Abstract

In this research, nanostructured TiO₂ thin film was deposited on a glass substrate by the electron beam physical vapor deposition method. X-ray diffraction, field emission scanning electron microscopy, and a UV-VIS-NIR spectrophotometer were used to characterize the structure, morphology, and transmittance spectrum of the TiO₂ thin film. X-ray diffraction showed that the TiO₂ thin film included both anatase and rutile phases and the field emission scanning electron microscopy indicated the average crystal size was 35 nm. Optical parameters of the TiO₂ thin film such as refractive index, extinction coefficient, thickness, and band gap were measured by the Swanepoel method based on the transmittance spectrum.

© 2016 Optical Society of America

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