Abstract

This paper proposes a model of photogrammetric distortion and a mathematical apparatus for determining it from measured values of transverse aberrations. The distortion considered here is described by means of orthogonal Zernike polynomials.

© 2012 OSA

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References

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  1. D. Flagello, “Towards a comprehensive control of full-field image quality in optical lithography,” Proc. SPIE 3051, 672 (1997).
    [CrossRef]
  2. M. M. Rusinov, Engineering Photogrammetry (Nedra, Moscow, 1966).
  3. M. Born and E. Wolf, Principles of Optics: Electromagnetic Theory of Propagation, Interference, and Diffraction of Light (Pergamon Press, Oxford, 1965; Nauka, Moscow, 1970).

1997 (1)

D. Flagello, “Towards a comprehensive control of full-field image quality in optical lithography,” Proc. SPIE 3051, 672 (1997).
[CrossRef]

Born, M.

M. Born and E. Wolf, Principles of Optics: Electromagnetic Theory of Propagation, Interference, and Diffraction of Light (Pergamon Press, Oxford, 1965; Nauka, Moscow, 1970).

Flagello, D.

D. Flagello, “Towards a comprehensive control of full-field image quality in optical lithography,” Proc. SPIE 3051, 672 (1997).
[CrossRef]

Rusinov, M. M.

M. M. Rusinov, Engineering Photogrammetry (Nedra, Moscow, 1966).

Wolf, E.

M. Born and E. Wolf, Principles of Optics: Electromagnetic Theory of Propagation, Interference, and Diffraction of Light (Pergamon Press, Oxford, 1965; Nauka, Moscow, 1970).

Proc. SPIE (1)

D. Flagello, “Towards a comprehensive control of full-field image quality in optical lithography,” Proc. SPIE 3051, 672 (1997).
[CrossRef]

Other (2)

M. M. Rusinov, Engineering Photogrammetry (Nedra, Moscow, 1966).

M. Born and E. Wolf, Principles of Optics: Electromagnetic Theory of Propagation, Interference, and Diffraction of Light (Pergamon Press, Oxford, 1965; Nauka, Moscow, 1970).

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