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Sub-wavelength patterning of the optical near-field

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Abstract

We report the sub-wavelength patterning of the optical near-field by total internal reflection illumination of a regular array of resonant gold nano-particles. Under appropriate conditions, the in-plane coupling between Localized Surface Plasmon (LSP) fields gives rise to sub-wavelength light spots between the structures. Measurements performed with an Apertureless Scanning Near-Field Optical Microscope (ASNOM) show a good agreement with theoretical predictions based on the Green dyadic method. This concept might offer a convenient way to elaborate extended optical trap landscapes for manipulation of sub-micrometer systems.

©2004 Optical Society of America

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Figures (4)

Fig. 1.
Fig. 1. Theoretical map of the near-field electric intensity calculated 100nm above a 5×6 array (640nm period) of gold pads (100×100×40)nm3 (location represented by the black squares). The illumination is performed by a plane wave (633nm, TM polarization) under total internal reflection (45° incidence angle). The normalization at each point is done with respect to the electric intensity in the observation plane in the absence of any nanostructure.
Fig. 2.
Fig. 2. Schematic description of our ASNOM set-up
Fig. 3.
Fig. 3. (a–b) 2.4µm×2.4µm images recorded simultaneously above the fabricated sample. (a) AFM topography, (b) ASNOM image (λ=632.8nm, TM polarization and 45° incidence angle). (c–d) Comparison over a unit cell of the theoretical near-field electric intensity (c) and the experimental measurements (d) (zoom in on the square area drawn on Fig. 3(b)).
Fig. 4.
Fig. 4. Dependence of the ASNOM signal on the tip-sample distance when precisely located above one of the inter-particle maxima (experimental data in black, fitting in red).

Equations (1)

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Δ x Δ k x 2 π
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