

Xie, Y.

Zeitner, U. D.

U. D. Zeitner and P. Dannberg, “Double-sided hybrid microoptical elements combining functions of multistage optical systems,” Proc. SPIE Vol. 4440 Lithographic and Micromachining Techniques for Optical Component Fabrication, pp.44–50, (2001).
[Crossref]

Zhao, J.

Appl. Opt. (3)

Opt. Eng. (1)

M. T. Gale, M. Rossi, J. Pedersen, and H. Schütz, “Fabrication of continuous-relief micro-optical elements by direct laser writing in photoresist,” Opt. Eng. 33,3556–3566 (1994).
[Crossref]

Opt. Express (3)

Proc. SPIE Vol. (1)

U. D. Zeitner and P. Dannberg, “Double-sided hybrid microoptical elements combining functions of multistage optical systems,” Proc. SPIE Vol. 4440 Lithographic and Micromachining Techniques for Optical Component Fabrication, pp.44–50, (2001).
[Crossref]

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Figures (7)

Fig. 1.
Fig. 1. Sketch of the main functional components of the modified laser lithography system allowing for structuring curved surfaces.

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Fig. 2.
Fig. 2. Data preparation: data are defined in the tangential plane and projected onto the surface (a). The structure is divided into a number of subfields, where each subfield is pre-distorted and exposed separately (b).

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Fig. 3.
Fig. 3. Design of a simple optical 1:1 imaging setup.

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Fig. 4.
Fig. 4. Comparison of MTF for standard lens (blue, dotted line) and hybrid lens (red, plain line) to diffraction limited performance of an ideal lens (black, dashed line) for a field of view of 2 mm × 2 mm in the image plane. The table on the right shows parameters of the simulation.

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Fig. 5.
Fig. 5. (a) Photograph of the diffractive element on a biconvex lens. (b) Microscope picture of the hybrid element taken in differential interference contrast mode.

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Fig. 6.
Fig. 6. Comparison of theoretically and experimentally obtained polychromatic MTF for the standard and the hybrid lens.

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Fig. 7.
Fig. 7. Maximum diffraction efficiency for blazed gratings with varying grating period which were fabricated by our laser lithography system on planar substrates.

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Tables (1)

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Table 1. Technical data of the new laser-lithography system

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Equations (1)

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ε ( m , λ ) = sin c 2 { π [ m − m 0 λ 0 Δ n ( λ 0 ) Δ n ( λ ) λ ] } ,

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