Abstract

It has been proposed that a planar silver layer could be used to project a super-resolution image in the near field when illuminated near its plasma frequency [J. B. Pendry, Phys. Rev. Lett. 86, 3966 (2000)]. This has been investigated experimentally using a modified form of conformal-mask photolithography, where dielectric spacers and silver layers are coated onto a tungsten-on-glass mask. We report here on the experimental confirmation that super-resolution imaging can be achieved using a 50-nm thick planar silver layer as a near-field lens at wavelengths around 365 nm. Gratings with periods down to 145 nm have been resolved, which agrees well with our finite-difference time domain (FDTD) simulations.

© 2005 Optical Society of America

PDF Article

References

  • View by:
  • |

  1. J. B. Pendry, �??Negative refraction makes a perfect lens,�?? Phys. Rev. Lett. 85, 3966�??3969 (2000).
    [CrossRef]
  2. R. A. Shelby, D. R. Smith and S. Schultz, �??Experimental verification of a negative index of refraction,�?? Science 292, 77�??79 (2001).
    [CrossRef]
  3. A. N. Lagarkov and V. N. Kissel, �??Near-perfect imaging in a focusing system based on a left-handed-material plate,�?? Phys. Rev. Lett. 92, art. no. 077401 (2004).
    [CrossRef]
  4. D. O. S. Melville, R. J. Blaikie and C. R. Wolf, �??Submicron imaging with a planar silver lens,�?? Appl. Phys. Lett. 84, 4403�??4405 (2004).
    [CrossRef]
  5. R. J. Blaikie and D. O. S. Melville, �??Imaging through planar silver lenses in the optical near field,�?? J. Opt. A: Pure Appl. Opt. 7, S176�??S183 (2005).
    [CrossRef]
  6. M. M. Alkaisi, R. J. Blaikie, S. J. McNab, R. Cheung and D. R. S. Cumming, �??Sub-diffraction-limited patterning using evanescent near-field optical lithography,�?? Appl. Phys. Lett. 75, 3560�??3562 (1999).
    [CrossRef]
  7. X. G. Luo and T. Ishihara, �??Subwavelength photolithography based on surface-plasmon polariton resonance,�?? Opt. Express 12, 3055�??3065 (2004), <a href= "http://www.opticsexpress.org/abstract.cfm?URI=OPEX-12-14-3055">http://www.opticsexpress.org/abstract.cfm?URI=OPEX-12-14-3055</a>.
    [CrossRef]
  8. H. F. Talbot, �??Facts relating to optical science,�?? Phil. Mag. 9, 401�??407 (1836).

Appl. Phys. Lett. (2)

D. O. S. Melville, R. J. Blaikie and C. R. Wolf, �??Submicron imaging with a planar silver lens,�?? Appl. Phys. Lett. 84, 4403�??4405 (2004).
[CrossRef]

M. M. Alkaisi, R. J. Blaikie, S. J. McNab, R. Cheung and D. R. S. Cumming, �??Sub-diffraction-limited patterning using evanescent near-field optical lithography,�?? Appl. Phys. Lett. 75, 3560�??3562 (1999).
[CrossRef]

J. Opt. A: Pure Appl. Opt. (1)

R. J. Blaikie and D. O. S. Melville, �??Imaging through planar silver lenses in the optical near field,�?? J. Opt. A: Pure Appl. Opt. 7, S176�??S183 (2005).
[CrossRef]

Opt. Express (1)

Phil. Mag. (1)

H. F. Talbot, �??Facts relating to optical science,�?? Phil. Mag. 9, 401�??407 (1836).

Phys. Rev. Lett. (2)

A. N. Lagarkov and V. N. Kissel, �??Near-perfect imaging in a focusing system based on a left-handed-material plate,�?? Phys. Rev. Lett. 92, art. no. 077401 (2004).
[CrossRef]

J. B. Pendry, �??Negative refraction makes a perfect lens,�?? Phys. Rev. Lett. 85, 3966�??3969 (2000).
[CrossRef]

Science (1)

R. A. Shelby, D. R. Smith and S. Schultz, �??Experimental verification of a negative index of refraction,�?? Science 292, 77�??79 (2001).
[CrossRef]

Cited By

OSA participates in CrossRef's Cited-By Linking service. Citing articles from OSA journals and other participating publishers are listed here.

Alert me when this article is cited.


Metrics