Abstract

This paper proposes a method of monitoring the optical constants and thickness of a layer while it is being deposited in vacuum, using measurements of the reflectance and transmittance on two substrates with different refractive indices. All four measured signals, as well as the background-illumination signal, are monitored by a monochromatic spatial radiation detector. The system was certified using nickel films up to 80nm thick.

© 2008 Optical Society of America

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References

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  1. S. V. Andreev, N. N. Karasev, É. S. Putilin, and A. O. Shakin, “Automation of photometric monitoring of the thickness of deposited layers,” Izv. Vyssh. Uchebn. Zaved. Élektronika 6, 85 (2003).

2003

S. V. Andreev, N. N. Karasev, É. S. Putilin, and A. O. Shakin, “Automation of photometric monitoring of the thickness of deposited layers,” Izv. Vyssh. Uchebn. Zaved. Élektronika 6, 85 (2003).

Izv. Vyssh. Uchebn. Zaved. Élektronika

S. V. Andreev, N. N. Karasev, É. S. Putilin, and A. O. Shakin, “Automation of photometric monitoring of the thickness of deposited layers,” Izv. Vyssh. Uchebn. Zaved. Élektronika 6, 85 (2003).

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