Abstract

Reflection can significantly improve the quality of subwavelength near-field images, which is explained by appropriate interference between forward and reflected waves. Plasmonic slabs may form approximate super-mirrors. This paper develops general theory in both spectral and spatial representations that allows the reflector position and permittivity to be determined for optimum image uniformity. This elucidates previous observations and predicts behaviour for some other interesting regimes, including interferometric lithography.

© 2007 Optical Society of America

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References

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    [Crossref] [PubMed]
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    [Crossref] [PubMed]
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    [Crossref]
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2006 (2)

T. Taubner, D. Korobkin, Y. Urzhumov, G. Shvets, and R. Hillenbrand, “Near-field microscopy through a SiC superlens,” Science 313, 1595–1595 (2006).
[Crossref] [PubMed]

M. D. Arnold and R. J. Blaikie, “Using surface-plasmon effects to improve process latitude in near-field optical lithography,” in Proceedings of the International Conference on Nanoscience and Nanotechnology, Brisbane, Australia, IEEE Press 06EX1411C, 548–551 (2006).

2005 (5)

D. O. S. Melville and R. J. Blaikie, “Super-resolution imaging through a planar silver layer,” Opt. Express 13, 2127–2134 (2005)
[Crossref] [PubMed]

D. B. Shao and S. C. Chen, “Numerical simulation of surface-plasmon-assisted nanolithography,” Opt. Express 13, 6964–6973 (2005).
[Crossref] [PubMed]

N. Fang, H. Lee, C. Sun, and X. Zhang, “Sub-diffraction-limited optical imaging with a silver superlens,” Science 308, 534–537 (2005).
[Crossref] [PubMed]

J. S. Wei and F. X. Gan, “Dynamic readout of subdiffraction-limited pit arrays with a silver superlens,” Appl. Phys. Lett. 87, art. no. 211101 (2005).
[Crossref]

D. B. Shao and S. C. Chen, “Surface-plasmon-assisted nanoscale photolithography by polarized light,” Appl. Phys. Lett. 86, art. no. 253107 (2005)
[Crossref]

2004 (1)

R. J. Blaikie, M. M. Alkaisi, S. J. McNab, and D. O. S. Melville, “Nanoscale optical patterning using evanescent fields and surface plasmons,” Int. J. Nanoscience 3, 405–417 (2004)
[Crossref]

2000 (1)

J. B. Pendry, “Negative refraction makes a perfect lens,” Phys. Rev. Lett. 85, 3966–3969 (2000).
[Crossref] [PubMed]

1997 (1)

Alkaisi, M. M.

R. J. Blaikie, M. M. Alkaisi, S. J. McNab, and D. O. S. Melville, “Nanoscale optical patterning using evanescent fields and surface plasmons,” Int. J. Nanoscience 3, 405–417 (2004)
[Crossref]

Arnold, M. D.

M. D. Arnold and R. J. Blaikie, “Using surface-plasmon effects to improve process latitude in near-field optical lithography,” in Proceedings of the International Conference on Nanoscience and Nanotechnology, Brisbane, Australia, IEEE Press 06EX1411C, 548–551 (2006).

Blaikie, R. J.

M. D. Arnold and R. J. Blaikie, “Using surface-plasmon effects to improve process latitude in near-field optical lithography,” in Proceedings of the International Conference on Nanoscience and Nanotechnology, Brisbane, Australia, IEEE Press 06EX1411C, 548–551 (2006).

D. O. S. Melville and R. J. Blaikie, “Super-resolution imaging through a planar silver layer,” Opt. Express 13, 2127–2134 (2005)
[Crossref] [PubMed]

R. J. Blaikie, M. M. Alkaisi, S. J. McNab, and D. O. S. Melville, “Nanoscale optical patterning using evanescent fields and surface plasmons,” Int. J. Nanoscience 3, 405–417 (2004)
[Crossref]

Chen, S. C.

D. B. Shao and S. C. Chen, “Surface-plasmon-assisted nanoscale photolithography by polarized light,” Appl. Phys. Lett. 86, art. no. 253107 (2005)
[Crossref]

D. B. Shao and S. C. Chen, “Numerical simulation of surface-plasmon-assisted nanolithography,” Opt. Express 13, 6964–6973 (2005).
[Crossref] [PubMed]

Estroff, A.

B. W. Smith, Y. Fan, J. Zhou, N. Lafferty, and A. Estroff, “Evanescent wave imaging in optical lithography,” Proc. SPIE6154 (2006)

Fan, Y.

B. W. Smith, Y. Fan, J. Zhou, N. Lafferty, and A. Estroff, “Evanescent wave imaging in optical lithography,” Proc. SPIE6154 (2006)

Fang, N.

N. Fang, H. Lee, C. Sun, and X. Zhang, “Sub-diffraction-limited optical imaging with a silver superlens,” Science 308, 534–537 (2005).
[Crossref] [PubMed]

Gan, F. X.

J. S. Wei and F. X. Gan, “Dynamic readout of subdiffraction-limited pit arrays with a silver superlens,” Appl. Phys. Lett. 87, art. no. 211101 (2005).
[Crossref]

Hell, S. W.

Hillenbrand, R.

T. Taubner, D. Korobkin, Y. Urzhumov, G. Shvets, and R. Hillenbrand, “Near-field microscopy through a SiC superlens,” Science 313, 1595–1595 (2006).
[Crossref] [PubMed]

Korobkin, D.

T. Taubner, D. Korobkin, Y. Urzhumov, G. Shvets, and R. Hillenbrand, “Near-field microscopy through a SiC superlens,” Science 313, 1595–1595 (2006).
[Crossref] [PubMed]

Kozubek, M.

Lafferty, N.

B. W. Smith, Y. Fan, J. Zhou, N. Lafferty, and A. Estroff, “Evanescent wave imaging in optical lithography,” Proc. SPIE6154 (2006)

Lee, H.

N. Fang, H. Lee, C. Sun, and X. Zhang, “Sub-diffraction-limited optical imaging with a silver superlens,” Science 308, 534–537 (2005).
[Crossref] [PubMed]

McNab, S. J.

R. J. Blaikie, M. M. Alkaisi, S. J. McNab, and D. O. S. Melville, “Nanoscale optical patterning using evanescent fields and surface plasmons,” Int. J. Nanoscience 3, 405–417 (2004)
[Crossref]

Melville, D. O. S.

D. O. S. Melville and R. J. Blaikie, “Super-resolution imaging through a planar silver layer,” Opt. Express 13, 2127–2134 (2005)
[Crossref] [PubMed]

R. J. Blaikie, M. M. Alkaisi, S. J. McNab, and D. O. S. Melville, “Nanoscale optical patterning using evanescent fields and surface plasmons,” Int. J. Nanoscience 3, 405–417 (2004)
[Crossref]

Pendry, J. B.

J. B. Pendry, “Negative refraction makes a perfect lens,” Phys. Rev. Lett. 85, 3966–3969 (2000).
[Crossref] [PubMed]

Schrader, M.

Shao, D. B.

D. B. Shao and S. C. Chen, “Surface-plasmon-assisted nanoscale photolithography by polarized light,” Appl. Phys. Lett. 86, art. no. 253107 (2005)
[Crossref]

D. B. Shao and S. C. Chen, “Numerical simulation of surface-plasmon-assisted nanolithography,” Opt. Express 13, 6964–6973 (2005).
[Crossref] [PubMed]

Shvets, G.

T. Taubner, D. Korobkin, Y. Urzhumov, G. Shvets, and R. Hillenbrand, “Near-field microscopy through a SiC superlens,” Science 313, 1595–1595 (2006).
[Crossref] [PubMed]

Smith, B. W.

B. W. Smith, Y. Fan, J. Zhou, N. Lafferty, and A. Estroff, “Evanescent wave imaging in optical lithography,” Proc. SPIE6154 (2006)

Sun, C.

N. Fang, H. Lee, C. Sun, and X. Zhang, “Sub-diffraction-limited optical imaging with a silver superlens,” Science 308, 534–537 (2005).
[Crossref] [PubMed]

Taubner, T.

T. Taubner, D. Korobkin, Y. Urzhumov, G. Shvets, and R. Hillenbrand, “Near-field microscopy through a SiC superlens,” Science 313, 1595–1595 (2006).
[Crossref] [PubMed]

Urzhumov, Y.

T. Taubner, D. Korobkin, Y. Urzhumov, G. Shvets, and R. Hillenbrand, “Near-field microscopy through a SiC superlens,” Science 313, 1595–1595 (2006).
[Crossref] [PubMed]

Wei, J. S.

J. S. Wei and F. X. Gan, “Dynamic readout of subdiffraction-limited pit arrays with a silver superlens,” Appl. Phys. Lett. 87, art. no. 211101 (2005).
[Crossref]

Wilson, T.

Zhang, X.

N. Fang, H. Lee, C. Sun, and X. Zhang, “Sub-diffraction-limited optical imaging with a silver superlens,” Science 308, 534–537 (2005).
[Crossref] [PubMed]

Zhou, J.

B. W. Smith, Y. Fan, J. Zhou, N. Lafferty, and A. Estroff, “Evanescent wave imaging in optical lithography,” Proc. SPIE6154 (2006)

Appl. Phys. Lett. (2)

J. S. Wei and F. X. Gan, “Dynamic readout of subdiffraction-limited pit arrays with a silver superlens,” Appl. Phys. Lett. 87, art. no. 211101 (2005).
[Crossref]

D. B. Shao and S. C. Chen, “Surface-plasmon-assisted nanoscale photolithography by polarized light,” Appl. Phys. Lett. 86, art. no. 253107 (2005)
[Crossref]

Int. J. Nanoscience (1)

R. J. Blaikie, M. M. Alkaisi, S. J. McNab, and D. O. S. Melville, “Nanoscale optical patterning using evanescent fields and surface plasmons,” Int. J. Nanoscience 3, 405–417 (2004)
[Crossref]

Opt. Express (2)

Opt. Lett. (1)

Phys. Rev. Lett. (1)

J. B. Pendry, “Negative refraction makes a perfect lens,” Phys. Rev. Lett. 85, 3966–3969 (2000).
[Crossref] [PubMed]

Proceedings of the International Conference on Nanoscience and Nanotechnology, Brisbane, Australia, IEEE Press 06EX1411C (1)

M. D. Arnold and R. J. Blaikie, “Using surface-plasmon effects to improve process latitude in near-field optical lithography,” in Proceedings of the International Conference on Nanoscience and Nanotechnology, Brisbane, Australia, IEEE Press 06EX1411C, 548–551 (2006).

Science (2)

T. Taubner, D. Korobkin, Y. Urzhumov, G. Shvets, and R. Hillenbrand, “Near-field microscopy through a SiC superlens,” Science 313, 1595–1595 (2006).
[Crossref] [PubMed]

N. Fang, H. Lee, C. Sun, and X. Zhang, “Sub-diffraction-limited optical imaging with a silver superlens,” Science 308, 534–537 (2005).
[Crossref] [PubMed]

Other (1)

B. W. Smith, Y. Fan, J. Zhou, N. Lafferty, and A. Estroff, “Evanescent wave imaging in optical lithography,” Proc. SPIE6154 (2006)

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