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Heat accumulation effects in femtosecond laser-written waveguides with variable repetition rate

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Abstract

High-repetition rate femtosecond lasers are shown to drive heat accumulation processes that are attractive for rapid writing of low-loss optical waveguides in transparent glasses. A novel femtosecond fiber laser system (IMRA America, FCPA µJewel) providing variable repetition rate between 0.1 and 5 MHz was used to study the relationship between heat accumulation and resulting waveguide properties in fused silica and various borosilicate glasses. Increasing repetition rate was seen to increase the waveguide diameter and decrease the waveguide loss, with waveguides written with 1-MHz repetition rate yielding ~0.2-dB/cm propagation loss in Schott AF45 glass. A finite-difference thermal diffusion model accurately tracks the waveguide diameter as cumulative heating expands the modification zone above 200-kHz repetition rate.

©2005 Optical Society of America

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Figures (5)

Fig. 1.
Fig. 1. Ultrafast laser beam delivery system for transverse waveguide writing
Fig. 2.
Fig. 2. Optical microscope images showing heat affected zones created in AF45 borosilicate glass with 450-nJ pulse energy from a 1045-nm femtosecond laser. Total pulse (top) and fluence accumulation (bottom) is shown for each column and the laser repetition rate is indicated for each row. Laser direction is normal to page.
Fig. 3.
Fig. 3. Finite-difference model of glass temperature versus exposure, at a radial position of 2 µm from the center of the laser beam.
Fig. 4.
Fig. 4. Melt radius versus net fluence: numerical simulation (solid line) assuming 40% absorption and observed waveguide diameter (solid circle).
Fig. 5.
Fig. 5. Left to right: cross sectional (a) and transverse (b) microscope images, and 1550-nm mode profile (c) of waveguide written in AF45 at 1 MHz, 520 nJ, 0.65-NA and 15 mm/s. The red arrows indicate the direction of the femtosecond laser.

Tables (1)

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Table 1. Glass properties Schott and Corning glasses [12]

Equations (2)

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E ( r ) = E 0 exp ( r 2 w 0 2 )
r ( r 2 T r ) = r 2 D T t
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