Abstract

A negative-tone sensitive SiO₂/TiO₂ organic-inorganic hybrid sol-gel material was synthesized and characterized for fabrication of multilevel micro-optical elements by direct electron-beam lithography. The exposure was carried out by an in-house modified electron-beam writing system using LEO SEM-982 with Elphy Quantum exposure beam-blanking control system at 25keV. The hybrid Sol-Gel material demonstrated a superb sensitivity for doses between 0.22μC/cm² and 0.33μC/cm².

©2002 Optical Society of America

Single-step fabrication of continuous surface relief micro-optical elements in hybrid sol-gel glass by laser direct writing

W. X. Yu, X. -C. Yuan, N. Q. Ngo, W. X. Que, W. C. Cheong, and V. Koudriachov
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Fabrication of refractive microlens in hybrid SiO₂/TiO₂ sol-gel glass by electron beam lithography

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UV induced controllable volume growth in hybrid sol-gel glass for fabrication of a refractive microlens by use of a grayscale mask

Weixing Yu and X.-C. Yuan
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