Abstract
Multiangle ellipsometric studies of hafnium dioxide films 30-300nm thick, deposited on optical glass by electron-beam evaporation, have been
carried out in the 314-632-nm spectral region. It is found that the collection of ellipsometric data
can be described in a model of a two-layer reflective system. The parameters of the
system are found. The inner layer is homogeneous, its refractive index, within the
limits of error of the computational procedure, is identical for all the test
samples, and the thickness increases during the deposition of the film. The outer
layer has a lower refractive index than the inner one, and its thickness varies
within the limits 10-20nm for the different samples.
© 2009 Optical Society of America
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