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[Crossref]
S. Grigoropoulos, E. Gogolides, A. D. Tserepi, and A. G. Nassiopoulos, “Highly anisotropic silicon reactive ion etching for nanofabrication using mixtures of SF6/CHF3 gases,” J. Vac. Sci. Technol. B 15, 640–645 (1997).
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R. C. Tyan, P. C. Sun, A. Scherer, and Y. Fainman, “Polarizing beam splitter based on the anisotropic spectral reflectivity characteristic of form-birefringent multilayer gratings”, Opt. Lett. 21, 82–89 (1996).
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[Crossref]
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D. C. Flanders, “Submicrometer periodicity gratings as artificial anisotropic dielectrics,” Appl. Phys. Lett 42, 492–49 (1983).
[Crossref]
S. Y. Chou, S. J. Schablitsky, and L. Zhuang, “Application of amorphous silicon gratings in polarization switching vertical-cavity surface-emitting lasers,” J. Vac. Sci. Technol. B 15, 2864–2867 (1997).
[Crossref]
R. C. Tyan, P. C. Sun, A. Scherer, and Y. Fainman, “Polarizing beam splitter based on the anisotropic spectral reflectivity characteristic of form-birefringent multilayer gratings”, Opt. Lett. 21, 82–89 (1996).
[Crossref]
F. Xu, R. C. Tyan, P. C. Sun, and Y. Fainman, “Fabrication, modeling, and characterization of form-birefringent nanostructures,” Opt. Lett. 24, 2457–2459 (1995).
[Crossref]
D. C. Flanders, “Submicrometer periodicity gratings as artificial anisotropic dielectrics,” Appl. Phys. Lett 42, 492–49 (1983).
[Crossref]
S. Grigoropoulos, E. Gogolides, A. D. Tserepi, and A. G. Nassiopoulos, “Highly anisotropic silicon reactive ion etching for nanofabrication using mixtures of SF6/CHF3 gases,” J. Vac. Sci. Technol. B 15, 640–645 (1997).
[Crossref]
S. Grigoropoulos, E. Gogolides, A. D. Tserepi, and A. G. Nassiopoulos, “Highly anisotropic silicon reactive ion etching for nanofabrication using mixtures of SF6/CHF3 gases,” J. Vac. Sci. Technol. B 15, 640–645 (1997).
[Crossref]
S. Grigoropoulos, E. Gogolides, A. D. Tserepi, and A. G. Nassiopoulos, “Highly anisotropic silicon reactive ion etching for nanofabrication using mixtures of SF6/CHF3 gases,” J. Vac. Sci. Technol. B 15, 640–645 (1997).
[Crossref]
S. Y. Chou, S. J. Schablitsky, and L. Zhuang, “Application of amorphous silicon gratings in polarization switching vertical-cavity surface-emitting lasers,” J. Vac. Sci. Technol. B 15, 2864–2867 (1997).
[Crossref]
R. C. Tyan, P. C. Sun, A. Scherer, and Y. Fainman, “Polarizing beam splitter based on the anisotropic spectral reflectivity characteristic of form-birefringent multilayer gratings”, Opt. Lett. 21, 82–89 (1996).
[Crossref]
R. C. Tyan, P. C. Sun, A. Scherer, and Y. Fainman, “Polarizing beam splitter based on the anisotropic spectral reflectivity characteristic of form-birefringent multilayer gratings”, Opt. Lett. 21, 82–89 (1996).
[Crossref]
F. Xu, R. C. Tyan, P. C. Sun, and Y. Fainman, “Fabrication, modeling, and characterization of form-birefringent nanostructures,” Opt. Lett. 24, 2457–2459 (1995).
[Crossref]
S. Grigoropoulos, E. Gogolides, A. D. Tserepi, and A. G. Nassiopoulos, “Highly anisotropic silicon reactive ion etching for nanofabrication using mixtures of SF6/CHF3 gases,” J. Vac. Sci. Technol. B 15, 640–645 (1997).
[Crossref]
R. C. Tyan, P. C. Sun, A. Scherer, and Y. Fainman, “Polarizing beam splitter based on the anisotropic spectral reflectivity characteristic of form-birefringent multilayer gratings”, Opt. Lett. 21, 82–89 (1996).
[Crossref]
F. Xu, R. C. Tyan, P. C. Sun, and Y. Fainman, “Fabrication, modeling, and characterization of form-birefringent nanostructures,” Opt. Lett. 24, 2457–2459 (1995).
[Crossref]
F. Xu, R. C. Tyan, P. C. Sun, and Y. Fainman, “Fabrication, modeling, and characterization of form-birefringent nanostructures,” Opt. Lett. 24, 2457–2459 (1995).
[Crossref]
S. Y. Chou, S. J. Schablitsky, and L. Zhuang, “Application of amorphous silicon gratings in polarization switching vertical-cavity surface-emitting lasers,” J. Vac. Sci. Technol. B 15, 2864–2867 (1997).
[Crossref]
D. C. Flanders, “Submicrometer periodicity gratings as artificial anisotropic dielectrics,” Appl. Phys. Lett 42, 492–49 (1983).
[Crossref]
S. Y. Chou, S. J. Schablitsky, and L. Zhuang, “Application of amorphous silicon gratings in polarization switching vertical-cavity surface-emitting lasers,” J. Vac. Sci. Technol. B 15, 2864–2867 (1997).
[Crossref]
S. Grigoropoulos, E. Gogolides, A. D. Tserepi, and A. G. Nassiopoulos, “Highly anisotropic silicon reactive ion etching for nanofabrication using mixtures of SF6/CHF3 gases,” J. Vac. Sci. Technol. B 15, 640–645 (1997).
[Crossref]
T. J. Kim, G. Campbell, and R. K. Kostuk, “Volume holographic phase-retardation elements,” Opt. Lett. 20, 2030–2032 (1995).
[Crossref]
[PubMed]
A. G. Lopez and H. G. Craighead, “Wave-plate polarizing beam splitter based on a form-birefringent multilayer grating,” Opt. Lett. 23, 1627–1629 (1998).
[Crossref]
F. Xu, R. C. Tyan, P. C. Sun, and Y. Fainman, “Fabrication, modeling, and characterization of form-birefringent nanostructures,” Opt. Lett. 24, 2457–2459 (1995).
[Crossref]
R. C. Tyan, P. C. Sun, A. Scherer, and Y. Fainman, “Polarizing beam splitter based on the anisotropic spectral reflectivity characteristic of form-birefringent multilayer gratings”, Opt. Lett. 21, 82–89 (1996).
[Crossref]
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