Abstract

The quality level of optoelectronic devices and complexes largely depends on the antireflection, reflective, spectral-splitting, and other forms of coatings used in optical systems. The prospect of bringing into commercial use next-generation coatings—gradient optical coatings and thick correction layers capable of changing the course of the rays in an optical medium—requires the synthesis of new film-forming materials. The coatings developed by Spektr Scientific-Technical Center of the Russian Academy of Sciences and the Academy of Engineering Sciences of the Russian Federation and certified at the enterprises of OAO S. A. Zverev Krasnogorsk Factory can be recommended for the solution of the problems indicated above. Optical coatings fabricated using gadolinium zirconate (Gd<sub>2</sub>Zr<sub>2</sub>O<sub>7</sub>) and lutetium zirconate (Lu<sub>2</sub>Zr<sub>2</sub>O<sub>7</sub>) are distinguished by improved optical parameters by comparison with standard coatings, as well as possessing superior mechanical, radiation, and thermal stability.

© 2007 Optical Society of America

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References

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  1. Sh. A. Furman, Thin-Film Optical Coatings (Mashinostroenie, Leningrad, 1977), pp. 260-280.
  2. S. P. Ionov, A. S. Alikhanyan, and V. P. Orlovskiĭ, "Relative chemical potential (RCP) of the zirconium atom in molecules and crystals," Dokl. Akad. Nauk SSSR 336, No. 2, 206 (1994).
  3. S. P. Ionov, A. S. Alikhanyan, G. E. Sukhanova, and V. V. Kirilenko, Zh. Fiz. Khim. 67, 1149 (1993).
  4. K. N. Marushkin, A. S. Alikhanyan, and V. P. Orlovskiĭ, "Thermodynamic properties of zirconium, hafnium, and yttrium oxides," Zh. Neorg. Khim. 35, 2071 (1990).
  5. Research report "Fundamental and exploratory studies on the creation of new film-forming materials based on complex oxides and fluorides of metals for vacuum sputtering," (NTTs Spektr RAN and AIN RF, Moscow, 2003).
  6. L. Holland, Vacuum Deposition of Thin Films (Chapman and Hall, London, 1956; Gosénergoizdat, Moscow, 1963), pp. 525-581.
  7. A. Ritter, "Thin-film dielectric materials for optical applications," in The Physics of Thin Films: Advances in Research and Development, ed. G.Hass and R.E.Thun (Academic Press, New York, 1976; Mir, Moscow, 1978), vol. 8, pp. 60-70.
  8. S.M.Kuznetsov and M.A.Okatov, eds. Optical Technician's Handbook (Mashinostroenie, Leningrad, 1983).
  9. H. K. Pulker, "Characterization of optical thin films," Appl. Opt. 12, 1969 (1979).
  10. P. P. Yakovlev and B. B. Meshkov, Designing Interference Coatings (Mashinostroenie, Moscow, 1987).
  11. V. A. Krzhizhanovskaya, L. G. Shcherbakova, É. K. Keler, and V. B. Glushkova, "The mechanism of the interaction between Lu2O3 and ZrO2," Izv. Akad. Nauk SSSR, Neorg. Mater. 8, 536 (1972).
  12. M. B. Svechnikov, compiler, Radiation Strength of Dielectric Coatings of the Optical Elements of High-Power Solid-State Lasers, part 2, Review No. 5073 (TsNIII Informatsii i TÉI, Moscow, 1990).
  13. Tagechi Hideki, Takahashi Yusuzi, and Matasimo Cujo, Jpn. J. Appl. Phys. 19, 1417 (1980).
    [CrossRef]
  14. R. J. Ackerman and R. Thorn, "Vaporization of oxides," Progr. Ceram. Sci. 1, 39 (1961).

1994 (1)

S. P. Ionov, A. S. Alikhanyan, and V. P. Orlovskiĭ, "Relative chemical potential (RCP) of the zirconium atom in molecules and crystals," Dokl. Akad. Nauk SSSR 336, No. 2, 206 (1994).

1993 (1)

S. P. Ionov, A. S. Alikhanyan, G. E. Sukhanova, and V. V. Kirilenko, Zh. Fiz. Khim. 67, 1149 (1993).

1990 (1)

K. N. Marushkin, A. S. Alikhanyan, and V. P. Orlovskiĭ, "Thermodynamic properties of zirconium, hafnium, and yttrium oxides," Zh. Neorg. Khim. 35, 2071 (1990).

1980 (1)

Tagechi Hideki, Takahashi Yusuzi, and Matasimo Cujo, Jpn. J. Appl. Phys. 19, 1417 (1980).
[CrossRef]

1979 (1)

H. K. Pulker, "Characterization of optical thin films," Appl. Opt. 12, 1969 (1979).

1972 (1)

V. A. Krzhizhanovskaya, L. G. Shcherbakova, É. K. Keler, and V. B. Glushkova, "The mechanism of the interaction between Lu2O3 and ZrO2," Izv. Akad. Nauk SSSR, Neorg. Mater. 8, 536 (1972).

1961 (1)

R. J. Ackerman and R. Thorn, "Vaporization of oxides," Progr. Ceram. Sci. 1, 39 (1961).

Appl. Opt. (1)

H. K. Pulker, "Characterization of optical thin films," Appl. Opt. 12, 1969 (1979).

Dokl. Akad. Nauk SSSR (1)

S. P. Ionov, A. S. Alikhanyan, and V. P. Orlovskiĭ, "Relative chemical potential (RCP) of the zirconium atom in molecules and crystals," Dokl. Akad. Nauk SSSR 336, No. 2, 206 (1994).

Izv. Akad. Nauk SSSR, Neorg. Mater. (1)

V. A. Krzhizhanovskaya, L. G. Shcherbakova, É. K. Keler, and V. B. Glushkova, "The mechanism of the interaction between Lu2O3 and ZrO2," Izv. Akad. Nauk SSSR, Neorg. Mater. 8, 536 (1972).

Jpn. J. Appl. Phys. (1)

Tagechi Hideki, Takahashi Yusuzi, and Matasimo Cujo, Jpn. J. Appl. Phys. 19, 1417 (1980).
[CrossRef]

Progr. Ceram. Sci. (1)

R. J. Ackerman and R. Thorn, "Vaporization of oxides," Progr. Ceram. Sci. 1, 39 (1961).

Zh. Fiz. Khim. (1)

S. P. Ionov, A. S. Alikhanyan, G. E. Sukhanova, and V. V. Kirilenko, Zh. Fiz. Khim. 67, 1149 (1993).

Zh. Neorg. Khim. (1)

K. N. Marushkin, A. S. Alikhanyan, and V. P. Orlovskiĭ, "Thermodynamic properties of zirconium, hafnium, and yttrium oxides," Zh. Neorg. Khim. 35, 2071 (1990).

Other (7)

Research report "Fundamental and exploratory studies on the creation of new film-forming materials based on complex oxides and fluorides of metals for vacuum sputtering," (NTTs Spektr RAN and AIN RF, Moscow, 2003).

L. Holland, Vacuum Deposition of Thin Films (Chapman and Hall, London, 1956; Gosénergoizdat, Moscow, 1963), pp. 525-581.

A. Ritter, "Thin-film dielectric materials for optical applications," in The Physics of Thin Films: Advances in Research and Development, ed. G.Hass and R.E.Thun (Academic Press, New York, 1976; Mir, Moscow, 1978), vol. 8, pp. 60-70.

S.M.Kuznetsov and M.A.Okatov, eds. Optical Technician's Handbook (Mashinostroenie, Leningrad, 1983).

M. B. Svechnikov, compiler, Radiation Strength of Dielectric Coatings of the Optical Elements of High-Power Solid-State Lasers, part 2, Review No. 5073 (TsNIII Informatsii i TÉI, Moscow, 1990).

P. P. Yakovlev and B. B. Meshkov, Designing Interference Coatings (Mashinostroenie, Moscow, 1987).

Sh. A. Furman, Thin-Film Optical Coatings (Mashinostroenie, Leningrad, 1977), pp. 260-280.

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