Abstract

This paper presents the results of the development of a unique metrologic platform intended for the study of the nanodefects of an object and the measurement of its surface flatness on large areas. The design of the platform is based on the simultaneous use of modulation interference microscopy and noncontact aeromagnetic guides. The optical layout and an algorithm for obtaining panoramic images are considered. It is shown to be promising to use the metrologic platform in the optics and semiconductor industries.

© 2012 OSA

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  1. O. Noordman, A. Tychkov, J. Baselmans, J. Tsacoyeanes, G. Politi, M. Patra, V. Blahnik, and M. Maul, “Speckle in optical lithography and the influence on line width roughness,” Proc. SPIE 7274, 72741R (2009).
    [CrossRef]
  2. M. M. Barysheva, B. A. Gribkov, Yu. A. Vainer, M. V. Zorina, A. E. Pestov, Yu. Ya. Platonov, D. N. Rogachev, N. N. Salashchenko, and N. I. Chkhalo, “Problem of roughness detection for supersmooth surfaces,” Proc. SPIE 8076, 80760M-1 (2011).
  3. J. Valley, N. Poduje, J. Sinha, N. Judell, W. Jie, M. Boonman, S. Tempelaars, Y. van Dommelen, H. Kattouw, J. Hauschild, B. Hughes, A. Grabbe, and L. Stanton, “Approaching new metrics for wafer flatness: an investigation of the lithographic consequences of wafer non-flatness,” Proc. SPIE 5375, 1098 (2004).
    [CrossRef]
  4. T. Fujisawa, S. Inoue, and T. Hagiwara, “Desirable wafer edge flatness for CD control in photolithography,” Proc. SPIE 5040, 600 (2003).
    [CrossRef]
  5. M. Born and E. Wolf, Principles of Optics: Electromagnetic Theory of Propagation, Interference, and Diffraction of Light (Pergamon Press, Oxford, 1970; Nauka, Moscow, 1973).
  6. V. A. Andreev, K. V. Indukaev, and P. A. Osipov, “Method of determining the microrelief of an object and the optical properties of the near-surface layer, modulation interference microscope for implementing the method,” Russian Patent No. 2 181 498 (2002).
  7. V. A. Andreev, K. V. Indukaev, and P. A. Osipov, “Method for measuring the microrelief of an object and optical characteristics of near-surface layer, modulation interference microscope for carrying out said method,” Europ. Pat. Appl. 01922153.0-2217, 1/23 (2001).
  8. V. A. Andreev, K. V. Indukaev, and P. A. Osipov, “Method for determining an object microrelief and optical properties of a surface layer, a modulation interference microscope for the method realization,” U.S. Patent 7 221 458, B2 (2003).
  9. A. H. Bennet, H. Osterberg, and H. Jupnik, Phase Microscopy: Principles and Applications (John Wiley & Sons Inc., New York, 1951).
  10. V. A. Andreev, K. V. Indukaev, O. K. Ioselev, A. Legkii, G. Lazarev, and D. Orlov, “Phase modulation microscope MIM-2.1 for measurements of surface microrelief. Results of measurements,” J. Russ. Laser Res. 26, 394 (2005).
    [CrossRef]
  11. V. A. Andreev and K. V. Indukaev, “The Rytov–Vladimirskii phase and interferometric measurements,” J. Russ. Laser Res. 22, 1 (2001).
    [CrossRef]
  12. S. Pancharatnam, Collected Work of S. Pancharatnam, G. W. Series ed. (Oxford Univ. Press, London, 1975).
  13. K. V. Indukaev and P. A. Osipov, “Device for displacing an object,” Russian Patent No. 2 385 220 (2008).

2011 (1)

M. M. Barysheva, B. A. Gribkov, Yu. A. Vainer, M. V. Zorina, A. E. Pestov, Yu. Ya. Platonov, D. N. Rogachev, N. N. Salashchenko, and N. I. Chkhalo, “Problem of roughness detection for supersmooth surfaces,” Proc. SPIE 8076, 80760M-1 (2011).

2009 (1)

O. Noordman, A. Tychkov, J. Baselmans, J. Tsacoyeanes, G. Politi, M. Patra, V. Blahnik, and M. Maul, “Speckle in optical lithography and the influence on line width roughness,” Proc. SPIE 7274, 72741R (2009).
[CrossRef]

2005 (1)

V. A. Andreev, K. V. Indukaev, O. K. Ioselev, A. Legkii, G. Lazarev, and D. Orlov, “Phase modulation microscope MIM-2.1 for measurements of surface microrelief. Results of measurements,” J. Russ. Laser Res. 26, 394 (2005).
[CrossRef]

2004 (1)

J. Valley, N. Poduje, J. Sinha, N. Judell, W. Jie, M. Boonman, S. Tempelaars, Y. van Dommelen, H. Kattouw, J. Hauschild, B. Hughes, A. Grabbe, and L. Stanton, “Approaching new metrics for wafer flatness: an investigation of the lithographic consequences of wafer non-flatness,” Proc. SPIE 5375, 1098 (2004).
[CrossRef]

2003 (1)

T. Fujisawa, S. Inoue, and T. Hagiwara, “Desirable wafer edge flatness for CD control in photolithography,” Proc. SPIE 5040, 600 (2003).
[CrossRef]

2001 (1)

V. A. Andreev and K. V. Indukaev, “The Rytov–Vladimirskii phase and interferometric measurements,” J. Russ. Laser Res. 22, 1 (2001).
[CrossRef]

Andreev, V. A.

V. A. Andreev, K. V. Indukaev, O. K. Ioselev, A. Legkii, G. Lazarev, and D. Orlov, “Phase modulation microscope MIM-2.1 for measurements of surface microrelief. Results of measurements,” J. Russ. Laser Res. 26, 394 (2005).
[CrossRef]

V. A. Andreev and K. V. Indukaev, “The Rytov–Vladimirskii phase and interferometric measurements,” J. Russ. Laser Res. 22, 1 (2001).
[CrossRef]

Barysheva, M. M.

M. M. Barysheva, B. A. Gribkov, Yu. A. Vainer, M. V. Zorina, A. E. Pestov, Yu. Ya. Platonov, D. N. Rogachev, N. N. Salashchenko, and N. I. Chkhalo, “Problem of roughness detection for supersmooth surfaces,” Proc. SPIE 8076, 80760M-1 (2011).

Baselmans, J.

O. Noordman, A. Tychkov, J. Baselmans, J. Tsacoyeanes, G. Politi, M. Patra, V. Blahnik, and M. Maul, “Speckle in optical lithography and the influence on line width roughness,” Proc. SPIE 7274, 72741R (2009).
[CrossRef]

Bennet, A. H.

A. H. Bennet, H. Osterberg, and H. Jupnik, Phase Microscopy: Principles and Applications (John Wiley & Sons Inc., New York, 1951).

Blahnik, V.

O. Noordman, A. Tychkov, J. Baselmans, J. Tsacoyeanes, G. Politi, M. Patra, V. Blahnik, and M. Maul, “Speckle in optical lithography and the influence on line width roughness,” Proc. SPIE 7274, 72741R (2009).
[CrossRef]

Boonman, M.

J. Valley, N. Poduje, J. Sinha, N. Judell, W. Jie, M. Boonman, S. Tempelaars, Y. van Dommelen, H. Kattouw, J. Hauschild, B. Hughes, A. Grabbe, and L. Stanton, “Approaching new metrics for wafer flatness: an investigation of the lithographic consequences of wafer non-flatness,” Proc. SPIE 5375, 1098 (2004).
[CrossRef]

Born, M.

M. Born and E. Wolf, Principles of Optics: Electromagnetic Theory of Propagation, Interference, and Diffraction of Light (Pergamon Press, Oxford, 1970; Nauka, Moscow, 1973).

Chkhalo, N. I.

M. M. Barysheva, B. A. Gribkov, Yu. A. Vainer, M. V. Zorina, A. E. Pestov, Yu. Ya. Platonov, D. N. Rogachev, N. N. Salashchenko, and N. I. Chkhalo, “Problem of roughness detection for supersmooth surfaces,” Proc. SPIE 8076, 80760M-1 (2011).

Fujisawa, T.

T. Fujisawa, S. Inoue, and T. Hagiwara, “Desirable wafer edge flatness for CD control in photolithography,” Proc. SPIE 5040, 600 (2003).
[CrossRef]

Grabbe, A.

J. Valley, N. Poduje, J. Sinha, N. Judell, W. Jie, M. Boonman, S. Tempelaars, Y. van Dommelen, H. Kattouw, J. Hauschild, B. Hughes, A. Grabbe, and L. Stanton, “Approaching new metrics for wafer flatness: an investigation of the lithographic consequences of wafer non-flatness,” Proc. SPIE 5375, 1098 (2004).
[CrossRef]

Gribkov, B. A.

M. M. Barysheva, B. A. Gribkov, Yu. A. Vainer, M. V. Zorina, A. E. Pestov, Yu. Ya. Platonov, D. N. Rogachev, N. N. Salashchenko, and N. I. Chkhalo, “Problem of roughness detection for supersmooth surfaces,” Proc. SPIE 8076, 80760M-1 (2011).

Hagiwara, T.

T. Fujisawa, S. Inoue, and T. Hagiwara, “Desirable wafer edge flatness for CD control in photolithography,” Proc. SPIE 5040, 600 (2003).
[CrossRef]

Hauschild, J.

J. Valley, N. Poduje, J. Sinha, N. Judell, W. Jie, M. Boonman, S. Tempelaars, Y. van Dommelen, H. Kattouw, J. Hauschild, B. Hughes, A. Grabbe, and L. Stanton, “Approaching new metrics for wafer flatness: an investigation of the lithographic consequences of wafer non-flatness,” Proc. SPIE 5375, 1098 (2004).
[CrossRef]

Hughes, B.

J. Valley, N. Poduje, J. Sinha, N. Judell, W. Jie, M. Boonman, S. Tempelaars, Y. van Dommelen, H. Kattouw, J. Hauschild, B. Hughes, A. Grabbe, and L. Stanton, “Approaching new metrics for wafer flatness: an investigation of the lithographic consequences of wafer non-flatness,” Proc. SPIE 5375, 1098 (2004).
[CrossRef]

Indukaev, K. V.

V. A. Andreev, K. V. Indukaev, O. K. Ioselev, A. Legkii, G. Lazarev, and D. Orlov, “Phase modulation microscope MIM-2.1 for measurements of surface microrelief. Results of measurements,” J. Russ. Laser Res. 26, 394 (2005).
[CrossRef]

V. A. Andreev and K. V. Indukaev, “The Rytov–Vladimirskii phase and interferometric measurements,” J. Russ. Laser Res. 22, 1 (2001).
[CrossRef]

Inoue, S.

T. Fujisawa, S. Inoue, and T. Hagiwara, “Desirable wafer edge flatness for CD control in photolithography,” Proc. SPIE 5040, 600 (2003).
[CrossRef]

Ioselev, O. K.

V. A. Andreev, K. V. Indukaev, O. K. Ioselev, A. Legkii, G. Lazarev, and D. Orlov, “Phase modulation microscope MIM-2.1 for measurements of surface microrelief. Results of measurements,” J. Russ. Laser Res. 26, 394 (2005).
[CrossRef]

Jie, W.

J. Valley, N. Poduje, J. Sinha, N. Judell, W. Jie, M. Boonman, S. Tempelaars, Y. van Dommelen, H. Kattouw, J. Hauschild, B. Hughes, A. Grabbe, and L. Stanton, “Approaching new metrics for wafer flatness: an investigation of the lithographic consequences of wafer non-flatness,” Proc. SPIE 5375, 1098 (2004).
[CrossRef]

Judell, N.

J. Valley, N. Poduje, J. Sinha, N. Judell, W. Jie, M. Boonman, S. Tempelaars, Y. van Dommelen, H. Kattouw, J. Hauschild, B. Hughes, A. Grabbe, and L. Stanton, “Approaching new metrics for wafer flatness: an investigation of the lithographic consequences of wafer non-flatness,” Proc. SPIE 5375, 1098 (2004).
[CrossRef]

Jupnik, H.

A. H. Bennet, H. Osterberg, and H. Jupnik, Phase Microscopy: Principles and Applications (John Wiley & Sons Inc., New York, 1951).

Kattouw, H.

J. Valley, N. Poduje, J. Sinha, N. Judell, W. Jie, M. Boonman, S. Tempelaars, Y. van Dommelen, H. Kattouw, J. Hauschild, B. Hughes, A. Grabbe, and L. Stanton, “Approaching new metrics for wafer flatness: an investigation of the lithographic consequences of wafer non-flatness,” Proc. SPIE 5375, 1098 (2004).
[CrossRef]

Lazarev, G.

V. A. Andreev, K. V. Indukaev, O. K. Ioselev, A. Legkii, G. Lazarev, and D. Orlov, “Phase modulation microscope MIM-2.1 for measurements of surface microrelief. Results of measurements,” J. Russ. Laser Res. 26, 394 (2005).
[CrossRef]

Legkii, A.

V. A. Andreev, K. V. Indukaev, O. K. Ioselev, A. Legkii, G. Lazarev, and D. Orlov, “Phase modulation microscope MIM-2.1 for measurements of surface microrelief. Results of measurements,” J. Russ. Laser Res. 26, 394 (2005).
[CrossRef]

Maul, M.

O. Noordman, A. Tychkov, J. Baselmans, J. Tsacoyeanes, G. Politi, M. Patra, V. Blahnik, and M. Maul, “Speckle in optical lithography and the influence on line width roughness,” Proc. SPIE 7274, 72741R (2009).
[CrossRef]

Noordman, O.

O. Noordman, A. Tychkov, J. Baselmans, J. Tsacoyeanes, G. Politi, M. Patra, V. Blahnik, and M. Maul, “Speckle in optical lithography and the influence on line width roughness,” Proc. SPIE 7274, 72741R (2009).
[CrossRef]

Orlov, D.

V. A. Andreev, K. V. Indukaev, O. K. Ioselev, A. Legkii, G. Lazarev, and D. Orlov, “Phase modulation microscope MIM-2.1 for measurements of surface microrelief. Results of measurements,” J. Russ. Laser Res. 26, 394 (2005).
[CrossRef]

Osterberg, H.

A. H. Bennet, H. Osterberg, and H. Jupnik, Phase Microscopy: Principles and Applications (John Wiley & Sons Inc., New York, 1951).

Pancharatnam, S.

S. Pancharatnam, Collected Work of S. Pancharatnam, G. W. Series ed. (Oxford Univ. Press, London, 1975).

Patra, M.

O. Noordman, A. Tychkov, J. Baselmans, J. Tsacoyeanes, G. Politi, M. Patra, V. Blahnik, and M. Maul, “Speckle in optical lithography and the influence on line width roughness,” Proc. SPIE 7274, 72741R (2009).
[CrossRef]

Pestov, A. E.

M. M. Barysheva, B. A. Gribkov, Yu. A. Vainer, M. V. Zorina, A. E. Pestov, Yu. Ya. Platonov, D. N. Rogachev, N. N. Salashchenko, and N. I. Chkhalo, “Problem of roughness detection for supersmooth surfaces,” Proc. SPIE 8076, 80760M-1 (2011).

Platonov, Yu. Ya.

M. M. Barysheva, B. A. Gribkov, Yu. A. Vainer, M. V. Zorina, A. E. Pestov, Yu. Ya. Platonov, D. N. Rogachev, N. N. Salashchenko, and N. I. Chkhalo, “Problem of roughness detection for supersmooth surfaces,” Proc. SPIE 8076, 80760M-1 (2011).

Poduje, N.

J. Valley, N. Poduje, J. Sinha, N. Judell, W. Jie, M. Boonman, S. Tempelaars, Y. van Dommelen, H. Kattouw, J. Hauschild, B. Hughes, A. Grabbe, and L. Stanton, “Approaching new metrics for wafer flatness: an investigation of the lithographic consequences of wafer non-flatness,” Proc. SPIE 5375, 1098 (2004).
[CrossRef]

Politi, G.

O. Noordman, A. Tychkov, J. Baselmans, J. Tsacoyeanes, G. Politi, M. Patra, V. Blahnik, and M. Maul, “Speckle in optical lithography and the influence on line width roughness,” Proc. SPIE 7274, 72741R (2009).
[CrossRef]

Rogachev, D. N.

M. M. Barysheva, B. A. Gribkov, Yu. A. Vainer, M. V. Zorina, A. E. Pestov, Yu. Ya. Platonov, D. N. Rogachev, N. N. Salashchenko, and N. I. Chkhalo, “Problem of roughness detection for supersmooth surfaces,” Proc. SPIE 8076, 80760M-1 (2011).

Salashchenko, N. N.

M. M. Barysheva, B. A. Gribkov, Yu. A. Vainer, M. V. Zorina, A. E. Pestov, Yu. Ya. Platonov, D. N. Rogachev, N. N. Salashchenko, and N. I. Chkhalo, “Problem of roughness detection for supersmooth surfaces,” Proc. SPIE 8076, 80760M-1 (2011).

Sinha, J.

J. Valley, N. Poduje, J. Sinha, N. Judell, W. Jie, M. Boonman, S. Tempelaars, Y. van Dommelen, H. Kattouw, J. Hauschild, B. Hughes, A. Grabbe, and L. Stanton, “Approaching new metrics for wafer flatness: an investigation of the lithographic consequences of wafer non-flatness,” Proc. SPIE 5375, 1098 (2004).
[CrossRef]

Stanton, L.

J. Valley, N. Poduje, J. Sinha, N. Judell, W. Jie, M. Boonman, S. Tempelaars, Y. van Dommelen, H. Kattouw, J. Hauschild, B. Hughes, A. Grabbe, and L. Stanton, “Approaching new metrics for wafer flatness: an investigation of the lithographic consequences of wafer non-flatness,” Proc. SPIE 5375, 1098 (2004).
[CrossRef]

Tempelaars, S.

J. Valley, N. Poduje, J. Sinha, N. Judell, W. Jie, M. Boonman, S. Tempelaars, Y. van Dommelen, H. Kattouw, J. Hauschild, B. Hughes, A. Grabbe, and L. Stanton, “Approaching new metrics for wafer flatness: an investigation of the lithographic consequences of wafer non-flatness,” Proc. SPIE 5375, 1098 (2004).
[CrossRef]

Tsacoyeanes, J.

O. Noordman, A. Tychkov, J. Baselmans, J. Tsacoyeanes, G. Politi, M. Patra, V. Blahnik, and M. Maul, “Speckle in optical lithography and the influence on line width roughness,” Proc. SPIE 7274, 72741R (2009).
[CrossRef]

Tychkov, A.

O. Noordman, A. Tychkov, J. Baselmans, J. Tsacoyeanes, G. Politi, M. Patra, V. Blahnik, and M. Maul, “Speckle in optical lithography and the influence on line width roughness,” Proc. SPIE 7274, 72741R (2009).
[CrossRef]

Vainer, Yu. A.

M. M. Barysheva, B. A. Gribkov, Yu. A. Vainer, M. V. Zorina, A. E. Pestov, Yu. Ya. Platonov, D. N. Rogachev, N. N. Salashchenko, and N. I. Chkhalo, “Problem of roughness detection for supersmooth surfaces,” Proc. SPIE 8076, 80760M-1 (2011).

Valley, J.

J. Valley, N. Poduje, J. Sinha, N. Judell, W. Jie, M. Boonman, S. Tempelaars, Y. van Dommelen, H. Kattouw, J. Hauschild, B. Hughes, A. Grabbe, and L. Stanton, “Approaching new metrics for wafer flatness: an investigation of the lithographic consequences of wafer non-flatness,” Proc. SPIE 5375, 1098 (2004).
[CrossRef]

van Dommelen, Y.

J. Valley, N. Poduje, J. Sinha, N. Judell, W. Jie, M. Boonman, S. Tempelaars, Y. van Dommelen, H. Kattouw, J. Hauschild, B. Hughes, A. Grabbe, and L. Stanton, “Approaching new metrics for wafer flatness: an investigation of the lithographic consequences of wafer non-flatness,” Proc. SPIE 5375, 1098 (2004).
[CrossRef]

Wolf, E.

M. Born and E. Wolf, Principles of Optics: Electromagnetic Theory of Propagation, Interference, and Diffraction of Light (Pergamon Press, Oxford, 1970; Nauka, Moscow, 1973).

Zorina, M. V.

M. M. Barysheva, B. A. Gribkov, Yu. A. Vainer, M. V. Zorina, A. E. Pestov, Yu. Ya. Platonov, D. N. Rogachev, N. N. Salashchenko, and N. I. Chkhalo, “Problem of roughness detection for supersmooth surfaces,” Proc. SPIE 8076, 80760M-1 (2011).

J. Russ. Laser Res. (2)

V. A. Andreev, K. V. Indukaev, O. K. Ioselev, A. Legkii, G. Lazarev, and D. Orlov, “Phase modulation microscope MIM-2.1 for measurements of surface microrelief. Results of measurements,” J. Russ. Laser Res. 26, 394 (2005).
[CrossRef]

V. A. Andreev and K. V. Indukaev, “The Rytov–Vladimirskii phase and interferometric measurements,” J. Russ. Laser Res. 22, 1 (2001).
[CrossRef]

Proc. SPIE (4)

O. Noordman, A. Tychkov, J. Baselmans, J. Tsacoyeanes, G. Politi, M. Patra, V. Blahnik, and M. Maul, “Speckle in optical lithography and the influence on line width roughness,” Proc. SPIE 7274, 72741R (2009).
[CrossRef]

M. M. Barysheva, B. A. Gribkov, Yu. A. Vainer, M. V. Zorina, A. E. Pestov, Yu. Ya. Platonov, D. N. Rogachev, N. N. Salashchenko, and N. I. Chkhalo, “Problem of roughness detection for supersmooth surfaces,” Proc. SPIE 8076, 80760M-1 (2011).

J. Valley, N. Poduje, J. Sinha, N. Judell, W. Jie, M. Boonman, S. Tempelaars, Y. van Dommelen, H. Kattouw, J. Hauschild, B. Hughes, A. Grabbe, and L. Stanton, “Approaching new metrics for wafer flatness: an investigation of the lithographic consequences of wafer non-flatness,” Proc. SPIE 5375, 1098 (2004).
[CrossRef]

T. Fujisawa, S. Inoue, and T. Hagiwara, “Desirable wafer edge flatness for CD control in photolithography,” Proc. SPIE 5040, 600 (2003).
[CrossRef]

Other (7)

M. Born and E. Wolf, Principles of Optics: Electromagnetic Theory of Propagation, Interference, and Diffraction of Light (Pergamon Press, Oxford, 1970; Nauka, Moscow, 1973).

V. A. Andreev, K. V. Indukaev, and P. A. Osipov, “Method of determining the microrelief of an object and the optical properties of the near-surface layer, modulation interference microscope for implementing the method,” Russian Patent No. 2 181 498 (2002).

V. A. Andreev, K. V. Indukaev, and P. A. Osipov, “Method for measuring the microrelief of an object and optical characteristics of near-surface layer, modulation interference microscope for carrying out said method,” Europ. Pat. Appl. 01922153.0-2217, 1/23 (2001).

V. A. Andreev, K. V. Indukaev, and P. A. Osipov, “Method for determining an object microrelief and optical properties of a surface layer, a modulation interference microscope for the method realization,” U.S. Patent 7 221 458, B2 (2003).

A. H. Bennet, H. Osterberg, and H. Jupnik, Phase Microscopy: Principles and Applications (John Wiley & Sons Inc., New York, 1951).

S. Pancharatnam, Collected Work of S. Pancharatnam, G. W. Series ed. (Oxford Univ. Press, London, 1975).

K. V. Indukaev and P. A. Osipov, “Device for displacing an object,” Russian Patent No. 2 385 220 (2008).

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