Abstract
We analyze the combined effect of nonuniformity of exposure over a hologram field and nonlinear response of holographic materials on the overall diffraction efficiency achievable and optimum exposure. We propose that this combined effect be described using a special parameter called the hologram form factor (by analogy with the technique used to describe interaction between bodies of complex shape), i.e., using a correction function or parameter to describe the effect of the extended nature (or shape) on its interaction with other particles and fields. We describe a method for calculating the form factor and show that the basic differences between the optimum exposures and those published in the specifications for the material can be described using correction coefficients obtained from the hologram form factor. We calculate these coefficients both for real holograms recorded using Gaussian beams and used in holographic data storage devices and for model holograms; these calculations provide a good illustration of the trends describing the average diffractive efficiency as a function of exposure. The coefficients for the real holograms are shown to be in good agreement with prior experimental data.
© 2016 Optical Society of America
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