Abstract

It is shown that it is promising to use the RGB data of bright-field optical microscopy to efficiently monitor the surface cleanliness of the active elements of semiconductor wafers in the planar production cycle. It is demonstrated that the film thickness on a substrate surface can be determined from RGB data obtained by means of a photosensor based on a Bayer array with known spectral response. An example shows how to use it on a GaAs semiconductor wafer with metallized active gold elements. Software has been developed for channel-by-channel comparison of a discriminated region of two pictures. An algorithm is presented for obtaining micrographs that can subsequently be analyzed and compared.

© 2020 Optical Society of America

848 ppi high-brightness active-matrix micro-LED micro-display using GaN-on-Si epi-wafers towards mass production

Longheng Qi, Xu Zhang, Wing Cheung Chong, Peian Li, and Kei May Lau
Opt. Express 29(7) 10580-10591 (2021)

Metal-enhanced bright-field microscopy

Harish Sasikumar and Manoj Varma
Appl. Opt. 59(32) 9971-9977 (2020)

Data-driven imaging of tissue inflammation using RGB-based hyperspectral reconstruction toward personal monitoring of dermatologic health

Taehoon Kim, Michelle A. Visbal-Onufrak, Raymond L. Konger, and Young L. Kim
Biomed. Opt. Express 8(11) 5282-5296 (2017)

Nonlinear dependence between the surface reflectance and the duty-cycle of semiconductor nanorod array

Yi-Hao Pai, Yu-Chan Lin, Jai-Lin Tsai, and Gong-Ru Lin
Opt. Express 19(3) 1680-1690 (2011)

2.6 W optically-pumped semiconductor disk laser operating at 1.57-µm using wafer fusion

Jussi Rautiainen, Jari Lyytikäinen, Alexei Sirbu, Alexandru Mereuta, Andrei Caliman, Eli Kapon, and Oleg G. Okhotnikov
Opt. Express 16(26) 21881-21886 (2008)