Abstract

This article is devoted to the work of the Design Office of Precision Electronic Machine-Construction (KBTÉM OMO), which for more than fifty years has provided microelectronics for optomechanical equipment. The size of the elements of integrated circuits has been reduced by a factor of 30 (from 5 ?m to 180 nm) by using this equipment, and the accuracy with which they are arranged on the entire area of a wafer has been increased by a factor of 200 (from 2 ?m to 10 nm). The first integrated circuits, with tens of transistors, have metamorphosed into complex functional systems, with billions of transistors.

© 2013 Optical Society of America

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  1. B. J.  Lin, Optical Lithography: Here is Why (SPIE, Bellingham, Washington, 2009).
  2. K. A.  Valiev, Physical Bases of Submicron Lithography in Microelectronics (Radio i Svyaz’, Moscow, 1984).
  3. Ya. I.  Tochitski?, Optical Technologies of Micro- and Nanoelectronics (RIVSh, Minsk, 2010).
  4. I. M.  Glazkov Ya. A.  Ra?khman, Image Generators in the Production of Integrated Microsystems (Nauka i Tekhnika, Minsk, 1981).
  5. É. S.  Gurevich, L. P.  Psikova, G. V.  Fokova, “Projection objective with magnification—0.1,” Inventor’s Certificate No. 1 177 788.
  6. É. S.  Gurevich, V. I.  Tsuran, G. I.  Tikhonchuk, A. L.  Bogush, “Projection objective with magnification—1/5×,” Patent of the Republic of Belarus No. 5713 (2003).
  7. G. V.  Fokova É. S.  Gurevich, “Illuminator for projection optical printing,” Patent of the Republic of Belarus No. 7688 (2006).
  8. É. S.  Gurevich, G. I.  Tikhonchuk, V. E.  Matyushkov, A. L.  Bogush, A. S.  Age?chenko, V. I.  Tsuran, “Exposure projection system with magnification 1×,” Korean Patent No. 0586062 (2006).

Ageichenko, A. S.

É. S.  Gurevich, G. I.  Tikhonchuk, V. E.  Matyushkov, A. L.  Bogush, A. S.  Age?chenko, V. I.  Tsuran, “Exposure projection system with magnification 1×,” Korean Patent No. 0586062 (2006).

Bogush, A. L.

É. S.  Gurevich, G. I.  Tikhonchuk, V. E.  Matyushkov, A. L.  Bogush, A. S.  Age?chenko, V. I.  Tsuran, “Exposure projection system with magnification 1×,” Korean Patent No. 0586062 (2006).

É. S.  Gurevich, V. I.  Tsuran, G. I.  Tikhonchuk, A. L.  Bogush, “Projection objective with magnification—1/5×,” Patent of the Republic of Belarus No. 5713 (2003).

Fokova, G. V.

G. V.  Fokova É. S.  Gurevich, “Illuminator for projection optical printing,” Patent of the Republic of Belarus No. 7688 (2006).

É. S.  Gurevich, L. P.  Psikova, G. V.  Fokova, “Projection objective with magnification—0.1,” Inventor’s Certificate No. 1 177 788.

Glazkov, I. M.

I. M.  Glazkov Ya. A.  Ra?khman, Image Generators in the Production of Integrated Microsystems (Nauka i Tekhnika, Minsk, 1981).

Gurevich, É. S.

É. S.  Gurevich, V. I.  Tsuran, G. I.  Tikhonchuk, A. L.  Bogush, “Projection objective with magnification—1/5×,” Patent of the Republic of Belarus No. 5713 (2003).

G. V.  Fokova É. S.  Gurevich, “Illuminator for projection optical printing,” Patent of the Republic of Belarus No. 7688 (2006).

É. S.  Gurevich, L. P.  Psikova, G. V.  Fokova, “Projection objective with magnification—0.1,” Inventor’s Certificate No. 1 177 788.

É. S.  Gurevich, G. I.  Tikhonchuk, V. E.  Matyushkov, A. L.  Bogush, A. S.  Age?chenko, V. I.  Tsuran, “Exposure projection system with magnification 1×,” Korean Patent No. 0586062 (2006).

Lin, B. J.

B. J.  Lin, Optical Lithography: Here is Why (SPIE, Bellingham, Washington, 2009).

Matyushkov, V. E.

É. S.  Gurevich, G. I.  Tikhonchuk, V. E.  Matyushkov, A. L.  Bogush, A. S.  Age?chenko, V. I.  Tsuran, “Exposure projection system with magnification 1×,” Korean Patent No. 0586062 (2006).

Psikova, L. P.

É. S.  Gurevich, L. P.  Psikova, G. V.  Fokova, “Projection objective with magnification—0.1,” Inventor’s Certificate No. 1 177 788.

Raikhman, Ya. A.

I. M.  Glazkov Ya. A.  Ra?khman, Image Generators in the Production of Integrated Microsystems (Nauka i Tekhnika, Minsk, 1981).

Tikhonchuk, G. I.

É. S.  Gurevich, V. I.  Tsuran, G. I.  Tikhonchuk, A. L.  Bogush, “Projection objective with magnification—1/5×,” Patent of the Republic of Belarus No. 5713 (2003).

É. S.  Gurevich, G. I.  Tikhonchuk, V. E.  Matyushkov, A. L.  Bogush, A. S.  Age?chenko, V. I.  Tsuran, “Exposure projection system with magnification 1×,” Korean Patent No. 0586062 (2006).

Tochitskii, Ya. I.

Ya. I.  Tochitski?, Optical Technologies of Micro- and Nanoelectronics (RIVSh, Minsk, 2010).

Tsuran, V. I.

É. S.  Gurevich, V. I.  Tsuran, G. I.  Tikhonchuk, A. L.  Bogush, “Projection objective with magnification—1/5×,” Patent of the Republic of Belarus No. 5713 (2003).

É. S.  Gurevich, G. I.  Tikhonchuk, V. E.  Matyushkov, A. L.  Bogush, A. S.  Age?chenko, V. I.  Tsuran, “Exposure projection system with magnification 1×,” Korean Patent No. 0586062 (2006).

Valiev, K. A.

K. A.  Valiev, Physical Bases of Submicron Lithography in Microelectronics (Radio i Svyaz’, Moscow, 1984).

Other (8)

B. J.  Lin, Optical Lithography: Here is Why (SPIE, Bellingham, Washington, 2009).

K. A.  Valiev, Physical Bases of Submicron Lithography in Microelectronics (Radio i Svyaz’, Moscow, 1984).

Ya. I.  Tochitski?, Optical Technologies of Micro- and Nanoelectronics (RIVSh, Minsk, 2010).

I. M.  Glazkov Ya. A.  Ra?khman, Image Generators in the Production of Integrated Microsystems (Nauka i Tekhnika, Minsk, 1981).

É. S.  Gurevich, L. P.  Psikova, G. V.  Fokova, “Projection objective with magnification—0.1,” Inventor’s Certificate No. 1 177 788.

É. S.  Gurevich, V. I.  Tsuran, G. I.  Tikhonchuk, A. L.  Bogush, “Projection objective with magnification—1/5×,” Patent of the Republic of Belarus No. 5713 (2003).

G. V.  Fokova É. S.  Gurevich, “Illuminator for projection optical printing,” Patent of the Republic of Belarus No. 7688 (2006).

É. S.  Gurevich, G. I.  Tikhonchuk, V. E.  Matyushkov, A. L.  Bogush, A. S.  Age?chenko, V. I.  Tsuran, “Exposure projection system with magnification 1×,” Korean Patent No. 0586062 (2006).

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