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How the ion-sputtering regime affects the microrelief of holographic diffraction gratings

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Abstract

The effect of ion sputtering on the line profile of holographic diffraction gratings has been modelled by computer and studied experimentally. It has been established that computer modelling gives a good description of the experimental results, and this makes it possible to use it for a purposeful search for the optimum ion-profiling regimes of holographic diffraction gratings.

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