Abstract

Electron-beam-induced absorption in quartz glasses of types KS-4V, KU-1, and Corning 7940 has been experimentally investigated in the 150-1000-nm region. Samples of optical materials were irradiated in regimes similar to the operating conditions of the windows of electron-beam excimer lasers, in particular, powerful KrF lasers for laser thermonuclear synthesis. It is shown that the electron-beam-induced absorption in all the quartz glasses that were tested reaches a steady-state level during irradiation that is determined by the mean specific power density of the electron beam. Under identical irradiation conditions, the steady-state absorption level in KS-4V glass in the UV region is about a factor of 4 less than in KU-1 glass and a factor of 2 less than in Corning 7940. © 2004 Optical Society of America

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