Electron-beam-induced absorption in quartz glasses of types KS-4V, KU-1, and Corning 7940 has been experimentally investigated in the 150-1000-nm region. Samples of optical materials were irradiated in regimes similar to the operating conditions of the windows of electron-beam excimer lasers, in particular, powerful KrF lasers for laser thermonuclear synthesis. It is shown that the electron-beam-induced absorption in all the quartz glasses that were tested reaches a steady-state level during irradiation that is determined by the mean specific power density of the electron beam. Under identical irradiation conditions, the steady-state absorption level in KS-4V glass in the UV region is about a factor of 4 less than in KU-1 glass and a factor of 2 less than in Corning 7940. © 2004 Optical Society of America

PDF Article

Cited By

You do not have subscription access to this journal. Cited by links are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
Login to access OSA Member Subscription